Patents by Inventor Jennifer Sun

Jennifer Sun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150129574
    Abstract: Embodiments involve smart device fabrication for semiconductor processing tools via precision patterning. In one embodiment, a method of manufacturing a semiconductor processing tool component includes providing a substrate of the semiconductor processing tool component, patterning the substrate to form a sensor directly on the substrate, and depositing a top layer over the sensor. The sensor may include, for example, a temperature or strain sensor. The method can also include patterning the substrate to form one or more of: heaters, thermistors, and electrodes on the substrate. In one embodiment, the method involves patterning a surface of the component oriented towards a plasma region inside of the semiconductor processing tool.
    Type: Application
    Filed: November 11, 2013
    Publication date: May 14, 2015
    Inventors: Jennifer SUN, Yikai CHEN, Biraja KANUNGO, Vahid FIROUZDOR
  • Publication number: 20150061237
    Abstract: Embodiments of the present disclosure generally provide chamber components with enhanced thermal properties and methods of enhancing thermal properties of chamber components including bonding materials. One embodiment of the present disclosure provides a method for fabricating a composite structure. The method includes applying a bonding material to a first component, and converting the bonding material applied to the first component to an enhanced bonding layer by heating the bonding material to outgas volatile species from the bonding material. The outgassed volatile species accumulates to at least 0.05% in mass of the bonding material. The method further includes contacting a second component and the enhanced bonding layer to join the first and second components.
    Type: Application
    Filed: November 6, 2014
    Publication date: March 5, 2015
    Inventors: Jennifer SUN, Sumanth BANDA, Ren-Guan DUAN
  • Patent number: 8916021
    Abstract: Embodiments of the present invention generally provide chamber components with enhanced thermal properties and methods of enhancing thermal properties of chamber components including bonding materials. One embodiment of the present invention provides a method for fabricating a composite structure. The method includes applying a bonding material to a first component, and converting the bonding material applied to the first component to an enhanced bonding layer by heating the bonding material to outgas volatile species from the bonding material. The outgassed volatile species accumulates to at least 0.05% in mass of the bonding material. The method further includes contacting a second component and the enhanced bonding layer to join the first and second components.
    Type: Grant
    Filed: October 19, 2011
    Date of Patent: December 23, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Sun, Sumanth Banda, Ren-Guan Duan
  • Publication number: 20140344112
    Abstract: A personalized feed system is described herein that provides feeds that are tailored to the preferences of each user of a real estate website or application. A user signs up to receive a stored profile with the website, and the profile includes information such as what geographical regions the buyer is interested in, what types of homes the buyer is looking for, and so on. The personalized feed system uses this information to provide a feed specific to the buyer that notifies the buyer of listings that are of particular relevance to that buyer. The personalized feed system summarizes other real estate events that are relevant to the user in a single time-oriented feed. Buyers receive information about new and/or modified listings, sales, outstanding offers, status of a transaction, and the like, while sellers receive information about sales, new and/or modified listings, open offers, and so on.
    Type: Application
    Filed: October 4, 2013
    Publication date: November 20, 2014
    Inventors: MICHAEL SMEDBERG, JENNIFER SUN, ROBERT GAY, JASON WAIN
  • Publication number: 20120193456
    Abstract: Embodiments of the present invention provide a gas distribution plate assembly having protective elements for plasma processing. The gas distribution plate assembly includes a base plate having a front side and a backside, and a plurality of protective elements in direct contact with the base plate. The protective elements cover the front side of the base plate to protect the base plate from a plasma processing environment during use.
    Type: Application
    Filed: January 31, 2012
    Publication date: August 2, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Dmitry Lubomirsky, Kartik Ramaswamy, Kallol Bera, Jennifer Sun
  • Publication number: 20120104703
    Abstract: Embodiments of the present invention generally provide chamber components with enhanced thermal properties and methods of enhancing thermal properties of chamber components including bonding materials. One embodiment of the present invention provides a method for fabricating a composite structure. The method includes applying a bonding material to a first component, and converting the bonding material applied to the first component to an enhanced bonding layer by heating the bonding material to outgas volatile species from the bonding material. The outgassed volatile species accumulates to at least 0.05% in mass of the bonding material. The method further includes contacting a second component and the enhanced bonding layer to join the first and second components.
    Type: Application
    Filed: October 19, 2011
    Publication date: May 3, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Jennifer Sun, Sumanth Banda, Ren-Guan Duan
  • Publication number: 20110198034
    Abstract: Described herein are exemplary methods and apparatuses for fabricating a gas distribution showerhead assembly in accordance with one embodiment. In one embodiment, a method includes providing a gas distribution plate having a first set of through-holes for delivering processing gases into a semiconductor processing chamber. The first set of through-holes is located on a backside of the plate (e.g., Aluminum substrate). The method includes spraying (e.g., plasma spraying) a coating material (e.g., Ytrria based material) onto a cleaned surface of the gas distribution plate. The method includes removing (e.g., surface grinding) a portion of the coating material from the surface to reduce a thickness of the coating material. The method includes forming (e.g., UV laser drilling, machining) a second set of through-holes in the coating material such that the through-holes are aligned with the first-set of through-holes.
    Type: Application
    Filed: January 21, 2011
    Publication date: August 18, 2011
    Inventors: Jennifer Sun, Senh Thach, Ren-Guan Duan, Thomas Graves
  • Patent number: 7942965
    Abstract: A method of fabricating silicon parts are provided herein. The method includes growing a silicon sample, machining the sample to form a part, and annealing the part by exposing the part sequentially to one or more gases. Process conditions during silicon growth and post-machining anneal are designed to provide silicon parts that are particularly suited for use in corrosive environments.
    Type: Grant
    Filed: March 19, 2007
    Date of Patent: May 17, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Elmira Ryabova, Jie Yuan, Jennifer Sun
  • Patent number: 7919722
    Abstract: A method of fabricating yttria parts is provided herein. In one embodiment, the method includes sintering a yttria sample, machining the sintered sample to form a part, and annealing the part by heating the part at a predetermined heating rate, maintaining the part at a constant annealing temperature, and cooling the part at a predetermined cooling rate. At least one of the sintering and annealing atmospheres is an oxygen-containing atmosphere.
    Type: Grant
    Filed: June 21, 2007
    Date of Patent: April 5, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Elmira Ryabova, Jennifer Sun, Jie Yuan
  • Publication number: 20090302002
    Abstract: A method and an apparatus for removing polymer from a substrate are provided. In one embodiment, an apparatus utilized to remove polymer from a substrate includes a processing chamber having a chamber wall and a chamber lid defining a process volume, a substrate support assembly disposed in the processing chamber, and a remote plasma source coupled to the processing chamber through an outlet port formed within the chamber wall, the outlet port having an opening pointing toward an periphery region of a substrate disposed on the substrate support assembly, wherein the remote plasma source is fabricated from a material resistant to hydrogen species.
    Type: Application
    Filed: February 27, 2009
    Publication date: December 10, 2009
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Kenneth Collins, Martin Salinas, Walter Merry, Jie Yuan, Andrew Nguyen, Kartik Ramaswamy, Jennifer Sun, Ren-Guan Duan, Xiaoming He, Nancy Fung
  • Publication number: 20080233022
    Abstract: A method of fabricating silicon parts are provided herein. The method includes growing a silicon sample, machining the sample to form a part, and annealing the part by exposing the part sequentially to one or more gases. Process conditions during silicon growth and post-machining anneal are designed to provide silicon parts that are particularly suited for use in corrosive environments.
    Type: Application
    Filed: March 19, 2007
    Publication date: September 25, 2008
    Inventors: Elmira Ryabova, Jie Yuan, Jennifer Sun
  • Publication number: 20080099148
    Abstract: A method of fabricating yttria parts is provided herein. In one embodiment, the method includes sintering a yttria sample, machining the sintered sample to form a part, and annealing the part by heating the part at a predetermined heating rate, maintaining the part at a constant annealing temperature, and cooling the part at a predetermined cooling rate. At least one of the sintering and annealing atmospheres is an oxygen-containing atmosphere.
    Type: Application
    Filed: June 21, 2007
    Publication date: May 1, 2008
    Inventors: Elmira Ryabova, Jennifer Sun, Jie Yuan
  • Publication number: 20080017516
    Abstract: A method of forming a component capable of being exposed to a plasma in a process chamber comprises forming a structure comprising a surface and electroplating yttrium, and optionally aluminum or zirconium, onto the surface. Thereafter, the electroplated layer can be annealed to oxide the yttrium and other electroplated species.
    Type: Application
    Filed: June 21, 2007
    Publication date: January 24, 2008
    Inventors: Nianci Han, Li Xu, Hong Shih, Yang Zhang, Danny Lu, Jennifer Sun
  • Publication number: 20070151581
    Abstract: Disclosed herein is a gas distribution plate for use in a gas distribution assembly for a processing chamber, where the gas distribution plate is fabricated from a solid yttrium oxide-comprising substrate, which may also include aluminum oxide. The gas distribution plate includes a plurality of through-holes, which are typically crescent-shaped. Through-holes which have been formed in the solid yttrium oxide-comprising substrate by ultrasonic drilling perform particularly well. The solid yttrium oxide-comprising substrate typically comprises at least 99.9% yttrium oxide, and has a density of at least 4.92 g/cm3, a water absorbency of about 0.02% or less, and an average grain size within the range of about 10 ?m to about 25 ?m. Also disclosed herein are methods for fabricating and cleaning the yttrium oxide-comprising gas distribution plate.
    Type: Application
    Filed: November 3, 2006
    Publication date: July 5, 2007
    Inventors: Xikun Wang, Li Xu, Jennifer Sun
  • Publication number: 20070134416
    Abstract: Disclosed herein is a cleaning method useful in removing contaminants from a surface of a coating which comprises an oxide or fluoride of a Group III B metal. Typically the coating overlies an aluminum substrate which is present as part of a semiconductor processing apparatus. The coating typically comprises an oxide or a fluoride of Y, Sc, La, Ce, Eu, Dy, or the like, or yttrium-aluminum-garnet (YAG). The coating may further comprise about 20 volume % or less of Al2O3.
    Type: Application
    Filed: November 10, 2006
    Publication date: June 14, 2007
    Inventors: Xikun Wang, Li Xu, Jennifer Sun
  • Publication number: 20070047170
    Abstract: An electrostatic chuck has an electrode embedded in a dielectric which is mounted on a pedestal. The dielectric has a contact surface with an average surface roughness of less than about 0.5 ?m, a surface peak waviness of less than about 0.12 ?m, and a surface peak waviness material ratio of greater than about 20%. The surface texture can be formed by lapping the dielectric surface with a slurry of abrasive particles.
    Type: Application
    Filed: August 29, 2005
    Publication date: March 1, 2007
    Inventors: Jennifer Sun, James Dempster, Semyon Kats, Allen Fox
  • Publication number: 20060253784
    Abstract: A system and method of maintaining community safety standards within an Internet community. A balance is achieved between open communication and costly supervision of an immersive online community by use of automated algorithms, human supervision and peer monitoring. An automated filtering process is used in conjunction with an evaluation and penalty process. The filter is enhanced over time. A peer-to-peer control and peer-to-administrator reporting scheme complete the system and methods to synergistically to maintain safety and set standards within the community.
    Type: Application
    Filed: April 11, 2006
    Publication date: November 9, 2006
    Inventors: James Bower, Mark Dinan, Ann Pickard, Jennifer Sun, Munir Bhatti, Joseph Cook
  • Patent number: 6949203
    Abstract: An integrated in situ etch process performed in a multichamber substrate processing system having first and second etching chambers. In one embodiment the first chamber includes an interior surface that has been roughened to at least 100 Ra and the second chamber includes an interior surface that has a roughness of less than about 32 Ra. The process includes transferring a substrate having formed thereon in a downward direction a patterned photoresist mask, a dielectric layer, a barrier layer and a feature in the substrate to be contacted into the first chamber where the dielectric layer is etched in a process that encourages polymer formation over the roughened interior surface of the chamber. The substrate is then transferred from the first chamber to the second chamber under vacuum conditions and, in the second chamber, is exposed to a reactive plasma such as oxygen to strip away the photoresist mask deposited over the substrate.
    Type: Grant
    Filed: March 3, 2003
    Date of Patent: September 27, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Chang-Lin Hsieh, Diana Xiaobing Ma, Brian Sy Yuan Shieh, Gerald Zheyao Yin, Jennifer Sun, Senh Thach, Lee Luo, Claes H. Bjorkman
  • Publication number: 20050173569
    Abstract: We have developed a gas distribution showerhead assembly, for use in a semiconductor processing chamber, which can be easily cleaned, with minimal chamber downtime. The gas distribution showerhead assembly includes an electrode having openings therethrough, and a gas distribution plate which includes a plurality of through-holes for delivering processing gases into the semiconductor processing chamber. The gas distribution plate is bonded to a first, lower major surface of the electrode. A removable insert which fits into an opening in the electrode through which gas flows. Spacing between surfaces of the removable insert and surfaces of the electrode is adequate to permit gas flow, but inadequate for plasma ignition within the opening. The removable insert can be easily removed during cleaning of the gas distribution showerhead, permitting the holes in the gas distribution plate to be easily accessed from both sides of the gas distribution plate.
    Type: Application
    Filed: February 5, 2004
    Publication date: August 11, 2005
    Inventors: Hamid Noorbakhsh, James Carducci, Jennifer Sun, Larry Elizaga
  • Publication number: 20050056218
    Abstract: Disclosed herein is a gas distribution plate for use in a gas distribution assembly for a processing chamber, where the gas distribution plate is fabricated from a solid yttrium oxide-comprising substrate, which may also include aluminum oxide. The gas distribution plate includes a plurality of through-holes, which are typically crescent-shaped. Through-holes which have been formed in the solid yttrium oxide-comprising substrate by ultrasonic drilling perform particularly well. The solid yttrium oxide-comprising substrate-typically comprises at least 99.9% yttrium oxide, and has a density of at least 4.92 g/cm3, a water absorbency of about 0.02% or less, and an average grain size within the range of about 10 ?m to about 25 ?m. Also disclosed herein are methods for fabricating and cleaning the yttrium oxide-comprising gas distribution plate.
    Type: Application
    Filed: August 13, 2004
    Publication date: March 17, 2005
    Inventors: Jennifer Sun, Senh Thach, James Dempster, Li Xu, Thanh Pham