Abstract: Disclosed are apparatus and methods for characterizing a plurality of structures of interest on a semiconductor wafer. A plurality of models having varying combinations of floating and fixed critical parameters and corresponding simulated spectra is generated. Each model is generated to determine one or more critical parameters for unknown structures based on spectra collected from such unknown structures. It is determined which one of the models best correlates with each critical parameter based on reference data that includes a plurality of known values for each of a plurality of critical parameters and corresponding known spectra. For spectra obtained from an unknown structure using a metrology tool, different ones of the models are selected and used to determine different ones of the critical parameters of the unknown structure based on determining which one of the models best correlates with each critical parameter based on the reference data.

Abstract: An apparatus and method for managing health data through a user terminal are provided. The method includes inputting a user terminal number for identifying the user terminal, and information of a medical instrument for measuring the health data to a management server interworked with the user terminal, receiving, by a receiver, a security type table mapped onto the user terminal number and comprising a security type code for instructing the health data which the medical instrument has measured to be stored in a first memory without security or in a second memory with security, from the management server, and storing the health data in the first memory or the second memory, which the security type code instructs, through determining the security type code of the security type table when the health data is received from the medical instrument.

Abstract: A thin film deposition apparatus, including a plurality of linear nozzle parts separated from each other; and an exhaust plate to which is attached the plurality of linear nozzle parts, each linear nozzle part including a linear body member; a pair of first reaction gas pipes in the linear body member and inflowing a first reaction gas; a second reaction gas pipe between the pair of first reaction gas pipes and inflowing a second reaction gas; and a pair of control gas pipes between each of the first reaction gas pipes and the second reaction gas pipe and inflowing a control gas controlling a flow of the second reaction gas.

Abstract: An apparatus and method for managing health data through a user terminal are provided. The method includes inputting a user terminal number for identifying the user terminal, and information of a medical instrument for measuring the health data to a management server interworked with the user terminal, receiving, by a receiver, a security type table mapped onto the user terminal number and comprising a security type code for instructing the health data which the medical instrument has measured to be stored in a first memory without security or in a second memory with security, from the management server, and storing the health data in the first memory or the second memory, which the security type code instructs, through determining the security type code of the security type table when the health data is received from the medical instrument.

Abstract: Provided are a WLAN management procedure, a station supporting the procedure, and a frame format for the procedure. In the management procedure, a reporting station receives a event request frame including one or more event request elements each of which comprises an event type field for specifying the event type of an event request and an event response limit field for specifying the number of requested event report elements. And, in response to the event request frame, the reporting station transmits an event response frame including event report elements for the event type specified in the event type field as many as the number specified in the event response limit field.

Abstract: Methods of determining asymmetric properties of structures are described. A method includes measuring, for a grating structure, a first signal and a second, different, signal obtained by optical scatterometry. A difference between the first signal and the second signal is then determined. An asymmetric structural parameter of the grating structure is determined based on a calculation using the first signal, the second signal, and the difference.

Abstract: A vapor deposition apparatus for depositing a thin film on a substrate includes a cover having an accommodation portion and a communicated portion, which communicated portion is connected to the accommodation portion and faces a direction of the substrate, and includes a body in the accommodation portion, which body includes a first portion and a second portion. The first portion is disposed at a first location of the body and connected to a first injection portion for injecting a first material onto the substrate, the second portion is disposed at a second location of the body and connected to a second injection portion for injecting a second material onto the substrate, and the body rotates in at least one direction so that the first portion and the second portion are alternately connected to each other with respect to the communicated portion.

Abstract: A display device including: a plastic window including a light transmittance film and a polymer layer, and a functional film including a touch screen panel film, a polarizing film, or a combination thereof. The light transmittance film, the polymer layer, and the functional film are sequentially stacked on each other, and the light transmittance film, the functional film, and the polymer layer are attached to each other by a plastic. A method of manufacturing the same is also provided.

Abstract: An atomic layer deposition apparatus includes a first base plate on which a seat portion is defined to allow a substrate to be seated thereon, a second base plate disposed opposite to the first base plate, a first gas nozzle portion arranged on the second base plate, a second gas nozzle portion arranged on the second base plate to be spaced apart from the first gas nozzle portion and substantially parallel to the first gas nozzle portion, and a gas storage portion connected to the first gas nozzle portion and the second gas nozzle portion.

Abstract: A vapor deposition apparatus for depositing a thin layer on a substrate, the vapor deposition apparatus includes a plurality of modules arranged to respectively face different regions of the substrate, each of the plurality of modules including a body unit, and a nozzle unit disposed on one of surfaces of the body unit facing the substrate, where the plurality of modules is configured to individually perform deposition processes on different regions of the substrate, respectively.

Abstract: A canister includes an accommodation portion for accommodating a liquid material; an outlet pipe that is connected to the accommodation portion so as to discharge a gas material obtained by vaporizing the liquid material; a blocking cover that is connected to an upper surface of the accommodation portion; and a plurality of baffle plates that are disposed in the accommodation portion and are spaced apart from each other. The canister further includes a restrictor including a main body member that is disposed between the plurality of baffle plates and the blocking cover and is connected to an internal surface of the accommodation portion, an extension member extending from the main body member, and a through portion that is formed through the main body member and the extension member. A deposition procedure using the canister is efficiently performed and characteristics of a deposition layer are easily improved.

Abstract: A vapor deposition apparatus includes a substrate mount unit on which a substrate is mounted, a plurality of first nozzle units which injects a first raw material in a direction of the substrate mount unit, a plurality of second nozzle units which is alternately disposed with the plurality of first nozzle units and injects a second raw material in the direction of the substrate mount unit, and a plasma module unit which supplies the second raw material to the plurality of second nozzle units. The second raw material is a radical, and the substrate mount unit includes an electrostatic generation part.

Abstract: A light emitting device package is disclosed. The light emitting device package includes a body, first and second lead frames disposed on the body, and a light emitting device connected to the first and second lead frames, wherein at least one of the first and second lead frames includes first and second regions having different thicknesses.

Abstract: In an aspect, a window panel for a display device includes a plastic substrate formed of a transparent polyimide, and a first colored hard coating layer disposed at one surface of the plastic substrate is provided.

Abstract: A vapor deposition apparatus for depositing thin films on a substrate includes a supply unit including a plurality of linear supply members configured to supply at least one gas; and a nozzle unit including a plurality of nozzle members connected to the plurality of supply members and configured to supply the at least one gas toward the substrate, wherein two adjacent nozzle members of the plurality of nozzle members are connected to at least one common supply member of the plurality of supply members.

Abstract: Ultra-large graphene oxide (UL-GO) sheets are formed using a Langmuir-Blodgett (LB) thin film process. Sulfuric acid and nitric acid are applied to interlayers of natural graphite flake to form graphite intercalation compound (GIC) powders. The GIC powders are expanded at a high temperature, and intercalating agents are used to further oxidize the expanded GIC powders by to exfoliating the EG into monolayer graphene oxide (GO) sheets. The GO is sequentially centrifuged and UL-GO sheets are collected. An LB thin film is prepared from the collected sheets and the thin films are reduced and chemically doped.

Abstract: Disclosed are apparatus and methods for characterizing a plurality of structures of interest on a semiconductor wafer. A plurality of models having varying combinations of floating and fixed critical parameters and corresponding simulated spectra is generated. Each model is generated to determine one or more critical parameters for unknown structures based on spectra collected from such unknown structures. It is determined which one of the models best correlates with each critical parameter based on reference data that includes a plurality of known values for each of a plurality of critical parameters and corresponding known spectra. For spectra obtained from an unknown structure using a metrology tool, different ones of the models are selected and used to determine different ones of the critical parameters of the unknown structure based on determining which one of the models best correlates with each critical parameter based on the reference data.

Abstract: A method of depositing a layer includes spraying a source gas and a reactant gas onto a substrate disposed on a susceptor unit using at least one source gas spray nozzle and at least one reactant gas nozzle to form a first source gas region and a first reactant gas region on the substrate, respectively, moving the susceptor unit by a distance corresponding to a width of the source gas spray nozzle or a width of the reactant gas spray nozzle in a first direction, and spraying the source gas and the reactant gas onto the first reactant gas region and the first source gas region using the source gas spray nozzle and the reactant gas nozzle, respectively, to form a first monolayer.

Abstract: Provided is a vapor deposition apparatus including a deposition unit including a plurality of deposition modules disposed parallel to each other and a substrate mounting unit located below the deposition unit, on which a substrate is mounted. In this case, each of the plurality of deposition modules includes a nozzle configured to selectively inject a raw gas and a purge gas toward the substrate mounting unit, and the nozzle injects the raw gas while the substrate mounting unit is being located below the nozzle.

Abstract: A window panel includes an adhesion-base layer having first and second surfaces opposite to each other and including a thermoplastic polymer, a first film on the first surface and including a first plastic layer and a first surface hardness layer on the first plastic layer, and a second film on the second surface and including a second plastic layer and a second surface hardness layer on the second plastic layer. The adhesion-base layer, the first plastic layer, and the second plastic layer include a same material. A display apparatus includes the window panel. A method of manufacturing the window panel includes preparing the first film, preparing the second film, disposing the first film and the second film parallel to each other, providing a thermoplastic polymer between the first film and the second film, and forming the adhesion-base layer by curing the thermoplastic polymer.