Patents by Inventor Hitoshi Yokono

Hitoshi Yokono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4587197
    Abstract: A photosensitive polymer composition comprising (A) a poly(amic acid), (B) a compound or a mixture of compounds which can form a compound having two or more amino groups in the molecule, and (C) at least one compound having a boiling point of 150.degree. C. or higher at atmospheric pressure and selected from the group consisting of ##STR1## wherein R.sup.a, R.sup.b, R.sup.c, m and n are as defined in the specification, has good properties and does not produce cracks on a pattern at the time of development obtained from said composition.
    Type: Grant
    Filed: February 8, 1984
    Date of Patent: May 6, 1986
    Assignees: Hitachi, Ltd., Hitachi Chemical Co., Ltd.
    Inventors: Mithumasa Kojima, Fumio Kataoka, Fusaji Shoji, Hitoshi Yokono
  • Patent number: 4565767
    Abstract: A light-sensitive polymer composition comprising a poly(amic acid), a special bisazide compound and an amine compound can give a film which has high sensitivity and in which portions exposed to light are not easily released by a developing solution at the time of development.
    Type: Grant
    Filed: April 24, 1984
    Date of Patent: January 21, 1986
    Assignees: Hitachi, Ltd, Hitachi Chemical Company, Ltd.
    Inventors: Fumio Kataoka, Fusaji Shoji, Isao Obara, Issei Takemoto, Hitoshi Yokono, Tokio Isogai, Mitsumasa Kojima
  • Patent number: 4554237
    Abstract: Disclosed are photosensitive resin composition useful for formation of fine patterns on semiconductor devices, magnetic bubble devices, etc. which is highly sensitive and is excellent in developability and which has no problem such as precipitation of azide compounds and remaining azide particles after development and a method for forming fine patterns with said composition.Said photosensitive resin composition comprises (a) at least one polymer compound selected from the group consisting of a novolak resin and a polyhydroxystyrene resin and (b) an azide compound represented by the general formula (1): ##STR1## [wherein X is --N.sub.3 or --SO.sub.2 N.sub.3, Y is ##STR2## R.sup.1 is a lower alkylene such as --CH.sub.2 CH.sub.2 --, --CH.sub.2 CH.sub.2 CH.sub.2 --, or --CH.sub.2 CH.sub.2 OCH.sub.2 CH.sub.2 CH.sub.2 --, a hydroxyalkylene or an aminoalkylene such as ##STR3## (wherein R.sup.4 and R.sup.5 are lower alkyl or hydrogen, R.sup.6 -R.sup.8 are lower alkyl groups, R.sup.
    Type: Grant
    Filed: December 22, 1982
    Date of Patent: November 19, 1985
    Assignees: Hitach, Ltd., Hitachi Chemical Company, Ltd.
    Inventors: Fumio Kataoka, Fusaji Shoji, Hitoshi Yokono, Daisuke Makino, Shigeru Koibuchi, Asao Isobe
  • Patent number: 4544729
    Abstract: A photo and radiation sensitive-organopolymeric material having at least one Si--Si).sub.n bond, wherein n is an integer of from 1 to 5 has a good resistance to dry etching, a good adhesion and a good heat resistance and is useful for finer patterning with a good resolution.
    Type: Grant
    Filed: June 22, 1984
    Date of Patent: October 1, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Kazuo Nate, Takashi Inoue, Hitoshi Yokono, Mitsuo Ishikawa, Makoto Kumada
  • Patent number: 4530746
    Abstract: A photosensitive resin composition comprising (a) 10 to 90 parts by weight of at least one polymerizable monomer of the formula: ##STR1## (R is defined in the specification), (b) 90 to 10 parts by weight of at least one compound selected from the group consisting of epoxy-acrylate resins, 1,2-polybutadiene resins, polyester resins and organopolysiloxanes, all having one or more acryloyloxy or methacryloyloxy groups in their molecular end or ends, and (c) 0.05 to 5 parts by weight of a photosensitizer based on 100 parts by weight of the sum of the components (a) and (b) shows slight shrinkage and the resulting coating film is good in adhesive properties and mechanical strength.
    Type: Grant
    Filed: May 20, 1983
    Date of Patent: July 23, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Kazufumi Azuma, Kazuo Nate, Mitsuo Nakatani, Hitoshi Yokono, Takeshi Endo
  • Patent number: 4513132
    Abstract: Heat-resistant silicone block polymer with a good flexibility obtained by reaction of an organosilsesquioxane with a silicone compound or organosiloxane in the presence of a basic catalyst in an organic solvent.
    Type: Grant
    Filed: March 31, 1983
    Date of Patent: April 23, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Fusaji Shoji, Issei Takemoto, Fumio Kataoka, Hitoshi Yokono, Tokio Isogai
  • Patent number: 4504646
    Abstract: Aliphatic aldehyde polymer containing at least one Si atom in its molecular chain is a positive type resist having a very high sensitivity to radiation such as electron beams, X-rays, ion beams, etc.
    Type: Grant
    Filed: November 9, 1983
    Date of Patent: March 12, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Kazuo Nate, Takashi Inoue, Hitoshi Yokono
  • Patent number: 4495218
    Abstract: A thin film of a-Si, SiO.sub.2 or Si.sub.3 N.sub.4 can be formed on a substrate using a starting material gas containing at least a polysilane of the formula Si.sub.n H.sub.2n+2 (n=2, 3 or 4) by a chemical vapor deposition method with irradiation with light with high film forming rate at lower temperatures.
    Type: Grant
    Filed: September 22, 1983
    Date of Patent: January 22, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Kazufumi Azuma, Mitsuo Nakatani, Kazuo Nate, Masaaki Okunaka, Hitoshi Yokono
  • Patent number: 4486232
    Abstract: An electrode material for semi-conductor device such as solar cells comprises Ag powders, at least one metal of zirconium, hafnium, vanadium, niobium, and tantalum, an organic binder, and an organic solvent, and, if necessary, glass, Pd powders and Pt powders.The electrodes are prepared from the electrode material by printing, drying and firing at a low temperature and have a low contact resistance without any junction breakage or increase in leak current.
    Type: Grant
    Filed: August 17, 1983
    Date of Patent: December 4, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Mitsuo Nakatani, Haruhiko Matsuyama, Masaaki Okunaka, Hitoshi Yokono, Tokio Isogai, Tadashi Saitoh, Sumiyuki Midorikawa
  • Patent number: 4484796
    Abstract: An optical fiber connector comprising a pair of plugs, a sleeve and a pair of cap nuts which is assembled at the site where optical fibers are installed, so as to connect the optical fibers with a high degree of positional accuracy. The plugs and the sleeve are molded of a composition including a synthetic resin added with a suitable content of a filler, such as glass beads.
    Type: Grant
    Filed: November 10, 1981
    Date of Patent: November 27, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Hidemi Sato, Aizo Kaneda, Hitoshi Yokono, Atsuyoshi Ohashi, Kiyohide Miyake, Toshiro Kodama, Kiichi Suzuki
  • Patent number: 4478902
    Abstract: A screen for projection television set comprising a foamed support and a reflective film adhered to the concave side of the support, said support having the outer layers with a high density such as 0.7 to 1.2 g/cm.sup.3 and the inner portion with a low density so as to make the density of the foamed support as a whole 0.2 to 0.5 g/cm.sup.3, has good projection properties, surface hardness with sufficiently strong support. When said support is foam molded by using a polyurethane having special polyol components, its heat resistance is remarkably increased and can be foam molded at high temperatures without deformation.
    Type: Grant
    Filed: September 1, 1981
    Date of Patent: October 23, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Susumu Tsuzuku, Yasuo Hira, Masao Gotoh, Hitoshi Yokono, Yoshihisa Hosoe
  • Patent number: 4473662
    Abstract: In a composition for producing polyurethane foam which comprises an organic polyisocynate compound, a compound having at least one active hydrogen atom in the molecule, a foaming agent and a catalyst as essential components, an aminoalkylsilane represented by the following general formula is contained: ##STR1## wherein n is 1 or 2, and R.sub.1 to R.sub.5 are alkyl groups. By use of such a catalyst polyurethane foam having a even color distribution and excellent mechanical properties is produced.
    Type: Grant
    Filed: November 30, 1982
    Date of Patent: September 25, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Yasuo Hira, Susumu Tsuzuku, Masao Gotoh, Hitoshi Yokono
  • Patent number: 4451551
    Abstract: A light- or radiation-sensitive polymer composition comprising (a) a poly(amic acid) having as a major component a repeating unit of the formula: ##STR1## (b) one or more light- or radiation-sensitive compounds having an amino group and an aromatic azide group or aromatic sulfonylazide group in one molecule, and if necessary (c) one or more photosensitizers and/or amine compounds having at least one unsaturated bonding, and/or (d) one or more compounds having at least two unsaturated bonding in one molecule, is highly sensitive to light and radiation and can give a precise relief pattern on a substrate. Further, a finally obtained polyimide film is excellent in heat resistance.
    Type: Grant
    Filed: December 17, 1981
    Date of Patent: May 29, 1984
    Assignees: Hitachi, Ltd., Hitachi Chemical Company
    Inventors: Fumio Kataoka, Fusaji Shoji, Isao Obara, Hitoshi Yokono, Tokio Isogai, Mitumasa Kojima
  • Patent number: 4446185
    Abstract: A reaction injection molded article formed with threads and a method of molding same, wherein threaded members, such as threaded inserts, helicoils, etc., are positioned in the cavity of a reaction injection mold, and molding material is injected into the cavity to form the threaded members into a unitary structure with a body of the reaction injection molded article. The threaded members are securedly held in place by a surface layer of relatively high density. The molding material is a mixture of an A liquid and a B liquid, the A liquid containing 100 weight parts of polyether polyol obtained by adding alkylene oxide to various kinds of alcohol or amine, 1-5 weight parts of a reaction promoting agent (catalyst) comprising tertiary amines, tin compounds, etc.
    Type: Grant
    Filed: March 8, 1982
    Date of Patent: May 1, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Kenichi Waragai, Masao Gotoh, Hitoshi Yokono, Kazumi Iijima
  • Patent number: 4444704
    Abstract: Integral skin polymethane foams can be produced in a short time by impingement mixing a solution comprising polyols containing as an essential component a polyol derived from aromatic amine, a blowing agent and a special catalyst of tertiary amine salt having a hetero ring in the molecule, with a solution comprising one or more polyisocyanates, followed by injection into a closed mold and foaming and curing therein.
    Type: Grant
    Filed: January 19, 1982
    Date of Patent: April 24, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Yasuo Hira, Susumu Tsuzuku, Masao Gotoh, Hitoshi Yokono, Reishi Naka
  • Patent number: 4420500
    Abstract: A transparent conducting film is prepared from a composition comprising an indium compound, a tin compound, and a solvent as essential components, the tin compound being a compound represented by the following general formula:(R).sub.a Sn(NO.sub.3).sub.b (X).sub.4-a-b (1)wherein R is an alkyl group having 1 to 4 carbon atoms, X is a hydroxyl group, a halogen atom, or a carboxyl group, and a and b are integers of 1.about.3, and a+b.ltoreq.4 by coating a substrate with the said composition, subjecting the coated substrate to ultraviolet irradiation at a substrate temperature of 200.degree. C. or higher, and heating the substrate at 400.degree. C. or higher. The composition has a long pot life and the film has a low resistance and distinguished mechanical strength, chemical resistance and etching susceptibility.
    Type: Grant
    Filed: February 2, 1982
    Date of Patent: December 13, 1983
    Assignees: Hitachi, Ltd., Hitachi Chemical Co., Ltd.
    Inventors: Mitsuo Nakatani, Mitsuo Yamazaki, Masaaki Okunaka, Ryoichi Sudo, Kenji Tochigi, Hitoshi Yokono
  • Patent number: 4411609
    Abstract: A method of and an apparatus for molding a plastic wherein the injection pressure (transfer pressure) is switched to a holding pressure when the internal pressure of the mold cavity sensed by a pressure sensor reaches a predetermined injection pressure (transfer pressure), to initiate holding of the pressure applied to the cavity. The holding pressure is removed when the internal pressure thereof becomes zero or in accordance with the detection of a predetermined inflection point in the internal pressure which is indicative of a gate sealing point in the mold cavity or is brought to a predetermined value close to zero. The molded articles are of high precision finishes, and conservation of energy and natural resources can be achieved.
    Type: Grant
    Filed: April 17, 1981
    Date of Patent: October 25, 1983
    Assignee: Hitachi, Ltd.
    Inventors: Masaki Yoshii, Hidemi Sato, Aizo Kaneda, Masayoshi Aoki, Hitoshi Yokono, Mitsunori Oka
  • Patent number: 4409341
    Abstract: A composition for polyurethane foam comprising (a) polyols containing at least one of alkylene oxide adducts of aniline-formaldehyde condensates and alkylene oxide adducts of reduced compounds of nitrated toluenes in an amount of 30 to 70% by weight of the polyols, (b) at least one isocyanate of the formula: ##STR1## a fire retardant, together with one or more conventional catalysts, foam stabilizers, blowing agents and the like additives, can give fire retardant, high impact and heat resistant urethane foams.
    Type: Grant
    Filed: December 31, 1981
    Date of Patent: October 11, 1983
    Assignee: Hitachi, Ltd.
    Inventors: Yasuo Hira, Susumu Tsuzuku, Makoto Iida, Masao Gotoh, Hitoshi Yokono, Yoshikazu Kimura, Kazumi Iijima
  • Patent number: 4387311
    Abstract: In a dynamoelectric machine having a stator assembly of coil windings and a core, a heat-dissipating, uninflammable, electro-insulative housing encapsulates the coil windings and the core. The housing is made of a cured molded article or material formed of a resin-filler composition which comprises a liquid unsaturated polyester resin, a finely divided calcium carbonate powder, an inorganic mineral particulate having a particle size larger than that of the calcium carbonate powder, a chopped glass fiber and an aluminum hydroxide powder, wherein the ratio by weight of the calcium carbonate to the mineral particulate is 0.3 to 4, the ratio of the weight of glass fiber to the total weight of the composition is 0.05 to 0.25, the ratio of the weight of the polyester resin to the total weight of the composition is 0.1 to 0.4, the weight ratio of the calcium carbonate powder, the mineral particulate and the glass fiber to the total weight of the composition is 0.15 to 0.
    Type: Grant
    Filed: March 25, 1981
    Date of Patent: June 7, 1983
    Assignee: Hitachi, Ltd.
    Inventors: Tsuguo Kobayashi, Tetsuo Ishikawa, Kenichi Hironaka, Hideo Umetsu, Masatsugu Ogata, Hitoshi Yokono
  • Patent number: 4369208
    Abstract: A transparent electroconductive film of lower resistance with a smaller content of remaining organic components and less pinholes than those of the conventional transparent electroconductive film is produced by applying a coating solution selected from (a) a coating solution comprising an inorganic indium compound free from a photosensitive group in the molecule or an inorganic tin compound free from a photosensitive group in the molecule, an organic ligand, and an organic solvent, (b) a coating solution comprising an organic indium compound free from a photosensitive group in the molecule, or an organic tin compound free from a photosensitive group in the molecule, and an organic solvent, and (c) the coating solution (a) or (b) further containing a dopant to the surface of a substrate, thereby forming a film thereon, and then irradiating the substrate with radiation capable of exciting organic groups, for example, ultraviolet rays in a state where the substrate is kept at a high temperature (100.degree.-600.
    Type: Grant
    Filed: December 11, 1980
    Date of Patent: January 18, 1983
    Assignees: Hitachi, Ltd., Hitachi Chemical Company, Ltd.
    Inventors: Masaaki Okunaka, Ryoichi Sudo, Hitoshi Yokono, Tokio Isogai, Mitsuo Yamazaki