Patents by Inventor Janos Kirz

Janos Kirz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9874531
    Abstract: Periodic spatial patterns of x-ray illumination are used to gather information about periodic objects. The structured illumination may be created using the interaction of a coherent or partially coherent x-ray source with a beam splitting grating to create a Talbot interference pattern with periodic structure. The object having periodic structures to be measured is then placed into the structured illumination, and the ensemble of signals from the multiple illumination spots is analyzed to determine various properties of the object and its structures. Applications to x-ray absorption/transmission, small angle x-ray scattering, x-ray fluorescence, x-ray reflectance, and x-ray diffraction are all possible using the method of the invention.
    Type: Grant
    Filed: May 15, 2015
    Date of Patent: January 23, 2018
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Publication number: 20170336334
    Abstract: An x-ray transmission spectrometer system to be used with a compact x-ray source to measure x-ray absorption with both high spatial and high spectral resolution. The spectrometer system comprises a compact high brightness x-ray source, an optical system with a low pass spectral filter property to focus the x-rays through an object to be examined, and a spectrometer comprising a crystal analyzer (and, in some embodiments, a mosaic crystal) to disperse the transmitted beam, and in some instances an array detector. The high brightness/high flux x-ray source may have a take-off angle between 0 and 15 degrees, and be coupled to an optical system that collects and focuses the high flux x-rays to micron-scale spots, leading to high flux density. The x-ray optical system may also act as a “low-pass” filter, allowing a predetermined bandwidth of x-rays to be observed at one time while excluding the higher harmonics.
    Type: Application
    Filed: July 31, 2017
    Publication date: November 23, 2017
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Srivatsan Seshadri, Janos Kirz, Sylvia Jia Yun Lewis
  • Patent number: 9823203
    Abstract: Systems for x-ray diffraction/scattering measurements having greater x-ray flux and x-ray flux density are disclosed. These are useful for applications such as material structural analysis and crystallography. The higher flux is achieved by using designs for x-ray targets comprising a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density, and used to illuminate materials for the analysis based on their scattering/diffractive effects.
    Type: Grant
    Filed: March 3, 2016
    Date of Patent: November 21, 2017
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Publication number: 20170261442
    Abstract: This disclosure presents systems for x-ray microscopy using an array of micro-beams having a micro- or nano-scale beam intensity profile to provide selective illumination of micro- or nano-scale regions of an object. An array detector is positioned such that each pixel of the detector only detects x-rays corresponding to a single micro- or nano-beam. This allows the signal arising from each x-ray detector pixel to be identified with the specific, limited micro- or nano-scale region illuminated, allowing sampled transmission image of the object at a micro- or nano-scale to be generated while using a detector with pixels having a larger size and scale. Detectors with higher quantum efficiency may therefore be used, since the lateral resolution is provided solely by the dimensions of the micro- or nano-beams. The micro- or nano-scale beams may be generated using an arrayed x-ray source or a set of Talbot interference fringes.
    Type: Application
    Filed: May 26, 2017
    Publication date: September 14, 2017
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Srivatsan Seshadri, Alan Francis Lyon, David Charles Reynolds
  • Patent number: 9719947
    Abstract: An x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a ? phase-shifting grating, and an x-ray detector to convert two-dimensional x-ray intensities into electronic signals. The system may also comprise a second analyzer grating G2 that may be placed in front of the detector to form additional interference fringes, a means to translate the second grating G2 relative to the detector. The system may additionally comprise an antiscattering grid to reduce signals from scattered x-rays. Various configurations of dark-field and bright-field detectors are also disclosed.
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: August 1, 2017
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Publication number: 20170162288
    Abstract: Systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may have a take-off angle from 0 to 105 mrad. and be coupled to an x-ray optical system that collects and focuses the high flux x-rays to spots that can be as small as one micron, leading to high flux density.
    Type: Application
    Filed: February 14, 2017
    Publication date: June 8, 2017
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Patent number: 9594036
    Abstract: This disclosure presents systems for total reflection x-ray fluorescence measurements that have x-ray flux and x-ray flux density several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection and/or for total-reflection fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray brightness and therefore greater x-ray flux. The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density.
    Type: Grant
    Filed: March 1, 2015
    Date of Patent: March 14, 2017
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Publication number: 20170052128
    Abstract: An x-ray spectrometer system comprising an x-ray imaging system with at least one achromatic imaging x-ray optic and an x-ray detection system. The optical train of the imaging system is arranged so that its object focal plane partially overlaps an x-ray emitting volume of an object. An image of a portion of the object is formed with a predetermined image magnification at the x-ray detection system. The x-ray detection system has both high spatial and spectral resolution, and converts the detected x-rays to electronic signals. In some embodiments, the detector system may have a small aperture placed in the image plane, and use a silicon drift detector to collect x-rays passing through the aperture. In other embodiments, the detector system has an energy resolving pixel array x-ray detector. In other embodiments, wavelength dispersive elements may be used in either the optical train or the detector system.
    Type: Application
    Filed: August 18, 2016
    Publication date: February 23, 2017
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Benjamin Donald Stripe
  • Publication number: 20170047191
    Abstract: We present a micro-x-ray fluorescence (XRF) system having a high-brightness x-ray illumination system with high x-ray flux and high flux density. The higher brightness is achieved in part by using x-ray target designs that comprise a number of microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density at the fluorescent sample. Such systems may be useful for a variety of applications, including mineralogy, trace element detection, structure and composition analysis, metrology, as well as forensic science and diagnostic systems.
    Type: Application
    Filed: September 19, 2016
    Publication date: February 16, 2017
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Patent number: 9570265
    Abstract: We present a micro-x-ray fluorescence (XRF) system having a high-brightness x-ray illumination system with high x-ray flux and high flux density. The higher brightness is achieved in part by using x-ray target designs that comprise a number of microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density at the fluorescent sample. Such systems may be useful for a variety of applications, including mineralogy, trace element detection, structure and composition analysis, metrology, as well as forensic science and diagnostic systems.
    Type: Grant
    Filed: September 19, 2016
    Date of Patent: February 14, 2017
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Patent number: 9543109
    Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved by aligning discrete x-ray sub-sources, or through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and in turn allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of an on-axis collection angle, allowing the accumulation of x-rays from several microstructures to be aligned to appear to have a single origin, also known as “zero-angle” x-ray radiation.
    Type: Grant
    Filed: April 1, 2016
    Date of Patent: January 10, 2017
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon
  • Publication number: 20160351370
    Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of a take-off angle at or near 0°, allowing the accumulation of x-rays from several microstructures to be aligned and be used to form a beam in the shape of an annular cone.
    Type: Application
    Filed: May 27, 2016
    Publication date: December 1, 2016
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon, David Charles Reynolds
  • Publication number: 20160320320
    Abstract: This invention discloses a method and apparatus for x-ray techniques using structured x-ray illumination for examining material properties of an object. In particular, an object with one or more regions of interest (ROIs) having a particular shape, size, and pattern may be illuminated with an x-ray beam whose cross sectional beam profile corresponds to the shape, size and pattern of the ROIs, so that the x-rays of the beam primarily interact only with the ROIs. This allows a greater x-ray flux to be used, enhancing the signal from the ROI itself, while reducing unwanted signals from regions not in the ROI, improving signal-to-noise ratios and/or measurement throughput This may be used with a number of x-ray measurement techniques, including x-ray fluorescence (XRF), x-ray diffraction (XRD), small angle x-ray scattering (SAXS), x-ray absorption fine-structure spectroscopy (XAFS), x-ray near edge absorption spectroscopy, and x-ray emission spectroscopy.
    Type: Application
    Filed: June 5, 2016
    Publication date: November 3, 2016
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Patent number: 9449781
    Abstract: This disclosure presents systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density.
    Type: Grant
    Filed: December 8, 2014
    Date of Patent: September 20, 2016
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Patent number: 9448190
    Abstract: This disclosure presents systems for x-ray absorption fine structure (XAFS) measurements that have x-ray flux and flux density several orders of magnitude greater than existing compact systems. These are useful for laboratory or field applications of x-ray absorption near-edge spectroscopy (XANES) or extended x-ray fine absorption structure (EXFAS) spectroscopy. The higher brightness is achieved by using designs for x-ray targets that comprise a number of aligned microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment with higher electron density and/or higher energy electrons, leading to greater x-ray brightness and high flux. The high brightness x-ray source is then coupled to an x-ray reflecting optical system to collimate the x-rays, and a monochromator, which selects the exposure energy.
    Type: Grant
    Filed: March 3, 2015
    Date of Patent: September 20, 2016
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Publication number: 20160268094
    Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved by aligning discrete x-ray sub-sources, or through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and in turn allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of an on-axis collection angle, allowing the accumulation of x-rays from several microstructures to be aligned to appear to have a single origin, also known as “zero-angle” x-ray radiation.
    Type: Application
    Filed: April 1, 2016
    Publication date: September 15, 2016
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon
  • Patent number: 9390881
    Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved by aligning discrete x-ray sub-sources, or through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and in turn allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. Some embodiments of the invention comprise x-ray optical elements placed between sub-sources of x-rays. These x-ray optical elements may form images of one or more x-ray sub-sources in alignment with other x-ray sub-sources, and may enhance the linear accumulation that can be achieved.
    Type: Grant
    Filed: September 19, 2014
    Date of Patent: July 12, 2016
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon
  • Publication number: 20160178540
    Abstract: This disclosure presents systems for x-ray diffraction/scattering measurements that have x-ray flux and x-ray flux density several orders of magnitude greater than existing x-ray technologies. These may therefore be useful for applications such as structural analysis and crystallography. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray brightness and therefore greater x-ray flux. The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density.
    Type: Application
    Filed: March 3, 2016
    Publication date: June 23, 2016
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
  • Publication number: 20160066870
    Abstract: An x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The structures may be microstructures with lateral dimensions measured on the order of microns, and in some embodiments, the structures are arranged in a regular array. The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a ? or ?/2 phase-shifting grating, an x-ray detector to convert two-dimensional x-ray intensities into electronic signals, and in some embodiments, also comprises an additional analyzer grating G2 that may be placed in front of the detector to form additional interference fringes. Systems may also include a means to translate and/or rotate the relative positions of the x-ray source and the object under investigation relative to the beam splitting grating and/or the analyzer grating for tomography applications.
    Type: Application
    Filed: November 17, 2015
    Publication date: March 10, 2016
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon
  • Publication number: 20160064175
    Abstract: Disclosed are targets for generating x-rays using electron beams and their method of fabrication. They comprise a number of microstructures fabricated from an x-ray target material arranged in close thermal contact with a substrate such that the heat is more efficiently drawn out of the x-ray target material. This allows irradiation of the x-ray generating substance with higher electron density or higher energy electrons, leading to greater x-ray brightness, without inducing damage or melting. The microstructures may comprise conventional x-ray target materials (such as tungsten) that are patterned at micron-scale dimensions on a thermally conducting substrate, such as diamond. The microstructures may have any number of geometric shapes to best generate x-rays of high brightness and efficiently disperse heat. In some embodiments, the target comprising microstructures may be incorporated into a rotating anode geometry, to enhance x-ray generation in such systems.
    Type: Application
    Filed: August 29, 2014
    Publication date: March 3, 2016
    Applicant: SIGRAY, INC.
    Inventors: Wenbing YUN, Janos KIRZ, Sylvia Jia Yun LEWIS