Patents by Inventor Hoshang Subawalla
Hoshang Subawalla has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7581549Abstract: A process for removing carbon-containing residues from a substrate is described herein. In one aspect, there is provided a process for removing carbon-containing residue from at least a portion of a surface of a substrate comprising: providing a process gas comprising an oxygen source, a fluorine source, an and optionally additive gas wherein the molar ratio of oxygen to fluorine contained within the process gas ranges from about 1 to about 10; activating the process gas using at least one energy source to provide reactive species; and contacting the surface of the substrate with the reactive species to volatilize and remove the carbon-containing residue from the surface.Type: GrantFiled: July 12, 2005Date of Patent: September 1, 2009Assignee: Air Products and Chemicals, Inc.Inventors: Andrew David Johnson, Hoshang Subawalla, Bing Ji, Raymond Nicholas Vrtis, Eugene Joseph Karwacki, Jr., Robert Gordon Ridgeway, Peter James Maroulis, Mark Leonard O'Neill, Aaron Scott Lukas, Stephen Andrew Motika
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Publication number: 20080004194Abstract: Methods for generating a single-phase supercritical dense processing fluid have been disclosed. The single-phase supercritical dense processing fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. At least one processing agent is added to the pressurization vessel, or to the processing chamber, or to the single-phase supercritical dense fluid during transfer from the pressurization vessel to the processing chamber; to produce the single-phase supercritical dense processing fluid. Methods for processing an article with a single-phase supercritical dense processing fluid in a processing chamber are also disclosed.Type: ApplicationFiled: August 7, 2007Publication date: January 3, 2008Applicant: Air Products and Chemicals, Inc.Inventors: Wayne McDermott, Hoshang Subawalla, Andrew Johnson, Alexander Schwarz, Richard Ockovic
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Publication number: 20080000505Abstract: Apparatus for processing an article with a single-phase supercritical dense processing fluid in a processing chamber while applying ultrasonic energy during processing. The single-phase supercritical dense fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. A processing agent may be added to the pressurization vessel, to the processing chamber, or to the single-phase supercritical dense fluid during transfer from the pressurization vessel to the processing chamber. The ultrasonic energy may be generated continuously at a constant frequency or at variable frequencies. Alternatively, the ultrasonic energy may be generated intermittently.Type: ApplicationFiled: August 2, 2007Publication date: January 3, 2008Applicant: AIR PRODUCTS AND CHEMICALS, INC.Inventors: WAYNE MCDERMOTT, HOSHANG SUBAWALLA, ANDREW JOHNSON, ALEXANDER SCHWARZ, RICHARD OCKOVIC
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Patent number: 7267727Abstract: Method for processing an article with a dense processing fluid in a processing chamber while applying ultrasonic energy during processing. The dense fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. A processing agent may be added to the pressurization vessel, to the processing chamber, or to the dense fluid during transfer from the pressurization vessel to the processing chamber. The ultrasonic energy may be generated continuously at a constant frequency or at variable frequencies. Alternatively, the ultrasonic energy may be generated intermittently.Type: GrantFiled: December 16, 2003Date of Patent: September 11, 2007Assignee: Air Products and Chemicals, Inc.Inventors: Wayne Thomas McDermott, Hoshang Subawalla, Andrew David Johnson, Alexander Schwarz
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Publication number: 20070137675Abstract: Method for removing flux residue and defluxing residue from an article using a dense processing fluid and a dense rinse fluid is disclosed herein. In one embodiment, there is provided a method comprising: introducing the article comprising contaminants into a processing chamber; contacting the article with a dense processing fluid comprising a dense fluid, at least one processing agent, and optionally a cosolvent to provide a partially treated article; and contacting the partially treated article with a dense rinse fluid comprising the dense fluid and optionally the cosolvent to provide a treated article wherein an agitation source is introducing during at least a portion of the first and/or the second contacting step.Type: ApplicationFiled: February 5, 2007Publication date: June 21, 2007Inventors: Wayne McDermott, Gene Parris, Dean Roth, Hoshang Subawalla
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Patent number: 7211553Abstract: A dense cleaning fluid for removing contaminants from a substrate and a method comprising same is disclosed herein. In one embodiment of the present invention, the dense cleaning fluid comprises a dense fluid and at least one acetylenic diol or acetylenic alcohol surfactant.Type: GrantFiled: December 16, 2003Date of Patent: May 1, 2007Assignee: Air Products and Chemicals, Inc.Inventors: Hoshang Subawalla, Gene Everad Parris, Madhukar Bhaskara Rao, Christine Peck Kretz
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Patent number: 7195676Abstract: Method for removing flux residue and defluxing residue from an article using a dense processing fluid and a dense rinse fluid is disclosed herein. In one embodiment, there is provided a method comprising: introducing the article comprising contaminants into a processing chamber; contacting the article with a dense processing fluid comprising a dense fluid, at least one processing agent, and optionally a cosolvent to provide a partially treated article; and contacting the partially treated article with a dense rinse fluid comprising the dense fluid and optionally the cosolvent to provide a treated article wherein an agitation source is introducing during at least a portion of the first and/or the second contacting step.Type: GrantFiled: July 13, 2004Date of Patent: March 27, 2007Assignee: Air Products and Chemicals, Inc.Inventors: Wayne Thomas McDermott, Gene Everad Parris, Dean Van-John Roth, Hoshang Subawalla
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Patent number: 7074378Abstract: This invention describes an improvement in a process for purifying a nitrogen trifluoride (NF3) stream containing unreacted F2, HF, and nitrogen oxides from an NF3 reactor wherein the F2, and HF are removed and then the nitrogen oxides removed by adsorption. The improvement in the process resides in selectively removing the F2 from said NF3 stream without generating oxygen difluoride, removing HF and then removing said nitrogen oxides by adsorption. Further purification can be effected as desired.Type: GrantFiled: January 23, 2004Date of Patent: July 11, 2006Assignee: Air Products and Chemicals, Inc.Inventors: James Joseph Hart, Philip Bruce Henderson, Howard Paul Withers, Jr., Madhukar Bhaskara Rao, Hoshang Subawalla
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Publication number: 20060081273Abstract: A method for removing contaminants from an article is described herein. In one embodiment, there is provided a method comprising loosening at least a portion of the contaminants by treating the article with a treatment method involving a processing fluid and/or dense processing fluid to provide a partially treated article comprising loosened contaminants; contacting the partially treated article with a dense rinse fluid comprising a dense fluid, optionally a co-solvent, and optionally an entrainer to remove liquid-based contaminants; and removing at least a portion of the loosened contaminants by exposing the partially treated article with at least one exposure method to provide a treated article wherein the selection of the at least one exposure method depends upon whether the loosened contaminants are wet or dry.Type: ApplicationFiled: October 20, 2004Publication date: April 20, 2006Inventors: Wayne McDermott, Hoshang Subawalla, Madhukar Rao, Dean Roth, Keith Fabregas
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Publication number: 20060027249Abstract: A process for removing carbon-containing residues from a substrate is described herein. In one aspect, there is provided a process for removing carbon-containing residue from at least a portion of a surface of a substrate comprising: providing a process gas comprising an oxygen source, a fluorine source, an and optionally additive gas wherein the molar ratio of oxygen to fluorine contained within the process gas ranges from about 1 to about 10; activating the process gas using at least one energy source to provide reactive species; and contacting the surface of the substrate with the reactive species to volatilize and remove the carbon-containing residue from the surface.Type: ApplicationFiled: July 12, 2005Publication date: February 9, 2006Inventors: Andrew Johnson, Hoshang Subawalla, Bing Ji, Raymond Vrtis, Eugene Karwacki, Robert Ridgeway, Peter Maroulis, Mark O'Neill, Aaron Lukas, Stephen Motika
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Publication number: 20060011217Abstract: Method for removing flux residue and defluxing residue from an article using a dense processing fluid and a dense rinse fluid is disclosed herein. In one embodiment, there is provided a method comprising: introducing the article comprising contaminants into a processing chamber; contacting the article with a dense processing fluid comprising a dense fluid, at least one processing agent, and optionally a cosolvent to provide a partially treated article; and contacting the partially treated article with a dense rinse fluid comprising the dense fluid and optionally the cosolvent to provide a treated article wherein an agitation source is introducing during at least a portion of the first and/or the second contacting step.Type: ApplicationFiled: July 13, 2004Publication date: January 19, 2006Inventors: Wayne McDermott, Gene Parris, Dean Roth, Hoshang Subawalla
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Publication number: 20050163695Abstract: This invention describes an improvement in a process for purifying a nitrogen trifluoride (NF3) stream containing unreacted F2, HF, and nitrogen oxides from an NF3 reactor wherein the F2, and HF are removed and then the nitrogen oxides removed by adsorption. The improvement in the process resides in selectively removing the F2 from said NF3 stream without generating oxygen difluoride, removing HF and then removing said nitrogen oxides by adsorption. Further purification can be effected as desired.Type: ApplicationFiled: January 23, 2004Publication date: July 28, 2005Inventors: James Hart, Philip Henderson, Howard Withers, Madhukar Rao, Hoshang Subawalla
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Publication number: 20050029490Abstract: A dense cleaning fluid for removing contaminants from a substrate and a method comprising same is disclosed herein. In one embodiment of the present invention, the dense cleaning fluid comprises a dense fluid and at least one acetylenic diol or acetylenic alcohol surfactant.Type: ApplicationFiled: December 16, 2003Publication date: February 10, 2005Inventors: Hoshang Subawalla, Gene Parris, Christopher Mammarella, Bridget O'Brien, Keith Fabregas, Madhukar Rao, Christine Kretz
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Processing of semiconductor substrates with dense fluids comprising acetylenic diols and/or alcohols
Publication number: 20050029492Abstract: A dense cleaning fluid for removing contaminants from an substrate and a method comprising same is disclosed herein. In one embodiment of the present invention, the dense cleaning fluid comprises a dense fluid and at least one acetylenic diol or acetylenic alcohol surfactant.Type: ApplicationFiled: August 5, 2003Publication date: February 10, 2005Inventors: Hoshang Subawalla, Gene Parris, Christopher Mammarella, Bridget O'Brien, Keith Fabregas, Madhukar Rao, Christine Kretz -
Publication number: 20040144399Abstract: Method for processing an article with a dense processing fluid in a processing chamber while applying ultrasonic energy during processing. The dense fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. A processing agent may be added to the pressurization vessel, to the processing chamber, or to the dense fluid during transfer from the pressurization vessel to the processing chamber. The ultrasonic energy may be generated continuously at a constant frequency or at variable frequencies. Alternatively, the ultrasonic energy may be generated intermittently.Type: ApplicationFiled: December 16, 2003Publication date: July 29, 2004Inventors: Wayne Thomas McDermott, Hoshang Subawalla, Andrew David Johnson, Alexander Schwarz
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Publication number: 20040055621Abstract: Method for processing an article with a dense processing fluid in a processing chamber while applying ultrasonic energy during processing. The dense fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. A processing agent may be added to the pressurization vessel, to the processing chamber, or to the dense fluid during transfer from the pressurization vessel to the processing chamber. The ultrasonic energy may be generated continuously at a constant frequency or at variable frequencies. Alternatively, the ultrasonic energy may be generated intermittently.Type: ApplicationFiled: September 24, 2002Publication date: March 25, 2004Applicant: Air Products and Chemicals, Inc.Inventors: Wayne Thomas McDermott, Hoshang Subawalla, Andrew David Johnson, Alexander Schwarz