Abstract: A plasma processing apparatus includes a process chamber, a platen positioned in the process chamber for supporting a workpiece, a source configured to generate a plasma in the process chamber, and a monitoring system including an ion mobility spectrometer configured to monitor a condition of the plasma. A monitoring method including generating a plasma in a process chamber of a plasma processing apparatus, supporting a workpiece on a platen in the process chamber, and monitoring a condition of the plasma with an ion mobility spectrometer is also provided.

Abstract: A plasma detector system may include a high frequency generator arranged to send incident electromagnetic radiation through a plasma chamber of a plasma system; and a high frequency detection system arranged to detect signal intensity of high frequency radiation sent from the high frequency generator and transmitted through the plasma chamber.

Abstract: A plasma processing tool comprises a plasma chamber configured to generate a plasma from a gas introduced into the chamber where the generated plasma has an electron plasma frequency. A plurality of electrodes disposed within the chamber. Each of the electrodes configured to create a rapidly-rising-electric-field pulse in a portion of the plasma contained in the chamber. Each of said rapidly-rising-electric-field pulses having a rise time substantially equal to or less than the inverse of the electron plasma frequency and a duration of less than the inverse of the ion plasma frequency. In this manner, the electron energy distribution in the generated plasma may be spatially and locally modified thereby affecting the density, composition and temperature of the species in the plasma and consequently the uniformity of the density and composition of ions and neutrals directed at a target substrate.

Abstract: Techniques for plasma processing a substrate are disclosed. In one particular exemplary embodiment, the technique may be realized with a method comprising introducing a feed gas proximate to a plasma source, where the feed gas may comprise a first and second species, where the first and second species have different ionization energies; providing a multi-level RF power waveform to the plasma source, where the multi-level RF power waveform has at least a first power level during a first pulse duration and a second power level during a second pulse duration, where the second power level may be different from the first power level; ionizing the first species of the feed gas during the first pulse duration; ionizing the second species during the second pulse duration; and providing a bias to the substrate during the first pulse duration.

Abstract: A method is disclosed for adjusting the composition of plasmas used in plasma doping, plasma deposition and plasma etching techniques. The disclosed method enables the plasma composition to be controlled by modifying the energy distribution of the electrons present in the plasma. Energetic electrons are produced in the plasma by accelerating electrons in the plasma using very fast voltage pulses. The pulses are long enough to influence the electrons, but too fast to affect the ions significantly. Collisions between the energetic electrons and the constituents of the plasma result in changes in the plasma composition. The plasma composition can then be optimized to meet the requirements of the specific process being used. This can entail changing the ratio of ion species in the plasma, changing the ratio of ionization to dissociation, or changing the excited state population of the plasma.

Abstract: A plasma processing apparatus includes a process chamber, a platen positioned in the process chamber for supporting a workpiece, a source configured to generate a plasma in the process chamber, and a monitoring system including an ion mobility spectrometer configured to monitor a condition of the plasma. A monitoring method including generating a plasma in a process chamber of a plasma processing apparatus, supporting a workpiece on a platen in the process chamber, and monitoring a condition of the plasma with an ion mobility spectrometer is also provided.

Abstract: Hybrid plasma monitor. A ground electrode is spaced apart from a high voltage electrode supporting an electric discharge therebetween to generate a plasma. The ground electrode and the high voltage electrode form an annular region into which a sample is introduced for generating a plasma. Microwave radiation couples into the plasma to sustain the plasma. A light detector such as a spectrometer receives light resulting from atomic emissions from the sample to analyze elements in the sample.

Abstract: A microwave plasma apparatus for processing a material includes a plasma chamber, a microwave radiation source, and a waveguide guiding microwave radiation from the microwave radiation source to the plasma chamber. A process gas flows through the plasma chamber and the microwave radiation couples to the process gas to produce a plasma jet. A process material is introduced to the plasma chamber, becomes entrained in the plasma jet, and is thereby transformed to a stream of product material droplets or particles. The product material droplets or particles are substantially more uniform in size, velocity, temperature, and melt state than are droplets or particles produced by prior devices.

Abstract: A method and apparatus for a multistage plasmatron fuel reformer system having a wide dynamic operational range. In one aspect, the system includes a plasmatron configured for low flow operation followed by a reaction extension cylinder and then by a nozzle section capable of providing additional air and/or fuel inputs. The nozzle section is then followed by another reaction extension region. When high flow rate of the system is needed, the low fuel flow rate provided by the plasmatron followed by the first reaction extension region provides the high temperature used to effectively initiate the partial oxidation reaction in the next section. The initiation of this reaction may also be facilitated by the presence of hydrogen.

Abstract: Hybrid plasma monitor. A ground electrode is spaced apart from a high voltage electrode supporting an electric discharge therebetween to generate a plasma. The ground electrode and the high voltage electrode form an annular region into which a sample is introduced for generating a plasma. Microwave radiation couples into the plasma to sustain the plasma. A light detector such as a spectrometer receives light resulting from atomic emissions from the sample to analyze elements in the sample.

Abstract: Ion mobility spectrometer. The spectrometer includes an enclosure for receiving a sample therewithin and an electron beam window admits an electron beam into the enclosure to ionize the sample in an ionization region. A shutter grid is spaced apart from the ionization region and means are provided for sample ion preconcentration upstream of the shutter grid. The ion preconcentration is effective to reduce space charge resulting in a lowered threshold detection level.

Abstract: Ion mobility spectrometer. The spectrometer includes an enclosure for receiving a sample therewithin and an electron beam window admits an electron beam into the enclosure to ionize the sample in an ionization region. A shutter grid is spaced apart from the ionization region and means are provided for sample ion preconcentration upstream of the shutter grid. The ion preconcentration is effective to reduce space charge resulting in a lowered threshold detection level.

Abstract: Pollution control apparatus. An exhaust aftertreatment unit is fitted to the exhaust of an internal combustion engine and a fuel reformer provides hydrogen rich gas in an optimal way to the aftertreatment unit to regenerate the aftertreatment unit. It is preferred that the hydrogen rich gas be provided only to a portion of the aftertreatment unit at any time to regenerate that portion. Stored hydrogen may be used.

Abstract: A method and apparatus for a multistage plasmatron fuel reformer system having a wide dynamic operational range. In one aspect, the system includes a plasmatron configured for low flow operation followed by a reaction extension cylinder and then by a nozzle section capable of providing additional air and/or fuel inputs. The nozzle section is then followed by another reaction extension region. When high flow rate of the system is needed, the low fuel flow rate provided by the plasmatron followed by the first reaction extension region provides the high temperature used to effectively initiate the partial oxidation reaction in the next section. The initiation of this reaction may also be facilitated by the presence of hydrogen.

Abstract: Ion mobility spectrometer. The spectrometer includes an enclosure for receiving a sample therewithin and an electron beam window admits an electron beam into the enclosure to ionize the sample in an ionization region. A shutter grid is spaced apart from the ionization region and means are provided for sample ion preconcentration upstream of the shutter grid. The ion preconcentration is effective to reduce space charge resulting in a lowered threshold detection level.

Abstract: In embodiments, spectroscopic monitor monitors modulated light signals to detect low levels of contaminants and other compounds in the presence of background interference. The monitor uses a spectrometer that includes a transmissive modulator capable of causing different frequency ranges to move onto and off of the detector. The different ranges can include those with the desired signal and those selected to subtract background contributions from those with the desired signal. Embodiments of the system are particularly useful for monitoring metal concentrations in combustion effluent.

Abstract: High power microwave plasma torch. The torch includes a source of microwave energy which is propagated by a waveguide. The waveguide has no structural restrictions between the source of microwave energy and the plasma to effect resonance. The gas flows across the waveguide and microwave energy is coupled into the gas to create a plasma. At least 5 kilowatts of microwave energy is coupled into the gas. It is preferred that the waveguide be a fundamental mode waveguide or a quasi-optical overmoded waveguide. In one embodiment, the plasma torch is used in a furnace for heating a material within the furnace.

Abstract: The apparatus for analyzing a sample gas includes a source of microwave energy directed onto the sample gas to create a plasma. A spectrometer is arranged to receive light from the plasma to identify different elements and/or to determine the concentration of at least one element in the sample gas. In one embodiment, an attached calibration system is provided for calibrating the output of the spectrometer. The calibration system includes a nebulizer apparatus for introducing a controlled amount of at least one element into the sample gas. The apparatus also includes structure adapted to add a swirl component to the plasma gas flow as an aid to plasma confinement. It is also preferred that a pair of electrodes contacting the sample gas be provided for igniting the plasma.