Abstract: Polyurethane foams having a density of less than 200 g/l are prepared by reacting a) polyisocyanates with b) compounds having at least two hydrogen atoms reactive with isocyanate groups, the polyisocyanates a) being aromatic di- or polyisocyanates and the compounds b) having at least two hydrogen atoms reactive with isocyanate groups containing at least one acrylate polyol.

Abstract: Solid compositions comprising (A) at least one solid (meth)acrylate copolymer with a number-average molecular weight of from 850 to 10 000 and a molecular weight polydispersity Mw/Mn of from 1.0 to 5.0, containing at least one group (a) having at least one bond which can be activated with actinic radiation; and (B) at least one solid compound comprising a parent structure and, attached thereto, on average per molecule more than one group (a) having at least one bond which can be activated with actinic radiation; and their use as coating materials, adhesives or sealing compounds which can be crosslinked thermally and/or with actinic radiation, or for preparing coating materials, adhesives or sealing compounds which can be crosslinked thermally and/or with actinic radiation.

Abstract: The present invention relates to partially branched polymers having a number-average molecular weight Mn in the range from 500 to 20 000 daltons and synthesized from ethylenically unsaturated monomers including: i) from 80 to 99.9% by weight of monoethylenically unsaturated monomers A, and ii) from 0.1 to 20% by weight of monomers B containing at least two nonconjugated ethylenically unsaturated double bonds, the weight fraction of the monomers A and B being based on the total amount of the ethylenically unsaturated monomers that constitute the polymer.

Abstract: The invention relates to a method of producing flexible polyurethane foams that have a density of not more than 100 g/l, by reacting: a) polyisocyanates with b) compounds with at least two hydrogen atoms that arm reactive with isocyanate groups. The inventive method is characterized in that the polyisocyanates (a) are aromatic di- or polysiocyanates and the compounds with at least two hydrogen atoms (b) that are reactive with isocyanate groups contain at least one acrylate polyol.

Abstract: Polyurethane foams are prepared by reacting a) polyisocyanates with b) compounds having at least two hydrogen atoms reactive with isocyanate groups, by a process in which the polyisocyanates a) are aliphatic di- or polyisocyanates and the compounds having at least two hydrogen atoms reactive with isocyanate groups b) contain at least one acrylate polyol.

Abstract: The present invention provides a process for preparing a curable aqueous polymer dispersion, the polymer dispersion obtainable by said process, a coating composition comprising at least one such polymer dispersion, and a process for producing a coated substrate using such a polymer dispersion.

Abstract: The present invention relates to partially branched polymers having a number-average molecular weight Mn in the range from 500 to 20 000 daltons and synthesized from ethylenically unsaturated monomers including:

Abstract: The present invention relates to an aqueous dispersion comprising a solid pulverulent component A and an aqueous component B, said component A comprising a UV-curable powder coating material.

Abstract: Polyurethane foams are prepared by reacting

Abstract: The invention relates to transparent, undiscolored and uncrosslinked, radiation-curable binders of low additive content, obtainable by polymer-analogous reaction of epoxy-functional (meth)acrylate copolymers (A) with an unsaturated monocarboxylic acid (B), the reaction a) of the copolymer (A) taking place with at least 2 equivalents of the carboxylic acid (B), b) in the absence of reaction accelerators and inhibitors, c) in a continuously operated reactor, d) without solvent, e) at from 130 to 170° C., f) with a degree of conversion of at least 90% within an average residence time which is as short as possible but sufficient, and which is below 13 to 22 minutes. The reaction products contain virtually no byproducts and are advantageous binders for clearcoat materials and powder coating materials.

Abstract: Positive-working radiation-sensitive mixtures, essentially consisting of(a1) a water-insoluble organic binder which contains acid-labile groups and is rendered soluble in aqueous alkaline solutions by the action of an acid, or(a2.1) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid, and(b) an organic compound which produces an acid under the action of actinic radiation, which additionally contain(c) a strongly basic organic compound having hydroxide, alkoxide or phenoxide anions, are suitable for the production of relief structures having improved contrast.

Abstract: A positive-working radiation-sensitive mixture essentially consists of(a) at least one polymer which contains acid-labile groups and is insoluble in water but becomes soluble in aqueous alkaline solutions as a result of the action of acid,(b) at least one organic compound which produces an acid under the action of actinic radiation and(c) at least one further organic compound differing from (b), where the polymer (a) contains incorporated units of the formulae (I), (II) and (III) ##STR1## and the organic compound (b) is a sulfonium salt of the formula (IV) ##STR2## The radiation-sensitive mixture is suitable for the production of relief structures having improved contrast.

Abstract: A positive-working radiation-sensitive mixture essentially consists of(a.sub.1) at least one water-insoluble, organic polymeric binder which contains acid-labile groups and becomes soluble in aqueous alkaline solutions as a result of the action of acid, or(a.sub.2.1) a polymeric binder which is insoluble in water and soluble in aqueous alkaline solutions and(a.sub.2.2) a low molecular weight organic compound whose solubility and aqueous alkaline developer is increased as a result of the action of acid, and(b) at least one organic compound which produces an acid under the action of actinic radiation, and, if required,(c) one or more further organic compounds which differ from (b),at least one of the components (a.sub.1), (a.sub.2.1), (a.sub.2.2), (b) and (c) containing a bonded group of the general formula (I) --O.sup..crclbar. N.sup..sym. R.sub.4, or component (c) being of the formula (II) ##STR1## The radiation-sensitive mixture is suitable for the production of relief structures.

Abstract: A radiation-sensitive mixture essentially consisting of(a) a water-insoluble binder or binder mixture and(b) a compound which forms a strong acid on exposure to radiation,component (a) being a phenolic resin in which some or all of the phenolic hydroxyl groups have been replaced with groups (IA) or (IB) ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are each alkyl or R.sup.1 together with R.sup.2 forms a ring and X is CH.sub.2, O, S, SO.sub.2 or NR.sup.4, is suitable for the production of relief structures.

Abstract: An emergency ring of elastic material for a vehicle wheel having a one-piece deep bed rim comprises a one-piece annular support body, which via support rings are supported exclusively on the rim bed of the wheel and is spaced apart from at least one side wall region or of a pneumatic tire. Reinforcement inlays are disposed radially such that there is only relatively little compressible elastic material within the reinforcement inlays. High security against rotation of the emergency ring relative to the rim is thereby assured. Moreover, the emergency ring is easily mounted and provides great security against a tire being thrown off, even when cornering with tires with low air pressure.

Abstract: A positive-working UV-sensitive mixture containing(a1) an organic binder containing acid-labile ether, ester or carbonate groups or(a2) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(a2.1) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid, or(a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups and in addition a group which forms an acid under the action of radiation, or a mixture of the organic compounds (a2.1) and (a2.2) and(b) an arylsulfonic ester, is suitable for the production of relief patterns.

Abstract: A radiation-sensitive mixture which contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more groups cleavable by an acid and in addition a group which forms a strong acid under the action of radiation, and additionally(c) an alkyl- or arylsulfonate of a hydroxyaromatic, is suitable for the production of relief patterns.

Abstract: A radiation-sensitive mixture suitable for producing relief patterns comprises(a) a water-insoluble but alkali-soluble polymeric binder,(b) an organic compound whose solubility in an alkaline developer is increased by the action of acid and which contains at least one acid-cleavable group and additionally a group which forms a strong acid on irradiation, and additionally(c) an organic compound which reacts with water or stronger nucleophiles at up to 120.degree. C.

Abstract: An aqueous developer suitable in particular for developing photoresists which contain a phenolic resin and an onium salt contains from 0.5 to 5 % by weight of a tetraalkylammonium hydroxide and from 5 to 25% by weight of at least one amine of the general formula ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are identical or different and each is hydrogen, alkyl, hydroxyalkyl or aminoalkyl, or two of R.sup.1 to R.sup.3 combine to form a N-containing ring, with at least one of R.sup.1 to R.sup.3 being hydroxyalkyl or aminoalkyl.

Abstract: An aqueous developer solution contains, as a water-soluble basic compound, a compound of the general formula (I) ##STR1## where R.sup.1 to R.sup.5 are identical or different and are each H, OH, hydroxyalkyl, alkoxy or alkyl.It is suitable for developing positive-working photoresists.