Abstract: The present disclosure provides a target and a method of performing overlay measurements on a target. The target includes an array of cells comprising a first cell, a second cell, a third cell, and a fourth cell. Each cell includes a periodic structure with a pitch. The periodic structure includes a first section and a second section, separated by a first gap. The target further includes an electron beam overlay target, such that electron beam overlay measurements, advanced imaging metrology, and/or scatterometry measurements can be performed on the target.

Abstract: Electron beam overlay targets and method of performing overlay measurements on a target using a semiconductor metrology tool are provided. One target includes a plurality of electron beam overlay elements and a plurality of two-dimensional elements that provide at least one two-dimensional imaging. The plurality of two dimensional elements are an array of evenly-spaced polygonal gratings across at least three rows and at least three columns. Another target includes a plurality of electron beam overlay elements and a plurality of AIMid elements. Each of the electron beam overlay elements includes at least two gratings that are overlaid at a perpendicular orientation to each other. The plurality of AIMid elements includes at least two gratings that are overlaid at a perpendicular orientation to each other.

Abstract: Combined electron beam overlay and scatterometry overlay targets include first and second periodic structures with gratings. Gratings in the second periodic structure can be positioned under the gratings of the first periodic structure or can be positioned between the gratings of the first periodic structure. These overlay targets can be used in semiconductor manufacturing.

Abstract: Electron beam overlay targets and method of performing overlay measurements on a target using a semiconductor metrology tool are provided. One target includes a plurality of electron beam overlay elements and a plurality of two-dimensional elements that provide at least one two-dimensional imaging. The plurality of two dimensional elements are an array of evenly-spaced polygonal gratings across at least three rows and at least three columns. Another target includes a plurality of electron beam overlay elements and a plurality of AIMid elements. Each of the electron beam overlay elements includes at least two gratings that are overlaid at a perpendicular orientation to each other. The plurality of AIMid elements includes at least two gratings that are overlaid at a perpendicular orientation to each other.

Abstract: Combined electron beam overlay and scatterometry overlay targets include first and second periodic structures with gratings. Gratings in the second periodic structure can be positioned under the gratings of the first periodic structure or can be positioned between the gratings of the first periodic structure. These overlay targets can be used in semiconductor manufacturing.

Abstract: Electron beam overlay targets and method of performing overlay measurements on a target using a semiconductor metrology tool are provided. One target includes a plurality of electron beam overlay elements and a plurality of two-dimensional elements that provide at least one two-dimensional imaging. The plurality of two dimensional elements are an array of evenly-spaced polygonal gratings across at least three rows and at least three columns. Another target includes a plurality of electron beam overlay elements and a plurality of AIMid elements. Each of the electron beam overlay elements includes at least two gratings that are overlaid at a perpendicular orientation to each other. The plurality of AIMid elements includes at least two gratings that are overlaid at a perpendicular orientation to each other.

Abstract: The present disclosure provides a target and a method of performing overlay measurements on a target. The target includes an array of cells comprising a first cell, a second cell, a third cell, and a fourth cell. Each cell includes a periodic structure with a pitch. The periodic structure includes a first section and a second section, separated by a first gap. The target further includes an electron beam overlay target, such that electron beam overlay measurements, advanced imaging metrology, and/or scatterometry measurements can be performed on the target.

Abstract: A method, system and computer program product for determination of a metrology target design, comprising generating a first candidate target design for a selected design type compatible with one or more metrology tools or and a set of boundaries for a simulation range Measurement of the first target design with the one or more metrology tools within the boundaries of the simulation range is simulated for two or more measurement settings to generate one or more performance metrics. Simulating the measurement takes into account layer properties of one or more layers in a stack profile. The optimal design is determined from at least the performance metrics based on one or more selection criteria and then sent or stored.

Abstract: A method, system and computer program product for determination of a metrology target design, comprising generating a first candidate target design for a selected design type compatible with one or more metrology tools or and a set of boundaries for a simulation range Measurement of the first target design with the one or more metrology tools within the boundaries of the simulation range is simulated for two or more measurement settings to generate one or more performance metrics. Simulating the measurement takes into account layer properties of one or more layers in a stack profile. The optimal design is determined from at least the performance metrics based on one or more selection criteria and then sent or stored.

Abstract: A closed system for rehydrating powder and delivering the rehydrated powder to a reactor, may include a liquid reservoir for containing liquid; a syringe configured to contain powder to be rehydrated; a reactor; a controller for controlling operation of the syringe; and a conduit fluidically linking the liquid reservoir to a port of the syringe, fluidically linking the port to the reactor. The controller is configured to operate the syringe so as to draw liquid from the liquid reservoir into the syringe and rehydrate the powder, or to drive the rehydrated powder into the reactor.

Abstract: A system includes rigid reservoirs, each divided by a flexible diaphragm into a hydraulic chamber and a delivery chamber. The hydraulic chamber is connected to a hydraulic liquid conduit via a valve and the delivery chamber is connected to a delivery conduit. A hydraulic actuator is operable to apply pressure to the hydraulic liquid so as to force the hydraulic liquid into a hydraulic chamber whose valve is open, pushing the diaphragm distally to force the delivery liquid from the delivery chamber into the connected delivery conduit. The actuator is also operable to apply suction to the hydraulic liquid in the hydraulic liquid conduit so as to draw hydraulic liquid from the hydraulic chamber, proximally pulling the flexible diaphragm to draw the delivery liquid from the delivery conduit into the delivery chamber.

Abstract: A closed system for rehydrating powder and delivering the rehydrated powder to a reactor, may include a liquid reservoir for containing liquid; a syringe configured to contain powder to be rehydrated; a reactor; a controller for controlling operation of the syringe; and a conduit fluidically linking the liquid reservoir to a port of the syringe, fluidically linking the port to the reactor. The controller is configured to operate the syringe so as to draw liquid from the liquid reservoir into the syringe and rehydrate the powder, or to drive the rehydrated powder into the reactor.

Abstract: A system includes rigid reservoirs, each divided by a flexible diaphragm into a hydraulic chamber and a delivery chamber. The hydraulic chamber is connected to a hydraulic liquid conduit via a valve and the delivery chamber is connected to a delivery conduit. A hydraulic actuator is operable to apply pressure to the hydraulic liquid so as to force the hydraulic liquid into a hydraulic chamber whose valve is open, pushing the diaphragm distally to force the delivery liquid from the delivery chamber into the connected delivery conduit. The actuator is also operable to apply suction to the hydraulic liquid in the hydraulic liquid conduit so as to draw hydraulic liquid from the hydraulic chamber, proximally pulling the flexible diaphragm to draw the delivery liquid from the delivery conduit into the delivery chamber.

Abstract: A liquid reservoir for use in a microgravity environment includes a bladder for holding a liquid. The bladder includes flexible walls and an opening for extraction of the liquid from the bladder. An internal structure is shaped so as to form a channel to conduct the liquid from an end of the bladder that is distal to the opening. The internal structure is configured to prevent the walls of the bladder from blocking the channel when suction is applied to the opening.

Abstract: A serviceable system for handling fluids in microgravity includes supply reservoirs to hold a supply fluid for a process, a fluid processing unit to perform the process and a collection reservoir to collect a fluid from the fluid processing unit. Each supply reservoirs is provided with a supply valve assembly of valves and conduits, and at least one external conduit that is connectable to an external fluid source or to an external suction source. The supply valve assembly is configured to enable individually: flow of the supply fluid from the supply reservoir to the fluid processing unit, flow of a fluid into the supply reservoir from the external conduit; withdrawal of fluid from supply reservoir to the external conduit, and flow of fluid from the external conduit to the fluid processing unit.

Abstract: A liquid reservoir for use in a microgravity environment includes a bladder for holding a liquid. The bladder includes flexible walls and an opening for extraction of the liquid from the bladder. An internal structure is shaped so as to form a channel to conduct the liquid from an end of the bladder that is distal to the opening. The internal structure is configured to prevent the walls of the bladder from blocking the channel when suction is applied to the opening.

Abstract: A serviceable system for handling fluids in microgravity includes supply reservoirs to hold a supply fluid for a process, a fluid processing unit to perform the process and a collection reservoir to collect a fluid from the fluid processing unit. Each supply reservoirs is provided with a supply valve assembly of valves and conduits, and at least one external conduit that is connectable to an external fluid source or to an external suction source. The supply valve assembly is configured to enable individually: flow of the supply fluid from the supply reservoir to the fluid processing unit, flow of a fluid into the supply reservoir from the external conduit; withdrawal of fluid from supply reservoir to the external conduit, and flow of fluid from the external conduit to the fluid processing unit.

Abstract: One or more parameters of a sample that includes a textured substrate and one or more overlying films is determined using, e.g., an optical metrology device to direct light to be incident on the sample and detecting light after the incident light interacts with the sample. The acquired data is normalized using reference data that is produced using a textured reference sample. The normalized data is then fit to simulated data that is associated with a model having an untextured substrate and one or more variable parameters. The value(s) of the one or more variable parameters from the model associated with the simulated data having the best fit is reported as measurement result.

Abstract: One or more parameters of a sample that includes a textured substrate and one or more overlying films is determined using, e.g., an optical metrology device to direct light to be incident on the sample and detecting light after the incident light interacts with the sample. The acquired data is normalized using reference data that is produced using a textured reference sample. The normalized data is then fit to simulated data that is associated with a model having an untextured substrate and one or more variable parameters. The value(s) of the one or more variable parameters from the model associated with the simulated data having the best fit is reported as measurement result.

Abstract: A pre-metal dielectric structure of a single-poly EEPROM structure includes a UV light-absorbing film, which prevents the charge on a floating gate of the EEPROM structure from being changed in response to UV radiation. In one embodiment, the pre-metal dielectric structure includes a first pre-metal dielectric layer, an amorphous silicon layer located over the first pre-metal dielectric layer, and a second pre-metal dielectric layer located over the amorphous silicon layer.