Patents by Inventor John N. Gregg
John N. Gregg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240084452Abstract: A tray for a vaporization vessel that includes a tray having a side wall, a bottom plate, one or more apertures that extend through the bottom plate, and a duct that extends through and from the bottom plate. The tray configured to support a solid reagent to be vaporized. A method of assembling the tray that includes forming a first tray that has the side wall and the bottom plate. A vaporization vessel that includes one or more of the trays.Type: ApplicationFiled: October 13, 2023Publication date: March 14, 2024Inventors: Bryan C. HENDRIX, Scott L. Battle, David J. Eldridge, John N. Gregg, Jacob Thomas, Manuel F. Gonzales, Kenney R. Jordan, Benjamin H. Olson
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Patent number: 11821087Abstract: A tray for a vaporization vessel that includes a tray having a side wall, a bottom plate, one or more apertures that extend through the bottom plate, and a duct that extends through and from the bottom plate. The tray configured to support a solid reagent to be vaporized. A method of assembling the tray that includes forming a first tray that has the side wall and the bottom plate. A vaporization vessel that includes one or more of the trays.Type: GrantFiled: April 23, 2020Date of Patent: November 21, 2023Assignee: ENTEGRIS, INC.Inventors: Bryan C. Hendrix, Scott L Battle, David J. Eldridge, John N. Gregg, Jacob Thomas, Manuel F. Gonzales, Kenney R. Jordan, Benjamin H. Olson
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Publication number: 20230130079Abstract: A system includes a vaporizer vessel. The vaporizer vessel includes an outlet fluidly connected to the vaporizer vessel. A heater is configured to heat the vaporizer vessel. A valve is configured to regulate a pressure of a vaporized material at the outlet. In response to the pressure at the outlet being outside a set pressure range, the heater is configured to increase or decrease heat to the vaporizer vessel.Type: ApplicationFiled: October 24, 2022Publication date: April 27, 2023Inventors: Scott L. Battle, John N. Gregg, Donn K. Naito, Bryan Hendrix
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Publication number: 20230112884Abstract: A modular tray for an ampoule of a delivery system of solid precursor materials used in Atomic Layer Deposition (ALD) processes, Chemical Vapor Deposition (CVD) processes or both. The modular tray is configured with separate components which can enhance the ease of which the modular tray can be inserted into the ampoule, and the tray is configured to make improved contact with inner wall surfaces of the ampoule to provide improved heat transfer from the inner wall to the modular tray and ultimately to the solid precursor materials disposed on the modular tray.Type: ApplicationFiled: October 6, 2022Publication date: April 13, 2023Inventors: Scott L. Battle, Jacob Thomas, Benjamin H. Olson, John N. Gregg
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Publication number: 20230115177Abstract: A tray for an ampoule of a delivery system of solid precursor materials used in Atomic Layer Deposition (ALD) processes, Chemical Vapor Deposition (CVD) processes or both. The tray is configured to be able to have a reduced profile size when compressed to enhance the ease of which the tray can be inserted into the ampoule, and the tray is configured to expand in size to make improved contact with inner wall surfaces of the ampoule to provide improved heat transfer from the inner wall to the tray and ultimately to the solid precursor materials disposed on the tray.Type: ApplicationFiled: October 6, 2022Publication date: April 13, 2023Inventors: Scott L. Battle, Donn K. Naito, John N. Gregg, Jacob Thomas, Chase Parker, James Schindler, Bryan C. Hendrix, Benjamin H. Olson
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Publication number: 20210123134Abstract: A solids delivery ampule includes an ampule body defining an interior space. The interior space contains one or more solids support, and each solids support configured to support a quantity of a sublimation solid. The solids delivery ampule also includes a vapor outlet ports, one or more level sensor ports, and one or more level sensors. Each of the one or more level sensors extending through the one or more level sensor port into the interior space. Each of the one or more level sensors measures the quantity of the sublimation solid in each solids support.Type: ApplicationFiled: November 13, 2019Publication date: April 29, 2021Inventors: John N. GREGG, Scott L. BATTLE, Donn NAITO
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Patent number: 10895010Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.Type: GrantFiled: October 25, 2016Date of Patent: January 19, 2021Assignee: ENTEGRIS, INC.Inventors: John M. Cleary, Jose I. Arno, Bryan C. Hendrix, Donn Naito, Scott Battle, John N. Gregg, Michael J. Wodjenski, Chongying Xu
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Patent number: 10895347Abstract: The invention is directed to a vaporizer or ampoule assembly with improved heat transfer between a vaporizer vessel body and at least one support tray located therein. In particular, there is provided a heat transfer enhancing member that is disposed between a vessel body and support tray. In one example of a heat transfer enhancing member or assembly there is included a heat conductive mesh or liner around totally or partially around the support tray that is wedged in between the support tray and the interior diameter or wall of the vessel body. In a related embodiment, the heat transfer enhancing member includes an expandable support tray sidewall to increase physical contact between the support tray and the vessel body interior wall.Type: GrantFiled: October 17, 2018Date of Patent: January 19, 2021Assignee: ENTEGRIS, INC.Inventors: Bryan C. Hendrix, Scott L. Battle, John N. Gregg
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Publication number: 20200340110Abstract: A tray for a vaporization vessel that includes a tray having a side wall, a bottom plate, one or more apertures that extend through the bottom plate, and a duct that extends through and from the bottom plate. The tray configured to support a solid reagent to be vaporized. A method of assembling the tray that includes forming a first tray that has the side wall and the bottom plate. A vaporization vessel that includes one or more of the trays.Type: ApplicationFiled: April 23, 2020Publication date: October 29, 2020Inventors: Bryan C. HENDRIX, Scott L. BATTLE, David J. ELDRIDGE, John N. GREGG, Jacob THOMAS, Manuel F. GONZALES, Kenney R. JORDAN, Benjamin H. OLSON
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Patent number: 10465286Abstract: Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may include an ampoule having a removable top. Multiple containers defining multiple material support surfaces may be stacked disposed within a vessel in thermal communication with the vessel. A tube may be disposed within the vessel and coupled to a gas inlet. Filters, flow meters, and level sensors may be further provided. Product gas resulting from contact of introduced gas with vaporized material may be delivered to atomic layer deposition (ALD) or similar process equipment. At least a portion of source material including a solid may be dissolved in a solvent, followed by removal of solvent to yield source material (e.g., a metal complex) disposed within the vaporizer.Type: GrantFiled: October 17, 2016Date of Patent: November 5, 2019Assignee: ENTEGRIS, INC.Inventors: John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito, Ravi K. Laxman
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Patent number: 10385452Abstract: Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel having one or more interior walls enclosing an interior volume and a plurality of reagent support trays configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between adjacent reagent support trays in the stack of reagent support trays to cause the flow of gas to interact with the source reagent material in a particular reagent support tray before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.Type: GrantFiled: May 31, 2013Date of Patent: August 20, 2019Assignee: ENTEGRIS, INC.Inventors: Bryan C. Hendrix, John N. Gregg, Scott L. Battle, Donn K. Naito, Kyle Bartosh, John M. Cleary, Sebum Cheon, Jordan Hodges
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Publication number: 20190120433Abstract: The invention is directed to a vaporizer or ampoule assembly with improved heat transfer between a vaporizer vessel body and at least one support tray located therein. In particular, there is provided a heat transfer enhancing member that is disposed between a vessel body and support tray. In one example of a heat transfer enhancing member or assembly there is included a heat conductive mesh or liner around totally or partially around the support tray that is wedged in between the support tray and the interior diameter or wall of the vessel body. In a related embodiment, the heat transfer enhancing member includes an expandable support tray sidewall to increase physical contact between the support tray and the vessel body interior wall.Type: ApplicationFiled: October 17, 2018Publication date: April 25, 2019Inventors: Bryan C. HENDRIX, Scott L. BATTLE, John N. GREGG
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Publication number: 20170037511Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.Type: ApplicationFiled: October 25, 2016Publication date: February 9, 2017Inventors: John M. Cleary, Jose I. Arno, Bryan C. Hendrix, Donn Naito, Scott Battle, John N. Gregg, Michael J. Wodjenski, Chongying Xu
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Publication number: 20170029946Abstract: Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may comprise an ampoule having a removable top. Multiple containers defining multiple material support surfaces may be stacked disposed within a vessel in thermal communication with the vessel. A tube may be disposed within the vessel and coupled to a gas inlet. Filters, flow meters, and level sensors may be further provided. Product gas resulting from contact of introduced gas with vaporized material may be delivered to atomic layer deposition (ALD) or similar process equipment. At least a portion of source material including a solid may be dissolved in a solvent, followed by removal of solvent to yield source material (e.g., a metal complex) disposed within the vaporizer.Type: ApplicationFiled: October 17, 2016Publication date: February 2, 2017Applicant: Entegris, Inc.Inventors: John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito, Ravi K. Laxman
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Patent number: 9469898Abstract: Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may comprise an ampoule having a removable top. Multiple containers defining multiple material support surfaces may be stacked disposed within a vessel in thermal communication with the vessel. A tube may be disposed within the vessel and coupled to a gas inlet. Filters, flow meters, and level sensors may be further provided. Product gas resulting from contact of introduced gas with vaporized material may be delivered to atomic layer deposition (ALD) or similar process equipment. At least a portion of source material including a solid may be dissolved in a solvent, followed by removal of solvent to yield source material (e.g., a metal complex) disposed within the vaporizer.Type: GrantFiled: July 31, 2015Date of Patent: October 18, 2016Assignee: ENTEGRIS, INC.Inventors: John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito, Ravi K. Laxman
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Publication number: 20150337436Abstract: Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may comprise an ampoule having a removable top. Multiple containers defining multiple material support surfaces may be stacked disposed within a vessel in thermal communication with the vessel. A tube may be disposed within the vessel and coupled to a gas inlet. Filters, flow meters, and level sensors may be further provided. Product gas resulting from contact of introduced gas with vaporized material may be delivered to atomic layer deposition (ALD) or similar process equipment. At least a portion of source material including a solid may be dissolved in a solvent, followed by removal of solvent to yield source material (e.g., a metal complex) disposed within the vaporizer.Type: ApplicationFiled: July 31, 2015Publication date: November 26, 2015Applicant: Entegris, Inc.Inventors: John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito, Ravi K. Laxman
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Publication number: 20150218696Abstract: Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may comprise an ampoule having a removable top. Multiple containers defining multiple material support surfaces may be stacked disposed within a vessel in thermal communication with the vessel. A tube may be disposed within the vessel and coupled to a gas inlet. Filters, flow meters, and level sensors may be further provided. Product gas resulting from contact of introduced gas with vaporized material may be delivered to atomic layer deposition (ALD) or similar process equipment. At least a portion of source material including a solid may be dissolved in a solvent, followed by removal of solvent to yield source material (e.g., a metal complex) disposed within the vaporizer.Type: ApplicationFiled: April 14, 2015Publication date: August 6, 2015Applicant: Entegris, Inc.Inventors: John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito, Ravi K. Laxman
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Publication number: 20150191819Abstract: Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel having one or more interior walls enclosing an interior volume and a plurality of reagent support trays configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between adjacent reagent support trays in the stack of reagent support trays to cause the flow of gas to interact with the source reagent material in a particular reagent support tray before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.Type: ApplicationFiled: May 31, 2013Publication date: July 9, 2015Inventors: Bryan C. Hendrix, John N. Gregg, Scott L. Battle, Donn K. Naito, Kyle Bartosh, John M. Cleary, Sebum Cheon, Jordan Hodges
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Patent number: 9004462Abstract: Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may comprise an ampoule having a removable top. Multiple containers defining multiple material support surfaces may be stacked disposed within a vessel in thermal communication with the vessel. A tube may be disposed within the vessel and coupled to a gas inlet. Filters, flow meters, and level sensors may be further provided. Product gas resulting from contact of introduced gas with vaporized material may be delivered to atomic layer deposition (ALD) or similar process equipment. At least a portion of source material including a solid may be dissolved in a solvent, followed by removal of solvent to yield source material (e.g., a metal complex) disposed within the vaporizer.Type: GrantFiled: April 13, 2013Date of Patent: April 14, 2015Assignee: Entegris, Inc.Inventors: John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito, Ravi K. Laxman
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Publication number: 20140329025Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.Type: ApplicationFiled: July 19, 2014Publication date: November 6, 2014Inventors: John M. Cleary, Jose I. Arno, Bryan C. Hendrix, Donn Naito, Scott Battle, John N. Gregg, Michael J. Wodjenski, Chongying Xu