Patents by Inventor Katsumi Murofushi

Katsumi Murofushi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11912824
    Abstract: A fluorine-containing ether compound represented by the following formula (1) is provided. R1—CH2—R2—CH2—R3 (1) (In the formula (1), R1 is an alkoxy group having 1 to 10 carbon atoms, R2 is a perfluoropolyether chain, R3 is —OCH2CH(OH)CH2O(CH2)mOH (in in the formula is an integer of 2 to 4).
    Type: Grant
    Filed: July 10, 2020
    Date of Patent: February 27, 2024
    Assignee: RESONAC CORPORATION
    Inventors: Naoya Fukumoto, Daisuke Yagyu, Tsuyoshi Kato, Katsumi Murofushi
  • Publication number: 20240034951
    Abstract: A fluorine-containing ether compound represented by the following formula (1) is provided. R2—CH2—R1—CH2OCH2CH(OH)—(CH2)n—CH(OH)CH2OCH2—R1—CH2—R2??(1) (in the formula (1), n is an integer of 2 to 6, R1 is a perfluoropolyether chain, R2 is —OCH2CH(OH)CH2O(CH2)mOH (m in the formula is an integer of 2 to 4)).
    Type: Application
    Filed: July 9, 2020
    Publication date: February 1, 2024
    Applicant: Resonac Corporation
    Inventors: Naoya FUKUMOTO, Daisuke YAGYU, Tsuyoshi KATO, Katsumi MUROFUSHI
  • Patent number: 11845906
    Abstract: A fluorine-containing ether compound represented by the following formula (1). C6H6-n—[O—R1—O—CH2—R2—CH2—R3]n??(1) (in the formula (1), n is an integer of 2 or 3, R1 is any one of —CH2CH2—, —CH2CH2CH2— and —CH2CH(OH)CH2—, R2 is a perfluoropolyether chain, R3 is —OCH2CH(OH)CH2O(CH2)mOH (m in the formula is an integer of 2 to 4)).
    Type: Grant
    Filed: September 8, 2020
    Date of Patent: December 19, 2023
    Assignee: RESONAC CORPORATION
    Inventors: Naoya Fukumoto, Daisuke Yagyu, Tsuyoshi Kato, Katsumi Murofushi
  • Patent number: 11820742
    Abstract: There is provided a fluorine-containing ether compound represented by the following formula. R1—R2—CH2—R3—CH2—OCH2CH(OH)CH2O—CH2—R3—CH2—R4—R5 (in the formula. R3 represents a perfluoropolyether chain; R2 and R4 represent a divalent linking group having a polar group; R1 and R5 represent a terminal group bonded to an oxygen atom of R2 or R4; and at least one of R1 and R5 is any one selected from the group consisting of an alkenyl group having 2 to 8 carbon atoms, an alkynyl group having 3 to 8 carbon atoms, an aromatic hydrocarbon-containing group, and an aromatic heterocycle-containing group).
    Type: Grant
    Filed: December 17, 2020
    Date of Patent: November 21, 2023
    Assignee: Resonac Corporation
    Inventors: Naoya Fukumoto, Tsuyoshi Kato, Katsumi Murofushi, Daisuke Yagyu, Shunya Suzuki, Ayano Asano
  • Patent number: 11767483
    Abstract: The fluorine-containing ether compound is represented by the following formula (1): R1—R2—CH2—R3—CH2—R4. In the formula (1), R1 is represented by the following formula (2), R2 is represented by the following formula (3), R3 is a perfluoropolyether chain, and R4 is an organic end group different from R1—R2— and contains two or three polar groups, wherein each polar group is bonded to a different carbon atom, and the carbon atoms to which the polar groups are bonded are bonded to one another via a linking group containing a carbon atom to which the polar group is not bonded. In the formula (2), R5 is an alkoxy group selected from the group consisting of a methoxy, an ethoxy and a propoxy group. In the formula (3), w is 2 or 3.
    Type: Grant
    Filed: August 28, 2019
    Date of Patent: September 26, 2023
    Assignee: Resonac Corporation
    Inventors: Daisuke Yagyu, Naoya Fukumoto, Tsuyoshi Kato, Katsumi Murofushi
  • Publication number: 20230257521
    Abstract: A fluorine-containing ether compound represented by the following formula (1) is provided. (In the formula (1), R1 is an alkoxy group having 1 to 10 carbon atoms, R2 is a perfluoropolyether chain, R3 is —OCH2CH(OH)CH2O(CH2)mOH (m in the formula is an integer of 2 to 4).
    Type: Application
    Filed: July 10, 2020
    Publication date: August 17, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Naoya FUKUMOTO, Daisuke YAGYU, Tsuyoshi KATO, Katsumi MUROFUSHI
  • Patent number: 11661478
    Abstract: A fluorine-containing ether compound of the present invention is represented by the following General Formula (1). (In the General Formula (1), X is a trivalent atom or a trivalent atom group, A is a linking group including at least one polar group, B is a linking group having a perfluoropolyether chain, and D is a polar group or a substituent having a polar group at the end.) [Chem.
    Type: Grant
    Filed: February 6, 2018
    Date of Patent: May 30, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Takuya Minami, Yoshishige Okuno, Yuta Yamaguchi, Ryuuta Miyasaka, Naoya Fukumoto, Hiroko Hattori, Hiroyuki Tomita, Michio Seri, Naoko Ito, Ichiro Ota, Katsumi Murofushi
  • Patent number: 11661408
    Abstract: The fluorine-containing ether compound is represented by the following formula (1): R1—R2—CH2—R3—CH2—R4. In the formula (1), R1 is represented by the following formula (2), R2 is represented by the following formula (3), R3 is a perfluoropolyether chain, and R4 is an organic end group different from R1—R2— and contains two or three polar groups, wherein each polar group is bonded to a different carbon atom, and the carbon atoms to which the polar groups are bonded are bonded to one another via a linking group containing a carbon atom to which the polar group is not bonded. In the formula (2), r is 1 to 3. In the formula (3), w is 2 or 3.
    Type: Grant
    Filed: August 28, 2019
    Date of Patent: May 30, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Daisuke Yagyu, Naoya Fukumoto, Tsuyoshi Kato, Katsumi Murofushi
  • Patent number: 11639330
    Abstract: Provided is a fluorine-containing ether compound that can be suitably used as a material for a lubricant for a magnetic recording medium, capable of forming a lubricant layer having excellent chemical substance resistance and wear resistance even when the thickness is small. A fluorine-containing ether compound represented by the following formula (1): R1—R2—CH2—R3—CH2—R4—R5??(1) In the formula (1), R3 is a perfluoropolyether chain. R2 and R4 are divalent linkage groups having a polar group, and may be the same or different. R1 and R5 are terminal groups bonded to R2 or R4, which may be the same or different, and at least one of R1 and R5 is an organic group having 1 to 8 carbon atoms wherein one or more hydrogen atoms of the organic group is substituted with a cyano group.
    Type: Grant
    Filed: July 30, 2018
    Date of Patent: May 2, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Masaki Nanko, Naoya Fukumoto, Daisuke Yagyu, Yuta Yamaguchi, Tsuyoshi Kato, Hiroyuki Tomita, Katsumi Murofushi, Shohei Nishizawa
  • Publication number: 20230120626
    Abstract: There is provided a fluorine-containing ether compound represented by the following formula. R1—R2—CH2—R3—CH2—OCH2CH(OH)CH2O—CH2—R3—CH2—R4—R5 (in the formula, R3 represents a perfluoropolyether chain; R2 and R4 represent a divalent linking group having a polar group and may be the same or different from each other; R1 and R5 represent a terminal group bonded to an oxygen atom of R2 or R4 and may be the same or different from each other; and at least one of R1 and R5 is an organic group having 1 to 8 carbon atoms and at least one of hydrogens included in the organic group is substituted by a cyano group).
    Type: Application
    Filed: December 16, 2020
    Publication date: April 20, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Naoya FUKUMOTO, Tsuyoshi KATO, Katsumi MUROFUSHI, Daisuke YAGYU, Masaki NANKO, Natsumi SHIBATA
  • Publication number: 20230099918
    Abstract: There is provided a fluorine-containing ether compound represented by the following formula. R1—R2—CH2—R3—CH2—OCH2CH(OH)CH2O—CH2—R3—CH2—R4—R5 (in the formula. R3 represents a perfluoropolyether chain; R2 and R4 represent a divalent linking group having a polar group; R1 and R5 represent a terminal group bonded to an oxygen atom of R2 or R4; and at least one of R1 and R5 is any one selected from the group consisting of an alkenyl group having 2 to 8 carbon atoms, an alkynyl group having 3 to 8 carbon atoms, an aromatic hydrocarbon-containing group, and an aromatic heterocycle-containing group).
    Type: Application
    Filed: December 17, 2020
    Publication date: March 30, 2023
    Applicant: SHOWA DENKO K.K.
    Inventors: Naoya FUKUMOTO, Tsuyoshi KATO, Katsumi MUROFUSHI, Daisuke YAGYU, Shunya SUZUKI, Ayano ASANO
  • Patent number: 11555005
    Abstract: A fluorine-containing ether compound according to the present invention is a fluorine-containing ether compound represented by the following General Formula (1).
    Type: Grant
    Filed: February 8, 2018
    Date of Patent: January 17, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: Naoya Fukumoto, Ryuuta Miyasaka, Hiroyuki Tomita, Michio Seri, Naoko Ito, Katsumi Murofushi
  • Publication number: 20220380695
    Abstract: A fluorine-containing ether compound represented by the following formula (1). C6H6-n—[O—R1—O—CH2—R2—CH2—R3]n??(1) (in the formula (1), n is an integer of 2 or 3, R1 is any one of —CH2CH2—, —CH2CH2CH2— and —CH2CH(OH)CH2—, R2 is a perfluoropolyether chain, R3 is —OCH2CH(OH)CH2O(CH2)mOH (m in the formula is an integer of 2 to 4)).
    Type: Application
    Filed: September 8, 2020
    Publication date: December 1, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Naoya FUKUMOTO, Daisuke YAGYU, Katsumi MUROFUSHI, Katsumi MUROFUSHI
  • Patent number: 11514945
    Abstract: A lubricant for a magnetic recording medium capable of forming a lubricant layer having excellent adhesion to a protective layer is provided. A lubricant for a magnetic recording medium contains a fluorine-containing ether compound in which a group having an ethylenic carbon-carbon double bond is disposed at one or both terminals of a perfluoroalkyl polyether chain. It is preferable that the group having the ethylenic carbon-carbon double bond is disposed at one terminal of the perfluoroalkyl polyether chain, and a hydroxyl group is disposed at other terminal. It is preferable that the lubricant for a magnetic recording medium contains a compound in which one or more functional groups selected from a hydroxyl group, an amino group, an amido group and a carboxyl group is disposed at one or both terminals of a perfluoroalkyl polyether chain.
    Type: Grant
    Filed: February 20, 2018
    Date of Patent: November 29, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Hiroyuki Tomita, Hiroko Hattori, Naoya Fukumoto, Ryuuta Miyasaka, Naoko Ito, Ichiro Ota, Katsumi Murofushi
  • Patent number: 11427779
    Abstract: A fluorine-containing ether compound represented by Formula (1) is provided. R1—R2—CH2—R3—CH2—R4—R5 ??(1) (In Formula (1), R1 and R5 each represents a group having a heterocyclic ring and may be the same as or different from each other, R2 and R4 each represents a divalent linking group having a polar group and play be the same as or different from each other, and R3 represents a perfluoropolyether chain.
    Type: Grant
    Filed: January 5, 2018
    Date of Patent: August 30, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Yuta Yamaguchi, Daisuke Yagyu, Naoya Fukumoto, Shoko Uetake, Tsuyoshi Kato, Hiroyuki Tomita, Ryuuta Miyasaka, Katsumi Murofushi
  • Publication number: 20220259513
    Abstract: A fluorine-containing ether compound represented by the following formula (1) is provided. R2—CH2—R1—CH2OCH2CH(OH)—(CH2)n—CH(OH)CH2OCH2—R1—CH2—R2??(1) (in the formula (1), n is an integer of 2 to 6, R1 is a perfluoropolyether chain, R2 is —OCH2CH(OH)CH2O(CH2)mOH (m in the formula is an integer of 2 to 4)).
    Type: Application
    Filed: July 9, 2020
    Publication date: August 18, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Naoya FUKUMOTO, Daisuke YAGYU, Tsuyoshi KATO, Katsumi MUROFUSHI
  • Patent number: 11332686
    Abstract: A fluorine-containing ether compound represented by formula (1) shown below. R4—CH2—R3—CH2—R2—CH2—R1—CH2—R2—CH2—R3—CH2—R4??(1) (In formula (1), R1 and R3 represent different perfluoropolyether chains, R2 represents a linking group containing one or more polar groups, and R4 represents a terminal group containing two or more polar groups.
    Type: Grant
    Filed: November 24, 2017
    Date of Patent: May 17, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Naoya Fukumoto, Yuta Yamaguchi, Naoko Ito, Katsumi Murofushi
  • Patent number: 11292979
    Abstract: A fluorine-containing ether compound represented by a formula (1) shown below. R4—CH2—R3—CH2—R2—CH2—R1—CH2—R2—CH2—R3—CH2—R5??(1) In formula (1), R1 and R3 represent the same or different perfluoropolyether chains, R2 represents a linking group containing at least one polar group, one or both of R4 and R5 represent a terminal group containing two or more polar groups, and R4 and R5 are different.
    Type: Grant
    Filed: February 20, 2017
    Date of Patent: April 5, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Yuta Yamaguchi, Naoya Fukumoto, Naoko Ito, Hiroyuki Tomita, Ichiro Ota, Katsumi Murofushi
  • Patent number: 11279664
    Abstract: The present invention relates to a fluorine-containing ether compound represented by Formula (1), R1—R2—CH2—R3—CH2—R4??(1). (In Formula (1), R1 is an end group including an organic group having at least one double bond or triple bond, R2 is a divalent linking group bonded to R1 by etheric oxygen, R3 is a perfluoropolyether chain, R4 is an end group having two or three polar groups with each polar group being bonded to different carbon atoms, and the carbon atoms, to which the polar groups are bonded, being bonded to each other via a linking group including carbon atoms to which the polar groups are not bonded.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: March 22, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Daisuke Yagyu, Yuta Yamaguchi, Naoya Fukumoto, Tsuyoshi Kato, Shoko Uetake, Hiroyuki Tomita, Ryuuta Miyasaka, Naoko Ito, Ichiro Ota, Katsumi Murofushi
  • Patent number: 11261394
    Abstract: A fluorine-containing ether compound represented by R1—R2—CH2—R3—CH2—R4—R5 is provided.
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: March 1, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Tsuyoshi Kato, Daisuke Yagyu, Naoya Fukumoto, Masaki Nanko, Masumi Kuritani, Katsumi Murofushi