Patents by Inventor Ivar Schram
Ivar Schram has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120153538Abstract: A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion.Type: ApplicationFiled: February 22, 2012Publication date: June 21, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Johan Frederick Dijksman, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Ivar SCHRAM, Jeroen Herman Lammers, Richard Joseph Marinus Schroeders
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Publication number: 20120127555Abstract: A method for manufacturing an electrowetting device provides a first fluid on a surface of a substrate. The method includes the steps of immersing part of the substrate in a second fluid, the second fluid being immiscible with the first fluid, and a surface of the second fluid forming a gutter along the surface of the substrate; providing a quantity of the first fluid in the gutter; and moving the gutter along the surface of the substrate, the surface of the substrate and a horizontal plane forming an angle between 100 degrees and 170 degrees. Also disclosed is an apparatus for performing the method.Type: ApplicationFiled: November 17, 2011Publication date: May 24, 2012Applicant: LIQUAVISTA B.V.Inventors: Ivar Schram, Romaric Massard, Christophe Miremont
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Patent number: 8144309Abstract: A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion.Type: GrantFiled: September 5, 2007Date of Patent: March 27, 2012Assignee: ASML Netherlands B.V.Inventors: Sander Frederik Wuister, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Ivar Schram, Jeroen Herman Lammers, Richard Joseph Marinus Schroeders
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Publication number: 20120012611Abstract: An imprintable medium dispenser includes a chamber, a nozzle, and an actuator connected to the chamber and configured to be actuated and thereby generate a pressure wave within the chamber such that imprintable medium is dispensed from the nozzle. The imprintable medium dispenser is provided with a control circuit which includes a monitoring apparatus configured to receive a transient oscillation signal generated when the actuator is actuated, and to monitor the operation of the imprintable medium dispenser by monitoring the transient oscillation signal.Type: ApplicationFiled: July 29, 2011Publication date: January 19, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Johan Frederik Dijksman, Anke Pierik, Martin Maurice Vernhout, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
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Publication number: 20110266255Abstract: A method of making an imprint template includes providing a transfer layer on a substrate and providing a layer of imprintable medium on the transfer layer, using a master imprint template to imprint a pattern into the imprintable medium, polymerizing the imprintable medium by exposing it to actinic radiation, then etching the resulting polymer layer, the transfer layer and the substrate such that the imprinted pattern is transferred to the substrate, the substrate thereby becoming an imprint template bearing a pattern which is the inverse of a pattern provided on the master imprint template.Type: ApplicationFiled: July 12, 2011Publication date: November 3, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Sander Frederik WUISTER, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
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Patent number: 8015939Abstract: An imprintable medium dispenser includes a chamber, a nozzle, and an actuator connected to the chamber and configured to be actuated and thereby generate a pressure wave within the chamber such that imprintable medium is dispensed from the nozzle. The imprintable medium dispenser is provided with a control circuit which includes a monitoring apparatus configured to receive a transient oscillation signal generated when the actuator is actuated, and to monitor the operation of the imprintable medium dispenser by monitoring the transient oscillation signal.Type: GrantFiled: June 30, 2006Date of Patent: September 13, 2011Assignee: ASML Netherlands B.V.Inventors: Johan Frederik Dijksman, Anke Pierik, Martin Maurice Vernhout, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
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Patent number: 7998651Abstract: A method of making an imprint template includes providing a transfer layer on a substrate and providing a layer of imprintable medium on the transfer layer, using a master imprint template to imprint a pattern into the imprintable medium, polymerizing the imprintable medium by exposing it to actinic radiation, then etching the resulting polymer layer, the transfer layer and the substrate such that the imprinted pattern is transferred to the substrate, the substrate thereby becoming an imprint template bearing a pattern which is the inverse of a pattern provided on the master imprint template.Type: GrantFiled: May 15, 2006Date of Patent: August 16, 2011Assignee: ASML Netherlands B.V.Inventors: Sander Frederik Wuister, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
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Patent number: 7946837Abstract: In an embodiment, an imprint lithography apparatus is disclosed that includes a support structure configured support an imprint template, the imprint template having a neutral plane which substantially bisects the imprint template, and an actuator located in a position such that, when the imprint template is supported by the support structure, the actuator is located between the support structure and a side of the imprint template, wherein the actuator is configured to meet the imprint template at a location which is displaced from the neutral plane of the imprint template.Type: GrantFiled: October 6, 2006Date of Patent: May 24, 2011Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Sander Frederik Wuister, Ivar Schram
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Patent number: 7943080Abstract: A method of aligning an imprint template with respect to a target region of a substrate is disclosed, the method including depositing a volume of an imprintable medium within the target region; contacting an imprint template to the imprintable medium so that the imprintable medium is compressed and allowing the imprint template, the target region, or both, to move laterally with respect to each other under interfacial tension forces between the target region and the imprint template, wherein a material which is less wetting than the substrate is provided in a configuration which at least partially surrounds the target region of the substrate.Type: GrantFiled: December 23, 2005Date of Patent: May 17, 2011Assignee: ASML Netherlands B.V.Inventors: Johan Frederik Dijksman, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
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Patent number: 7862756Abstract: A method of making a substantial replica of a first imprint template which bears a first pattern is disclosed. The method includes filling recesses of the first pattern with a first material, removing the first material from the first imprint template to form a second imprint template which bears a second pattern, the second pattern being the substantial inverse of the first pattern, filling recesses of the second pattern with a photo-curable medium, curing the photo-curable medium by illuminating it with radiation, and removing the cured medium from the second imprint template to form a third imprint template which bears a pattern that is a substantial replica of the first pattern.Type: GrantFiled: March 30, 2006Date of Patent: January 4, 2011Assignee: ASML Netherland B.V.Inventors: Sander Frederik Wuister, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
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Publication number: 20100321760Abstract: A display device comprising picture elements, which are constituted by electrowetting elements having at least one first fluid and a second fluid immiscible with each other within a space between a first support plate and a second support plate, the second fluid being electro-conductive or polar. The first fluid in each element is at the side of the first support plate confined by element walls, and the second fluid is shared by a plurality of picture elements, characterised by a preventer for preventing first fluid portions from being expelled from its confinement when forces other than electrowetting forces are exerted on this fluid.Type: ApplicationFiled: June 14, 2010Publication date: December 23, 2010Applicant: LIQUAVISTA B.V.Inventors: Robert A. Hayes, Andrea Giraldo, Anthony John Slack, Johannes Bokke Feenstra, Roy Van Dijk, Ivar Schram
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Patent number: 7854877Abstract: An imprint lithography method is disclosed, which includes imprinting a plurality of patterns in an imprintable medium provided on a substrate, wherein the order in which the patterns are imprinted in the imprintable medium is such that, for the majority of the patterns, two consecutively imprinted patterns are not imprinted adjacent to one another.Type: GrantFiled: August 14, 2007Date of Patent: December 21, 2010Assignee: ASML Netherlands B.V.Inventors: Ivar Schram, Johan Frederik Dijksman, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Jeroen Herman Lammers, Richard Joseph Marinus Schroeders
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Patent number: 7677877Abstract: A lithographic apparatus is disclosed that includes an imprint template and a radiation source configured to cure photosensitive material, the radiation source including a laser or a light emitting diode. An imprint template is also disclosed.Type: GrantFiled: November 3, 2006Date of Patent: March 16, 2010Assignee: ASML Netherlands B.V.Inventors: Sander Frederik Wuister, Aleksey Yurievich Kolesnychenko, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
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Publication number: 20100049120Abstract: A capsule and methodology for dispensing a medicament in the gastrointestinal tract of a mammal is disclosed, the gastrointestinal tract having tissue sites of interest. The capsule may include a medicament reservoir; medicament dispensing means such as a plurality of piezoelectric droplet jet nozzle dispensers; a power source; electronic control circuitry means and/or detecting means capable of communicating with a medicament dispensing means for regulating the amount and time interval for dispensing of the medicament into the gastrointestinal tract by the medicament dispensing means; and a non-digestible outer protective shell housing, e.g., the medicament reservoir, medicament dispensing means and electronic control circuitry means.Type: ApplicationFiled: October 17, 2007Publication date: February 25, 2010Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Johan Frederik Dijksman, Anke Pierik, Judith Margreet Rensen, Jeff Shimizu, Hans Zou, Ivar Schram
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Publication number: 20090146347Abstract: An imprint template cover for an imprint template having a pattern feature thereon. The cover is configured such that, in use, it extends around the pattern feature of the imprint template, and such that the cover does not contact the pattern feature.Type: ApplicationFiled: December 5, 2008Publication date: June 11, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Sander Frederik Wuister, Ivar Schram, Jeroen Herman Lammers
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Publication number: 20090108484Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.Type: ApplicationFiled: October 10, 2008Publication date: April 30, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Raymond Jacobus Wilhelmus Knaapen, Johan Frederik Dijksman, Sander Frederik Wuister, Ivar Schram, Raymond Wilhelmus Louis Lafarre
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Publication number: 20090057267Abstract: A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion.Type: ApplicationFiled: September 5, 2007Publication date: March 5, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Sander Frederik Wuister, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Ivar Schram, Jeroen Herman Lammers, Richard Joseph Marinus Schroeders
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Publication number: 20090047606Abstract: An imprint lithography method is disclosed, which includes imprinting a plurality of patterns in an imprintable medium provided on a substrate, wherein the order in which the patterns are imprinted in the imprintable medium is such that, for the majority of the patterns, two consecutively imprinted patterns are not imprinted adjacent to one another.Type: ApplicationFiled: August 14, 2007Publication date: February 19, 2009Applicant: ASML NETHERLANDS B.V.Inventors: IVAR SCHRAM, JOHAN FREDERIK DIJKSMAN, SANDER FREDERIK WUISTER, YVONNE WENDELA KRUIJT-STEGEMAN, JEROEN HERMAN LAMMERS, RICHARD JOSEPH MARINUS SCHROEDERS
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Publication number: 20080145774Abstract: In an embodiment, an imprint lithography apparatus is disclosed that includes a support structure configured support an imprint template, the imprint template having a neutral plane which substantially bisects the imprint template, and an actuator located in a position such that, when the imprint template is supported by the support structure, the actuator is located between the support structure and a side of the imprint template, wherein the actuator is configured to meet the imprint template at a location which is displaced from the neutral plane of the imprint template.Type: ApplicationFiled: October 6, 2006Publication date: June 19, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Sander Frederik Wuister, Ivar Schram
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Publication number: 20080018875Abstract: A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head, or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets.Type: ApplicationFiled: July 18, 2006Publication date: January 24, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Ivar Schram, Johan Frederik Dijksman, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Jeroen Herman Lammers