Abstract: A method for determining process window limiting patterns based on aberration sensitivity associated with a patterning apparatus. The method includes obtaining (i) a first set of kernels and a second set of kernels associated with an aberration wavefront of the patterning apparatus and (ii) a design layout to be printed on a substrate via the patterning apparatus; and determining, via a process simulation using the design layout, the first set of kernels, and the second set of kernels, an aberration sensitivity map associated with the aberration wavefront, the aberration sensitivity map indicating how sensitive one or more portions of the design layout are to an individual aberrations and an interaction between different aberrations; determining, based on the aberration sensitivity map, the process window limiting pattern associated with the design layout having relatively high sensitivity compared to other portions of the design layout.

Abstract: Hybrid organic/inorganic coating compositions of nanometer thickness are described, where the organic layer is a clay-containing layer comprising a clay and a hydrophilic polymer and the inorganic layer is a metal-containing layer comprising a metal with a refractive index greater than 1.5, where the coating compositions allow for the generation and tenability of iridescent color through control of the coat thickness.

Abstract: Embodiments of the present disclosure generally relate to a method and device for creating an index. For example, the embodiments of the present disclosure propose a method for creating an index, comprising: dividing a document into a plurality of regions; determining the number of times that a token appears in the plurality of regions, the token including at least one character in the document; assigning respective weights to the plurality of regions; and creating an inverted document linked list directed to the token based on the number of times that the token appears in the plurality of regions and respective weights of the plurality of regions. In addition, the embodiments of the present disclosure propose a corresponding device and computer program product for creating an index.

Abstract: A hair care composition is disclosed comprising an anti-dandruff agent selected from piroctone olamine, selenium sulfide and mixtures thereof and a copolymer comprising acrylamidopropyltrimonium chloride, wherein the weight ratio of the amount of the copolymer to the amount of the anti-dandruff agent is in the range of from 1:5 to 1:1.

Abstract: The invention provides a floor determination method for terminal devices, including the steps: S1: generate the atmospheric pressure data of the datum floor; S2: divide the coordinate system of a map and establish city-level grid atmospheric pressure database; S3: add commercial label to the grid data; S4: add the datum atmospheric pressure and floor-height atmospheric pressure difference to each grid; S5: judge the floor according to the device atmospheric pressure. The advantages of this invention include: it puts forward the determination method of building floor originally and can accurately calculate the floor where the device is according to the testing data of atmospheric pressure and device sensor, and the whole process of the method is fast, intelligent and accurate.

Abstract: This invention provides an IP positioning method & unit, computer storage medium and computing device. The method includes collecting the plurality of GPS coordinates pointing to the same IP address and mapping them to one coordinate system; clustering the plurality of GPS coordinates based on the K-means clustering algorithm to acquire minimum one principal cluster circle, wherein, the GPS coordinates are the principal cluster objects of the principal cluster circles; selecting the principal cluster circle with the largest number of cluster objects as the target cluster circle; screening the target cluster object from the principal clustering objects in the target cluster circle based on the preset rules and taking the GPS coordinate of the target cluster object as the IP center coordinate of the IP address.

Abstract: Indices of storage systems are managed. An example method includes: receiving a flush cycle for flushing expired events in a storage system including multiple events in a data stream, determining, based on the flush cycle, a time slice for managing the index of the storage system, creating a slice index node for the time slice in response to determining that the occurrence time of a first event that enters the storage system in the data stream is within the time slice, wherein the slice index node includes an index node of the first event, and adding the slice index node to the index. A corresponding device and a corresponding computer program product are provided. Thus, the index of a large number of events entering the storage system is managed according to the occurrence time of the events, and the storage system can be searched and updated accurately and effectively.

Abstract: Ideogram character analysis includes partitioning an original ideogram character into strokes and mapping each stroke to a corresponding stroke identifier (id) to create an original stroke id sequence that includes stroke identifiers. A candidate ideogram character that has a candidate stroke id sequence within a threshold distance to the original stroke id sequence is selected. One or more embodiments may create a new phrase by replacing the original ideogram character with the candidate ideogram character in a search phrase. One or more embodiments perform a search using the search phrase and the new phrase to obtain a result and present the result. One or more embodiments may replace an original ideogram character in a character recognized document with the candidate ideogram character and store the character recognized document.

Abstract: Ideogram character analysis includes partitioning an original ideogram character into strokes, and mapping each stroke to a corresponding stroke identifier (id) to create an original stroke id sequence that includes stroke identifiers. A candidate ideogram character that has a candidate stroke id sequence within a threshold distance to the original stroke id sequence is selected. One or more embodiments may create a new phrase by replacing the original ideogram character with the candidate ideogram character in a search phrase. One or more embodiments perform a search using the search phrase and the new phrase to obtain a result, and present the result. One or more embodiments may replace an original ideogram character in a character recognized document with the candidate ideogram character and store the character recognized document.

Abstract: Disclosed herein are genetically modified microorganisms and related methods for the enhanced export of oligosaccharides. The microorganisms described herein express major facility superfamily proteins such as CDT-1 which allows for the export of oligosaccharides. Variants of CDT-1 exhibit higher activity regarding oligosaccharide export. Means to export oligosaccharides into the growth medium are provided herein.

Abstract: The present invention provides a thin film transistor and a manufacturing method thereof. The thin film transistor includes a substrate, a gate electrode, a gate insulating layer, a semiconductor layer, a source electrode and a drain electrode, and a passivation layer. Both structures of the source electrode and the drain electrode are a three-layered metal structure, and the three-layered metal structure is a titanium tantalum/copper/titanium tantalum structure. Therefore, after the passivation layer is applied to the source electrode and the drain electrode, a bulging problem of the passivation layer can be effectively improved, and thus the thin film transistor has better plasticity and can be used for flexible displays.

Abstract: In general, in one aspect, the invention relates to a method for servicing requests. The method includes receiving, from a client system, a request comprising a query, where the query includes a first plurality of terms. The method further includes generating, using a thesaurus library, a related query including a second plurality of terms, where at least one term in the second plurality of terms is present in the first plurality of terms. The method further includes issuing the query to a content repository to obtain a first result, issuing the related query to the content repository to obtain a second result, processing the first result and the second result to generate a final result, and providing the final result to the client system.

Abstract: A method for determining a patterning device pattern. The method includes obtaining (i) an initial patterning device pattern having at least one feature, and (ii) a desired feature size of the at least one feature, obtaining, based on a patterning process model, the initial patterning device pattern and a target pattern for a substrate, a difference value between a predicted pattern of the substrate image by the initial patterning device and the target pattern for the substrate, determining a penalty value related the manufacturability of the at least one feature, wherein the penalty value varies as a function of the size of the at least one feature, and determining the patterning device pattern based on the initial patterning device pattern and the desired feature size such that a sum of the difference value and the penalty value is reduced.

Abstract: A patterning device, includes: an absorber layer on a patterning device substrate; and a reflective or transmissive layer on the patterning device substrate, wherein the absorber layer and the reflective or transmissive layer together define a pattern layout having a main feature and an attenuated sub-resolution assist feature paired with the main feature, wherein: the main feature is configured to generate, upon transferring the device pattern to a layer of patterning material on a substrate, the main feature in the layer of patterning material, and upon the transferring the pattern to the layer of patterning material, the attenuated sub-resolution assist feature is configured to avoid generating a feature in the layer of patterning material and to produce a different radiation intensity than the main feature.

Abstract: A circular dichroism spectrometer which comprises a metasurface. The metasurface has a plurality of anisotropic antennas configured to simultaneously spatially separate LCP and RCP spectral components from an incoming light beam. An optical detector array is included which detects the LCP and RCP spectral components. A transparent medium is situated between the metasurface and the optical detector array.

Abstract: This invention relates to a hair care composition which provides the desired anti-dandruff efficacy with uniform deposition of the active materials on hair/scalp. This is achieved through a judicious combination of a specific cationic deposition polymer and selective anti-dandruff agent of the right particle size.

Abstract: The present invention provides a thin film transistor and a manufacturing method thereof. The thin film transistor includes a substrate, a gate electrode, a gate insulating layer, a semiconductor layer, a source electrode and a drain electrode, and a passivation layer. Both structures of the source electrode and the drain electrode are a three-layered metal structure, and the three-layered metal structure is a titanium tantalum/copper/titanium tantalum structure. Therefore, after the passivation layer is applied to the source electrode and the drain electrode, a bulging problem of the passivation layer can be effectively improved, and thus the thin film transistor has better plasticity and can be used for flexible displays.

Abstract: A patterning device, includes: an absorber layer on a patterning device substrate; and a reflective or transmissive layer on the patterning device substrate, wherein the absorber layer and the reflective or transmissive layer together define a pattern layout having a main feature and an attenuated sub-resolution assist feature paired with the main feature, wherein: the main feature is configured to generate, upon transferring the device pattern to a layer of patterning material on a substrate, the main feature in the layer of patterning material, and upon the transferring the pattern to the layer of patterning material, the attenuated sub-resolution assist feature is configured to avoid generating a feature in the layer of patterning material and to produce a different radiation intensity than the main feature.