Patents by Inventor Jakob Vijfvinkel

Jakob Vijfvinkel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8129702
    Abstract: A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.
    Type: Grant
    Filed: April 30, 2010
    Date of Patent: March 6, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Levinus Pieter Bakker, Marcel Mathijs Theodore Marie Dierichs, Johannes Maria Freriks, Frank Jeroen Pieter Schuurmans, Jakob Vijfvinkel, Wilhelmus Josephus Box
  • Publication number: 20100200772
    Abstract: A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.
    Type: Application
    Filed: April 30, 2010
    Publication date: August 12, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Levinus Pieter BAKKER, Marcel Mathijs Theodore Marie Dierichs, Johannes Maria Freriks, Frank Jeroen Pieter Schuurmans, Jakob Vijfvinkel, Wilhelmus Josephus Box
  • Patent number: 7737425
    Abstract: A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.
    Type: Grant
    Filed: May 16, 2007
    Date of Patent: June 15, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Levinus Pieter Bakker, Marcel Mathijs Theodore Marie Dierichs, Johannes Maria Freriks, Frank Jeroen Pieter Schuurmans, Jakob Vijfvinkel, Wilhelmus Josephus Box
  • Publication number: 20070222956
    Abstract: A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.
    Type: Application
    Filed: May 16, 2007
    Publication date: September 27, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Levinus Bakker, Marcel Marie Dierichs, Johannes Freriks, Frank Schuurmans, Jakob Vijfvinkel, Wilhelmus Box
  • Patent number: 7247866
    Abstract: A contamination barrier that passes through radiation from a radiation source and captures debris coming from the radiation source is disclosed. The contamination barrier includes an inner ring, an outer ring, and a plurality of lamellas. The lamellas extend in a radial direction from a main axis, and each of the lamellas is positioned in a respective plane that include the main axis. At least one outer end of each of the lamellas is slidably connected to at least one of the inner and outer ring.
    Type: Grant
    Filed: December 23, 2003
    Date of Patent: July 24, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Levinus Pieter Bakker, Marcel Mathijs Theodore Marie Dierichs, Johannes Maria Freriks, Frank Jeroen Pieter Schuurmans, Jakob Vijfvinkel, Wilhelmus Josephus Box
  • Publication number: 20060131183
    Abstract: A grinding machine (1) for grinding a workpiece (40) comprises the following components: a cup wheel (10) having an annular grinding surface (11); a disc-shaped electrode (60), which is positioned in the vicinity of at least a portion of the grinding surface (11) such that a dressing area (75) is obtained in which a relatively small gap is present between the electrode (60) and the grinding surface (11), feed means (70) for feeding electrolyte to the dressing area (75); and a generator (20) for generating an electric current between the grinding surface (11) and the electrode (60), via the electrolyte. The electrode (60) is movable with respect to the dressing area (75), so that contamination of the electrode (60), which normally occurs as a result of the dressing process, is continuously removed. Consequently, the quality of the dressing process is maintained at a high level.
    Type: Application
    Filed: January 20, 2004
    Publication date: June 22, 2006
    Applicant: Koninklijke Philips Electronics N.V.
    Inventors: Raymond Jacobus Knaapen, Marinus Josephus Dona, Krassimir Krastev, Jakob Vijfvinkel, Piet Van Rens
  • Patent number: 6903805
    Abstract: In a lithographic projection apparatus, a slider is provided for motion of the substrate table or mask table. The slider is supported on a gas-bearing and separates a region at atmospheric pressure from a vacuum space region. A differential pressure pump is provided to maintain the pressure difference in the presence of the gas-bearing. A pressure compensation vessel is provided on top of the slider and also contains a vacuum. Over most of the area of the slider, the pressure on its opposed first and second sides is the same and so deformation of the slider is avoided. The sidewalls of the pressure compensation vessel transmit the external gas pressure to the slider such that they are in line with the forces of the gas-bearing.
    Type: Grant
    Filed: November 6, 2002
    Date of Patent: June 7, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Ronald Maarten Schneider, Jakob Vijfvinkel
  • Patent number: 6844922
    Abstract: A bearing for use in a vacuum chamber comprises a gas bearing discharging pressurised gas into a gap between two members to maintain a predetermined separation between those members.
    Type: Grant
    Filed: July 7, 2003
    Date of Patent: January 18, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Theodorus H. J. Bisschops, Jakob Vijfvinkel, Hermanus M. J. R. Soemers, Johannes C. Driessen, Michael J. M. Renkens, Adrianus G. Bouwer
  • Patent number: 6816238
    Abstract: A long-stroke movement is fed-through into a vacuum chamber by providing a sliding seal over an aperture in the vacuum chamber wall. The object to be moved, which may be a mask or wafer table in a lithographic apparatus, within the vacuum chamber is connected to or mounted on the sliding seal and moved by movement of the sliding seal. The sliding seal may be a plate, a bowl or a labyrinth of interleaved plates.
    Type: Grant
    Filed: July 17, 2002
    Date of Patent: November 9, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Theodorus H. J. Bisschops, Jakob Vijfvinkel, Hermanus M. J. R. Soemers, Johannes C. Driessen, Michael J. M. Renkens, Adrianus G. Bouwer
  • Publication number: 20040184014
    Abstract: A contamination barrier that passes through radiation from a radiation source and captures debris coming from the radiation source is disclosed. The contamination barrier includes an inner ring, an outer ring, and a plurality of lamellas. The lamellas extend in a radial direction from a main axis, and each of the lamellas is positioned in a respective plane that include the main axis. At least one outer end of each of the lamellas is slidably connected to at least one of the inner and outer ring.
    Type: Application
    Filed: December 23, 2003
    Publication date: September 23, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Levinus Pieter Bakker, Marcel Mathijs Theodore Marie Dierichs, Johannes Maria Freriks, Frank Jeroen Pieter Schuurmans, Jakob Vijfvinkel, Wilhelmus Josephus Box
  • Patent number: 6774374
    Abstract: A reference frame provided in a vacuum chamber is supported by support pillars extending through and isolated from the vacuum chamber walls to isolate the reference frame from vibrations in the vacuum chamber. The gap between the support pillar and the vacuum chamber wall may be sealed by a low-stiffness seal. The low stiffness seal may be a three part seal allowing relative motion in six-degrees of freedom.
    Type: Grant
    Filed: April 17, 2000
    Date of Patent: August 10, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes C. Driessen, Theodorus H. J. Bisschops, Jakob Vijfvinkel, Marinus J. J. Dona, Mark T. Meuwese, Ronald M. Schneider, Michel A. Mors, Hugo M. Visser
  • Patent number: 6747731
    Abstract: A lithographic projection apparatus comprises a vacuum chamber having a wall enclosing at least one of first and second object tables, the or each object table within the vacuum chamber being connected to positioning means for positioning the object table with respect to a projection system of the apparatus. The positioning means is provided with a pneumatic gravity compensator comprising a piston associated with the object table; a gas-filled pressure chamber, the gas in the pressure chamber acting on the movable member to at least partially counteract the weight of the object table; a gas bearing; and evacuating means for evacuating gas escaping through a gap between the movable member and a bearing surface of a cylindrical housing towards the vacuum chamber. A partially flexible rod connects the piston to the object table.
    Type: Grant
    Filed: June 27, 2003
    Date of Patent: June 8, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Eric W. A. Janssen, Marcel J. M. Renkens, Jakob Vijfvinkel, Ronald M. Schneider, Theo H. J. Bisschops, Rob Tabor
  • Publication number: 20040094722
    Abstract: A bearing for use in a vacuum chamber comprises a gas bearing discharging pressurised gas into a gap between two members to maintain a predetermined separation between those members.
    Type: Application
    Filed: July 7, 2003
    Publication date: May 20, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus H.J. Bisschops, Jakob Vijfvinkel, Hermanus M.J.R. Soemers, Johannes C. Driessen, Michael J.M. Renkens, Adrianus G. Bouwer
  • Publication number: 20040001188
    Abstract: A lithographic projection apparatus comprises a vacuum chamber having a wall enclosing at least one of first and second object tables, the or each object table within the vacuum chamber being connected to positioning means for positioning the object table with respect to a projection system of the apparatus. The positioning means is provided with a pneumatic gravity compensator comprising a piston associated with the object table; a gas-filled pressure chamber, the gas in the pressure chamber acting on the movable member to at least partially counteract the weight of the object table; a gas bearing; and evacuating means for evacuating gas escaping through a gap between the movable member and a bearing surface of a cylindrical housing towards the vacuum chamber. A partially flexible rod connects the piston to the object table.
    Type: Application
    Filed: June 27, 2003
    Publication date: January 1, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Eric W.A. Janssen, Marcel J.M. Renkens, Jakob Vijfvinkel, Ronald M. Schneider, Theo H.J. Bisschops, Rob Tabor
  • Patent number: 6618122
    Abstract: An object table is supported in a vacuum chamber by an elongate beam or beams extending through elongate slots in opposite walls of the vacuum chamber. Displacement of the beam in two orthogonal directions is achieved by displacing the beam laterally and longitudinally. The elongate slots are sealed by sliding plates supported by a gas bearing. The beam is driven longitudinally by linear motors acting against between a balance mass and the beam. The beam is driven laterally by linear motors acting between a balance mass and the sliding plates. The two balance masses may be separate or combined.
    Type: Grant
    Filed: June 17, 2002
    Date of Patent: September 9, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Theodorus H. J. Bisschops, Hermanus M. J. R. Soemers, Jakob Vijfvinkel, Johannes C. Driessen, Michael J. M. Renkens, Adrianus G. Bouwer
  • Patent number: 6603130
    Abstract: A bearing for use in a vacuum chamber comprises a gas bearing discharging pressurised gas into a gap between two members to maintain a predetermined separation between those members. To avoid the gas forming the gas bearing being an unacceptable leak into the vacuum chamber, a vacuum pump is provided between the vacuum chamber and the gas bearing.
    Type: Grant
    Filed: April 17, 2000
    Date of Patent: August 5, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Theodorus H. J. Bisschops, Jakob Vijfvinkel, Hermanus M. J. R. Soemers, Johannes C. Driessen, Michael J. M. Renkens, Adrianus G. Bouwer
  • Patent number: 6597429
    Abstract: A lithographic projection apparatus comprises a vacuum chamber having a wall enclosing at least one of first and second object tables, the or each object table within the vacuum chamber being connected to positioning means for positioning the object table with respect to a projection system of the apparatus. The positioning means is provided with a pneumatic gravity compensator comprising a piston associated with the object table; a gas-filled pressure chamber, the gas in the pressure chamber acting on the movable member to at least partially counteract the weight of the object table; a gas bearing; and evacuating means for evacuating gas escaping through a gap between the movable member and a bearing surface of a cylindrical housing towards the vacuum chamber. A partially flexible rod connects the piston to the object table.
    Type: Grant
    Filed: April 12, 2001
    Date of Patent: July 22, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Eric W. A. Janssen, Marcel J. M. Renkens, Jakob Vijfvinkel, Ronald M. Schneider, Theo H. J. Bisschops, Rob Tabor
  • Patent number: 6597433
    Abstract: A lithographic apparatus for step-and-scan operation has a three stage structure for the wafer stage. During step-and-scan operation, the long-stroke stage is moved steadily along the row or column of dies to be exposed sequentially. An intermediate scanning stage moves in a figure-of-eight motion relative to the long-stroke stage so that the net movement of the fine stage, which is carried by the scanning stage, is a meander path.
    Type: Grant
    Filed: April 17, 2000
    Date of Patent: July 22, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Michael J. M. Renkens, Adrianus G. Bouwer, Johannes C. Driessen, Theodorus H. J. Bisschops, Hermanus M. J. R. Soemers, Jakob Vijfvinkel
  • Publication number: 20030098960
    Abstract: In a lithographic projection apparatus, a slider is provided for motion of the substrate table or mask table. The slider is supported on a gas-bearing and separates a region at atmospheric pressure from a vacuum space region. A differential pressure pump is provided to maintain the pressure difference in the presence of the gas-bearing. A pressure compensation vessel is provided on top of the slider and also contains a vacuum. Over most of the area of the slider, the pressure on its opposed first and second sides is the same and so deformation of the slider is avoided. The sidewalls of the pressure compensation vessel transmit the external gas pressure to the slider such that they are in line with the forces of the gas-bearing.
    Type: Application
    Filed: November 6, 2002
    Publication date: May 29, 2003
    Inventors: Ronald Maarten Schneider, Jakob Vijfvinkel, Theodorus H.J. Bisschops, Hermanus M.J.R. Soemers, Johannes C. Driessen, Michael J.M. Renkens, Adrianus G. Bouwer
  • Publication number: 20020180946
    Abstract: A long-stroke movement is fed-through into a vacuum chamber by providing a sliding seal over an aperture in the vacuum chamber wall. The object to be moved, which may be a mask or wafer table in a lithographic apparatus, within the vacuum chamber is connected to or mounted on the sliding seal and moved by movement of the sliding seal. The sliding seal may be a plate, a bowl or a labyrinth of interleaved plates.
    Type: Application
    Filed: July 17, 2002
    Publication date: December 5, 2002
    Applicant: ASML Netherlands B.V.
    Inventors: Theodorus H.J. Bisschops, Jakob Vijfvinkel, Hermanus M.J.R. Soemers, Johannes C. Driessen, Michael J.M. Renkens, Adrianus G. Bouwer