Abstract: Methods and apparatus are disclosed for microlithographically exposing a photosensitive substrate comprising single-exposure areas and multiple-exposure areas. After exposing the substrate, line widths in the single-exposure areas are substantially the same as line widths in the multiple-exposure areas. Also disclosed are masks comprising a first mask pattern used to expose the single-exposure areas once and a plurality of other mask patterns for exposing the multiple-exposure areas a predetermined number of times. Each of the other mask patterns allows a lower intensity of illumination light flux to be distributed to the multiple-exposure areas per exposure of the substrate than allowed by the first mask pattern. Consequently, the average intensity of illumination-light flux distributed to the single-exposure area after one exposure is substantially equal to the average intensity of illumination-light flux distributed to the multiple-exposure areas after a predetermined number of exposures of such areas.

Abstract: Projection exposure systems and methods are disclosed that achieve higher light intensities and reduce the time required for each exposure in multiple exposures of non-linear resists such as a two-photon-absorption resist. Using spatial redistribution of laser light, an illumination optical system forms an illumination region that illuminates only a portion of the pattern on a mask with spatially coherent light from a light source. The system forms the entire mask pattern on a substrate by repeating a non-linear exposure while moving the illumination region and the mask pattern relative to one another. To exploit temporal redistribution of laser light, an illumination optical system employs a pulsed-oscillation-type laser light source to form a mask pattern while varying the light intensity profile on a mask.

Abstract: An observation apparatus of the present comprises (i) a light source for generating light; (ii) a separating optical system which splits the light from the light source into two different polarized light beams; (iii) a condenser optical system which converges the two polarized light beams from the separating optical system so as to respectively form light spots on two different positions on a sample object; (iv) a polarization selecting means which has a predetermined analyzer angle and selects a specific polarized light component from composite light made of the two polarized light beams by way of the sample object; (v) light detecting means which detects the polarized light component selected by the polarization selecting means; and (vi) phase difference adjustment means which adjusts a phase difference between the two polarized light beams by way of the sample object and guides composite light composed of the two polarized light beams as circularly polarized light to the polarization selecting means, when

Abstract: The present invention relates to a projection exposure method and an exposure apparatus for projecting a pattern on a photo-mask through a projection optical system onto a predetermined photosensitive material. The photosensitive material is a nonlinear photosensitive material in which the effective light intensity distribution is nonlinear to the intensity of incident exposure light. Further, multiple exposure is made with plural patterns having a certain lateral shift therebetween, or multiple exposure is made with shifting the position of an identical pattern, whereby multiple exposure is effected with patterns different in intensity distribution on the photosensitive material. A high-resolution pattern can be formed over the resolution limit of projection optical system by the above arrangement.

Abstract: A minute step measuring method comprises forming a laser spot on an object by condensing light from a laser light source, condensing light beams from the object on an end face of a double-mode waveguide, branching light propagating in the double-mode waveguide into two channel waveguides, detecting light beams emerging from the two channel waveguides, and measuring a minute step existing on the object, using a signal of a difference and a signal of a sum between two signals according to the two light beams detected, wherein measurement is conducted of a signal W.sub.a of the sum when the laser spot is located on one of two flat portions existing before and after the step, and of a signal W.sub.b of the sum when the laser spot is located on the other flat portion, and wherein the step is measured by correcting a difference between reflectivities of the two flat portions existing before and after the step in measuring the minute step, using the signals W.sub.a and W.sub.b.

Abstract: This optical disk comprises neighboring land tracks and a groove track laid therebetween. Light modulating regions are formed in said land tracks and each of the light modulating regions extends in the groove track.

Abstract: A laser scanning microscope provided with a laser light source, an illuminating optical system for condensing the light from the laser light source to form a light spot on a specimen, a scanning device for causing relative movement of the light spot with respect to the specimen, a photodetector for measuring the amount of light transmitted or reflected by the specimen, and an optical system with positive refraction power for guiding the light beam, transmitted or reflected by the specimen, to the light-receiving plane of the photodetector, wherein the photodetector is composed of a two-dimensional image sensor provided in a position displaced from the conjugate point of the light spot by such an amount that the light beam forms a far-field diffraction pattern of the specimen on the light-receiving plane of the photodetector.