Patents by Inventor Jifeng Liu

Jifeng Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070270418
    Abstract: In general, the present invention relates to compounds capable of inhibiting p38, methods for inhibiting p38 in vivo or in vitro, and methods for treating conditions associated with p38 activity or cytokine activity.
    Type: Application
    Filed: May 14, 2004
    Publication date: November 22, 2007
    Inventors: Mark Ashwell, Syed Ali, Jifeng Liu, Yanbin liu, Peter Lohse, Belew Mekonnen, Robert Selliah, Manish Tandon, Woj Wrona, Valery Antonenko
  • Patent number: 7266263
    Abstract: High-speed optoelectronic devices having a waveguide densely integrated with and efficiently coupled to a photodetector are fabricated utilizing methods generally compatible with CMOS processing techniques. In various implementations, the waveguide consists essentially of single-crystal silicon and the photodetector contains, or consists essentially of, epitaxially grown germanium or a silicon-germanium alloy having a germanium concentration exceeding about 90%.
    Type: Grant
    Filed: November 8, 2005
    Date of Patent: September 4, 2007
    Assignee: Massachusetts Institute of Technology
    Inventors: Donghwan Ahn, Jifeng Liu, Jurgen Michel, Lionel C. Kimerling
  • Publication number: 20070116398
    Abstract: An optoelectronic device includes an input waveguide structure that receives an input optical signal. A GeSi/Si waveguide structure receives from the input waveguide the input optical signal and performs selective optoelectronic operations on the input optical signal. The GeSi/Si waveguide structure outputs an optical or electrical output signal associated with the selective optoelectronic operations performed on the input optical signal. An output waveguide structure receives the output optical signal from the GeSi/Si waveguide structure and provides the optical output signal for further processing.
    Type: Application
    Filed: November 20, 2006
    Publication date: May 24, 2007
    Inventors: Dong Pan, Jifeng Liu, Jurgen Michel, Lionel Kimerling
  • Publication number: 20070105251
    Abstract: A laser structure includes at least one active layer having doped Ge so as to produce light emissions at approximately 1550 nm from the direct band gap of Ge. A first confinement structure is positioned on a top region of the at least one active layer. A second confinement structure is positioned on a bottom region the at least one active layer.
    Type: Application
    Filed: October 26, 2006
    Publication date: May 10, 2007
    Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    Inventors: Jifeng Liu, Dong Pan, Lionel Kimerling, Jurgen Michel, Sajan Saini
  • Publication number: 20070104410
    Abstract: High-speed optoetectronic devices having a waveguide densely integrated with and efficiently coupled to a photodetector are fabricated utilizing methods generally compatible with CMOS processing techniques. In various implementations, the waveguide consists essentially of single-crystal silicon and the photodetector contains, or consists essentially of, epitaxially grown germanium or a silicon-germanium alloy having a germanium concentration exceeding about 90%.
    Type: Application
    Filed: November 8, 2005
    Publication date: May 10, 2007
    Applicant: Massachusetts Institute of Technology
    Inventors: Donghwan Ahn, Jifeng Liu, Jurgen Michel, Lionel Kimerling
  • Publication number: 20070104411
    Abstract: High-speed optoelectronic devices having a waveguide densely integrated with and efficiently coupled to a photodetector are fabricated utilizing methods generally compatible with CMOS processing techniques. In various implementations, the waveguide consists essentially of single-crystal silicon and the photodetector contains, or consists essentially of, epitaxially grown germanium or a silicon-germanium alloy having a germanium concentration exceeding about 90%.
    Type: Application
    Filed: November 8, 2005
    Publication date: May 10, 2007
    Applicant: Massachusetts Institute of Technology
    Inventors: Donghwan Ahn, Jifeng Liu, Jurgen Michel, Lionel Kimerling
  • Publication number: 20070104441
    Abstract: High-speed optoelectronic devices having a waveguide densely integrated with and efficiently coupled to a photodetector are fabricated utilizing methods generally compatible with CMOS processing techniques. In various implementations, the waveguide consists essentially of single-crystal silicon and the photodetector contains, or consists essentially of, epitaxially grown germanium or a silicon-germanium alloy having a germanium concentration exceeding about 90%.
    Type: Application
    Filed: November 8, 2005
    Publication date: May 10, 2007
    Applicant: Massachusetts Institute of Technology
    Inventors: Donghwan Ahn, Jifeng Liu, Jurgen Michel, Lionel Kimerling
  • Publication number: 20070025670
    Abstract: A method of forming a low loss crystal quality waveguide is provided. The method includes providing a substrate and forming a dielectric layer on the substrate. A channel is formed by etching a portion of the dielectric layer. A selective growth of a Si Ge, or SiGe layer is performed in the area that defines the channel. Furthermore, the method includes thermally annealing the waveguide at a defined temperature range.
    Type: Application
    Filed: August 1, 2005
    Publication date: February 1, 2007
    Inventors: Dong Pan, Jifeng Liu, Jurgen Michel, John Yasaitis, Lionel Kimerling
  • Patent number: 6946318
    Abstract: A photodetector device includes a plurality of Ge epilayers that are grown on a substrate and annealed in a defined temperature range. The Ge epilayers form a tensile strained Ge layer that allows the photodetector device to operate efficiently in the C-band and L-band.
    Type: Grant
    Filed: September 28, 2004
    Date of Patent: September 20, 2005
    Assignee: Massachusetts Institute of Technology
    Inventors: Kazumi Wada, Lionel C. Kimerling, Yasuhiko Ishikawa, Douglas D. Cannon, Jifeng Liu
  • Publication number: 20050171895
    Abstract: Benchmarks for the price of a financial instrument such as FX spot rate for a currency pair are calculated by an algorithm based on a previous benchmark and a market price. The market price is derived from a deal price and a quote price. The deal price is based on deals conducted since the last benchmark and the quote price is based on bids and offers entered since the last benchmark. For each of the deal and quote prices, a price, weight and scatter is calculated which is used to calculate a benchmark price, weight and scatter and a benchmark error.
    Type: Application
    Filed: November 5, 2004
    Publication date: August 4, 2005
    Inventors: Edward Howorka, David Jifeng Liu, Jeffrey Edward Power, Nasir Ahmed Zubairi, Neena Jain
  • Publication number: 20050040411
    Abstract: A photodetector device includes a plurality of Ge epilayers that are grown on a substrate and annealed in a defined temperature range. The Ge epilayers form a tensile strained Ge layer that allows the photodetector device to operate efficiently in the C-band and L-band.
    Type: Application
    Filed: September 28, 2004
    Publication date: February 24, 2005
    Inventors: Kazumi Wada, Lionel Kimerling, Yasuhiko Ishikawa, Douglas Cannon, Jifeng Liu
  • Patent number: 6812495
    Abstract: A photodetector device includes a plurality of Ge epilayers that are grown on a substrate and annealed in a defined temperature range. The Ge epilayers form a tensile strained Ge layer that allows the photodetector device to operate efficiently in the C-band and L-band.
    Type: Grant
    Filed: December 2, 2002
    Date of Patent: November 2, 2004
    Assignee: Massachusetts Institute of Technology
    Inventors: Kazumi Wada, Lionel C. Kimerling, Yasuhiko Ishikawa, Douglas D. Cannon, Jifeng Liu
  • Publication number: 20030235931
    Abstract: A photodetector device includes a plurality of Ge epilayers that are grown on a substrate and annealed in a defined temperature range. The Ge epilayers form a tensile strained Ge layer that allows the photodetector device to operate efficiently in the C-band and L-band.
    Type: Application
    Filed: December 2, 2002
    Publication date: December 25, 2003
    Inventors: Kazumi Wada, Lionel C. Kimerling, Yasuhiko Ishikawa, Douglas D. Cannon, Jifeng Liu