Abstract: A device manufacturing method forms a liquid immersion area under a projection system via which an exposure light is projected, while supplying a liquid via a liquid supply inlet of a liquid retaining member and collecting the supplied liquid along with a gas via a liquid recovery outlet of the liquid retaining member. The liquid retaining member surrounds a tip portion of the projection system, which has a last optical element having a surface. The liquid retaining member has a surface opposite to the surface of the last optical element with a gap between the surfaces. A substrate is exposed with the exposure light through the liquid of the liquid immersion area, while moving the substrate below and relative to the projection system and the liquid retaining member. One of the liquid and the gas is separated from the other which have been collected via the liquid recovery outlet.

Abstract: A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space.

Abstract: A liquid immersion exposure apparatus includes a liquid-immersion-area-forming-member having an opening through which an exposure light is projected, the-liquid-immersion-area-forming-member having a first liquid supply inlet facing downward, a second liquid supply inlet provided opposite to an outer surface of the final optical element, and a first removal outlet facing downward. A liquid immersion area is formed on a portion of an upper surface of a substrate while performing a liquid supply via the first liquid supply inlet to a gap between the liquid-immersion-area-forming-member and the upper surface of the substrate, a liquid supply via the second liquid supply inlet to a gap between the liquid-immersion-area-forming-member and a final optical element of a projection system and a liquid removal via the first removal outlet from the gap between the liquid-immersion-area-forming-member and the upper surface of the substrate.

Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis of a circle corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).

Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY·axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).

Abstract: Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

Abstract: An exposure apparatus includes a projection optical system having a last optical element via which an exposure beam is projected to a projection area, and a liquid supply system having a first supply port and a second supply port via which an immersion liquid is supplied to form a liquid immersion area. The first supply port is arranged on one side of the projection area in a scanning direction, and the second supply port is arranged on the other side of the projection area in the scanning direction, the first and second supply ports facing downwardly. A plurality of shot areas of a substrate are successively exposed with the exposure beam through the liquid immersion area covering only a portion of an upper surface of the substrate.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY·axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).

Abstract: A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes: a projection system; a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet; a second nozzle member having a gas supply inlet via which a gas is supplied, the gas being supplied via the gas supply inlet to a space surrounding the liquid immersion area during the exposure; and a stage system having a holder by which the substrate is held. The substrate held by the holder is moved below and relative to the projection system, the first nozzle member and the second nozzle member.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: A liquid immersion exposure apparatus has: a projection system with an optical element; a substrate stage having a holder by which a substrate is held; an immersion area forming member having an opening through which exposure light is projected, a plurality of liquid recovery ports arranged facing downwardly and surrounding the opening, and a plurality of liquid supply ports arranged facing downwardly and between the opening and the liquid recovery ports; and a sensor having a transparent member and a light receiver, with the transparent member being provided at the substrate stage and the light receiver receiving light from the projection system through the transparent member and liquid between the end surface of the optical element and the transparent member.

Abstract: Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

Abstract: An exposure apparatus includes a projection system having a final element that projects exposure light to an upper surface of a substrate through liquid between the final element and the substrate. A liquid confinement member has a recovery outlet, via which the liquid is removed along with gas, arranged such that the upper surface of the substrate faces the recovery outlet, and the recovery outlet surrounds a path of the exposure light. The liquid confinement member confines the liquid to an area smaller than an area of the upper surface of the substrate by removing the liquid via the recovery outlet from a gap between the liquid confinement member and the upper surface of the substrate. An anti-vibration system is disposed such that transmission of vibrations between the liquid confinement member and the projection system is limited.

Abstract: A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes a projection system, a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet, a second nozzle member having a gas supply inlet via which a gas is supplied to a space surrounding the liquid immersion area during the exposure, a driving system which moves the second nozzle member relative to the first nozzle member, and a stage system having a holder which holds the substrate and which is movable relative to and below the projection system, the first nozzle member and the second nozzle member.

Abstract: A liquid immersion exposure apparatus includes a liquid-immersion-area-forming-member having an opening through which an exposure light is projected, the-liquid-immersion-area-forming-member having a first liquid supply inlet facing downward, a second liquid supply inlet provided opposite to an outer surface of the final optical element, and a first removal outlet facing downward. A liquid immersion area is formed on a portion of an upper surface of a substrate while performing a liquid supply via the first liquid supply inlet to a gap between the liquid-immersion-area-forming-member and the upper surface of the substrate, a liquid supply via the second liquid supply inlet to a gap between the liquid-immersion-area-forming-member and a final optical element of a projection system and a liquid removal via the first removal outlet from the gap between the liquid-immersion-area-forming-member and the upper surface of the substrate.

Abstract: Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

Abstract: An exposure apparatus where liquid supply operation and liquid recovery operation for forming a liquid immersion region are excellently performed to form the liquid immersion region in a desired condition, enabling high exposure accuracy and measurement accuracy to be achieved. An exposure apparatus (EX) is an apparatus that exposes a substrate (P) by emitting exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus has a liquid supply mechanism (10) having a supply opening (13) capable of supplying the liquid (LQ) in the direction substantially parallel to the surface of the substrate (P).

Abstract: A device manufacturing method forms a liquid immersion area under a projection system via which an exposure light is projected, while supplying a liquid via a liquid supply inlet of a liquid retaining member and collecting the supplied liquid along with a gas via a liquid recovery outlet of the liquid retaining member. The liquid retaining member surrounds a tip portion of the projection system, which has a last optical element having a surface. The liquid retaining member has a surface opposite to the surface of the last optical element with a gap between the surfaces. A substrate is exposed with the exposure light through the liquid of the liquid immersion area, while moving the substrate below and relative to the projection system and the liquid retaining member. One of the liquid and the gas is separated from the other which have been collected via the liquid recovery outlet.

Abstract: An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism (10). The exposure apparatus (EX) has a pressure adjustment mechanism (90) for adjusting pressure of the liquid (LQ) supplied from the liquid supply mechanism (10). A liquid immersion area is satisfactorily formed to obtain high exposure accuracy and measurement accuracy.