Abstract: Methods for the purification of steam, systems for purifying steam, methods for measuring and/or controlling steam flow rates, and uses for purified steam are provide. Also provided are substantially gas-impermeable membranes, such as perfluorinated ionomers (e.g., perfluoroethylene-sulfonic-acid/tetrafluoroethylene membranes), having a high ratio of water vapor permeation relative to gas permeation through the membrane. Also provided are methods of operation of such membranes at relatively high operating temperatures for the purification of steam and for operation of such membranes at relatively low temperature and sub-atmospheric pressures for the purification of steam. In a preferred embodiment, the system 400 for purifying steam comprises heater 404 for creating a source of a steam feed, and a purification device 416 for housing a substantially gas-impermeable membrane 424. In the operation of system 400, water, such as deionized water, is added to vessel 402 to provide a source of the steam feed.

Abstract: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.

Abstract: An apparatus, a system and a method for electrochemical generation of hydrogen are disclosed. The apparatus may include a cathode, a polymer electrolyte membrane surrounding the cathode and a housing surrounding the polymer electrolyte membrane. The housing may include an anode electrically connected to the cathode. The system for electrochemical generation of hydrogen may include a water purifier in fluid communication with a hydrogen generating unit, an electrolyte source in fluid communication with the hydrogen generation unit and a power source electrically connected to the hydrogen generating unit. The method may include passing water and electrolyte into the hydrogen generation unit and applying a voltage between the anode and the cathode to generate hydrogen gas.

Abstract: A lithographic projection apparatus (1) includes a support configured to support a patterning device (MA), the patterning device configured to pattern the projection beam according to a desired pattern. The apparatus has a substrate (W) table configure to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge gas supply system (100) configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system (100) includes a purge gas mixture generator (120) configured to generate a purge gas mixture which includes at least one purging gas and moisture. The purge gas mixture generator has a moisturizer (150) configured to add the moisture to the purge gas and a purge gas mixture outlet (130) connected to the purge gas mixture generator (120) configured to supply the purge gas mixture near the surface.

Abstract: A method and apparatus for the decontamination of fluid ammonia are described. Liquid or gaseous ammonia is purified of contaminants by passage through an adsorbent bed, the contaminants accumulating in the bed. A portion of the purified ammonia discharged from the bed is decomposed to hydrogen and nitrogen. The hydrogen is used to regenerate an adsorbent bed which has accumulated sufficient contaminants to reduce its ability to further decontaminate incoming ammonia satisfactorily. Preferably there are a plurality of interconnected adsorbent beds, with some being operated for ammonia decontamination while others are being regenerated, with their operations being reversed as needed to maintain a continual production of decontaminated ammonia from the plurality of beds. Computers or other controllers can be used to control such bed operations and interchanges. Internal production of hydrogen makes the system self-contained and no addition of hydrogen is needed.

Abstract: A lithographic projection apparatus (1) includes a support configured to support a patterning device (MA), the patterning device configured to pattern the projection beam according to a desired pattern. The apparatus has a substrate (W) table configure to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge gas supply system (100) configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system (100) includes a purge gas mixture generator (120) configured to generate a purge gas mixture which includes at least one purging gas and moisture. The purge gas mixture generator has a moisturizer (150) configured to add the moisture to the purge gas and a purge gas mixture outlet (130) connected to the purge gas mixture generator (120) configured to supply the purge gas mixture near the surface.

Abstract: A fluid connector is provided that allows for the simultaneous sealing of multiple tubes within a single outer shell when an external radial compressive force is applied.

Abstract: A vaporizing device is provided for control, delivery, and purification of low vapor pressure gases in conjunction with carrier gas in micro-electronics and other critical applications.

Abstract: A method of detecting a molecular species in an electronics processing environment is disclosed. The method exposes a capture substrate to the processing environment. The capture substrate has a surface area different from the surface area of an electronic substrate undergoing electronics processing. The molecular species is transferred from the environment to the capture substrate. A characteristic of the molecular species is identified, thereby detecting the species. Other methods utilize a capture substrate to remove the molecular species from an electronic processing environment, or use the capture substrate to determine the presence of a molecular species in a transfer container operating between two process environments or two intermediate process steps. Systems for carrying out the methods are also disclosed.

Abstract: Methods for the purification of steam, systems for purifying steam, methods for measuring and/or controlling steam flow rates, and uses for purified steam are provide. Also provided are substantially gas-impermeable membranes, such as perfluorinated ionomers (e.g., perfluoroethylene-sulfonic-acid/tetrafluoroethylene membranes), having a high ratio of water vapor permeation relative to gas permeation through the membrane. Also provided are methods of operation of such membranes at relatively high operating temperatures for the purification of steam and for operation of such membranes at relatively low temperature and sub-atmospheric pressures for the purification of steam. In a preferred embodiment, the system 400 for purifying steam comprises heater 404 for creating a source of a steam feed, and a purification device 416 for housing a substantially gas-impermeable membrane 424. In the operation of system 400, water, such as deionized water, is added to vessel 402 to provide a source of the steam feed.

Abstract: A method for hydride gas purification uses materials having at least one lanthanide metal or lanthanide metal oxide. The method reduces contaminants to less than 100 parts per billion (ppb), preferably 10 ppb, more preferably 1 ppb. The material can also include transition metals and transition metal oxides, rare earth elements and other metal oxides. The invention also includes materials for use in the method of the invention.

Abstract: A vaporizing device is provided for control, delivery, and purification of low vapor pressure gases in conjunction with carrier gas in micro-electronics and other critical applications.

Abstract: A fluid connector is provided that allows for the simultaneous sealing of multiple tubes within a single outer shell when an external radial compressive force is applied.

Abstract: A lithographic projection apparatus includes a support configured to support a patterning device, the patterning device configure to pattern the projection beam according to a desired patter. The apparatus has a substrate table configure to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge gas supply system configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system includes a purge gas mixture generator configured to generate a purge gas mixture which includes at least one purging gas and a moisture. The purge gas mixture generator has a moisturizer configured to add the moisture to the purge gas and a purge gas mixture outlet connected to the purge gas mixture generator configured to supply the purge gas mixture near the surface.

Abstract: The invention is a method for the decontamination of CO2 to a sufficient level of purity to allow it to be used in the semiconductor industry. The invention comprises the exposure of fluid CO2 to a combination metallic states of at least one metal under the appropriate conditions for removal of contaminants. The adsorbents are then decontaminated/activated to return the adsorbent to a mixed oxidation state and allow further rounds of decontamination. The adsorbents are selected to be complimentary to each other, preferentially adsorbing different contaminants. Additionally, the adsorbents are selected to undergo reduction differently such that upon regeneration only a portion of the metals are reduced and the adsorbent is returned essentially to its original state.

Abstract: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.

Abstract: An interactive method and apparatus are disclosed through which a fluid purification system operator inputs the system's parameters and the method then identifies one or more fluid purification equipment packages which will be optimized at the component level to the operator's specific requirements. The invention includes a relational database containing data on fluid purification equipment, the components thereof and ancillary equipment, and associated operational software to which the operator gains access through a computer and which then presents to the operator a series of questions relevant to gas purification equipment and system requirements. The questions are such that the responses elicited from the operator for each question determine what the successive questions will be and what optimal components will be identified. The software and databases may be in memory on the computer, embodied on CDs or DVDs run by the computer, or accessed through the Internet.

Abstract: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support for supporting a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a purge gas supply system. The purge gas supply system includes a purge gas mixture generator that includes a moisturizer that is arranged for adding moisture to a purge gas to generate a purge gas mixture, and a purge gas mixture outlet connected to the purge gas mixture generator for supplying the purge gas mixture to at least part of the lithographic projection apparatus.

Abstract: A method and composition for the removal of contaminants in a gas stream used in the contamination sensitive processes of photolithography and metrology are described. The synergistic effect of a combination of an electropositive metal component, a high silica zeolite, and a late transition metal compound effects removal or reduction of the contaminates in the gas which interfere with light transmittance to the ppb or ppt levels necessary for the gas to be suitable for these uses. The removal of neutral polar molecules, neutral polar aprotic molecules, protic and aprotic alkaline molecules, acidic polar species, and neutral non-polar aprotic molecules is accomplished with the claimed composition. Depending on the type of contaminant, the composition components are each varied from 10 to 80 parts by volume, with the total composition limited to 100 parts by volume.