Abstract: A booklet storage includes a first storage member that includes a first receiver portion and a second receiver portion connecting with the first receiver portion; and a second storage member that includes a third receiver portion and a fourth receiver portion connecting with the third receiver portion, wherein the first storage member and the second storage member together receive a booklet in combination, and wherein a first width between the first receiver portion or the second receiver portion and the third receiver portion and a second width between the first receiver portion or the second receiver portion and the fourth receiver portion are different from each other.

Abstract: Provided a measuring apparatus includes a wavelength dispersion device which dispersed light reflected by one surface of an examination target having a thickness D and light reflected by a rear surface of the examination target, as incident light, a detector in which a plurality of photodetection elements receiving light dispersed by the wavelength dispersion device and detecting a power of the received light in are provided in an array shape, and a piezoelectric device which is attached to the detector to convert an applied voltage into a mechanical power, wherein the detector detects the power of the received light when the detector is shifted by the mechanical power converted by the piezoelectric device as much as d/m, where d is a width of each of the photodetection elements in an array direction and m is an integer equal to or greater than 2.

Abstract: There is provided a plasma processing apparatus including a susceptor 114, having a substrate mounting portion for mounting thereon a substrate, to which a high frequency power is applied; a focus ring 210, disposed to surround the substrate mounted on the substrate mounting portion, including an outer ring 214 having a top surface higher than a top surface of the substrate and an inner ring 212 extending inwardly from the outer ring so as to allow at least a part of the inner ring to be positioned below a periphery of the substrate, the outer ring and the inner ring being formed as a single member; a dielectric ring 220 positioned between the focus ring and the susceptor; a dielectric constant varying device 250 for varying a dielectric constant of the dielectric ring.

Abstract: An electrostatic chuck for attracting and holding a substrate by using an electrostatic force includes a plurality of protrusion portions to be brought into contact with the substrate. The protrusion portions are formed of a ceramic dielectric including grains each having a specified particle diameter, and contact surfaces of the protrusion portions with the substrate are formed to have a surface roughness depending on the particle diameter.

Abstract: A substrate mounting table for mounting a substrate in a substrate processing apparatus includes a mounting table main body, an annular peripheral protrusion portion which is formed such that when the substrate is loaded on a reference surface at a substrate mounting side of the mounting table main body, it is in contact with a peripheral portion of the substrate and a sealed space filled with a heat transfer gas is formed below the substrate, a plurality of first protrusions which are formed on the reference surface inward from the annular peripheral protrusion portion such that they are in contact with the substrate when the substrate is loaded on the substrate mounting table, and a number of second protrusions which are provided independently of the first protrusions on the reference surface inward from the annular peripheral protrusion portion such that they are close to the substrate without contacting it when the substrate is loaded on the substrate mounting table.

Abstract: A machine user interface (UI) having a control panel that includes (a) controllable machine operating software; (b) a controllable display screen for displaying results from the controllable machine operating software; (c) a housing for the UI containing the controllable display screen; and (d) a button delineating control panel on the housing for containing a first series of buttons for controlling the controllable machine operating software, and a second series of buttons for controlling the controllable display screen. The button delineating control panel includes a first portion having a first plane for containing the first series of buttons, and a second portion having a second plane for containing the second series of buttons. The second plane intersects the first plane forming a delineating angle with the first plane.

Abstract: An electrostatic chuck for attracting and holding a substrate by using an electrostatic force includes a plurality of protrusion portions to be brought into contact with the substrate. The protrusion portions are formed of a ceramic dielectric including grains each having a specified particle diameter, and contact surfaces of the protrusion portions with the substrate are formed to have a surface roughness depending on the particle diameter.

Abstract: The present invention provides a weaving system for woven fabrics of various kinds in small lots, capable of weaving woven fabrics of various kinds in small lots in a continuous operation by an existing weaving machine while preventing generation of waste to the minimum degree. A weaving system for woven fabrics of various kinds in small lots, comprises the steps of successively selecting a plurality of kinds of threads according to a preliminarily designed design pattern, producing a thread supplying package for the warp by jointing per a predetermined thread supply amount, warping a plurality of the thread supplying packages for the warp so as to provide a warp beam, and organizing a weft to the warp supplied from the warp beam for forming different design patterns of a plurality of kinds continuously each with a warp thread jointing area disposed therebetween in the weaving direction.

Abstract: When a substrate 30 is to be subjected to a magnetron plasma process, a dipole ring magnet 21 is provided, in which a large number of anisotropic segment magnets 22 are arranged in a ring-like shape around the outer wall of a chamber 1. A magnetic field gradient, wherein the magnetic field strength decreases from the E pole side toward the W pole side in a direction perpendicular to a magnetic field direction B, is formed in a plane perpendicular to the direction of an electric field between a pair of electrodes separated from each other. The anisotropic segment magnets have a first section a including anisotropic segment magnets arranged in the vicinity of a region A located outside an E pole side end of the process substrate with an N pole thereof being directed toward this region, and a second portion b including anisotropic segment magnets arranged with an S pole thereof being directed toward this region, to locally increase the magnetic field strengths of the first and second regions.

Abstract: An object of the disclosure is to provide a vacuum processing apparatus capable of minimizing the size of the whole apparatus by reducing a floor area occupied by a vacuum pump. An etching apparatus 20 for applying an etching process on an object to be processed in a vacuum includes a processing vessel 21 for applying the etching process on a semiconductor wafer W introduced into the vessel 21 and a vacuum pump 30 arranged below the processing vessel 21 so as to be coaxial with the processing vessel 21, for sucking exhaust gas in the processing vessel 21 to form the vacuum.

Abstract: The present invention provides a weaving system for woven fabrics of various kinds in small lots, capable of weaving woven fabrics of various kinds in small lots in a continuous operation by an existing weaving machine while preventing generation of waste co the minimum degree. A weaving system for woven fabrics of various kinds in small lots, comprises the steps of successively selecting a plurality of kinds of threads according to a preliminarily designed design pattern, producing a thread supplying package for the warp by jointing per a predetermined thread supply amount, warping a plurality of the thread supplying packages for the warp so as to provide a warp beam, and organizing a weft to the warp supplied from the warp beam for forming different design patterns of a plurality of kinds continuously each with a warp thread jointing area disposed therebetween in the weaving direction.