Patents by Inventor Ji-Yun KWON

Ji-Yun KWON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11951130
    Abstract: The present invention relates to an antigen-binding molecule comprising a heavy chain variable region comprising a heavy-chain complementarity-determining region 1 (HCDR1) comprising an amino acid sequence represented by Sequence No. 1, an HCDR2 comprising an amino acid sequence represented by Sequence No. 2, and an HCDR3 comprising an amino acid sequence represented by Sequence No. 3; a light-chain variable region comprising a light-chain complementarity-determining region 1 (LCDR1) comprising an amino acid sequence represented by Sequence No. 4, an LCDR2 comprising an amino acid sequence represented by Sequence No. 5, and an LCDR3 comprising an amino acid sequence represented by Sequence No. 6; wherein the antigen-binding molecule is a T cell receptor (TCR); and to a cell line expressing the same.
    Type: Grant
    Filed: March 1, 2021
    Date of Patent: April 9, 2024
    Assignee: Eutilex Co., Ltd.
    Inventors: Byoung S. Kwon, Young Ho Kim, Kwang Hee Kim, Ji Won Chung, Young Gyoon Chang, Bo Rim Yi, Jung Yun Lee, Seung Hyun Lee, Sun Woo Im, Jin Kyung Choi, Hyun Tae Son, Eun Hye Yoo
  • Patent number: 9487694
    Abstract: Disclosed are a photosensitive resin composition including a composite dye that includes a red fluorescent dye re-emitting light at a 400 to 800 nm fluorescent wavelength; and a metal complex dye including at least one metal ion selected from Mg, Ni, Co, Zn, Cr, Pt, and Pd, and a color filter using the same.
    Type: Grant
    Filed: May 30, 2012
    Date of Patent: November 8, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Youn-Je Ryu, Gyu-Seok Han, Hwan-Sung Cheon, Hyun-Yong Cho
  • Patent number: 9482943
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a first dissolution-controlling agent including at least one of compounds represented by the following Chemical Formula 1 or Chemical Formula 2; (D) a second dissolution-controlling agent including a compound represented by the following Chemical Formula 3; and (E) a solvent, and a photosensitive resin film and a display device using the same.
    Type: Grant
    Filed: May 21, 2014
    Date of Patent: November 1, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jin-Hee Kang, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Soo Kim, Yong-Tae Kim, Kun-Bae Noh, Eun-Bi Park, Jae-Yeol Baek, Jae-Hwan Song, Eun-Kyoung Youn, Bum-Jin Lee, Jong-Hwa Lee, Jin-Young Lee, Chung-Beum Hong, Eun-Ha Hwang, In-Chul Hwang
  • Patent number: 9465289
    Abstract: The present invention discloses a photosensitive resin composition for an insulating film of a display device including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a color material having a maximum absorption wavelength of 400 to 550 nm; and (D) a solvent, an insulation film using the same, and a display device including the insulation film.
    Type: Grant
    Filed: April 9, 2013
    Date of Patent: October 11, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jin-Hee Kang, Yong-Tae Kim, Jong-Hwa Lee, Jin-Young Lee, Dae-Yun Kim, Sang-Kyun Kim, In-Chul Hwang
  • Patent number: 9429842
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin, (B) a photosensitive diazoquinone compound, (C) a thermosetting cross-linking agent represented by the following Chemical Formula 1, wherein each substituent of Chemical Formula 1 is the same as defined in the detailed description, and (D) a solvent, a photosensitive resin film using the same, and a display device.
    Type: Grant
    Filed: July 30, 2014
    Date of Patent: August 30, 2016
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Ji-Yun Kwon, Jin-Young Lee, Bum-Jin Lee, Jae-Hwan Song
  • Patent number: 9405188
    Abstract: Disclosed is a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a cross-linking agent; (D) a thermal acid generator; (E) a phenol compound; and (F) an organic solvent, wherein the cross-linking agent and thermal acid generator are included in a weight ratio of about 1:50 to about 50:1.
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: August 2, 2016
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jong-Hwa Lee, Ji-Yun Kwon, Sang-Soo Kim, Kun-Bae Noh, Eun-Bi Park, Jae-Yeol Baek, Bum-Jin Lee, Sang-Haeng Lee, Eun-Ha Hwang
  • Patent number: 9323147
    Abstract: Disclosed are a photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a phenol compound; (D) a thermal acid generator; and (E) a solvent, wherein the solvent includes an organic solvent having a boiling point of less than about 160° C. under an atmospheric pressure and an organic solvent having a boiling point of greater than or equal to about 160° C. under an atmospheric pressure, wherein the organic solvent having a boiling point of less than about 160° C. is included in an amount of greater than or equal to about 90 wt % and less than about 100 wt % based on the total amount of the solvent, and the organic solvent having a boiling point of greater than or equal to about 160° C. is included in an amount of greater than about 0 wt % and less than or equal to about 10 wt % based on the total amount of the solvent, a photosensitive resin film using the same, and a display device.
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: April 26, 2016
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jong-Hwa Lee, Ji-Yun Kwon, Sang-Soo Kim, Kun-Bae Noh, Eun-Bi Park, Jae-Yeol Baek, Bum-Jin Lee, Sang-Haeng Lee, Eun-Ha Hwang
  • Patent number: 9256118
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) an organic dye and (E) a solvent, wherein the organic dye (D) includes at least one red dye having an absorption wavelength of 590 to 700 nm, at least one yellow dye having an absorption wavelength of 550 to 590 nm, and at least one blue dye having an absorption wavelength of 450 to 500 nm.
    Type: Grant
    Filed: July 17, 2012
    Date of Patent: February 9, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jong-Hwa Lee, Hyun-Yong Cho, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Eun-Kyung Yoon, Jun-Ho Lee, Jin-Young Lee, Hwan-Sung Cheon, Chung-Beom Hong, Eun-Ha Hwang
  • Publication number: 20150185605
    Abstract: The present invention discloses a photosensitive resin composition for an insulating film of a display device including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a color material having a maximum absorption wavelength of 400 to 550 nm; and (D) a solvent, an insulation film using the same, and a display device including the insulation film.
    Type: Application
    Filed: April 9, 2013
    Publication date: July 2, 2015
    Inventors: Ji-Yun Kwon, Jin-Hee Kang, Yong-Tae Kim, Jong-Hwa Lee, Jin-Young Lee, Dae-Yun Kim, Sang-Kyun Kim, In-Chul Hwang
  • Publication number: 20150177617
    Abstract: Disclosed is a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a cross-linking agent; (D) a thermal acid generator; (E) a phenol compound; and (F) an organic solvent, wherein the cross-linking agent and thermal acid generator are included in a weight ratio of about 1:50 to about 50:1.
    Type: Application
    Filed: July 29, 2014
    Publication date: June 25, 2015
    Inventors: Jong-Hwa LEE, Ji-Yun KWON, Sang-Soo KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Bum-Jin LEE, Sang-Haeng LEE, Eun-Ha HWANG
  • Publication number: 20150168835
    Abstract: Disclosed are a photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a phenol compound; (D) a thermal acid generator; and (E) a solvent, wherein the solvent includes an organic solvent having a boiling point of less than about 160° C. under an atmospheric pressure and an organic solvent having a boiling point of greater than or equal to about 160° C. under an atmospheric pressure, wherein the organic solvent having a boiling point of less than about 160° C. is included in an amount of greater than or equal to about 90 wt % and less than about 100 wt % based on the total amount of the solvent, and the organic solvent having a boiling point of greater than or equal to about 160° C. is included in an amount of greater than about 0 wt % and less than or equal to about 10 wt % based on the total amount of the solvent, a photosensitive resin film using the same, and a display device.
    Type: Application
    Filed: July 29, 2014
    Publication date: June 18, 2015
    Inventors: Jong-Hwa LEE, Ji-Yun KWON, Sang-Soo KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Bum-Jin LEE, Sang-Haeng LEE, Eun-Ha HWANG
  • Publication number: 20150147694
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin, (B) a photosensitive diazoquinone compound, (C) a thermosetting cross-linking agent represented by the following Chemical Formula 1, wherein each substituent of Chemical Formula 1 is the same as defined in the detailed description, and (D) a solvent, a photosensitive resin film using the same, and a display device.
    Type: Application
    Filed: July 30, 2014
    Publication date: May 28, 2015
    Inventors: Ji-Yun KWON, Jin-Young LEE, Bum-Jin LEE, Jae-Hwan SONG
  • Patent number: 9040213
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin prepared by a phosphorous-containing diamine represented by the following Chemical Formula 1, (B) a photosensitive diazoquinone compound, and (C) a solvent. A photosensitive resin film prepared using the same and a semiconductor device including the photosensitive resin film are also disclosed. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: May 26, 2015
    Assignee: Cheil Industries Inc.
    Inventors: Hyun-Yong Cho, Sang-Soo Kim, Eun-Kyung Yoon, Jong-Hwa Lee, Jun-Ho Lee, Eun-Ha Hwang, Ji-Yun Kwon, Jin-Young Lee
  • Publication number: 20150118622
    Abstract: Disclosed are a positive photosensitive resin composition including (A) a polybenzoxazole precursor having a polydispersity of about 1 to about 1.6; (B) a photosensitive diazoquinone compound; (C) a thermal acid generator; and (D) a solvent, a photosensitive resin film using the same, and a display device.
    Type: Application
    Filed: May 22, 2014
    Publication date: April 30, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Jin-Hee KANG, Ji-Yun KWON, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Soo KIM, Yong-Tae KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Jae-Hwan SONG, Bum-Jin LEE, Jong-Hwa LEE, Jin-Young LEE, Chung-Beum HONG, Eun-Ha HWANG, In-Chul HWANG
  • Patent number: 8987342
    Abstract: A photosensitive resin composition for an insulating film of a display device includes (A) an alkali soluble resin including a polybenzoxazole precursor, polyamic acid, polyimide, or a combination thereof; (B) a photosensitive diazoquinone compound; (C) an ultraviolet (UV) absorber having a maximum absorption wavelength of about 300 to about 400 nm; and (D) a solvent. An insulating film and a display device can include the photosensitive resin composition.
    Type: Grant
    Filed: August 8, 2013
    Date of Patent: March 24, 2015
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jin-Hee Kang, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Soo Kim, Yong-Tae Kim, Kun-Bae Noh, Eun-Bi Park, Jae-Hwan Song, Eun-Kyoung Youn, Jong-Hwa Lee, Jin-Young Lee, Chung-Beum Hong, Eun-Ha Hwang, In-Chul Hwang
  • Patent number: 8961837
    Abstract: Provided are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a colorant including a diaminopyridine azo-based dye including a structure represented by Chemical Formula 1, and having an absorption wavelength at about 450 to about 550 nm, (B) an acrylic-based binder resin, (C) an acrylic-based photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent.
    Type: Grant
    Filed: June 27, 2013
    Date of Patent: February 24, 2015
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, In-Jae Lee, Ju-Ho Jung, Dong-Wan Kim, Jae-Hyun Kim, Gyu-Seok Han
  • Publication number: 20150050594
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a first dissolution-controlling agent including at least one of compounds represented by the following Chemical Formula 1 or Chemical Formula 2; (D) a second dissolution-controlling agent including a compound represented by the following Chemical Formula 3; and (E) a solvent, and a photosensitive resin film and a display device using the same.
    Type: Application
    Filed: May 21, 2014
    Publication date: February 19, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Ji-Yun KWON, Jin-Hee KANG, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Soo KIM, Yong-Tae KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Jae-Hwan SONG, Eun-Kyoung YOUN, Bum-Jin LEE, Jong-Hwa LEE, Jin-Young LEE, Chung-Beum HONG, Eun-Ha HWANG, In-Chul HWANG
  • Patent number: 8921019
    Abstract: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) at least one organic dye having an absorption wavelength of about 400 nm to about 700 nm, and (E) a solvent, wherein the organic dye (D) is included in an amount of about 1 to about 40 parts by weight based on about 100 parts by weight of the alkali soluble resin (A), and a photosensitive resin layer and a display device using the same.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: December 30, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jin-Hee Kang, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Kun-Bae Noh, Eun-Kyung Yoon, Jong-Hwa Lee, Jun-Ho Lee, Jin-Young Lee, Hwan-Sung Cheon, Hyun-Yong Cho, Chung-Beom Hong, Eun-Ha Hwang
  • Publication number: 20140319421
    Abstract: Disclosed are a photosensitive resin composition including a composite dye that includes a red fluorescent dye re-emitting light at a 400 to 800 nm fluorescent wavelength; and a metal complex dye including at least one metal ion selected from Mg, Ni, Co, Zn, Cr, Pt, and Pd, and a color filter using the same.
    Type: Application
    Filed: May 30, 2012
    Publication date: October 30, 2014
    Inventors: Ji-Yun Kwon, Youn-Je Ryu, Gyu-Seok Han, Hwan-Sung Cheon, Hyun-Yong Cho
  • Patent number: 8828630
    Abstract: Disclosed are photosensitive resin composition that includes a dye including a methine-based compound represented by the following Chemical Formula 1, wherein each substituent of Chemical Formula 1 is the same as defined in the detailed description, and a metal complex, and a color filter using the same.
    Type: Grant
    Filed: August 20, 2012
    Date of Patent: September 9, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Nam-Gwang Kim, Shahrokh Motallebi, In-Jae Lee, Sun-Hee Jin, Jae-Hyun Kim, Hwan-Sung Cheon, Gyu-Seok Han