Abstract: An optical apparatus includes: a first optical system configured to guide light from a first area on a first plane to a second plane, the second plane being a pupil plane of the first optical system relative to the first plane; a second optical system disposed between the second plane and a third plane, the second plane being a pupil plane of the second optical system relative to the third plane; a first reflective member that is disposed on a first optical path at an entrance side of the first optical system and that has a first reflective surface that is swingable; and a second reflective member that is disposed on a second optical path between the first optical system and the second optical system and that has a second reflective surface that is swingable.

Abstract: A processing apparatus is a processing apparatus that processes an object by a processing light from a processing light source, includes a first optical system that condenses the processing light from the processing light source on a condensed plane; and a second optical system that condenses the processing light from the first optical system to irradiate the object with it, a position in the condensed plane through which the processing light passes is changeable, a propagating direction of the processing light propagating from the first optical system to the second optical system changes depending on the position in the condensed plane through which the processing light passes.

Abstract: A charged particle beam optical apparatus has a plurality of irradiation optical systems each of which irradiates an object with a charged particle beam and a first control apparatus configured to control a second irradiation optical system on the basis of an operation state of a first irradiation optical system.

Abstract: A charged particle beam optical apparatus has a plurality of irradiation optical systems each of which irradiates an object with a charged particle beam and a first control apparatus configured to control a second irradiation optical system on the basis of an operation state of a first irradiation optical system.

Abstract: A charged particle beam optical apparatus has a plurality of irradiation optical systems each of which irradiates an object with a charged particle beam and a first control apparatus configured to control a second irradiation optical system on the basis of an operation state of a first irradiation optical system.

Abstract: A processing apparatus with: an irradiation apparatus that emits an energy beam; and a supply apparatus that supplies materials to an irradiation position of the energy beam, the processing apparatus forms a build object by moving the irradiation position from a first position on a first object to a second position that is away from the first object.

Abstract: A charged particle beam optical apparatus has a plurality of irradiation optical systems each of which irradiates an object with a charged particle beam and a first control apparatus configured to control a second irradiation optical system on the basis of an operation state of a first irradiation optical system.

Abstract: Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

Abstract: A liquid immersion exposure apparatus includes a projection system, an immersion area forming member having a liquid supply inlet, a liquid recovery outlet and an opening through which an exposure beam is projected, and a substrate stage having a substrate holding portion on which the substrate is held and a stage member having an upper surface provided adjacent to the upper surface of the held substrate with a gap therebetween. A portion of a liquid immersion area is formed by the immersion area forming member on the upper surface of the held substrate and another portion of the liquid immersion area is formed on the upper surface of the stage member when exposing an edge portion of the upper surface of the substrate with exposure light via liquid in the liquid immersion area.

Abstract: An exposure method sequentially exposes a plurality of shot areas of a substrate. The method includes: (i) holding the substrate on a substrate holder such that a gap is formed along an edge of the substrate; (ii) exposing one of the shot areas, located near a center of the substrate, through a liquid of a liquid immersion area which covers only a portion of a surface of the substrate, while moving the substrate at a first scanning speed; and (iii) exposing an other one of the shot areas through the liquid of the liquid immersion area, while moving the substrate at a second scanning speed lower than the first scanning speed. The other one of the shot areas is located near the edge of the substrate and the gap is included in the liquid immersion area during the exposure of the other one of the shot areas.

Abstract: An exposure apparatus includes a substrate stage having a substrate holder to hold a substrate, a gap being formed between an edge of the held substrate and a surface surrounding the held substrate, and a controller that controls an exposure operation in which shot areas of the substrate are exposed sequentially and respectively with an image through liquid of a liquid immersion area which covers a portion of an upper surface of the substrate. The controller moves the substrate stage at a first speed to expose one of the shot areas to the image through the liquid, moves the substrate stage at a second speed, that is lower than the first speed, to expose another one of the shot areas to the image through the liquid, and during the exposing of the another one of the shot areas, the liquid immersion area is formed over a portion of the gap.

Abstract: Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

Abstract: An exposure apparatus includes a projection optical system having a last optical element via which an exposure beam is projected to a projection area, and a liquid supply system having a first supply port and a second supply port via which an immersion liquid is supplied to form a liquid immersion area. The first supply port is arranged on one side of the projection area in a scanning direction, and the second supply port is arranged on the other side of the projection area in the scanning direction, the first and second supply ports facing downwardly. A plurality of shot areas of a substrate are successively exposed with the exposure beam through the liquid immersion area covering only a portion of an upper surface of the substrate.

Abstract: An exposure apparatus that exposes a substrate with light via liquid includes a stage which holds the substrate and is movable relative to a projection system; and a liquid supply system which supplies liquid onto the substrate held on the stage to form a liquid immersion area on part of the substrate The stage includes a substrate holder arranged in a recess of the stage to hold the substrate inside the recess so that an upper surface of the substrate is substantially flush with an upper surface of the stage around the recess; a flow passage connected to an internal space of the recess to remove liquid from the internal space; and a sensor which receives light from the projection optical system and is arranged so that an upper surface of the sensor is substantially flush with the upper surface of the stage around the recess.

Abstract: A substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material to hold the substrate, and a second holding portion formed on the base material to hold a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged to absorb the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.

Abstract: An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.

Abstract: An exposure apparatus includes a projection system provided with a final element which has a first outer surface that is liquid repellent, and a component disposed adjacent to the final element and having a second outer surface which is liquid repellent, the first outer surface and the second outer surface facing each other with a gap between the first and second outer surfaces. A substrate is exposed with exposure light from the projection system through immersion liquid between an end surface of the final element and the substrate, the immersion liquid covering a portion of an upper surface of the substrate. The gap is formed above the end surface of the final element.

Abstract: A liquid immersion exposure apparatus and method expose a substrate with illumination light via liquid. A projection optical system has plural optical elements that include a lens contacting the liquid and a barrel supporting the optical elements, the lens provided on a front end part of the projection optical system and exposed from the barrel. A liquid immersion member around the lens forms a liquid immersion area between the lens and part of the substrate. A drive device having a magnetic floating type of motor moves a substrate stage below the projection optical system. The liquid immersion member has a supply port to supply the liquid below the projection optical system and a recovery port to recover the liquid. The supply port is outside the projection area, the recovery port surrounds the projection area and the supply port, and each of the supply and recovery ports faces the substrate stage.

Abstract: A liquid immersion exposure apparatus includes a projection system having a final optical element; a liquid-immersion-area-forming-member having an opening through which an exposure light is projected, the-liquid-immersion-area-forming-member having a removal outlet facing downward and a liquid supply inlet; a substrate stage having a substrate holding portion, which is movable below and relative to the projection system; and a controller. The controller controls movement of the substrate stage, so that when the substrate is moved from a first position to a second position in a plane perpendicular to an optical axis of the final optical element, the controller limits the movement of the substrate stage based on a positional relation between the first position and the second position.

Abstract: A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space.