Patents by Inventor Katsumi Murofushi

Katsumi Murofushi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190180782
    Abstract: A magnetic recording medium includes a substrate, an underlayer provided on the substrate, and a magnetic layer provided on the underlayer and having a L10 structure and a (001) orientation. The magnetic layer has a granular structure in which an organic compound having a methylene skeleton or a methine skeleton is arranged at grain boundaries of magnetic grains.
    Type: Application
    Filed: October 24, 2018
    Publication date: June 13, 2019
    Inventors: Katsumi MUROFUSHI, Yoshitaka ISHIBASHI, Takayuki FUKUSHIMA, Kazuya NIWA, Lei ZHANG, Yuji MURAKAMI, Hisato SHIBATA, Takehiro YAMAGUCHI, Chen XU, Tetsuya KANBE, Tomoo SHIGE
  • Publication number: 20190084911
    Abstract: The present invention relates to a fluorine-containing ether compound represented by Formula (1), R1—R2—CH2—R3—CH2—R4??(1). (In Formula (1), R1 is an end group including an organic group having at least one double bond or triple bond, R2 is a divalent linking group bonded to R1 by etheric oxygen, R3 is a perfluoropolyether chain, R4 is an end group having two or three polar groups with each polar group being bonded to different carbon atoms, and the carbon atoms, to which the polar groups are bonded, being bonded to each other via a linking group including carbon atoms to which the polar groups are not bonded.
    Type: Application
    Filed: January 30, 2017
    Publication date: March 21, 2019
    Applicant: SHOWA DENKO K.K.
    Inventors: Daisuke YAGYU, Yuta YAMAGUCHI, Naoya FUKUMOTO, Tsuyoshi KATO, Shoko UETAKE, Hiroyuki TOMITA, Ryuuta MIYASAKA, Naoko ITO, Ichiro OTA, Katsumi MUROFUSHI
  • Publication number: 20180047419
    Abstract: A fluorine-containing ether compound of the present invention is represented by Formula (1). R1—CH2—R2—CH2—R3??(1) (In Formula (1), R1 is an organic end group having 3 or more carbon atoms which includes two or more polar groups with each polar group being bonded to different carbon atoms and the carbon atoms to which the polar groups are bonded being bonded to each other via a linking group including the carbon atoms which are not bonded to the polar groups, R2 includes a perfluoropolyether chain represented by Formula (3), and R3 is a hydroxyl group or R1) —(CF2)y-1—O—((CF2)yO)z—(CF2)y-1—??(3) (In Formula (3), y represents an integer of 2 to 4, and z represents an integer of 1 to 30).
    Type: Application
    Filed: July 31, 2017
    Publication date: February 15, 2018
    Applicant: SHOWA DENKO K.K.
    Inventors: Naoya FUKUMOTO, Daisuke YAGYU, Yuta YAMAGUCHI, Shoko UETAKE, Tsuyoshi KATO, Hiroyuki TOMITA, Ryuta MIYASAKA, Katsumi MUROFUSHI
  • Publication number: 20180009773
    Abstract: This fluorine-containing ether compound is represented by Formula (1). R1—R2—CH2—R3—CH2—R4—R5??(1) (in Formula (1), R1 is an aryl group or an aralkyl group, R2 is a divalent linking group having 0 or 1 polar group, R3 is a perfluoropolyether chain, R4 is a divalent linking group having 2 or 3 polar groups, and R5 is an aryl group or an aralkyl group.
    Type: Application
    Filed: July 3, 2017
    Publication date: January 11, 2018
    Applicant: SHOWA DENKO K.K.
    Inventors: Shoko UETAKE, Naoya FUKUMOTO, Daisuke YAGYU, Yuta YAMAGUCHI, Naoko ITO, Hiroyuki TOMITA, Ryuta MIYASAKA, Katsumi MUROFUSHI
  • Patent number: 8865801
    Abstract: The present invention relates to epoxy resin coating composition which comprises, at least, epoxy resin, a thiol-type curing agent and a curing assistant, being composed of two liquids of liquid (A) containing epoxy resin and a thiol-type curing agent and liquid (B) containing a curing assistant, which liquids are mixed just before using, wherein the thiol-type curing agent contains a branched compound containing a thiol group (P), which compound is an ester of polyhydric alcohol with thiol group-containing carboxylic acid represented by formula (1) HOCO(CH2)nCR1R2SH??(1) (in the formula, R1 represents a hydrogen atom or a linear or branched alkyl group having 1 to 10 carbon atoms, R2 represents a linear or branched alkyl group having 1 to 10 carbon atoms, and n represents an integer of 1 to 4), which exhibits a suitable pot life, excellent curability particularly at low and ordinary temperature and low toxicity.
    Type: Grant
    Filed: May 27, 2010
    Date of Patent: October 21, 2014
    Assignee: Showa Denko K.K.
    Inventors: Isao Yamagami, Hiroki Takenaka, Katsumi Murofushi
  • Patent number: 8840830
    Abstract: There is provided a method of molding which is capable of more highly precisely molding a molded article to be molded such as a lens than conventional technologies. A molded article such as a lens array and a mold for nanoimprinting is molded by repeating multiple times a transfer step including: a transformation step of bringing a light curable composition containing a compound having a polymerizable functional group and a polymerization initiator into contact with a transfer member 62 on which a transfer shape portion shaped equally to or reversely to an aspherical lens portion 312 is formed to transform the light curable composition to the transfer shape of the transfer member 62; a curing step of irradiating at least a transformed portion of the transformed light curable composition with light by a light irradiation unit 60 to cure the light curable composition; and a separation step of separating the cured light curable composition and the transfer member.
    Type: Grant
    Filed: November 13, 2009
    Date of Patent: September 23, 2014
    Assignee: AJI Co., Ltd.
    Inventors: Shigeru Yamaki, Hideo Miyata, Nobuyuki Mitarai, Nobuaki Ishii, Katsumi Murofushi, Kunio Yoshida
  • Patent number: 8399569
    Abstract: An object of the present invention is to provide a reactive urethane compound having superior curability, adhesion to substrates, transparency, molecular flexibility, and mechanical properties, a curable composition containing the compound, and a cured material formed from the composition. An ethylenically-unsaturated-group containing reactive urethane compound of the present invention is represented by formula (I): wherein R1 and R2 are each independently a hydrogen atom or an alkylene group; R3 is a hydrogen atom, a alkyl group, or an aryl group; R4 is a single bond or an alkylene group; R5 is a hydrogen atom or a methyl group; R6 is an oxygen atom, a sulfur atom, or an imino group; n is 2 to 12; m is 1 to 300; and X is an aliphatic, aromatic or heterocyclic compound residue.
    Type: Grant
    Filed: May 21, 2008
    Date of Patent: March 19, 2013
    Assignee: Showa Denko K.K.
    Inventors: Katsumi Murofushi, Nobuaki Ishii, Miyuki Tomita, Yotaro Hattori, Yoshifumi Urakawa
  • Patent number: 8349934
    Abstract: The present invention is directed to a hardening composition comprising silica fine particles (a), a (meth)acrylate (b) having two or more ethylenically unsaturated groups and being free from cyclic structure, a (meth)acrylate (c) having an ethylenically unsaturated group and having an alicyclic structure, a polymerization initiator (d) and black inorganic fine particles (e), wherein the silica fine particles (a) are surface-treated with a silane compound (f) represented by the following general formula (1) and a silane compound (g) represented by the following general formula (2): (in the formula (1), R1 represents a hydrogen atom or a methyl group, R2 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, R3 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; q represents an integer of 1 to 6; and r represents an integer of 0 to 2, (in the formula (2), R4 is an alkyl group having 1 to 3 carbon atoms or a phenyl group which may have a substituent; R
    Type: Grant
    Filed: December 10, 2009
    Date of Patent: January 8, 2013
    Assignee: Showa Denko K.K.
    Inventors: Katsumi Murofushi, Nobuaki Ishii, Shigeru Yamaki, Hideo Miyata, Yotaro Hattori
  • Patent number: 8283095
    Abstract: It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R1 is a hydrogen atom or a methyl group, and R2 is —CO—, —COO— or —COOR3— (wherein R3 is an alkylene group of 2 to 6 carbon atoms).
    Type: Grant
    Filed: August 14, 2007
    Date of Patent: October 9, 2012
    Assignee: Showa Denko K.K.
    Inventors: Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori, Katsumi Murofushi
  • Patent number: 8242217
    Abstract: It is an object of the present invention to provide an epoxy resin curing agent which has a favorable pot life and good storage stability as a curing agent for epoxy resins and from which an epoxy resin cured product having good water resistance and hardness is obtained through curing. The present invention is an epoxy resin curing agent containing a secondary or tertiary branched thiol compound having a substituent on a carbon atom at the ?-position to a thiol group, and is also an epoxy resin composition comprising a polyvalent epoxy compound and the epoxy resin curing agent.
    Type: Grant
    Filed: December 8, 2008
    Date of Patent: August 14, 2012
    Assignee: Showa Denko K.K.
    Inventors: Yoshifumi Urakawa, Hideo Miyata, Isao Yamagami, Katsumi Murofushi
  • Publication number: 20120077903
    Abstract: The present invention relates to epoxy resin coating composition which comprises, at least, epoxy resin, a thiol-type curing agent and a curing assistant, being composed of two liquids of liquid (A) containing epoxy resin and a thiol-type curing agent and liquid (B) containing a curing assistant, which liquids are mixed just before using, wherein the thiol-type curing agent contains a branched compound containing a thiol group (P), which compound is an ester of polyhydric alcohol with thiol group-containing carboxylic acid represented by formula (1) HOCO(CH2)nCR1R2SH??(1) (in the formula, R1 represents a hydrogen atom or a linear or branched alkyl group having 1 to 10 carbon atoms, R2 represents a linear or branched alkyl group having 1 to 10 carbon atoms, and n represents an integer of 1 to 4), which exhibits a suitable pot life, excellent curability particularly at low and ordinary temperature and low toxicity.
    Type: Application
    Filed: May 27, 2010
    Publication date: March 29, 2012
    Applicant: SHOWA DENKO K.K.
    Inventors: Isao Yamagami, Hiroki Takenaka, Katsumi Murofushi
  • Patent number: 8053167
    Abstract: Curable compositions have high sensitivity and excellent developability, and further have good storage properties as required. The compositions include a hydroxythiol compound represented by Formula (1) below and a compound with an ethylenically unsaturated double bond: wherein R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group or an aromatic ring; X is an aliphatic group, an aromatic ring-containing group or a heterocyclic ring-containing group; Y is an ester bond; k and l are each an integer ranging from 1 to 20; m is an integer of 0, 1 or 2; and n is 0 or 1.
    Type: Grant
    Filed: November 15, 2007
    Date of Patent: November 8, 2011
    Assignee: Showa Denko K.K.
    Inventors: Katsumi Murofushi, Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori
  • Publication number: 20110263779
    Abstract: The present invention is directed to a hardening composition comprising silica fine particles (a), a (meth)acrylate (b) having two or more ethylenically unsaturated groups and being free from cyclic structure, a (meth)acrylate (c) having an ethylenically unsaturated group and having an alicyclic structure, a polymerization initiator (d) and black inorganic fine particles (e), wherein the silica fine particles (a) are surface-treated with a silane compound (f) represented by the following general formula (1) and a silane compound (g) represented by the following general formula (2): (in the formula (1), R1 represents a hydrogen atom or a methyl group, R2 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, R3 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; q represents an integer of 1 to 6; and r represents an integer of 0 to 2, (in the formula (2), R4 is an alkyl group having 1 to 3 carbon atoms or a phenyl group which may have a substituent; R
    Type: Application
    Filed: December 10, 2009
    Publication date: October 27, 2011
    Applicant: SHOWA DENKO K.K.
    Inventors: Katsumi Murofushi, Nobuaki Ishii, Shigeru Yamaki, Hideo Miyata, Yotaro Hattori
  • Publication number: 20110227239
    Abstract: There is provided a method of molding which is capable of more highly precisely molding a molded article to be molded such as a lens than conventional technologies. A molded article such as a lens array and a mold for nanoimprinting is molded by repeating multiple times a transfer step including: a transformation step of bringing a light curable composition containing a compound having a polymerizable functional group and a polymerization initiator into contact with a transfer member 62 on which a transfer shape portion shaped equally to or reversely to an aspherical lens portion 312 is formed to transform the light curable composition to the transfer shape of the transfer member 62; a curing step of irradiating at least a transformed portion of the transformed light curable composition with light by a light irradiation unit 60 to cure the light curable composition; and a separation step of separating the cured light curable composition and the transfer member.
    Type: Application
    Filed: November 19, 2009
    Publication date: September 22, 2011
    Applicants: SHOWA DENKO K.K., AJI CO., LTD
    Inventors: Shigeru Yamaki, Hideo Miyata, Nobuyuki Mitarai, Nobuaki Ishii, Katsumi Murofushi, Kunio Yoshida
  • Publication number: 20110172421
    Abstract: An object of the present invention is to provide a novel photobase generator which can sensitively generate a base even by h-ray in place of a conventional 2-nitro-4,5-dimethoxybenzyloxycarbonylamine compound. Disclosed is an N-(?-aromatic group-substituted-2-nitro-4,5-dialkoxybenzyloxycarbonyl)amine compound represented by the following general formula (I). (In the above formula (I), R1 to R9 denote specific groups.
    Type: Application
    Filed: October 1, 2009
    Publication date: July 14, 2011
    Applicant: SHOWA DENKO K.K.
    Inventors: Isao Yamagami, Yoshihiko Maeda, Hiroshi Yasuda, Katsumi Murofushi
  • Publication number: 20110112243
    Abstract: The invention has an object of providing paint compositions showing excellent performances in both scratch resistance and impact resistance, and processes for forming multilayer paint films using the paint composition. The invention has another object of providing paint compositions suitably used as clear paints for finish painting automobiles and the like, and highly solidifiable paint compositions. A paint composition according to the invention includes a polyisocyanate prepolymer (A) including a monomer unit of Formula (1) below and a polyol (B), and has an average functional group equivalent weight of 160 to 400 g/eq. A process for forming multilayer paint films involves the paint composition. wherein R1 is a hydrogen atom or a methyl group; n is an integer of 0 or 1; when n=0, l=0, p=1 and m is an integer of 1 to 8; and when n=1, m=2, l=2 and p is an integer of 1 to 4.
    Type: Application
    Filed: June 24, 2009
    Publication date: May 12, 2011
    Applicant: SHOWA DENKO K.K.
    Inventors: Nobuaki Ishii, Katsuro Urakawa, Nobuyuki Mitarai, Katsumi Murofushi
  • Publication number: 20110077334
    Abstract: It is an object of the present invention to provide a curable composition capable of forming a heat-resistant cured film which is excellent in surface hardness, is good in flexibility and bending properties, and has strength and flexibility that are compatible with each other, and a cured product (film) of the composition. The curable composition includes a reactive (meth)acrylate polymer (A) having a monomer unit represented by the following formula (1), a polymerization initiator (B) and a reactive monomer(C): wherein R1 is a hydrogen atom, a methyl group or an ethyl group, R2 is a hydrogen atom or a methyl group, X1 is a straight-chain or branched hydrocarbon group of 2 to 6 carbon atoms or an alcohol residue of polyethylene glycol, polypropylene glycol or caprolactone-modified both-terminal diol, n is an integer of 2 to 4, and m is an integer of 1 to 5.
    Type: Application
    Filed: May 20, 2009
    Publication date: March 31, 2011
    Applicant: SHOWA DENKO K.K.
    Inventors: Hiroko OI, Yotaro Hattori, Nobuaki Ishii, Katsumi Murofushi
  • Publication number: 20100273940
    Abstract: It is an object of the present invention to provide an epoxy resin curing agent which has a favorable pot life and good storage stability as a curing agent for epoxy resins and from which an epoxy resin cured product having good water resistance and hardness is obtained through curing. The present invention is an epoxy resin curing agent containing a secondary or tertiary branched thiol compound having a substituent on a carbon atom at the ?-position to a thiol group, and is also an epoxy resin composition comprising a polyvalent epoxy compound and the epoxy resin curing agent.
    Type: Application
    Filed: December 8, 2008
    Publication date: October 28, 2010
    Applicant: SHOWA DENKO K.K.
    Inventors: Yoshifumi Urakawa, Hideo Miyata, Isao Yamagami, Katsumi Murofushi
  • Publication number: 20100233596
    Abstract: It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R1 is a hydrogen atom or a methyl group, and R2 is —CO—, —COO— or —COOR3— (wherein R3 is an alkylene group of 2 to 6 carbon atoms).
    Type: Application
    Filed: August 14, 2007
    Publication date: September 16, 2010
    Applicant: SHOWA DENKO K.K.
    Inventors: Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori, Katsumi Murofushi
  • Publication number: 20100210812
    Abstract: It is an object of the present invention to provide a curable composition having excellent curability and capable of forming a cured film which is excellent in surface hardness, scratch resistance, flexibility, bending property, transparency and curling property, and a cured product thereof. The curable composition of the present invention is characterized by comprising (A) a urethane compound represented by the following general formula (1), (B) a thiol compound and (C) a polymerization initiator.
    Type: Application
    Filed: June 26, 2008
    Publication date: August 19, 2010
    Applicant: SHOWA DENKO K.K.
    Inventors: Yoshifumi Urakawa, Nobuaki Ishii, Miyuki Tomita, Yotaro Hattori, Haruhiko Ikeda, Katsumi Murofushi