Abstract: A microlithography projection exposure tool with a radiation detector for the locally resolved recording of electromagnetic radiation. The radiation detector comprises: a solid state body which is configured to multiply electric charge and a collector which is configured to determine the location of the multiplied electric charge by means of charge division.

Abstract: In the case of a method and a measuring system for measuring the distortion of an optical imaging system with the aid of moiré patterns, an object grating with an object pattern is arranged in the object plane of the imaging system, and an image grating with an image pattern is arranged in the image plane of the imaging system. Both the object pattern and the image pattern in each case have a multiplicity of cells with sub-gratings of different grating properties, it being possible, in particular, for the sub-gratings to have different directions of periodicity and different phase angles.

Abstract: An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium.

Abstract: A device and a method for the optical measurement of an optical system (1), in particular an optical imaging system. The device includes one or more object-side test optics components (2a, 2b) arranged in front of the optical system to be measured, and/or one or more image-side test optics components (3, 4, 5) arranged behind the optical system to be measured. A container for use in such a device, a microlithography projection exposure machine equipped with such a device, and a method which can be carried out with the aid of this device are also disclosed. An immersion fluid is introduced adjacent to at least one of the one or more object-side test optics components and/or image-side test optics components. Such device and method provide for optical measurement by microlithography projection objectives of high numerical aperture using wavefront detection with shearing or point diffraction interferometry or a Moiré measuring technique.

Abstract: In the case of a method and a measuring system for measuring the distortion of an optical imaging system with the aid of moiré patterns, an object grating with an object pattern is arranged in the object plane of the imaging system, and an image grating with an image pattern is arranged in the image plane of the imaging system. Both the object pattern and the image pattern in each case have a multiplicity of cells with sub-gratings of different grating properties, it being possible, in particular, for the sub-gratings to have different directions of periodicity and different phase angles.