Abstract: The present invention provides a method for manufacturing a wafer-level package comprising the steps of coating adhesives on a wafer on which bumps are already formed and irradiating the adhesive layer using a laser to divide the wafer into individual chip units. According to the present invention, it is possible to effectively prevent adhesives from absorbing water during the dicing process when manufacturing a wafer-level package.

Abstract: Disclosed is a wafer level chip size package for an image sensor module and a manufacturing method thereof, more particularly to a small size image sensor module characterized by a structure where a glass formed with an I/R cut-off filter (layer) is assembled onto an image sensor chip by a polymer partition wall and a solder bump is formed on an electrode of the rear side of a chip connected by a through-hole formed on each I/O electrode of an image sensor chip and a wafer level chip size package process for realizing the module. The method for manufacturing a wafer level chip size package for an image sensor module, the method comprises: bonding an image sensor wafer glass and a glass wafer to form a through-hole on the image sensor wafer; filling the through-hole formed on the image sensor wafer with an exciting material; and forming a solder bump at the end of the exciting material to be connected with the circuit formed PCB substrate.

Abstract: The present invention relates to an image sensor module and a manufacturing method thereof, especially to a wafer level chip size package (WL-CSP) realized by directly contacting an image sensor chip wafer to a glass wafer on which an IR filter coating layer is deposited, an electrode rearrangement and a dicing process, a miniaturized image sensor module using this wafer level chip size package (WL-CSP) and a method thereof. The CMOS image sensor module using a wafer level chip size package technology according to the present invention comprises: an image sensor chip wafer having a partition with a lattice structure formed at portions except an image sensing area; and a glass wafer with an IR filter coating layer and a metal electrode; and wherein the image sensor chip wafer and the glass wafer form an electric contact and a chip sealing by a flip-chip bonding; and wherein a solder bump and a non solder bump are formed after a metal wiring is rearranged on a lower surface of the glass wafer.