Abstract: A vapor deposition apparatus for forming a deposition layer on a substrate, the vapor deposition apparatus includes a supply unit configured to receive a first source gas, a reaction space connected to the supply unit, a plasma generator in the reaction space, a first injection unit configured to inject a deposition source material to the substrate, the deposition source material including the first source gas, and a filament unit in the reaction space, the filament unit being connected to a power source.

Abstract: A gas spraying apparatus according to the embodiment of the present invention includes a spray part disposed and aligned on one side outside a substrate in the width direction of the substrate, and having a plurality of nozzles for spraying gas toward the substrate, and a spray control unit for automatically controlling whether or not each of a plurality of nozzles sprays gas such that a gas density distribution type in the width direction of the substrate becomes a targeted gas density distribution type by the gas sprayed through the plurality of nozzles. Therefore, according to the embodiment of the present invention, it is easy to carry out the process with a plurality of types of process types or a plurality of types of gas density distribution types, and a time for adjusting the open or close operation of the plurality of nozzles can be shortened.

Abstract: Disclosed is a method of separating an ethylene oligomerization effluent, in which, during the separation and purification of a product obtained through ethylene oligomerization, the temperature of the reaction product is adjusted and used, thus improving energy efficiency.

Abstract: Disclosed is a method of separating an ethylene oligomerization effluent, in which, during the separation and purification of a product obtained through ethylene oligomerization, the temperature of the reaction product is adjusted and used, thus improving energy efficiency.

Abstract: A vapor deposition apparatus for forming a deposition layer on a substrate, the vapor deposition apparatus includes a supply unit configured to receive a first source gas, a reaction space connected to the supply unit, a plasma generator in the reaction space, a first injection unit configured to inject a deposition source material to the substrate, the deposition source material including the first source gas, and a filament unit in the reaction space, the filament unit being connected to a power source.

Abstract: A vehicle cup holder includes a body part including a storage part having an irradiation hole formed at one side thereof; a cover mounted at an upper portion of the body part so as to open or close the storage part; and a lamp unit mounted on the body part and fixed by a coupling member. The lamp unit includes a housing fixed to the body part at one side end portion thereof, an LED lamp module fitted into the one side portion of the housing, a lens coupled on a front surface of the housing such that light emitted from an LED mounted on a substrate of the LED lamp module, is irradiated through the irradiation hole of the storage part, and a guide lens provided between the housing and the lens so as to diffuse and irradiate the light generated by the LED through the lens.

Abstract: A lateral light emitting diode device includes: a substrate; an n-type GaN layer disposed on the substrate; an activation layer disposed on the n-type GaN layer; a p-type GaN layer disposed on the activation layer; a current spreading layer disposed on the p-type GaN layer; a p-electrode disposed on the current spreading layer; a MESA region formed by removing portions of the current spreading layer, the p-type GaN layer, the activation layer, and the n-type GaN layer; a transparent window layer disposed on the n-type GaN layer in the entire or part of the MESA region; a plurality of contact plugs which is in contact with the n-type GaN layer through the transparent window layer; and an n-electrode disposed on the transparent window layer to connect the plurality of contact plugs to each other.

Abstract: A method and an apparatus for using a memory device are provided. A host device includes a transmitter that transmits data; a receiver that receives data; and a controller configured to receive configuration information of the memory device including the information related to the data stored in the one or more slots determined according to each vendor of the memory device, identify information related to predetermined data in the configuration data of the memory device, and receive the predetermined data from the memory device.

Abstract: An atomic layer deposition apparatus includes a first base plate on which a seat portion is defined to allow a substrate to be seated thereon, a second base plate disposed opposite to the first base plate, a first gas nozzle portion arranged on the second base plate, a second gas nozzle portion arranged on the second base plate to be spaced apart from the first gas nozzle portion and substantially parallel to the first gas nozzle portion, and a gas storage portion connected to the first gas nozzle portion and the second gas nozzle portion.

Abstract: An apparatus and method for managing health data through a user terminal are provided. The method includes inputting a user terminal number for identifying the user terminal, and information of a medical instrument for measuring the health data to a management server interworked with the user terminal, receiving, by a receiver, a security type table mapped onto the user terminal number and comprising a security type code for instructing the health data which the medical instrument has measured to be stored in a first memory without security or in a second memory with security, from the management server, and storing the health data in the first memory or the second memory, which the security type code instructs, through determining the security type code of the security type table when the health data is received from the medical instrument.

Abstract: A method of depositing a layer includes spraying a source gas and a reactant gas onto a substrate disposed on a susceptor unit using at least one source gas spray nozzle and at least one reactant gas nozzle to form a first source gas region and a first reactant gas region on the substrate, respectively, moving the susceptor unit by a distance corresponding to a width of the source gas spray nozzle or a width of the reactant gas spray nozzle in a first direction, and spraying the source gas and the reactant gas onto the first reactant gas region and the first source gas region using the source gas spray nozzle and the reactant gas nozzle, respectively, to form a first monolayer.

Abstract: A vapor deposition apparatus for depositing a thin film on a substrate, by which a deposition process is efficiently performed and deposition film characteristics are easily improved, and a vapor deposition apparatus including: a stage onto which a substrate is disposed; and a supply unit disposed to face the substrate and having a main body member and a nozzle member disposed on one surface of the main body member facing the substrate, to sequentially supply a plurality of gases towards the substrate, and a method of manufacturing an organic light-emitting display apparatus using the same.

Abstract: A display device includes preparing a high hardness film. In the high hardness film, a first supporting member, a silsesquioxane film, and a second supporting member are deposited. The high hardness film is pre-treated, forming a pre-window. A transparent member is formed on a surface of the pre-window through an injection process. The transparent member is formed of polycarbonate. The first supporting member and the second supporting member are formed of polyethylene terephthalate or polyethylene naphthalate.

Abstract: Disclosed are apparatus and methods for characterizing a plurality of structures of interest on a semiconductor wafer. A plurality of models having varying combinations of floating and fixed critical parameters and corresponding simulated spectra is generated. Each model is generated to determine one or more critical parameters for unknown structures based on spectra collected from such unknown structures. It is determined which one of the models best correlates with each critical parameter based on reference data that includes a plurality of known values for each of a plurality of critical parameters and corresponding known spectra. For spectra obtained from an unknown structure using a metrology tool, different ones of the models are selected and used to determine different ones of the critical parameters of the unknown structure based on determining which one of the models best correlates with each critical parameter based on the reference data.

Abstract: A vapor deposition apparatus for depositing thin films on a substrate includes a supply unit including a plurality of linear supply members configured to supply at least one gas; and a nozzle unit including a plurality of nozzle members connected to the plurality of supply members and configured to supply the at least one gas toward the substrate, wherein two adjacent nozzle members of the plurality of nozzle members are connected to at least one common supply member of the plurality of supply members.

Abstract: Ultra-large graphene oxide (UL-GO) sheets are formed using a Langmuir-Blodgett (LB) thin film process. Sulfuric acid and nitric acid are applied to interlayers of natural graphite flake to form graphite intercalation compound (GIC) powders. The GIC powders are expanded at a high temperature, and intercalating agents are used to further oxidize the expanded GIC powders by to exfoliating the EG into monolayer graphene oxide (GO) sheets. The GO is sequentially centrifuged and UL-GO sheets are collected. An LB thin film is prepared from the collected sheets and the thin films are reduced and chemically doped.

Abstract: The present invention relates to a heater block and a substrate treatment apparatus, and more particularly to a heater block to perform heat treatment on a substrate and a substrate treatment apparatus having the same. According to embodiments of the present invention, it is provided a heater block for a substrate treatment apparatus having heating lamps on its one side to transfer heat to a target subjected to heat treatment, the heating lamps having different arrangement patterns in a plurality of regions on said one side.

Abstract: Disclosed is a window for a display device that includes a first plastic substrate, a second plastic substrate disposed on one side of the first plastic substrate, and a bonding layer disposed between the first plastic substrate and second plastic substrate and bonding the first plastic substrate and the second plastic substrate, wherein the bonding layer has protrusions and depressions on a side in contact with the first plastic substrate.

Abstract: A vapor deposition apparatus for depositing a thin film on a substrate, by which a deposition process is efficiently performed and deposition film characteristics are easily improved, and a vapor deposition apparatus including: a stage onto which a substrate is disposed; and a supply unit disposed to face the substrate and having a main body member and a nozzle member disposed on one surface of the main body member facing the substrate, to sequentially supply a plurality of gases towards the substrate, and a method of manufacturing an organic light-emitting display apparatus using the same.

Abstract: Disclosed are apparatus and methods for characterizing a plurality of structures of interest on a semiconductor wafer. A plurality of models having varying combinations of floating and fixed critical parameters and corresponding simulated spectra is generated. Each model is generated to determine one or more critical parameters for unknown structures based on spectra collected from such unknown structures. It is determined which one of the models best correlates with each critical parameter based on reference data that includes a plurality of known values for each of a plurality of critical parameters and corresponding known spectra. For spectra obtained from an unknown structure using a metrology tool, different ones of the models are selected and used to determine different ones of the critical parameters of the unknown structure based on determining which one of the models best correlates with each critical parameter based on the reference data.