Abstract: Positive and negative working radiation sensitive mixtures suitable in particular for producing relief patterns contain a polymeric binder and an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also an additional group which upon irradiation forms a strong acid, the polymeric binders being reaction products of polymers that contain phenolic hydroxyl groups with dihydropyran or with alkyl vinyl ethers.

Abstract: A positive-working, radiation-sensitive mixture and a process for the production of relief images.The radiation-sensitive mixture contains(a) a water-insoluble polymeric binder which is soluble or at least dispersible in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups and in addition a further group which produces a strong acid on exposure to radiation, the polymeric binder (a) consisting a mixture of a phenolic polymer and a resin of the novolak type.The novel mixture is particularly suitable for the production of photoresists.

Abstract: A radiation sensitive mixture useful for producing relief patterns contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also a group which on irradiation forms a strong acid,wherein the polymeric binder (a) contains from 5 to 40 mol % of monomer units having ##STR1## in copolymerized or cocondensed form or the ##STR2## introduced by polymer analogous reaction with the proviso that the radical R contains from 5 to 9 carbon atoms.

Abstract: A radiation sensitive mixture suitable for producing relief patterns contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation,wherein the polymeric binder (a) contains from 5 to 35 mol % of monomer units having acid labile groups as copolymerized or cocondensed units or acid labile groups introduced by polymer analaogous reaction.

Abstract: A radiation sensitive mixture useful for producing relief patterns contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation, and in addition(c) a nonphotosensitive organic compound which contains at least one acid cleavable bond and the solubility of which in an aqueous alkaline developer is increased by the action of acid, or(d) a nonphotosensitive organic compound which contains at least one acid cleavable bond and which by the action of acid decomposes in such a way as to be completely removable by treatment at from 60.degree. to 120.degree. C.

Abstract: Positive and negative working radiation sensitive mixtures suitable in particular for producing relief patterns contain a polymeric binder and an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also an additional group which upon irradiation forms a strong acid, the polymeric binders being reaction products of polymers that contain phenolic hydroxyl groups with dihydropyran or with alkyl vinyl ethers.

Abstract: An aqueous developer solution contains, as a water-soluble basic compound, a compound of the general formula (I) ##STR1## where R.sup.1 to R.sup.5 are identical or different and are each H, OH, hydroxyalkyl, alkoxy or alkyl.It is suitable for developing positive-working photoresists.

Abstract: The invention relates to a radiation-sensitive mixture essentially consisting of(a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions,(b) a compound which upon irradiation forms a strong acid and(c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions,wherein the organic compound (c) is a .beta.-ketoacide ester.This radiation-sensitive mixture may be used to prepare photoresists.

Abstract: A planar, multilayered, laser-optical recording material comprises(a) a dimensionally stable, optically clear base material composed of a plastics substance and having a structured surface,(b) a superposed intermediate layer which is insoluble in organic solvents and which acts as a diffusion barrier thereagainst, and superposed thereon(c) an amorphous, thermally alterable, dye-containing recording layer producible by application from a solution and drying,wherein said intermediate layer (b)(b.sub.1) is from 5 to 95 nm thick and, based on (b), consists of(b.sub.2) from 88 to 99.5% by weight of an oxide and/or hydrated oxide of one or more of the elements of the group consisting of titanium, zirconium, hafnium, thorium, vanadium, niobium, tantalum, tungsten, aluminum, gallium, indium, silicon, germanium and tin and of(b.sub.3) from 0.5 to 12% by weight of a hydrocarbyl and(b.sub.

Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation.The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

Abstract: Copolymers containing from 5 to 50 mol % of monomers having o-nitrocarbinol ester groups, from 94 to 30 mol % of methacrylonitrile, from 1 to 20 mol % of olefinically unsaturated copolymerizable carboxylic acid and from 0 to 30 mol % of other copolymerizable monomers as copolymerized units are useful for fabricating semiconductor components.

Abstract: Copolymers containing from 5 to 50 mol % of monomers having o-nitrocarbinol ester groups, from 95 to 50 mol % of O-substituted p-hydroxystyrene and from 0 to 30 mol % of other copolymerizable monomers are useful for producing positive-working photoresists and light-sensitive coating materials.

Abstract: Copolymers useful in particular for producing two-layer resists and fabricating semiconductor devices contain from 5 to 50 mol % of monomers having o-nitrocarbinol ester groups, from 95 to 50 mol % of an olefinically unsaturated silicon-containing organic compound, from 0 to 20 mol % of an olefinically unsaturated carboxylic acid and from 0 to 25 mol % of other copolymerizable monomers.

Abstract: Stabilized solutions of radiation-crosslinkable polymer precursors of highly heat-resistant polymers, containing chelate complex-formers as stabilizers, do not tend to gel through premature crosslinking and can thus be stored and used over a long period.

Abstract: A device for the separation of gaseous mixtures into components of differing molecular mass. The device is designed according to the principle underlying a turbine or a turbomolecular pump. The device has a rotor that is equipped with discs made of magnetic material having blades at their periphery and is installed in a stationary casing having a gaseous mixture inlet and at least two gas outlets connected to a gas delivery tube, and to whose inside wall stator discs are attached between the rotor discs. The device further has voltage means. The gas delivery tube has controls connected thereto which keep the total pressure in the gaseous mixture below 10 Pa.

Abstract: The device continuously determines the carbon monoxide content of air in the emission and immision range, and comprises an electrochemical cell including an acid electrolyte with a cathode and a diffusion anode in the electrolyte, the anode being depolarizable by carbon monoxide in the acid electrolyte. A current measuring device measures the current between the anodeand the cathode responsive to detection of a gas containing carbon monoxide effective on the diffusion anode. The cathode is made of an unpolarizable material whose oxidation potential is so high that no oxygen reduction takes place at the anode. The cell functions without an external current source, and the current measuring device is connected to directly across the anode and the cathode. The cathode contains substances with an oxidation potential of from 1000 to 1300 millivolts relative to a hydrogen electrode in the same electrolyte.

Abstract: An electrochemical measuring cell for the continuous measurement of sulfur dioxide content of the air in emission and immission areas, comprises a cell housing which has a test gas cell chamber therein for the connection for circulating the gas to be tested into the chamber. The chamber also contains a diffusion electrode which serves as an anode and which is made up of a reversible organic redox system. The cathode comprises an active mass having a redox potential higher than the redox potential of the anode. An immobilized electrolyte is disposed between the anode and the cathode and the anode and cathode are connected to a device for measuring the short circuit current. The diffusion electrode is manufactured from a mixture of chloranil and sodium tungsten bronze which is pulverized in a ball mill for sixteen hours and mixed with a polyethylene powder and sodium sulfate and is then compressed.