Patents by Inventor Janos Kirz

Janos Kirz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190302042
    Abstract: Systems and methods for x-ray emission spectroscopy are provided in which at least one x-ray analyzer is curved and receives and diffracts fluorescence x-rays emitted from a sample, and at least one spatially-resolving x-ray detector receives the diffracted x-rays. The at least one x-ray analyzer and the at least one spatially-resolving x-ray detector are positioned on the Rowland circle. In some configurations, the fluorescence x-rays are emitted from the same surface of the sample that is irradiated by the x-rays from an x-ray source and the system has an off-Rowland circle geometry. In some other configurations, an x-ray optical train receives the fluorescence x-rays emitted from a sample impinged by electrons within an electron microscope and focuses at least some of the received fluorescence x-rays to a focal spot.
    Type: Application
    Filed: April 1, 2019
    Publication date: October 3, 2019
    Inventors: Wenbing Yun, Srivatsan Seshadri, Sylvia Jia Yun Lewis, Janos Kirz
  • Patent number: 10416099
    Abstract: A method for performing x-ray absorption spectroscopy and an x-ray absorption spectrometer system to be used with a compact laboratory x-ray source to measure x-ray absorption of the element of interest in an object with both high spatial and high spectral resolution. The spectrometer system comprises a compact high brightness laboratory x-ray source, an optical train to focus the x-rays through an object to be examined, and a spectrometer comprising a single crystal analyzer (and, in some embodiments, also a mosaic crystal) to disperse the transmitted beam onto a spatially resolving x-ray detector. The high brightness/high flux x-ray source may have a take-off angle between 0 and 105 mrad. and be coupled to an optical train that collects and focuses the high flux x-rays to spots less than 500 micrometers, leading to high flux density.
    Type: Grant
    Filed: March 21, 2018
    Date of Patent: September 17, 2019
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Srivatsan Seshadri, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon, Benjamin Donald Stripe
  • Patent number: 10401309
    Abstract: This invention discloses a method and apparatus for x-ray techniques using structured x-ray illumination for examining material properties of an object. In particular, an object with one or more regions of interest (ROIs) having a particular shape, size, and pattern may be illuminated with an x-ray beam whose cross sectional beam profile corresponds to the shape, size and pattern of the ROIs, so that the x-rays of the beam primarily interact only with the ROIs. This allows a greater x-ray flux to be used, enhancing the signal from the ROI itself, while reducing unwanted signals from regions not in the ROI, improving signal-to-noise ratios and/or measurement throughput. This may be used with a number of x-ray measurement techniques, including x-ray fluorescence (XRF), x-ray diffraction (XRD), small angle x-ray scattering (SAXS), x-ray absorption fine-structure spectroscopy (XAFS), x-ray near edge absorption spectroscopy, and x-ray emission spectroscopy.
    Type: Grant
    Filed: June 5, 2016
    Date of Patent: September 3, 2019
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Publication number: 20190254616
    Abstract: An x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The structures may be microstructures with lateral dimensions measured on the order of microns, and in some embodiments, the structures are arranged in a regular array. The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a ? or ?/2 phase-shifting grating, an x-ray detector to convert two-dimensional x-ray intensities into electronic signals, and in some embodiments, also comprises an additional analyzer grating G2 that may be placed in front of the detector to form additional interference fringes. Systems may also include a means to translate and/or rotate the relative positions of the x-ray source and the object under investigation relative to the beam splitting grating and/or the analyzer grating for tomography applications.
    Type: Application
    Filed: May 3, 2019
    Publication date: August 22, 2019
    Inventors: Wenbing Yun, Sylvia Jia yun Lewis, Janos Kirz, Alan Francis Lyon
  • Publication number: 20190250113
    Abstract: An x-ray interrogation system having one or more x-ray beams interrogates an object (i.e., object). A structured source producing an array of x-ray micro-sources can be imaged onto the object. Each of the one or more beams may have a high resolution, such as for example a diameter of about 15 microns or less, at the surface of the object. The illuminating one or more micro-beams can be high resolution in one dimension and/or two dimensions, and can be directed at the object to illuminate the object. The incident beam that illuminates the object has an energy that is greater than the x-ray fluorescence energy.
    Type: Application
    Filed: February 14, 2019
    Publication date: August 15, 2019
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Patent number: 10349908
    Abstract: An x-ray interferometric imaging system includes an x-ray source with a target having a plurality of discrete structures arranged in a periodic pattern. The system further includes a beam-splitting x-ray grating, a stage configured to hold an object to be imaged, and an x-ray detector having a two-dimensional array of x-ray detecting elements. The object is positioned between the beam-splitting x-ray grating and the x-ray detector, the x-ray detector is positioned to detect the x-rays diffracted by the beam-splitting x-ray grating and perturbed by the object to be imaged.
    Type: Grant
    Filed: November 17, 2015
    Date of Patent: July 16, 2019
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon
  • Patent number: 10352880
    Abstract: This disclosure presents systems for x-ray microscopy using an array of micro-beams having a micro- or nano-scale beam intensity profile to provide selective illumination of micro- or nano-scale regions of an object. An array detector is positioned such that each pixel of the detector only detects x-rays corresponding to a single micro- or nano-beam. This allows the signal arising from each x-ray detector pixel to be identified with the specific, limited micro- or nano-scale region illuminated, allowing sampled transmission image of the object at a micro- or nano-scale to be generated while using a detector with pixels having a larger size and scale. Detectors with higher quantum efficiency may therefore be used, since the lateral resolution is provided solely by the dimensions of the micro- or nano-beams. The micro- or nano-scale beams may be generated using an arrayed x-ray source or a set of Talbot interference fringes.
    Type: Grant
    Filed: May 26, 2017
    Date of Patent: July 16, 2019
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Srivatsan Seshadri, Alan Francis Lyon, David Vine
  • Patent number: 10304580
    Abstract: Systems for x-ray microscopy using an array of micro-beams having a micro- or nano-scale beam intensity profile to provide selective illumination of micro- or nano-scale regions of an object. An array detector is positioned such that each pixel of the detector only detects x-rays corresponding to a single micro-or nano-beam. This allows the signal arising from each x-ray detector pixel to be identified with the specific, limited micro- or nano-scale region illuminated, allowing sampled transmission image of the object at a micro- or nano-scale to be generated while using a detector with pixels having a larger size and scale. Detectors with higher quantum efficiency may therefore be used, since the lateral resolution is provided solely by the dimensions of the micro- or nano-beams. The micro- or nano-scale beams may be generated using a arrayed x-ray source and a set of Talbot interference fringes.
    Type: Grant
    Filed: April 16, 2018
    Date of Patent: May 28, 2019
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, David Vine, Sylvia Jia Yun Lewis, Janos Kirz, Srivatsan Seshadri
  • Patent number: 10297359
    Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.
    Type: Grant
    Filed: October 13, 2017
    Date of Patent: May 21, 2019
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, David Charles Reynolds, Alan Francis Lyon
  • Patent number: 10295486
    Abstract: An x-ray spectrometer system comprising an x-ray imaging system with at least one achromatic imaging x-ray optic and an x-ray detection system. The optical train of the imaging system is arranged so that its object focal plane partially overlaps an x-ray emitting volume of an object. An image of a portion of the object is formed with a predetermined image magnification at the x-ray detection system. The x-ray detection system has both high spatial and spectral resolution, and converts the detected x-rays to electronic signals. In some embodiments, the detector system may have a small aperture placed in the image plane, and use a silicon drift detector to collect x-rays passing through the aperture. In other embodiments, the detector system has an energy resolving pixel array x-ray detector. In other embodiments, wavelength dispersive elements may be used in either the optical train or the detector system.
    Type: Grant
    Filed: August 18, 2016
    Date of Patent: May 21, 2019
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Benjamin Donald Stripe
  • Patent number: 10295485
    Abstract: An x-ray transmission spectrometer system to be used with a compact x-ray source to measure x-ray absorption with both high spatial and high spectral resolution. The spectrometer system comprises a compact high brightness x-ray source, an optical system with a low pass spectral filter property to focus the x-rays through an object to be examined, and a spectrometer comprising a crystal analyzer (and, in some embodiments, a mosaic crystal) to disperse the transmitted beam, and in some instances an array detector. The high brightness/high flux x-ray source may have a take-off angle between 0 and 15 degrees, and be coupled to an optical system that collects and focuses the high flux x-rays to micron-scale spots, leading to high flux density. The x-ray optical system may also act as a “low-pass” filter, allowing a predetermined bandwidth of x-rays to be observed at one time while excluding the higher harmonics.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: May 21, 2019
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Srivatsan Seshadri, Janos Kirz, Sylvia Jia Yun Lewis
  • Publication number: 20190145917
    Abstract: An x-ray spectrometer system includes an x-ray source, an x-ray optical system, a mount, and an x-ray spectrometer. The x-ray optical system is configured to receive, focus, and spectrally filter x-rays from the x-ray source to form an x-ray beam having a spectrum that is attenuated in an energy range above a predetermined energy and having a focus at a predetermined focal plane.
    Type: Application
    Filed: December 19, 2018
    Publication date: May 16, 2019
    Inventors: Wenbing Yun, Srivatsan Seshadri, Janos Kirz, Sylvia Jia Yun Lewis
  • Patent number: 10269528
    Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of a take-off angle at or near 0°, allowing the accumulation of x-rays from several microstructures to be aligned and be used to form a beam in the shape of an annular cone.
    Type: Grant
    Filed: May 27, 2016
    Date of Patent: April 23, 2019
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon, David Charles Reynolds
  • Patent number: 10247683
    Abstract: An x-ray interrogation system having one or more x-ray beams interrogates an object (i.e., object). A structured source producing an array of x-ray micro-sources can be imaged onto the object. Each of the one or more beams may have a high resolution, such as for example a diameter of about 15 microns or less, at the surface of the object. The illuminating one or more micro-beams can be high resolution in one dimension and/or two dimensions, and can be directed at the object to illuminate the object. The incident beam that illuminates the object has an energy that is greater than the x-ray fluorescence energy.
    Type: Grant
    Filed: December 3, 2017
    Date of Patent: April 2, 2019
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Publication number: 20190088438
    Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.
    Type: Application
    Filed: October 13, 2017
    Publication date: March 21, 2019
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, David Charles Reynolds, Alan Francis Lyon
  • Publication number: 20190088381
    Abstract: Systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may have a take-off angle from 0 to 105 mrad. and be coupled to an x-ray optical system that collects and focuses the high flux x-rays to spots that can be as small as one micron, leading to high flux density.
    Type: Application
    Filed: February 14, 2017
    Publication date: March 21, 2019
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Publication number: 20190011379
    Abstract: A method for performing x-ray absorption spectroscopy and an x-ray absorption spectrometer system to be used with a compact laboratory x-ray source to measure x-ray absorption of the element of interest in an object with both high spatial and high spectral resolution. The spectrometer system comprises a compact high brightness laboratory x-ray source, an optical train to focus the x-rays through an object to be examined, and a spectrometer comprising a single crystal analyzer (and, in some embodiments, also a mosaic crystal) to disperse the transmitted beam onto a spatially resolving x-ray detector. The high brightness/high flux x-ray source may have a take-off angle between 0 and 105 mrad. and be coupled to an optical train that collects and focuses the high flux x-rays to spots less than 500 micrometers, leading to high flux density.
    Type: Application
    Filed: March 21, 2018
    Publication date: January 10, 2019
    Inventors: Wenbing Yun, Srivatsan Seshadri, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon, Benjamin Donald Stripe
  • Publication number: 20180261350
    Abstract: Systems for x-ray microscopy using an array of micro-beams having a micro- or nano-scale beam intensity profile to provide selective illumination of micro- or nano-scale regions of an object. An array detector is positioned such that each pixel of the detector only detects x-rays corresponding to a single micro-or nano-beam. This allows the signal arising from each x-ray detector pixel to be identified with the specific, limited micro- or nano-scale region illuminated, allowing sampled transmission image of the object at a micro- or nano-scale to be generated while using a detector with pixels having a larger size and scale. Detectors with higher quantum efficiency may therefore be used, since the lateral resolution is provided solely by the dimensions of the micro- or nano-beams. The micro- or nano-scale beams may be generated using a arrayed x-ray source and a set of Talbot interference fringes.
    Type: Application
    Filed: April 16, 2018
    Publication date: September 13, 2018
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, David Vine, Sylvia Jia Yun Lewis, Janos Kirz, Srivatsan Seshadri
  • Publication number: 20180202951
    Abstract: An x-ray interrogation system having one or more x-ray beams interrogates an object (i.e., object). A structured source producing an array of x-ray micro-sources can be imaged onto the object. Each of the one or more beams may have a high resolution, such as for example a diameter of about 15 microns or less, at the surface of the object. The illuminating one or more micro-beams can be high resolution in one dimension and/or two dimensions, and can be directed at the object to illuminate the object. The incident beam that illuminates the object has an energy that is greater than the x-ray fluorescence energy.
    Type: Application
    Filed: December 3, 2017
    Publication date: July 19, 2018
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Publication number: 20180144901
    Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.
    Type: Application
    Filed: October 13, 2017
    Publication date: May 24, 2018
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, David Charles Reynolds, Alan Francis Lyon