Patents by Inventor Kamal Hadidi

Kamal Hadidi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9206085
    Abstract: A method for processing feed material to produce dense and spheroidal products is described. The feed material is comprised of powder particles from the spray-drying technique or solution precursor droplets from ceramic or metallic materials. The feed material is processed using plasma generated from a microwave. The microwave plasma torch employed is capable of generating laminar flow during processing which allows for the production of spheroidal particles with a homogenous materials distribution. This results in products having improved thermal properties, improved corrosion and wear resistance and a higher tolerance to interface stresses.
    Type: Grant
    Filed: May 19, 2014
    Date of Patent: December 8, 2015
    Assignee: AMASTAN TECHNOLOGIES LLC
    Inventors: Kamal Hadidi, Makhlouf Redjdal
  • Patent number: 9196463
    Abstract: A plasma detector system may include a high frequency generator arranged to send incident electromagnetic radiation through a plasma chamber of a plasma system; and a high frequency detection system arranged to detect signal intensity of high frequency radiation sent from the high frequency generator and transmitted through the plasma chamber.
    Type: Grant
    Filed: April 7, 2011
    Date of Patent: November 24, 2015
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventor: Kamal Hadidi
  • Patent number: 9123509
    Abstract: Techniques for plasma processing a substrate are disclosed. In one particular exemplary embodiment, the technique may be realized with a method comprising introducing a feed gas proximate to a plasma source, where the feed gas may comprise a first and second species, where the first and second species have different ionization energies; providing a multi-level RF power waveform to the plasma source, where the multi-level RF power waveform has at least a first power level during a first pulse duration and a second power level during a second pulse duration, where the second power level may be different from the first power level; ionizing the first species of the feed gas during the first pulse duration; ionizing the second species during the second pulse duration; and providing a bias to the substrate during the first pulse duration.
    Type: Grant
    Filed: June 9, 2011
    Date of Patent: September 1, 2015
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: George D. Papasouliotis, Kamal Hadidi, Helen L. Maynard, Ludovic Godet, Vikram Singh, Timothy J. Miller, Bernard Lindsay
  • Publication number: 20150231701
    Abstract: A method for processing feed material to produce dense and spheroidal products is described. The feed material is comprised of powder particles from the spray-drying technique or solution precursor droplets from ceramic or metallic materials. The feed material is processed using plasma generated from a microwave. The microwave plasma torch employed is capable of generating laminar flow during processing which allows for the production of spheroidal particles with a homogenous materials distribution. This results in products having improved thermal properties, improved corrosion and wear resistance and a higher tolerance to interface stresses.
    Type: Application
    Filed: April 30, 2015
    Publication date: August 20, 2015
    Inventors: Kamal Hadidi, Makhlouf Redjdal
  • Publication number: 20150126355
    Abstract: Feed material comprising uniform solution precursor droplets is processed in a uniform melt state using microwave generated plasma. The plasma torch employed is capable of generating laminar gas flows and providing a uniform temperature profile within the plasma. Plasma exhaust products are quenched at high rates to yield amorphous products. Products of this process include spherical, highly porous and amorphous oxide ceramic particles such as magnesia-yttria (MgO—Y2O3). The present invention can also be used to produce amorphous non oxide ceramic particles comprised of Boron, Carbon, and Nitrogen which can be subsequently consolidated into super hard materials.
    Type: Application
    Filed: January 15, 2015
    Publication date: May 7, 2015
    Applicant: AMASTAN TECHNOLOGIES LLC
    Inventors: Kamal Hadidi, Makhlouf Redjdal
  • Patent number: 9023259
    Abstract: A method for processing feed material to produce dense and spheroidal products is described. The feed material is comprised of powder particles from the spray-drying technique or solution precursor droplets from ceramic or metallic materials. The feed material is processed using plasma generated from a microwave. The microwave plasma torch employed is capable of generating laminar flow during processing which allows for the production of spheroidal particles with a homogenous materials distribution. This results in products having improved thermal properties, improved corrosion and wear resistance and a higher tolerance to interface stresses.
    Type: Grant
    Filed: November 13, 2012
    Date of Patent: May 5, 2015
    Assignee: Amastan Technologies LLC
    Inventors: Kamal Hadidi, Makhlouf Redjdal
  • Patent number: 8951496
    Abstract: Feed material comprising uniform solution precursor droplets is processed in a uniform melt state using microwave generated plasma. The plasma torch employed is capable of generating laminar gas flows and providing a uniform temperature profile within the plasma. Plasma exhaust products are quenched at high rates to yield amorphous products. Products of this process include spherical, highly porous and amorphous oxide ceramic particles such as magnesia-yttria (MgO—Y2O3). The present invention can also be used to produce amorphous non oxide ceramic particles comprised of Boron, Carbon, and Nitrogen which can be subsequently consolidated into super hard materials.
    Type: Grant
    Filed: December 4, 2012
    Date of Patent: February 10, 2015
    Assignee: Amastan Technologies LLC
    Inventors: Kamal Hadidi, Makhlouf Redjdal
  • Publication number: 20140342093
    Abstract: A method for processing feed material to produce dense and spheroidal products is described. The feed material is comprised of powder particles from the spray-drying technique or solution precursor droplets from ceramic or metallic materials. The feed material is processed using plasma generated from a microwave. The microwave plasma torch employed is capable of generating laminar flow during processing which allows for the production of spheroidal particles with a homogenous materials distribution. This results in products having improved thermal properties, improved corrosion and wear resistance and a higher tolerance to interface stresses.
    Type: Application
    Filed: May 19, 2014
    Publication date: November 20, 2014
    Applicant: Amastan LLC
    Inventors: Kamal Hadidi, Makhlouf Redjdal
  • Publication number: 20140287162
    Abstract: A microwave plasma apparatus for processing a material includes a plasma chamber, a microwave radiation source, and a waveguide guiding microwave radiation from the microwave radiation source to the plasma chamber. A process gas flows through the plasma chamber and the microwave radiation couples to the process gas to produce a plasma jet. A process material is introduced to the plasma chamber, becomes entrained in the plasma jet, and is thereby transformed to a stream of product material droplets or particles. The product material droplets or particles are substantially more uniform in size, velocity, temperature, and melt state than are droplets or particles produced by prior devices.
    Type: Application
    Filed: June 6, 2014
    Publication date: September 25, 2014
    Inventors: Eric Jordan, Baki Cetegen, Kamal Hadidi, Paul P. Woskov
  • Publication number: 20140217630
    Abstract: Disclosed herein is a method to produce multiphase composite materials directly from solution precursor droplets by a fast pyrolysis process using a microwave plasma embodiment containing a microwave generating source, a dielectric plasma torch, and a droplet maker. Here, using homogenous solution precursors, droplets are generated with a narrow size distribution, and are injected and introduced into the microwave plasma torch with generally uniform thermal path. The generally uniform thermal path in the torch is achieved by axial injection of droplets into an axisymmetric hot zone with laminar flows. Upon exposing to high temperature within the plasma with controlled residence time, the droplets are pyrolyzed and converted into particles by quenching with a controlled rate of the exhaust gas in a gas chamber. The particles generated have generally uniform sizes and uniform thermal history, and can be used for a variety of applications.
    Type: Application
    Filed: March 13, 2014
    Publication date: August 7, 2014
    Applicant: AMASTAN LLC
    Inventors: Makhlouf Redjdal, Kamal Hadidi
  • Patent number: 8748785
    Abstract: A microwave plasma apparatus for processing a material includes a plasma chamber, a microwave radiation source, and a waveguide guiding microwave radiation from the microwave radiation source to the plasma chamber. A process gas flows through the plasma chamber and the microwave radiation couples to the process gas to produce a plasma jet. A process material is introduced to the plasma chamber, becomes entrained in the plasma jet, and is thereby transformed to a stream of product material droplets or particles. The product material droplets or particles are substantially more uniform in size, velocity, temperature, and melt state than are droplets or particles produced by prior devices.
    Type: Grant
    Filed: January 17, 2008
    Date of Patent: June 10, 2014
    Assignees: Amastan LLC, University of Connecticut
    Inventors: Eric Jordan, Baki M. Cetegen, Kamal Hadidi, Paul Woskov
  • Publication number: 20140155249
    Abstract: Feed material comprising uniform solution precursor droplets is processed in a uniform melt state using microwave generated plasma. The plasma torch employed is capable of generating laminar gas flows and providing a uniform temperature profile within the plasma. Plasma exhaust products are quenched at high rates to yield amorphous products. Products of this process include spherical, highly porous and amorphous oxide ceramic particles such as magnesia-yttria (MgO—Y2O3). The present invention can also be used to produce amorphous non oxide ceramic particles comprised of Boron, Carbon, and Nitrogen which can be subsequently consolidated into super hard materials.
    Type: Application
    Filed: December 4, 2012
    Publication date: June 5, 2014
    Inventors: Kamal HADIDI, Makhlouf REDJDAL
  • Publication number: 20140131906
    Abstract: A method for processing feed material to produce dense and spheroidal products is described. The feed material is comprised of powder particles from the spray-drying technique or solution precursor droplets from ceramic or metallic materials. The feed material is processed using plasma generated from a microwave. The microwave plasma torch employed is capable of generating laminar flow during processing which allows for the production of spheroidal particles with a homogenous materials distribution. This results in products having improved thermal properties, improved corrosion and wear resistance and a higher tolerance to interface stresses.
    Type: Application
    Filed: November 13, 2012
    Publication date: May 15, 2014
    Inventors: Kamal Hadidi, Makhlouf Redjdal
  • Patent number: 8692468
    Abstract: A RF source and method are disclosed which inductively create a plasma within an enclosure without an electric field or with a significantly decreased creation of an electric field. A ferrite material with an insulated wire wrapped around its body is used to efficiently channel the magnetic field through the legs of the ferrite. This magnetic field, which flows between the legs of the ferrite can then be used to create and maintain a plasma. In one embodiment, these legs rest on a dielectric window, such that the magnetic field passes into the chamber. In another embodiment, the legs of the ferrite extend into the processing chamber, thereby further extending the magnetic field into the chamber. This ferrite can be used in conjunction with a PLAD chamber, or an ion source for a traditional beam line ion implantation system.
    Type: Grant
    Filed: October 3, 2011
    Date of Patent: April 8, 2014
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Kamal Hadidi, Rajesh Dorai
  • Publication number: 20140091155
    Abstract: There is disclosed a piezoelectric droplet maker that is driven at high frequency and energized with high power and high frequency Operational Amplifier (OP-AMP) electronics. The droplet maker implements a method of producing jets of uniform droplets of solution precursors (or any other homogeneous liquids). The formation of droplets results from stream break up due to the disturbance of liquid jets by the piezo actuator as they leave an orifice. This disturbance can be electronically tuned to produce uniform droplets with high repeatability. In another aspect, the droplet maker can be used to inject axially uniform diameter solution precursor droplets into process gas flow of a microwave plasma apparatus.
    Type: Application
    Filed: September 28, 2012
    Publication date: April 3, 2014
    Applicants: AMASTAN LLC, UNIVERSITY OF CONNECTICUT
    Inventors: Eric JORDAN, Makhlouf RADJDAL, Kamal HADIDI
  • Patent number: 8664561
    Abstract: A method is disclosed for adjusting the composition of plasmas used in plasma doping, plasma deposition and plasma etching techniques. The disclosed method enables the plasma composition to be controlled by modifying the energy distribution of the electrons present in the plasma. Energetic electrons are produced in the plasma by accelerating electrons in the plasma using very fast voltage pulses. The pulses are long enough to influence the electrons, but too fast to affect the ions significantly. Collisions between the energetic electrons and the constituents of the plasma result in changes in the plasma composition. The plasma composition can then be optimized to meet the requirements of the specific process being used. This can entail changing the ratio of ion species in the plasma, changing the ratio of ionization to dissociation, or changing the excited state population of the plasma.
    Type: Grant
    Filed: July 1, 2009
    Date of Patent: March 4, 2014
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Kamal Hadidi, Rajesh Dorai, Bernard G. Lindsay, Vikram Singh, George D. Papasouliotis
  • Patent number: 8592783
    Abstract: An improved plasma processing chamber is disclosed, wherein some or all of the components which are exposed to the plasma are made of, or coated with, titanium diborane. Titanium diborane has a hardness in excess of 9 mhos, making it less susceptible to sputtering. In addition, titanium diborane is resistant to fluoride and chlorine ions. Finally, titanium diborane is electrically conductive, and therefore the plasma remains more uniform over time, as charge does not build on the surfaces of the titanium diborane components. This results in improved workpiece processing, with less contaminants and greater uniformity. In other embodiments, titanium diborane may be used to line components within a beam line implanter.
    Type: Grant
    Filed: September 26, 2011
    Date of Patent: November 26, 2013
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Kamal Hadidi, George D. Papasouliotis, Craig R. Chaney
  • Publication number: 20130270261
    Abstract: A microwave plasma torch providing two laminar flows is described. Two laminar flows are created using a set of at least three concentric, staggered dielectric tubes connected to a pressurized gas source. An inner laminar flow entrains injected particles entering the plasma. An outer laminar flow creates a sheath around the plasma and prevents it from attaching to the walls of the plasma torch. The entry point of the gas source is designed to ensure laminar flow for both the entrainment of the particles and for the shielding of the plasma plume. The uniform processing conditions results in uniform particles and a homogenous materials distribution. This enables a final product with improved thermal properties, improved corrosion and wear resistance and a higher tolerance to interface stresses. The microwave plasma torch can be used for producing nanomaterial powder and for spray coating materials onto various substrates.
    Type: Application
    Filed: April 13, 2012
    Publication date: October 17, 2013
    Inventors: Kamal Hadidi, Makhlouf Redjdal
  • Publication number: 20130082599
    Abstract: A RF source and method are disclosed which inductively create a plasma within an enclosure without an electric field or with a significantly decreased creation of an electric field. A ferrite material with an insulated wire wrapped around its body is used to efficiently channel the magnetic field through the legs of the ferrite. This magnetic field, which flows between the legs of the ferrite can then be used to create and maintain a plasma. In one embodiment, these legs rest on a dielectric window, such that the magnetic field passes into the chamber. In another embodiment, the legs of the ferrite extend into the processing chamber, thereby further extending the magnetic field into the chamber. This ferrite can be used in conjunction with a PLAD chamber, or an ion source for a traditional beam line ion implantation system.
    Type: Application
    Filed: October 3, 2011
    Publication date: April 4, 2013
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Kamal Hadidi, Rajesh Dorai
  • Publication number: 20130075253
    Abstract: An improved plasma processing chamber is disclosed, wherein some or all of the components which are exposed to the plasma are made of, or coated with, titanium diborane. Titanium diborane has a hardness in excess of 9 mhos, making it less susceptible to sputtering. In addition, titanium diborane is resistant to fluoride and chlorine ions. Finally, titanium diborane is electrically conductive, and therefore the plasma remains more uniform over time, as charge does not build on the surfaces of the titanium diborane components. This results in improved workpiece processing, with less contaminants and greater uniformity. In other embodiments, titanium diborane may be used to line components within a beam line implanter.
    Type: Application
    Filed: September 26, 2011
    Publication date: March 28, 2013
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Kamal Hadidi, George D. Papasouliotis, Craig R. Chaney