Abstract: The present disclosure relates to an organic electroluminescent compound and an organic electroluminescent device comprising the same. By comprising the organic electroluminescent compound of the present disclosure, an organic electroluminescent device having improved driving voltage, luminous efficiency, and/or lifespan characteristics can be provided.

Abstract: A vacuum cleaner that includes a first cleaner module and a second cleaner module that is removably coupled to the first cleaner module. The first cleaner module includes a first body and a first dust collection unit, and the second cleaner module includes a second body and a second dust collection unit. Thus, when done in an upright mode, cleaning can be done with a sufficiently great suction force. When done in a handy mode after the second cleaner module is separated, cleaning can be easily done using the second cleaner module.

Abstract: The present disclosure relates to a cleaner improving the cleaning efficiency. The cleaner includes a main body, a suction device configured to suck foreign substances on a surface to be cleaned, and an extension member positioned in the rear of the suction device to connect the main body and the suction device, wherein the suction device includes a suction head including a suction port, a connection member connecting the suction head and the extension member, and a weight accommodated in the suction device and disposed between the suction port and the extension member such that the suction port is prevented from being lifted from the surface to be cleaned when the suction device moves along the surface to be cleaned.

Abstract: The present disclosure relates to a cleaner improving the cleaning efficiency. The cleaner includes a main body, a suction device configured to suck foreign substances on a surface to be cleaned, and an extension member positioned in the rear of the suction device to connect the main body and the suction device, wherein the suction device includes a suction head including a suction port, a connection member connecting the suction head and the extension member, and a weight accommodated in the suction device and disposed between the suction port and the extension member such that the suction port is prevented from being lifted from the surface to be cleaned when the suction device moves along the surface to be cleaned.

Abstract: Disclosed herein is a cleaner with improved cleaning efficiency. A cleaner includes a main body having a dust collecting unit and a suction head including a head cover, a base plate having a suction port to suck in foreign substances on a surface to be cleaned and coupled to the head cover, and a brush rotatably provided between the head cover and the base plate, wherein the base plate includes a first inclined portion slantly extending from a front end of the suction port with respect to the surface to be cleaned, and a second inclined portion slantly extending from a rear end of the suction port with respect to the surface to be cleaned, and integrally formed with the first inclined portion.

Abstract: Provided are a plasma generating apparatus using mutual inductive coupling and a substrate treating apparatus including the same. According to an embodiment of the present invention, a plasma generating apparatus includes: an RF power supply providing an RF signal; a plurality of electromagnetic field applying units inducing an electromagnetic field by receiving the RF signal; and a reactance element connected to a ground terminal of the electromagnetic field applying unit, wherein each of the electromagnetic field applying units may include a plurality of mutually-inductively coupled coils.

Abstract: A vacuum cleaner that includes a first cleaner module and a second cleaner module that is removably coupled to the first cleaner module. The first cleaner module includes a first body and a first dust collection unit, and the second cleaner module includes a second body and a second dust collection unit. Thus, when done in an upright mode, cleaning can be done with a sufficiently great suction force. When done in a handy mode after the second cleaner module is separated, cleaning can be easily done using the second cleaner module.

Abstract: A vacuum cleaner that includes a first cleaner module and a second cleaner module that is removably coupled to the first cleaner module. The first cleaner module includes a first body and a first dust collection unit, and the second cleaner module includes a second body and a second dust collection unit. Thus, when done in an upright mode, cleaning can be done with a sufficiently great suction force. When done in a handy mode after the second cleaner module is separated, cleaning can be easily done using the second cleaner module.

Abstract: Disclosed herein is a cleaner with improved cleaning efficiency. A cleaner includes a main body having a dust collecting unit and a suction head including a head cover, a base plate having a suction port to suck in foreign substances on a surface to be cleaned and coupled to the head cover, and a brush rotatably provided between the head cover and the base plate, wherein the base plate includes a first inclined portion slantly extending from a front end of the suction port with respect to the surface to be cleaned, and a second inclined portion slantly extending from a rear end of the suction port with respect to the surface to be cleaned, and integrally formed with the first inclined portion.

Abstract: An apparatus for treating a substrate includes a process chamber with a treatment space, a substrate support unit that supports the substrate, a gas supply unit that supplies a gas into the treatment space, and a plasma source that excites the gas into plasma, the process chamber includes a discharge chamber that is provided over the substrate support unit and has a space in which the gas is excited into the plasma, and the plasma source includes an antenna including a first coil and a second coil that surround a side surface of the discharge chamber along a circumference of the discharge chamber, and a power supply that applies electric power to the antenna, wherein the first coil and the second coil are alternately arranged along a vertical direction, and when viewed from the top, currents flow through the first coil and the second coil in the same direction.

Abstract: Provided is a plasma generating device. The plasma generating device includes: an RF power supply providing an RF signal; a plasma chamber providing a space where gas is injected to generate plasma; a first electromagnetic inducer installed at one portion of the plasma chamber and inducing an electromagnetic field in the plasma chamber as the RF signal is applied; a second electromagnetic inducer installed at another portion of the plasma chamber and inducing an electromagnetic field in the plasma chamber as the RF signal is applied; a first load connected to the first electromagnetic inducer; a second load connected to the second electromagnetic inducer; and a controller controlling a power supplied to the first electromagnetic inducer and the second electromagnetic inducer by adjusting at least one impedance of the first load and the second load.

Abstract: A vacuum cleaner that includes an upright main body, an upright fan motor generating a suction force, and a wheel assembly that is mounted on the upright main body and guides movement and rotation of the upright main body. The upright main body includes a first housing that is installed on the wheel assembly so as to be rotatable in a leftward/rightward direction, and a second housing that is installed in the first housing so as to be rotatable in a forward/backward direction. The vacuum cleaner can be moved and rotated by freely moving an extension frame extending upward from the second housing in forward, backward, leftward, and rightward directions.

Abstract: Provided are a plasma generation device, a method of controlling a characteristic of plasma, and a substrate processing device using the same. The plasma generation device includes a first radio frequency (RF) power supply supplying a first RF signal; a chamber supplying a space in which plasma is generated; a plasma source installed at the chamber, wherein the plasma source receives the first RF signal and generates plasma; a second RF power supply supplying a second RF signal; a direct current (DC) bias power supply supplying a DC bias signal; and an electrode arranged in the chamber, wherein the electrode receives an overlap signal obtained by overlapping the second RF signal and the DC bias signal and controls a characteristic of the plasma.

Abstract: Provided are a substrate processing device and a method of handing particles thereof.

Abstract: The present invention relates to an apparatus for generating plasma using a dual plasma source and a substrate treatment apparatus including the same. A plasma generation apparatus according to an embodiment of the present invention includes: an RF power supply configured to supply an RF signal; a plasma chamber configured to provide a space in which plasma is generated; a first plasma source installed at one part of the plasma chamber to generate plasma; and a second plasma source installed at the other part of the plasma chamber to generate plasma, the second plasma source including: a plurality of insulating loops formed along a circumference of the plasma chamber, wherein a gas passage through which a process gas is injected and moved to the plasma chamber is provided in each insulating loop; and a plurality of electromagnetic field appliers coupled to the insulating loops and receiving the RF signal to excite the process gas moved through the gas passage to a plasma state.

Abstract: Provided are a plasma generating apparatus using mutual inductive coupling and a substrate treating apparatus including the same. According to an embodiment of the present invention, a plasma generating apparatus includes: an RF power supply providing an RF signal; a plurality of electromagnetic field applying units inducing an electromagnetic field by receiving the RF signal; and a reactance element connected to a ground terminal of the electromagnetic field applying unit, wherein each of the electromagnetic field applying units may include a plurality of mutually-inductively coupled coils.

Abstract: Provided is a substrate treating apparatus including a first supplying unit, a second supplying unit, a first source, a second source, a gas separation member or the like. Plasma generated from a first gas supplied from a first supplying unit by the first source is used for treating a central area of a substrate. Plasma generated from a second gas supplied from a second supplying unit by the second source is used for treating an edge area of the substrate. A gas separation member prevents plasmas generated respectively from first and second gases from being mixed up.

Abstract: A vacuum cleaner that includes a first cleaner module and a second cleaner module that is removably coupled to the first cleaner module. The first cleaner module includes a first body and a first dust collection unit, and the second cleaner module includes a second body and a second dust collection unit. Thus, when done in an upright mode, cleaning can be done with a sufficiently great suction force. When done in a handy mode after the second cleaner module is separated, cleaning can be easily done using the second cleaner module.

Abstract: A vacuum cleaner that includes an upright main body, an upright fan motor generating a suction force, and a wheel assembly that is mounted on the upright main body and guides movement and rotation of the upright main body. The upright main body includes a first housing that is installed on the wheel assembly so as to be rotatable in a leftward/rightward direction, and a second housing that is installed in the first housing so as to be rotatable in a forward/backward direction. The vacuum cleaner can be moved and rotated by freely moving an extension frame extending upward from the second housing in forward, backward, leftward, and rightward directions.

Abstract: Provided is a plasma generating device. The plasma generating device includes: an RF power supply providing an RF signal; a plasma chamber providing a space where gas is injected to generate plasma; a first electromagnetic inducer installed at one portion of the plasma chamber and inducing an electromagnetic field in the plasma chamber as the RF signal is applied; a second electromagnetic inducer installed at another portion of the plasma chamber and inducing an electromagnetic field in the plasma chamber as the RF signal is applied; a first load connected to the first electromagnetic inducer; a second load connected to the second electromagnetic inducer; and a controller controlling a power supplied to the first electromagnetic inducer and the second electromagnetic inducer by adjusting at least one impedance of the first load and the second load.