Abstract: System and method for removing molecular contaminants from an air stream are disclosed. The system includes first, second and third filter. The first filter removes organic contaminants from an air stream passing through the first filter. The second filter is downstream of the first filter, is physically and chemically exchangeable with the first filter and removes organic contaminants from the air stream output of the first filter. The third filter, downstream of the second filter, is not exchangeable with the first filter or the second filter. The first position filter can be replaced by the second filter in the second position when the first filter in the first position becomes depleted as detected. A new filter in the second filter position is inserted. Replacing the depleted first filter with the second downstream filter reduces costs and waste while inserting the new filter in the second position ensures removing organic contaminants.

Abstract: A media sample holder includes a base and a plurality of retention assemblies including retaining tabs and opposing flexible release lever arms, configured to allow attachment of the base to an attachment adapter. The media sample holder can attach a media sample on or near a filter. The media sample holder held in the media sample holder can have a different removal efficiency curve than a removal efficiency curve of the filter. The media sample can be placed at or near the filter for a period of time, then tested to determine the status and/or life of the filter based on the relationship between the remaining life, exposure, or removal efficiency of the filter and the exposure or removal efficiency of the tested media sample.

Abstract: An active wet scrubbing filtration system for decontamination of a gas stream comprises components including one or more of: a) a vortexing apparatus which induces a contaminant-bearing gas into a helical flow; b) an initial scrubbing fluid spray section configured so as to project a spray of scrubbing fluid into the contaminant-bearing gas stream; c) an absorption structure; d) a condenser; and e) first and second scrubbing fluid decontamination systems that may be engaged or disengaged independently of each other. In some embodiments, the worksite comprises a clean room or one or more a semiconductor processing tools, which may include photolithography tools or photolithography tool clusters. In some embodiments, the active wet scrubbing filtration system may be useful in cleaning and recycling air or other process gasses for use in clean rooms or semiconductor processing tools.

Abstract: A media sample holder includes a base and a plurality of retention assemblies including retaining tabs and opposing flexible release lever arms, configured to allow attachment of the base to an attachment adapter. The media sample holder can attach a media sample on or near a filter. The media sample holder held in the media sample holder can have a different removal efficiency curve than a removal efficiency curve of the filter. The media sample can be placed at or near the filter for a period of time, them tested to determine the status and/or life of the filter based on the relationship between the remaining life, exposure, or removal efficiency of the filter and the exposure or removal efficiency of the tested media sample.

Abstract: System and method for removing molecular contaminants from an air stream are disclosed. The system includes first, second and third filter. The first filter removes organic contaminants from an air stream passing through the first filter. The second filter is downstream of the first filter, is physically and chemically exchangeable with the first filter and removes organic contaminants from the air stream output of the first filter. The third filter, downstream of the second filter, is not exchangeable with the first filter or the second filter. The first position filter can be replaced by the second filter in the second position when the first filter in the first position becomes depleted as detected. A new filter in the second filter position is inserted. Replacing the depleted first filter with the second downstream filter reduces costs and waste while inserting the new filter in the second position ensures removing organic contaminants.

Abstract: System and method for removing molecular contaminants from an air stream are disclosed. The system includes first, second and third filter. The first filter removes organic contaminants from an air stream passing through the first filter. The second filter is downstream of the first filter, is physically and chemically exchangeable with the first filter and removes organic contaminants from the air stream output of the first filter. The third filter, downstream of the second filter, is not exchangeable with the first filter or the second filter. The first position filter can be replaced by the second filter in the second position when the first filter in the first position becomes depleted as detected. A new filter in the second filter position is inserted. Replacing the depleted first filter with the second downstream filter reduces costs and waste while inserting the new filter in the second position ensures removing organic contaminants.

Abstract: An active wet scrubbing filtration system for decontamination of a gas stream comprises components including one or more of: a) a vortexing apparatus which induces a contaminant-bearing gas into a helical flow; b) an initial scrubbing fluid spray section configured so as to project a spray of scrubbing fluid into the contaminant-bearing gas stream; c) an absorption structure; d) a condenser; and e) first and second scrubbing fluid decontamination systems that may be engaged or disengaged independently of each other. In some embodiments, the worksite comprises a clean room or one or more a semiconductor processing tools, which may include photolithography tools or photolithography tool clusters. In some embodiments, the active wet scrubbing filtration system may be useful in cleaning and recycling air or other process gasses for use in clean rooms or semiconductor processing tools.

Abstract: Described herein are liquid-free traps for trace levels of an acidic or basic airborne molecular contaminant in a gas. In one version of the invention described herein, the liquid-free trap comprises a housing, comprising an inlet and an outlet; a flow path between the inlet and the outlet; and a rigid sintered hydrophilic material situated in the flow path between the inlet and the outlet and sealed in the housing. The rigid sintered hydrophilic material is functionalized with from about 0.05 molar milliequivalents to about 10 molar milliequivalents of a basic species for trapping an acidic airborne molecular contaminant in the gas or from about 0.05 molar milliequivalents to about 10 molar milliequivalents of an acidic species for trapping a basic airborne molecular contaminant in the gas. Methods of using the liquid-free traps to detect or measure trace levels of an acidic or basic airborne molecular contaminant are also described.

Abstract: System and method for removing molecular contaminants from an air stream are disclosed. The system includes first, second and third filter. The first filter removes organic contaminants from an air stream passing through the first filter. The second filter is downstream of the first filter, is physically and chemically exchangeable with the first filter and removes organic contaminants from the air stream output of the first filter. The third filter, downstream of the second filter, is not exchangeable with the first filter or the second filter. The first position filter can be replaced by the second filter in the second position when the first filter in the first position becomes depleted as detected. A new filter in the second filter position is inserted. Replacing the depleted first filter with the second downstream filter reduces costs and waste while inserting the new filter in the second position ensures removing organic contaminants.

Abstract: Described herein are liquid-free traps for trace levels of an acidic or basic airborne molecular contaminant in a gas. In one version of the invention described herein, the liquid-free trap comprises a housing, comprising an inlet and an outlet; a flow path between the inlet and the outlet; and a rigid sintered hydrophilic material situated in the flow path between the inlet and the outlet and sealed in the housing. The rigid sintered hydrophilic material is functionalized with from about 0.05 molar milliequivalents to about 10 molar milliequivalents of a basic species for trapping an acidic airborne molecular contaminant in the gas or from about 0.05 molar milliequivalents to about 10 molar milliequivalents of an acidic species for trapping a basic airborne molecular contaminant in the gas. Methods of using the liquid-free traps to detect or measure trace levels of an acidic or basic airborne molecular contaminant are also described.

Abstract: A low out-gassing polyurethane is described for use in applications where contaminants must be kept to very low levels, such as during lithography. In particular, the polyurethane is essentially free of silicon-containing species, which present particular contamination problems in the context of electronic device manufacturing. The polyurethane may be utilized as a potting material in filter assemblies, or in other contexts within the environment of electronics manufacturing. Testing of the novel polyurethane formulation shows the off-gassing characteristics to be much lower than commercially available potting materials made from polyethylene.