Patents by Inventor Hiroshi Kawasaki

Hiroshi Kawasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240149390
    Abstract: Provided is a polishing pad comprising a polishing layer made of a polyurethane resin foam containing an isocyanate-terminated prepolymer, and a curing agent, wherein the ratio (NC80/NC40) of a weight proportion (NC80) of an amorphous phase content in the polishing layer measured at 80° C. by a pulsed NMR method to a weight proportion (NC40) of the amorphous phase content in the polishing layer measured at 40° C. by the pulsed NMR method is between 1.5 and 2.5.
    Type: Application
    Filed: March 18, 2022
    Publication date: May 9, 2024
    Applicant: FUJIBO HOLDINGS, INC.
    Inventors: Yoshihide KAWAMURA, Teppei TATENO, Hiroshi KURIHARA, Satsuki YAMAGUCHI, Yamato TAKAMIZAWA, Keisuke OCHI, Tetsuaki KAWASAKI
  • Publication number: 20240138695
    Abstract: A skin resistance measurement device includes a pair of electrode portions provided on an epidermis and a measurement portion configured to measure skin resistance between the pair of electrode portions. The pair of electrode portions has a structure in which drying of the epidermis is naturally performed.
    Type: Application
    Filed: March 11, 2022
    Publication date: May 2, 2024
    Inventors: Takao SOMEYA, Akihito MIYAMOTO, Ikue KAWASHIMA, Masayuki AMAGAI, Hiroshi KAWASAKI
  • Publication number: 20240131653
    Abstract: This polishing pad has a polishing layer that comprises a polyurethane resin foam derived from an isocyanate-terminated prepolymer and a curing agent, wherein: the distance between hard segments in the polishing layer as measured by small-angle X-ray scattering is 9.5 nm or less; or the ratio (NC80/CC80) of the content proportion by weight (NC80) of an amorphous phase in the polishing layer as measured by pulse NMR at 80° C. to the content proportion by weight (CC80) of a crystalline phase in the polishing layer as measured by pulse NMR at 80° C. is 2.6-3.1, and the ratio (NC40/CC40) of the content proportion by weight (NC40) of an amorphous phase in the polishing layer as measured by pulse NMR at 40° C. to the content proportion by weight (CC40) of a crystalline phase in the polishing layer as measured by pulse NMR at 40° C. is 0.5-0.9.
    Type: Application
    Filed: March 28, 2022
    Publication date: April 25, 2024
    Applicant: FUJIBO HOLDINGS, INC.
    Inventors: Teppei TATENO, Hiroshi KURIHARA, Satsuki YAMAGUCHI, Yamato TAKAMIZAWA, Keisuke OCHI, Tetsuaki KAWASAKI
  • Publication number: 20240100305
    Abstract: A guide wire is provided with a core shaft, a coil portion, a sound source, and wiring. The coil portion is coupled to a distal end portion of the core shaft and is helically wound around a periphery of the core shaft to the rearward. The coil portion includes an open portion in which an interval of element wires constituting the coil portion itself is larger than that in another portion. The sound source is provided in an inner side of the open portion. The wiring extends along an extending direction of the core shaft, and a distal end of the wiring is positioned at an inner side of the coil portion. The wiring supplies energy to the sound source.
    Type: Application
    Filed: September 14, 2023
    Publication date: March 28, 2024
    Inventors: Hirozumi Takeshima, Tomohiko Tanaka, Hiroshi Kuribara, Hironori Kawasaki
  • Patent number: 11905848
    Abstract: To provide a turbine blade, a manufacturing method for a turbine blade, and a gas turbine. In the turbine blade including a cooling passage provided along a blade height direction, the cooling passage includes: a first cooling hole including one end opening toward a front end, and having an inner diameter that is constant along the blade height direction; and a second cooling hole including one end communicating with the other end of the first cooling hole without a level difference, and having an inner diameter that is increased toward a base end. A length from the one end of the first cooling hole to a position where the first cooling hole and the second cooling hole are communicated with is 40% to 60% of a length from the one end of the first cooling hole to a gas path surface on the base end.
    Type: Grant
    Filed: June 1, 2020
    Date of Patent: February 20, 2024
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Masayoshi Hatta, Keita Takamura, Susumu Wakazono, Takashi Fujii, Hiroyuki Otomo, Yosuke Mukai, Kazuhisa Tamura, Takaaki Oda, Hiroshi Kawasaki, Hiroyuki Kishihara
  • Patent number: 11840754
    Abstract: There is provided a vapor deposition mask including: a resin mask including a plurality of resin mask openings corresponding to a pattern to be produced by vapor deposition; and a metal mask including a metal mask opening, the resin mask and the metal mask being stacked such that the resin mask openings overlap with the metal mask opening, wherein a shape of the metal mask opening as the metal mask is seen in plan view includes a polygon as a basic shape and an elongation part, added to the polygon, the elongation part elongating a length of a whole periphery of the polygon.
    Type: Grant
    Filed: June 27, 2017
    Date of Patent: December 12, 2023
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hiroshi Kawasaki, Yasuko Sone, Kumiko Hokari
  • Publication number: 20230120663
    Abstract: A gateway device (30) relays voice communication between a communication terminal to be connected to a closed network (10) and a communication terminal to be connected to a LAN (20). The gateway device (30) includes a closed network communicator (31) connected to the closed network (10), a communication relay (32) to perform encapsulation or decapsulation of data for enabling voice communication between the closed network (10) and the LAN (20), and a LAN communicator (33) connected to the LAN (20).
    Type: Application
    Filed: July 20, 2021
    Publication date: April 20, 2023
    Inventor: Hiroshi KAWASAKI
  • Patent number: 11534105
    Abstract: An estimation method for estimating a parameter related to skin function is provided. The estimation method includes an image acquisition step for acquiring a skin image in which unevenness of a skin surface is captured; an extraction step for extracting a feature vector based on topological information on the skin image from the skin image acquired in the image acquisition step; an estimation step for estimating the parameter related to skin function based on the feature vector extracted in the extraction step, using an estimation model constructed based on past actual measurement data in which feature vectors are associated with the parameter related to skin function; and a presentation step for presenting the parameter related to skin function estimated in the estimation step.
    Type: Grant
    Filed: March 19, 2020
    Date of Patent: December 27, 2022
    Assignees: KEIO UNIVERSITY, KOSE Corporation
    Inventors: Hiroshi Kawasaki, Eiryo Kawakami, Keita Koseki, Tamotsu Ebihara, Masayuki Amagai, Eiji Naru, Makoto Mizuno, Miki Ito, Toru Atsugi, Yukako Kimura
  • Patent number: 11404640
    Abstract: A vapor deposition mask includes a metal mask and a resin mask having an opening. An inner wall surface for composing the opening has an inflection point in a thicknesswise cross section of the resin mask. When an intersection of a first surface, not facing the metal mask, of the resin mask and the inner wall surface is set to be a first intersection, an intersection of a second surface, facing the metal mask, of the resin mask and the inner wall surface is set to be a second intersection, and there is set a first inflection point first positioned from the first intersection toward the second intersection, an angle formed by a line connecting the first intersection and the first inflection point and the first surface is larger than an angle formed by a line connecting the first inflection point and the second intersection and the second surface.
    Type: Grant
    Filed: September 30, 2020
    Date of Patent: August 2, 2022
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Toshihiko Takeda, Katsunari Obata, Hiroshi Kawasaki
  • Publication number: 20220195175
    Abstract: A flame retardant resin composition comprising: a hydrogenated petroleum resin, being a hydrogenated product of a polymer of an unsaturated hydrocarbon comprising at least one selected from the group consisting of an alicyclic compound having a five-membered ring and an aromatic hydrocarbon compound; a polyolefin; and an inorganic filler.
    Type: Application
    Filed: April 8, 2020
    Publication date: June 23, 2022
    Applicant: ENEOS CORPORATION
    Inventors: Hiroshi KAWASAKI, Shotaro UCHIZAWA, Ichigen WATANABE
  • Publication number: 20220170376
    Abstract: To provide a turbine blade, a manufacturing method for a turbine blade, and a gas turbine. In the turbine blade including a cooling passage provided along a blade height direction, the cooling passage includes: a first cooling hole including one end opening toward a front end, and having an inner diameter that is constant along the blade height direction; and a second cooling hole including one end communicating with the other end of the first cooling hole without a level difference, and having an inner diameter that is increased toward a base end. A length from the one end of the first cooling hole to a position where the first cooling hole and the second cooling hole are communicated with is 40% to 60% of a length from the one end of the first cooling hole to a gas path surface on the base end.
    Type: Application
    Filed: June 1, 2020
    Publication date: June 2, 2022
    Inventors: Masayoshi HATTA, Keita TAKAMURA, Susumu WAKAZONO, Takashi FUJII, Hiroyuki OTOMO, Yosuke MUKAI, Kazuhisa TAMURA, Takaaki ODA, Hiroshi KAWASAKI, Hiroyuki KISHIHARA
  • Publication number: 20220142561
    Abstract: An estimation method according to the disclosure for estimating a parameter related to skin function, the estimation method includes an image acquisition step for acquiring a skin image in which unevenness of a skin surface is captured; an extraction step for extracting a feature vector based on topological information on the skin image from the skin image acquired in the image acquisition step; an estimation step for estimating the parameter related to skin function based on the feature vector extracted in the extraction step, using an estimation model constructed based on past actual measurement data in which feature vectors are associated with the parameter related to skin function; and a presentation step for presenting the parameter related to skin function estimated in the estimation step.
    Type: Application
    Filed: March 19, 2020
    Publication date: May 12, 2022
    Applicants: KEIO UNIVERSITY, KOSE Corporation
    Inventors: Hiroshi KAWASAKI, Eiryo KAWAKAMI, Keita KOSEKI, Tamotsu EBIHARA, Masayuki AMAGAI, Eiji NARU, Makoto MIZUNO, Miki ITO, Toru ATSUGI, Yukako KIMURA
  • Patent number: 11196002
    Abstract: In a method for producing a vapor deposition mask including a resin mask 20 including resin mask openings 25 corresponding to a pattern to be produced by vapor deposition, and a metal mask 10 including a metal mask opening 15, the metal mask being stacked on one surface of the resin mask, when the plurality of resin mask openings 25 are formed, as to any one resin mask opening 25a of the plurality of resin mask openings 25, the resin mask opening 25 is formed such that in a thicknesswise cross section of the resin mask, an acute angle (?1) formed by one inner wall surface forming the one resin mask opening and the other surface of the resin mask is different from an acute angle (?2) formed by the other inner wall surface forming the one resin mask opening and the other surface of the resin mask.
    Type: Grant
    Filed: October 4, 2017
    Date of Patent: December 7, 2021
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hiroshi Kawasaki, Katsunari Obata
  • Publication number: 20210214843
    Abstract: A vapor deposition mask includes: a metal mask in which a metal mask opening is provided; and a resin mask in which a resin mask opening corresponding to a pattern to be produced by vapor deposition is provided at a position overlapping with the metal mask opening, the metal mask and the resin mask being stacked, wherein an arithmetic average height (Sa) of a surface of the resin mask exposed from the metal mask opening is not more than 0.8 ?m.
    Type: Application
    Filed: December 15, 2020
    Publication date: July 15, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Yasuko SONE, Hiroshi KAWASAKI, Yoshinori HIROBE, Katsunari OBATA, Asako NARITA, Hitoshi ISHIRO, Chiaki HATSUTA
  • Publication number: 20210207258
    Abstract: There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal mask 10 in which a slit 15 is provided and a resin mask 20 in which openings 25 corresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slit 15 are stacked, and the metal mask 10 has a general region 10a in which the slit 15 is provided and a thick region 10b larger in thickness than the general region.
    Type: Application
    Filed: March 19, 2021
    Publication date: July 8, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Katsunari OBATA, Toshihiko TAKEDA, Hiroshi KAWASAKI, Hiroyuki NISHIMURA, Atsushi MAKI, Hiromitsu OCHIAI, Yoshinori HIROBE
  • Publication number: 20210167290
    Abstract: A vapor deposition mask capable of correctly performing confirmation of whether a shape pattern of openings formed in a resin mask is normal or similar confirmation while satisfying both high definition and lightweight, a vapor deposition mask preparation body for obtaining the vapor deposition mask, a frame-equipped vapor deposition mask including the vapor deposition mask, and a method for producing an organic semiconductor element using the frame-equipped vapor deposition mask. The aforementioned problem is solved by using, in a vapor deposition mask including a metal mask in which a through hole is formed and a resin mask in which an opening corresponding to a pattern to be produced by vapor deposition is formed at a position overlapping with the through hole, the metal mask and the resin mask being stacked, wherein the resin mask has about 40% or less of light ray transmittance at a wavelength of about 550 nm.
    Type: Application
    Filed: January 20, 2021
    Publication date: June 3, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Toshihiko TAKEDA, Hiroshi KAWASAKI, Katsunari OBATA
  • Patent number: 10982317
    Abstract: There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal mask 10 in which a slit 15 is provided and a resin mask 20 in which openings 25 corresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slit 15 are stacked, and the metal mask 10 has a general region 10a in which the slit 15 is provided and a thick region 10b larger in thickness than the general region.
    Type: Grant
    Filed: February 11, 2020
    Date of Patent: April 20, 2021
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Katsunari Obata, Toshihiko Takeda, Hiroshi Kawasaki, Hiroyuki Nishimura, Atsushi Maki, Hiromitsu Ochiai, Yoshinori Hirobe
  • Patent number: 10978641
    Abstract: A vapor deposition mask capable of correctly performing confirmation of whether a shape pattern of openings formed in a resin mask is normal or similar confirmation while satisfying both high definition and lightweight, a vapor deposition mask preparation body for obtaining the vapor deposition mask, a frame-equipped vapor deposition mask including the vapor deposition mask, and a method for producing an organic semiconductor element using the frame-equipped vapor deposition mask. The aforementioned problem is solved by using, in a vapor deposition mask including a metal mask in which a through hole is formed and a resin mask in which an opening corresponding to a pattern to be produced by vapor deposition is formed at a position overlapping with the through hole, the metal mask and the resin mask being stacked, wherein the resin mask has about 40% or less of light ray transmittance at a wavelength of about 550 nm.
    Type: Grant
    Filed: January 13, 2020
    Date of Patent: April 13, 2021
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Toshihiko Takeda, Hiroshi Kawasaki, Katsunari Obata
  • Patent number: 10910717
    Abstract: An antenna device including a first rod-shaped core having a flange portion and a second rod-shaped core having a flange portion, which are arranged in series and including a first coil and a second coil, wherein the end surface of the first rod-shaped core and the end surface of the second rod-shaped core are spaced.
    Type: Grant
    Filed: December 8, 2017
    Date of Patent: February 2, 2021
    Assignee: SUMIDA CORPORATION
    Inventors: Yoshinori Inoue, Isao Douchi, Kei Tanaka, Takanari Fujimaki, Yoshinori Miura, Hiroshi Kawasaki, Hiromitsu Kuriki, Takanobu Rokuka, Hiroyuki Miyazaki
  • Publication number: 20210020840
    Abstract: A vapor deposition mask includes a metal mask and a resin mask having an opening. An inner wall surface for composing the opening has an inflection point in a thicknesswise cross section of the resin mask. When an intersection of a first surface, not facing the metal mask, of the resin mask and the inner wall surface is set to be a first intersection, an intersection of a second surface, facing the metal mask, of the resin mask and the inner wall surface is set to be a second intersection, and there is set a first inflection point first positioned from the first intersection toward the second intersection, an angle formed by a line connecting the first intersection and the first inflection point and the first surface is larger than an angle formed by a line connecting the first inflection point and the second intersection and the second surface.
    Type: Application
    Filed: September 30, 2020
    Publication date: January 21, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Toshihiko TAKEDA, Katsunari OBATA, Hiroshi KAWASAKI