Patents by Inventor Hiroyuki Nagase

Hiroyuki Nagase has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6641980
    Abstract: A developer for a photopolymerizable presensitized plate for use in making a lithographic printing plate characterized in that it comprises an alkali silicate and a nonionic compound represented by the following general formula (I), it has a molar ratio: SiO2/M2O (wherein M represents an alkali metal or an ammonium group) ranging from 0.75 to 4.0, a pH value ranging from 11.5 to 12.8 and a conductivity ranging from 3 to 30 mS/cm: A—W  (I) wherein A represents a hydrophobic organic group whose logP as determined for A—H is not less than 1.5 and W represents a nonionic hydrophilic organic group whose logP as determined for W—H is less than 1.
    Type: Grant
    Filed: July 3, 2002
    Date of Patent: November 4, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroyuki Nagase, Kazuto Kunita
  • Publication number: 20030190555
    Abstract: An image forming method using a negative type image forming material is disclosed, and said method comprises the steps of exposing a negative type image forming material to infrared laser imagewise, which image forming material comprises a substrate and an image recording layer formed thereon, comprising (A) a radical generator, (B) a radical-polymerizable compound, (C) an infrared absorbing agent, and (D) a binder polymer; and developing the image forming material with an alkaline developing solution comprising a weak acid or a salt thereof having a dissociation constant pka of from 10 to 13.
    Type: Application
    Filed: March 21, 2003
    Publication date: October 9, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Hiroyuki Nagase
  • Publication number: 20030186174
    Abstract: An image forming method has the steps of exposing a negative type image forming material to infrared laser imagewise, which image forming material includes a substrate and an image recording layer formed thereon, containing a radical generator, a radical-polymerizable compound, an infrared absorbing agent, and a binder polymer; and developing the image forming material with an alkaline developing solution containing at least one nonionic aromatic ether based surfactant of formula: X—Y—O-(A)n-(B)m-H wherein X is an aromatic ring; Y represents a single bond or an alkylene group having 1 to 10 carbon atoms; A and B, which are different from each other, represent —CH2CH2O— or —CH2CH(CH3)O—; and n and m each represent o or an integer of from 1 to 100, provided that n and m are not 0 at the same time.
    Type: Application
    Filed: January 30, 2003
    Publication date: October 2, 2003
    Inventor: Hiroyuki Nagase
  • Patent number: 6605854
    Abstract: The package size of a diode is made smaller. On the element forming face of a semiconductor substrate having a p−-type conductive type, after a hyper-abrupt p+n+ junction of a p+-type diffusion layer, an n+-type hyper-abrupt layer, an n−-epitaxial layer, an n-type low resistance layer and an n+-type diffusion layer is formed, an anode electrode is formed on the top of the p+-type diffusion layer and a cathode electrode is formed on the top of the n+-type diffusion layer. Thereafter, electrode bumps are formed on the top of the anode electrode and the cathode electrode to thereby manufacture a small diode that can be facedown bonded onto a mounting board.
    Type: Grant
    Filed: January 17, 2002
    Date of Patent: August 12, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyuki Nagase, Shuichi Suzuki, Masaki Otoguro, Yasuharu Ichinose, Teruhiro Mitsuyasu
  • Publication number: 20030138732
    Abstract: A method for preparing a lithographic printing plate comprising the steps of imagewise exposing, to light, a presensitized plate for use in making a lithographic printing plate, which comprises a grained and anodized substrate provided thereon with a photopolymerizable light-sensitive layer containing a compound having at least one addition-polymerizable ethylenically unsaturated double bond and a titanocene type initiator; and then developing the light-exposed presensitized plate using a developer which comprises a surfactant and a weak acid or a salt thereof having a dissociation constant pka ranging from 10 to 13, and has a pH value ranging from 11.5 to 12.8. The method exhibits excellent development performance, and gives good results to the resultant printing plate in terms of printing durability and scumming. In addition, the change in pH value of the developer is so small that the stable development can be ensured for a long period of time.
    Type: Application
    Filed: August 19, 2002
    Publication date: July 24, 2003
    Inventor: Hiroyuki Nagase
  • Publication number: 20030118951
    Abstract: A developer for a photopolymerizable presensitized plate for use in making a lithographic printing plate characterized in that it comprises an alkali silicate and a nonionic compound represented by the following general formula (I), it has a molar ratio: SiO2/M2O (wherein M represents an alkali metal or an ammonium group) ranging from 0.75 to 4.0, a pH value ranging from 11.5 to 12.
    Type: Application
    Filed: July 3, 2002
    Publication date: June 26, 2003
    Inventors: Hiroyuki Nagase, Kazuto Kunita
  • Publication number: 20020102804
    Abstract: The package size of a diode is made smaller. On the element forming face of a semiconductor substrate having a p−-type conductive type, after a hyper-abrupt p+n+ junction of a p+-type diffusion layer, an n+-type hyper-abrupt layer, an n−-epitaxial layer, an n-type low resistance layer and an n+-type diffusion layer is formed, an anode electrode is formed on the top of the p+-type diffusion layer and a cathode electrode is formed on the top of the n+-type diffusion layer. Thereafter, electrode bumps are formed on the top of the anode electrode and the cathode electrode to thereby manufacture a small diode that can be facedown bonded onto a mounting board.
    Type: Application
    Filed: January 17, 2002
    Publication date: August 1, 2002
    Applicant: Hitachi, Ltd.
    Inventors: Hiroyuki Nagase, Shuichi Suzuki, Masaki Otoguro, Yasuharu Ichinose, Teruhiro Mitsuyasu
  • Publication number: 20020092436
    Abstract: A plate-making method of a lithographic printing plate is disclosed, which comprises the steps of exposure of a photo-sensitive lithographic printing plate having the acid value of a photosensitive layer of 1.0 meq/g or less with a laser beam, and then development with a developing solution having a pH value of 13.0 or less at a developing speed in an unexposed domain of 0.05 &mgr;m/s or more and at an osmotic speed of a developing solution in an exposed domain of 0.1 &mgr;m/s or less.
    Type: Application
    Filed: July 11, 2001
    Publication date: July 18, 2002
    Inventors: Mitsumasa Tsuchiya, Hiroyuki Nagase, Shunichi Kondo, Kazuto Kunita
  • Patent number: 5998095
    Abstract: A negative-working photosensitive material having formed on a support a photopolymerizable layer containing an addition polymerizable compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator, and a high molecular weight binder and also having formed on the layer a protective layer containing a water-soluble vinyl polymer and a polymer which does not have a compatibility with polyvinyl alcohol and is water soluble in itself.The protective layer has a practically sufficient adhesive property to the photopolymerizable layer and the photosensitive layer has a high sensitivity to an Ar.sup.+ laser and a TAG-SHG laser and is suitably used as a photosensitive lithographic printing plate.
    Type: Grant
    Filed: August 10, 1998
    Date of Patent: December 7, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Hiroyuki Nagase
  • Patent number: 5882838
    Abstract: A silver halide light-sensitive material comprises a support, a hardening layer and a light-sensitive layer. The hardening layer contains an ethylenically unsaturated polymerizable compound or an ethylenically unsaturated cross-linkable polymer. The light-sensitive layer contains silver halide and a hydrophilic polymer. The hardening layer or the light-sensitive layer contains a reducing agent. An adhesive layer or the light-sensitive layer contains a water-soluble synthetic polymer. The adhesive layer is provided between the hardening layer and the light-sensitive layer. The water-soluble synthetic polymer comprises a repeating unit represented by the formula (I) in an amount of at least 50 mol %: ##STR1## in which each of n1 and n2 is an integer of 10 to 5,000; each of R.sup.1 and R.sup.2 is hydrogen, an alkyl group or an aryl group; X is --O--R.sup.4 --O-- or --NR.sup.5 --; R.sup.4 is an alkylene group, an alkyleneoxyalkylene group, an arylene group or an aralkylene group; R.sup.
    Type: Grant
    Filed: October 3, 1997
    Date of Patent: March 16, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Satoshi Hoshi, Hiroyuki Nagase
  • Patent number: 5807659
    Abstract: A negative photosensitive lithographic printing plate comprising an aluminum or organic polymer support having a surface roughness Ra of 0.25 to 0.60 .mu.m and having provided thereon a photopolymerizable photosensitive layer comprising a polymerizable monomer, a photopolymerization initiator and a sensitizer having an absorbing wavelength of 400 to 1,000 nm, wherein the support has a functional group on its surface at the side of the photosensitive layer, and wherein the functional group has an unsaturated bond which can undergo a radical addition reaction and an Si atom which covalently bonds to an aluminum atom, an Si atom, or a carbon atom in the support via an oxygen atom.
    Type: Grant
    Filed: November 26, 1997
    Date of Patent: September 15, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Nobuyuki Nishimiya, Hiroyuki Nagase
  • Patent number: 5698372
    Abstract: A photosensitive lithographic printing plate is described, which comprises a photopolymerizable composition containing at least the following components (i) to (iii): (i) a polymerizable compound having an addition-polymerizable unsaturated bond, (ii) a photopolymerization initiator, and (iii) a pigment dispersion, wherein the pigment dispersion is dispersed in the presence of a polymer having an aliphatic double bond in a main chain or a side chain thereof.
    Type: Grant
    Filed: September 9, 1996
    Date of Patent: December 16, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasuo Okamoto, Syunichi Kondo, Hiroyuki Nagase