Patents by Inventor Jingjing Liu

Jingjing Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11086230
    Abstract: A method for optimization to increase lithographic apparatus throughput for a patterning process is described. The method includes providing a baseline dose for an EUV illumination and an initial pupil configuration, associated with a lithographic apparatus. The baseline dose and the initial pupil configuration are configured for use with a dose anchor mask pattern and a corresponding dose anchor target pattern for setting an illumination dose for corresponding device patterns of interest. The method includes biasing the dose anchor mask pattern relative to the dose anchor target pattern; determining an acceptable lower dose for the biased dose anchor mask pattern and the initial pupil configuration; unbiasing the dose anchor mask pattern relative to the dose anchor target pattern; and determining a changed pupil configuration and a mask bias for the device patterns of interest based on the acceptable lower dose and the unbiased dose anchor mask pattern.
    Type: Grant
    Filed: January 31, 2020
    Date of Patent: August 10, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Jingjing Liu
  • Publication number: 20210230287
    Abstract: Provided are novel fully human monoclonal antibodies that bind to human 4-1BB. It also provides the methods of hybridoma generation using humanized rats, the nucleic acid molecules encoding the anti-4-1BB antibodies, vectors and host cells used for the expression of anti-4-1BB antibodies. The invention further provides methods for validating the function of antibodies in vitro and the efficacy of antibodies in vivo. The antibodies of invention provide a very potent agent for the treatment of multiple cancers via modulating human immune function.
    Type: Application
    Filed: April 10, 2019
    Publication date: July 29, 2021
    Inventors: Yong ZHENG, Jingjing LIU, Jing LI
  • Patent number: 11068536
    Abstract: Embodiments of the present disclosure relate to a method and apparatus for managing a document index. The method comprises determining an independently updatable field in a plurality of documents, the independently updatable field comprising at least one item. The method further comprises creating an index for an item in the independently updatable field, the index containing an identifier of a document comprising the item, the document being included in the plurality of documents. Furthermore, the method further comprises storing the identifier of the document in blocks such that the index is updatable without modifying the identifier of the document.
    Type: Grant
    Filed: June 22, 2017
    Date of Patent: July 20, 2021
    Assignee: EMC IP Holding Company LLC
    Inventors: Kun Wu Huang, Winston Lei Zhang, Chao Chen, Jingjing Liu, Duke Hongtao Dai
  • Publication number: 20210214705
    Abstract: Compositions and methods are provided for producing 2?fucosyliaciose and L-fucose from recombinant microorganisms.
    Type: Application
    Filed: May 15, 2019
    Publication date: July 15, 2021
    Applicants: THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS, KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
    Inventors: Yong-Su JIN, Jingjing LIU, Sora YU, Eun Ju YUN, Suryang KWAK, Kyoung Heon KIM, Jaewon LEE
  • Patent number: 11048763
    Abstract: Techniques for searching a character string involve: determining a first set of documents including a first token in the character string, and a second set of documents including a second token in the character string; and generating a third set of documents based on the first and second sets of documents, in the third set of documents: i) a document being included in the first and second sets of documents, and ii) a distance between the first and second tokens in the document being equal to a distance between the first and second tokens in the character string.
    Type: Grant
    Filed: December 31, 2019
    Date of Patent: June 29, 2021
    Assignee: EMC IP Holding Company LLC
    Inventors: Duke Hongtao Dai, Winston Lei Zhang, Chao Chen, Kun Wu Huang, Jingjing Liu
  • Patent number: 11049701
    Abstract: Apparatus and methods for reducing and eliminating accumulation of excessive charged particles from substrate processing systems are provided herein. In some embodiments a process kit for a substrate process chamber includes: a cover ring having a body and a lip extending radially inward from the body, wherein the body has a bottom, a first wall, and a second wall, and wherein a first channel is formed between the second wall and the lip; a grounded shield having a lower inwardly extending ledge that terminates in an upwardly extending portion configured to interface with the first channel of the cover ring; and a bias power receiver coupled to the body and extending through an opening in the grounded shield.
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: June 29, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Adolph Miller Allen, William Johanson, Viachslav Babayan, Zhong Qiang Hua, Carl R. Johnson, Vanessa Faune, Jingjing Liu, Vaibhav Soni, Kirankumar Savandaiah, Sundarapandian Ramalinga Vijayalaks Reddy
  • Publication number: 20210182506
    Abstract: Embodiments of the present disclosure provide a method and apparatus for processing a multi-language text. According to embodiments of the present disclosure, the multi-language text including contents in a plurality of languages may be encoded with a Unicode. The method further comprises splitting the multi-language text into a plurality of parts based on the Unicode of the multi-language text, contents of the plurality of parts having different languages. In addition, the multi-language text may also be processed based on the plurality of parts.
    Type: Application
    Filed: February 26, 2021
    Publication date: June 17, 2021
    Inventors: Kun Wu Huang, Winston Lei Zhang, Chao Chen, Jingjing Liu, Duke Hongtao Dai
  • Patent number: 10990003
    Abstract: A method to determine a mask pattern for a patterning device. The method includes obtaining a target pattern to be printed on a substrate, an initial continuous tone image corresponding to the target pattern, a binarization function (e.g., a sigmoid, an arctan, a step function, etc.) configured to transform the initial continuous tone image, and a process model configured to predict a pattern on the substrate from an output of the binarization function; and generating a binarized image having a mask pattern corresponding to the initial continuous tone image by iteratively updating the initial continuous tone image based on a cost function such that the cost function is reduced. The cost function (e.g., EPE) determines a difference between a predicted pattern determined by the process model and the target pattern.
    Type: Grant
    Filed: February 15, 2019
    Date of Patent: April 27, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Jingjing Liu, Rafael C. Howell, Xingyue Peng
  • Publication number: 20210116816
    Abstract: A method for determining electromagnetic fields associated with a mask model of a patterning process. The method includes obtaining a mask stack region of interest and an interaction order corresponding to the mask stack region of interest. The mask stack region of interest is divided into sub regions. The mask stack region of interest has one or more characteristics associated with propagation of electromagnetic waves through the mask stack region of interest. The method includes generating one or more electromagnetic field determination expressions based on the Maxwell Equations and the Quantum Schrodinger Equation. The method includes determining an electromagnetic field associated with the mask stack region of interest based on the sub regions of the mask stack region of interest and the characteristics associated with the propagation of electromagnetic waves through the mask stack region of interest, using the one or more electromagnetic field determination expressions.
    Type: Application
    Filed: April 16, 2019
    Publication date: April 22, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Xingyue PENG, Jingjing LIU
  • Publication number: 20210108964
    Abstract: A circular dichroism spectrometer which comprises a metasurface. The metasurface has a plurality of anisotropic antennas configured to simultaneously spatially separate LCP and RCP spectral components from an incoming light beam. An optical detector array is included which detects the LCP and RCP spectral components. A transparent medium is situated between the metasurface and the optical detector array.
    Type: Application
    Filed: July 20, 2020
    Publication date: April 15, 2021
    Applicant: Purdue Research Foundation
    Inventors: Amr Mohammad E Shaltout, Alexander V. Kildishev, Vladimir M Shalaev, Jingjing Liu
  • Publication number: 20210097049
    Abstract: Embodiments of the present disclosure provide a method, device, and computer program product for managing index tables. There is provided a method of managing index tables, comprising: determining the number of indexing requests for documents, the indexing requests being received within a predetermined period of time; obtaining information related to a processing index table in an index processing system, the processing index table being used for storing indices generated based on the indexing requests, the index processing system further comprising a receiving index table, the receiving index table being used for storing at least a part of the indices in the processing index table; and adjusting, based on the number of indexing requests and the obtained information, the number of processing index tables in the index processing system.
    Type: Application
    Filed: March 26, 2020
    Publication date: April 1, 2021
    Inventors: Frank Yifan Huang, Jingjing Liu
  • Patent number: 10936829
    Abstract: Embodiments of the present disclosure provide a method and apparatus for processing a multi-language text. According to embodiments of the present disclosure, the multi-language text including contents in a plurality of languages may be encoded with a Unicode. The method further comprises splitting the multi-language text into a plurality of parts based on the Unicode of the multi-language text, contents of the plurality of parts having different languages. In addition, the multi-language text may also be processed based on the plurality of parts.
    Type: Grant
    Filed: June 21, 2017
    Date of Patent: March 2, 2021
    Assignee: EMC IP Holding Company LLC
    Inventors: Kun Wu Huang, Winston Lei Zhang, Chao Chen, Jingjing Liu, Duke Hongtao Dai
  • Patent number: 10936667
    Abstract: Embodiments of the present disclosure provide a solution for indicating a search result. A method of indicating a search result is disclosed, which includes, in response to receiving a query term, searching for an electronic document having metadata related to the query term. The method further includes, in response to the electronic document being searched, locating a metadata term matching with the query term from the metadata of the electronic document. The method further includes providing an indication highlighting the metadata term.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: March 2, 2021
    Assignee: EMC IP Holding Company LLC
    Inventors: Kun Wu Huang, Charlie Chen, Winston Lei Zhang, Jingjing Liu, Duke Dai
  • Patent number: 10927449
    Abstract: Embodiments of the present disclosure provide a sputtering chamber with in-situ ion implantation capability. In one embodiment, the sputtering chamber comprises a target, an RF and a DC power supplies coupled to the target, a support body comprising a flat substrate receiving surface, a bias power source coupled to the support body, a pulse controller coupled to the bias power source, wherein the pulse controller applies a pulse control signal to the bias power source such that the bias power is delivered either in a regular pulsed mode having a pulse duration of about 100-200 microseconds and a pulse repetition frequency of about 1-200 Hz, or a high frequency pulsed mode having a pulse duration of about 100-300 microseconds and a pulse repetition frequency of about 200 Hz to about 20 KHz, and an exhaust assembly having a concentric pumping port formed through a bottom of the processing chamber.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: February 23, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Jingjing Liu, Ludovic Godet, Srinivas D. Nemani, Yongmei Chen, Anantha K. Subramani
  • Patent number: 10877809
    Abstract: The present disclosure provides a method for information processing. The method is applied in an electronic device and comprises: acquiring, upon detecting that the electronic device has been switched from a first state to a second state, a priority list storing a priority of each application that is initiated by a user among all applications when the electronic device is switched to the first state again; and selecting one or more applications from the priority list for preloading. Also provided is an apparatus for information processing.
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: December 29, 2020
    Assignees: Beijing Lenovo Software Ltd., Lenovo (Beijing) Limited
    Inventors: Wei Hou, Jingjing Liu
  • Patent number: 10860590
    Abstract: The present disclosure provides method and apparatus of information processing. The method comprises: in response to a request of a first user for first information, searching a database to obtain second information; determining a first relevance between a second user associated with the second information and the first user; determining a second relevance between the second information and the first information based on the first relevance; and presenting the second information to the first user based at least in part on the second relevance.
    Type: Grant
    Filed: April 17, 2018
    Date of Patent: December 8, 2020
    Assignee: EMC IP Holding Corporation LLC
    Inventors: Duke Hongtao Dai, Winston Lei Zhang, Kun Wu (Sheperd) Huang, Charlie Chao Chen, Jingjing Liu
  • Patent number: 10858727
    Abstract: A deposited amorphous carbon film includes at least 95% carbon. A percentage of sp3 carbon-carbon bonds present in the amorphous carbon film exceeds 30%, and a hydrogen content of the amorphous carbon film is less than 5%. A process of depositing amorphous carbon on a workpiece includes positioning the workpiece within a process chamber and positioning a magnetron assembly adjacent to the process chamber. The magnetron assembly projects a magnetic field into the process chamber. The method further includes providing a carbon target such that the magnetic field extends through the carbon target toward the workpiece. The method further includes providing a source gas to the process chamber, and providing pulses of DC power to a plasma formed from the source gas within the process chamber. The pulses of DC power are supplied in pulses of 40 microseconds or less, that repeat at a frequency of at least 4 kHz.
    Type: Grant
    Filed: May 19, 2017
    Date of Patent: December 8, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Jingjing Liu, Zhong Qiang Hua, Adolph Miller Allen, Michael W. Stowell, Srinivas D. Nemani, Chentsau Ying, Bhargav Citla, Viachslav Babayan, Andrej Halabica
  • Publication number: 20200362189
    Abstract: Hybrid organic/inorganic coating compositions of nanometer thickness are described, where the organic layer is a clay-containing layer comprising a clay and a hydrophilic polymer and the inorganic layer is a metal-containing layer comprising a metal with a refractive index greater than 1.5, where the coating compositions allow for the generation and tenability of iridescent color through control of the coat thickness.
    Type: Application
    Filed: August 18, 2018
    Publication date: November 19, 2020
    Applicants: KANEKA CORPORATION, THE UNIVERSITY OF CONNECTICUT
    Inventors: LUYI SUN, JINGJING LIU, SONGSHAN ZHENG, THOMAS D'AURIA, YOUNG HOON LIM, TIANLEI ZHOU, MASAYA KOTAKI
  • Publication number: 20200363713
    Abstract: A method to determine a mask pattern for a patterning device. The method includes obtaining a target pattern to be printed on a substrate, an initial continuous tone image corresponding to the target pattern, a binarization function (e.g., a sigmoid, an arctan, a step function, etc.) configured to transform the initial continuous tone image, and a process model configured to predict a pattern on the substrate from an output of the binarization function; and generating a binarized image having a mask pattern corresponding to the initial continuous tone image by iteratively updating the initial continuous tone image based on a cost function such that the cost function is reduced. The cost function (e.g., EPE) determines a difference between a predicted pattern determined by the process model and the target pattern.
    Type: Application
    Filed: February 15, 2019
    Publication date: November 19, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Stephen HSU, Jingjing LIU, Rafael C. HOWELL, Xingyue PENG
  • Patent number: D914583
    Type: Grant
    Filed: February 29, 2020
    Date of Patent: March 30, 2021
    Assignee: Qingdao Sentury Tire Co., Ltd.
    Inventors: Long Qin, Wenlong Lin, Yanmei Zhang, Jingjing Liu, Yan Xi