Patents by Inventor Kailash Kiran Patalay
Kailash Kiran Patalay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8441640Abstract: A substrate processing system includes an optical measurement assembly coupled to an exterior of a processing chamber that has a portion that is transparent. The processing chamber includes a reference object and a pedestal for supporting a work piece. The optical measurement assembly measures a lateral location, a height and a tilt of the pedestal by transmitting light into the processing chamber through the transparent portion of the processing chamber and detecting a reflected light from both the reference object and the portion of the pedestal after the reflected light leaves the chamber through the transparent portion of the processing chamber. A method of adjusting a pedestal includes analyzing the reflected light and leveling the pedestal, translating the pedestal, calibrating the pedestal height to a preheat ring level, and checking the level and location of the pedestal in response to the analyzed reflected light.Type: GrantFiled: September 26, 2008Date of Patent: May 14, 2013Assignee: Applied Materials, Inc.Inventors: Kailash Kiran Patalay, Richard O. Collins, Jean R. Vatus, Zhepeng Cong
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Patent number: 8398777Abstract: A pedestal positioning assembly system for use in a substrate processing system includes a pedestal rigidly attached to a pedestal shaft, a reference rigidly attached to the substrate processing system, a lateral adjustment assembly to adjust a lateral location of the pedestal relative to the reference, and a vertical adjustment assembly to adjust a tilt of the pedestal relative to the reference. The lateral adjustment assembly and the vertical adjustment assembly are external to a processing chamber and are coupled to the pedestal disposed within the processing chamber through the pedestal shaft. The reference can be a ring and the lateral adjustment assembly substantially centers the pedestal within the ring. A method of adjusting a pedestal includes leveling the pedestal, translating the pedestal, calibrating the pedestal height to a preheat ring level, and checking the level and location of the pedestal while rotating the pedestal.Type: GrantFiled: September 26, 2008Date of Patent: March 19, 2013Assignee: Applied Materials, Inc.Inventors: Richard O. Collins, Kailash Kiran Patalay, Jean R. Vatus, Zhepeng Cong
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Publication number: 20120201267Abstract: Embodiments of the present invention generally relate to methods and apparatus for measuring, calibrating, and controlling substrate temperature during low temperature and high temperature processing.Type: ApplicationFiled: July 25, 2011Publication date: August 9, 2012Applicant: APPLIED MATERIALS, INC.Inventor: KAILASH Kiran PATALAY
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Patent number: 8147137Abstract: A substrate processing system includes a processing chamber, a pedestal for supporting a substrate disposed within the processing chamber, and an optical pyrometry assembly coupled to the processing chamber to measure an emitted light originating substantially from a portion of the pedestal or substrate. The optical pyrometry assembly further includes a light receiver, and an optical detector. The optical pyrometry assembly receives a portion of the emitted light, and a temperature of the substrate is determined from an intensity of the portion of the emitted light near at least one wavelength.Type: GrantFiled: November 19, 2008Date of Patent: April 3, 2012Assignee: Applied Materials, Inc.Inventors: Kailash Kiran Patalay, Aaron Muir Hunter, Bruce E. Adams
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Publication number: 20110259432Abstract: A method and apparatus for delivering precursor materials to a processing chamber is provided. In one embodiment, a deposition apparatus is provided. The apparatus includes a chamber having a longitudinal axis, and a gas distribution assembly coupled to a sidewall of the chamber. The gas distribution assembly comprises a plurality of plenums coupled to one or more gas sources, an energy source positioned to provide energy to each of the plurality of plenums, and a variable power source coupled to the energy source, wherein the gas distribution assembly provides a flow path through the chamber that is normal to the longitudinal axis of the chamber.Type: ApplicationFiled: July 1, 2011Publication date: October 27, 2011Inventors: DAVID KEITH CARLSON, SATHEESH KUPPURAO, HOWARD BECKFORD, HERMAN DINIZ, KAILASH KIRAN PATALAY, BRIAN HAYES BURROWS, JEFFREY RONALD CAMPBELL, ZOUMING ZHU, XIAOWEI LI, ERROL ANTONIO SANCHEZ
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Patent number: 7976634Abstract: A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.Type: GrantFiled: November 8, 2007Date of Patent: July 12, 2011Assignee: Applied Materials, Inc.Inventors: David Keith Carlson, Satheesh Kuppurao, Howard Beckford, Herman Diniz, Kailash Kiran Patalay, Brian Hayes Burrows, Jeffrey Ronald Campbell, Zouming Zhu, Xiaowei Li, Errol Antonio Sanchez
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Patent number: 7964038Abstract: Methods and apparatus for providing an improved azimuthal thermal uniformity of a substrate are provided herein. In some embodiments, a substrate support for use in a semiconductor process chamber includes a susceptor plate; and a supporting member to support a backside of the susceptor plate proximate an outer edge thereof, wherein the supporting member substantially covers the backside of the susceptor plate. In some embodiments, the substrate support is disposed in a process chamber having at least some lamps disposed below the supporting member and utilized for heating the back side of the susceptor plate.Type: GrantFiled: October 2, 2008Date of Patent: June 21, 2011Assignee: Applied Materials, Inc.Inventors: Kailash Kiran Patalay, Jean R. Vatus, Dean Berlin
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Publication number: 20100124248Abstract: A substrate processing system includes a processing chamber, a pedestal for supporting a substrate disposed within the processing chamber, and an optical pyrometry assembly coupled to the processing chamber to measure an emitted light originating substantially from a portion of the pedestal or substrate. The optical pyrometry assembly further includes a light receiver, and an optical detector. The optical pyrometry assembly receives a portion of the emitted light, and a temperature of the substrate is determined from an intensity of the portion of the emitted light near at least one wavelength.Type: ApplicationFiled: November 19, 2008Publication date: May 20, 2010Applicant: Applied Materials, Inc.Inventors: KAILASH KIRAN PATALAY, Aaron Muir Hunter, Bruce E. Adams
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Publication number: 20100120259Abstract: Methods and apparatus for controlling temperature and flow characteristics of process gases in a process chamber have been provided herein. In some embodiments, an apparatus for controlling temperature and flow characteristics of a process gas in a process chamber may include a gas pre-heat ring configured to be disposed about a substrate and having a labyrinthine conduit disposed therein, wherein the labyrinthine conduit has an inlet and outlet to facilitate the flow of the process gas therethrough.Type: ApplicationFiled: November 13, 2008Publication date: May 13, 2010Applicant: APPLIED MATERIALS, INC.Inventors: JEAN R. VATUS, Kailash Kiran Patalay
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Publication number: 20100086784Abstract: Methods and apparatus for providing an improved azimuthal thermal uniformity of a substrate are provided herein. In some embodiments, a substrate support for use in a semiconductor process chamber includes a susceptor plate; and a supporting member to support a backside of the susceptor plate proximate an outer edge thereof, wherein the supporting member substantially covers the backside of the susceptor plate. In some embodiments, the substrate support is disposed in a process chamber having at least some lamps disposed below the supporting member and utilized for heating the back side of the susceptor plate.Type: ApplicationFiled: October 2, 2008Publication date: April 8, 2010Applicant: APPLIED MATERIALS, INC.Inventors: KAILASH KIRAN PATALAY, Jean R. Vatus, Dean Berlin
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Publication number: 20100075488Abstract: An apparatus for processing a substrate, comprising a processing chamber and a substrate support and lift pin assembly disposed within the chamber. The substrate support and lift pin assembly are coupled to a lift mechanism that controls positioning of the substrate support and the lift pins and provides rotation for the substrate support. The lift mechanism includes at least one sensor capable of generating a signal when clearance between the substrate support and the lift pins allows rotation of the substrate support to begin. The substrate support capable of concurrent axial motion and rotation may be used in a processing chamber comprising multiple processing zones separated by edge rings. Substrates may be subjected to successive or cyclical processes by moving between the multiple processing zones.Type: ApplicationFiled: September 15, 2009Publication date: March 25, 2010Applicant: APPLIED MATERIALS, INC.Inventors: Richard O. Collins, Nyi O. Myo, Kevin J. Bautista, John S. Webb, Errol C. Sanchez, Yi-Chiau Huang, Kailash Kiran Patalay, Zhi Yuan Zhou, Wilson Yu
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Publication number: 20090276097Abstract: A substrate processing system includes an optical measurement assembly coupled to an exterior of a processing chamber that has a portion that is transparent. The processing chamber includes a reference object and a pedestal for supporting a work piece. The optical measurement assembly measures a lateral location, a height and a tilt of the pedestal by transmitting light into the processing chamber through the transparent portion of the processing chamber and detecting a reflected light from both the reference object and the portion of the pedestal after the reflected light leaves the chamber through the transparent portion of the processing chamber. A method of adjusting a pedestal includes analyzing the reflected light and leveling the pedestal, translating the pedestal, calibrating the pedestal height to a preheat ring level, and checking the level and location of the pedestal in response to the analyzed reflected light.Type: ApplicationFiled: September 26, 2008Publication date: November 5, 2009Applicant: Applied Materials, Inc.Inventors: Kailash Kiran Patalay, Richard O. Collins, Jean R. Vatus, Zhepeng Cong
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Publication number: 20090272719Abstract: A pedestal positioning assembly system for use in a substrate processing system includes a pedestal rigidly attached to a pedestal shaft, a reference rigidly attached to the substrate processing system, a lateral adjustment assembly to adjust a lateral location of the pedestal relative to the reference, and a vertical adjustment assembly to adjust a tilt of the pedestal relative to the reference. The lateral adjustment assembly and the vertical adjustment assembly are external to a processing chamber and are coupled to the pedestal disposed within the processing chamber through the pedestal shaft. The reference can be a ring and the lateral adjustment assembly substantially centers the pedestal within the ring. A method of adjusting a pedestal includes leveling the pedestal, translating the pedestal, calibrating the pedestal height to a preheat ring level, and checking the level and location of the pedestal while rotating the pedestal.Type: ApplicationFiled: September 26, 2008Publication date: November 5, 2009Applicant: Applied Materials, Inc.Inventors: Richard O. Collins, Kailash Kiran Patalay, Jean R. Vatus, Zhepeng Cong
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Publication number: 20080210163Abstract: A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.Type: ApplicationFiled: November 8, 2007Publication date: September 4, 2008Inventors: David Keith Carlson, Satheesh Kuppurao, Howard Beckford, Herman Diniz, Kailash Kiran Patalay, Brian Hayes Burrows, Jeffrey Ronald Campbell, Zouming Zhu, Xiaowei Li, Errol Antonio Sanchez
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Publication number: 20080066684Abstract: Methods and apparatus for reducing autodoping and backside defects on a substrate during epitaxial deposition processes are provided herein. In some embodiments, an apparatus for reducing autodoping and backside defects on a substrate includes a substrate support ring having a substrate holder structure configured to support the substrate in a position for processing along an edge defined by the backside of the substrate and a sidewall of the substrate or along a plurality of discrete points on or proximate to the edge; and a spacer ring for positioning the substrate support ring above a susceptor plate to define a substrate gap region between the susceptor plate and the backside of the substrate, the spacer ring comprising a plurality of openings formed therethrough that facilitate passage of a gas into and out of the substrate gap region.Type: ApplicationFiled: October 5, 2007Publication date: March 20, 2008Applicant: APPLIED MATERIALS, INC.Inventors: KAILASH KIRAN PATALAY, Craig Metzner, Jean Vatus