Patents by Inventor Ivar Schram

Ivar Schram has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080003827
    Abstract: An imprintable medium dispenser includes a chamber, a nozzle, and an actuator connected to the chamber and configured to be actuated and thereby generate a pressure wave within the chamber such that imprintable medium is dispensed from the nozzle. The imprintable medium dispenser is provided with a control circuit which includes a monitoring apparatus configured to receive a transient oscillation signal generated when the actuator is actuated, and to monitor the operation of the imprintable medium dispenser by monitoring the transient oscillation signal.
    Type: Application
    Filed: June 30, 2006
    Publication date: January 3, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Johan Frederik Dijksman, Anke Pierik, Martin Maurice Vernhout, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
  • Publication number: 20070264591
    Abstract: A method of making an imprint template includes providing a transfer layer on a substrate and providing a layer of imprintable medium on the transfer layer, using a master imprint template to imprint a pattern into the imprintable medium, polymerizing the imprintable medium by exposing it to actinic radiation, then etching the resulting polymer layer, the transfer layer and the substrate such that the imprinted pattern is transferred to the substrate, the substrate thereby becoming an imprint template bearing a pattern which is the inverse of a pattern provided on the master imprint template.
    Type: Application
    Filed: May 15, 2006
    Publication date: November 15, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Sander Wuister, Johan Dijksman, Yvonne Kruijt-Stegeman, Ivar Schram
  • Publication number: 20070238037
    Abstract: A method of making a substantial replica of a first imprint template which bears a first pattern is disclosed. The method includes filling recesses of the first pattern with a first material, removing the first material from the first imprint template to form a second imprint template which bears a second pattern, the second pattern being the substantial inverse of the first pattern, filling recesses of the second pattern with a photo-curable medium, curing the photo-curable medium by illuminating it with radiation, and removing the cured medium from the second imprint template to form a third imprint template which bears a pattern that is a substantial replica of the first pattern.
    Type: Application
    Filed: March 30, 2006
    Publication date: October 11, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Sander Wuister, Johan Dijksman, Yvonne Kruijt-Stegeman, Ivar Schram
  • Publication number: 20070145643
    Abstract: A method of aligning an imprint template with respect to a target region of a substrate is disclosed, the method including depositing a volume of an imprintable medium within the target region; contacting an imprint template to the imprintable medium so that the imprintable medium is compressed and allowing the imprint template, the target region, or both, to move laterally with respect to each other under interfacial tension forces between the target region and the imprint template, wherein a material which is less wetting than the substrate is provided in a configuration which at least partially surrounds the target region of the substrate.
    Type: Application
    Filed: December 23, 2005
    Publication date: June 28, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Dijksman, Raymond Knaapen, Krassimir Krastev, Sander Wuister, Yvonne Kruijt-Stegeman, Ivar Schram
  • Publication number: 20070104813
    Abstract: A lithographic apparatus is disclosed that includes an imprint template and a radiation source configured to cure photosensitive material, the radiation source including a laser or a light emitting diode. An imprint template is also disclosed.
    Type: Application
    Filed: November 3, 2006
    Publication date: May 10, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Sander Wuister, Aleksey Kolesnychenko, Johan Dijksman, Yvonne Kruijt-Stegeman, Ivar Schram