Patents by Inventor Kazusei Tamai
Kazusei Tamai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230152272Abstract: A calibration liquid (1) is used for calibrating a water quality measurement device (100). The water quality measurement device (100) includes a plurality of sensors to be brought into contact with a measurement target liquid so as to measure concentrations of a plurality of types of target components contained in the measurement target liquid, and measures the concentrations of the plurality of types of target components. The calibration liquid (1) includes a solution which contains the plurality of types of target components at respective concentrations determined for the target components, and the solution has a pH within a predetermined pH range.Type: ApplicationFiled: January 27, 2021Publication date: May 18, 2023Inventors: Shunsuke KAMEI, Keisuke TASHIMA, Norimasa OSAWA, Kazusei TAMAI, Junji KOJIMA, Yasukazu IWAMOTO, Hiroshi NAGAI
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Patent number: 11446784Abstract: The present invention relates to a chemical mechanical polishing (CMP) apparatus for polishing a workpiece, such as a metal body, to a mirror finish. The chemical mechanical polishing apparatus includes: a polishing pad (2) having an annular polishing surface (2a) which has a curved vertical cross-section; a workpiece holder (11) for holding a workpiece (W) having a polygonal shape; a rotating device (15) configured to rotate the workpiece holder (11) about an axis of the workpiece (W); a pressing device (14) configured to press a periphery of the workpiece (W) against the annular polishing surface (2a); and an operation controller (25) configured to change a speed at which the rotating device (15) rotates the workpiece (W) according to a rotation angle of the workpiece (W). The pressing device (14) is disposed more inwardly than the workpiece holder (11) in a radial direction of the polishing table (3).Type: GrantFiled: May 15, 2019Date of Patent: September 20, 2022Assignees: EBARA CORPORATION, FUJIMI INCORPORATEDInventors: Yu Ishii, Kenya Ito, Hitoshi Morinaga, Kazusei Tamai, Shingo Ohtsuki, Hiroshi Asano
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Publication number: 20220268726Abstract: A water quality measuring system includes a first introduction section for introducing rearing water as a sampling target, and a first adding section which adds an acid to the rearing water introduced by the first introduction section, and a nitrous acid sensor whose measurement target is nitrous acid and which measures the measurement target concentration of the rearing water to which the acid has been added by the first adding section. The water quality measuring system includes a second adding section which adds a base to the rearing water introduced by the first introduction section, and an ammonia sensor whose measurement target is ammonia and which measures the measurement target concentration of the rearing water to which the base has been added by the second adding section.Type: ApplicationFiled: July 14, 2020Publication date: August 25, 2022Inventors: Yoji TAKEHIRO, Kazusei TAMAI, Gray Lawrence Sirosi PUTRA, Keisuke TASHIMA, Shunsuke KAMEI, Junji KOJIMA, Yasukazu IWAMOTO, Hiroshi NAGAI
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Publication number: 20220256818Abstract: An aquaculture system (Sy) includes mineral sensors (22, 24, 26) for detecting the concentrations of minerals contained in rearing water within a rearing tank (50) for rearing an aquatic organism or the rearing water within a circulation passage (70), and an adjustment section which performs instruction issuance or operation for rendering the concentrations of the minerals contained in the rearing water coincident with their standards when the mineral concentrations detected by the mineral sensors (22, 24, 26) deviate from their standards.Type: ApplicationFiled: July 14, 2020Publication date: August 18, 2022Inventors: Yoji TAKEHIRO, Kazusei TAMAI, Miyuki SAITO, Gray Lawrence Sirosi PUTRA, Koyo TAKENOSHITA, Isamu YOSHIDA, Ryoji NISHIMURA, Yusuke YAMASAKI
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Patent number: 10920104Abstract: Provided are an abrasive, a polishing composition, and a polishing method capable of polishing the surface of an alloy or metal oxide at a sufficient polishing removal rate and providing a high-quality mirror surface. The abrasive contains alumina having an ?-conversion rate of 80% or more and having a 50% particle diameter, in a volume-based cumulative particle diameter distribution, of 0.15 ?m or more to 0.35 ?m or less. The polishing composition contains this abrasive and has a pH of 7 or less. These abrasive and polishing composition are used for polishing polishing objects containing at least one of an alloy and a metal oxide.Type: GrantFiled: January 27, 2017Date of Patent: February 16, 2021Assignee: FUJIMI INCORPORATEDInventors: Hitoshi Morinaga, Kazusei Tamai, Maiko Asai, Yuuichi Ito, Kyosuke Tenko, Toru Kamada
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Patent number: 10882157Abstract: To provide a polishing pad capable of sufficiently polishing, in polishing of an object to be polished having at least one of a projection portion and a recessed portion on the surface, a portion near the projection portion or the inner surface of the recessed portion of the surface of the object to be polished. The polishing pad has a piloerection portion (1) in which a plurality of fibers (12) having a length of 2 mm or more are raised on the surface of a base (11), in which the mass of the fibers (12) is 250 g/m2 or more. The polishing pad is used for polishing an object to be polished (2) containing metal, an alloy, or a metal oxide material and having at least one of a projection portion (21) and a recessed portion (22) on the surface.Type: GrantFiled: May 18, 2016Date of Patent: January 5, 2021Assignee: FUJIMI INCORPORATEDInventors: Hitoshi Morinaga, Kazusei Tamai, Muneaki Tahara, Maiko Asai, Yuuichi Ito
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Patent number: 10669462Abstract: Abrasives, a polishing composition, and a polishing method that can reduce undulation of an outer surface of a resin coating by polishing with reduced occurrence of polishing flaws. The polishing composition includes abrasives of aluminium oxide particles having a specific surface area of 5 m2/g or more and 50 m2/g or less and an average secondary particle diameter of 0.05 ?m or more and 4.8 ?m or less. This polishing composition can be used for polishing an outer surface of the resin coating.Type: GrantFiled: September 10, 2015Date of Patent: June 2, 2020Assignee: FUJIMI INCORPORATEDInventors: Eiichi Yamada, Kazusei Tamai
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Patent number: 10626297Abstract: Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives, has a pH of 6.0 or more to 9.0 or less, and is used for polishing ceramic.Type: GrantFiled: November 26, 2015Date of Patent: April 21, 2020Assignee: FUJIMI INCORPORATEDInventors: Kazusei Tamai, Shingo Otsuki, Tomoya Ikedo, Shota Hishida, Hiroshi Asano, Maiko Asai, Yuuichi Ito
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Patent number: 10450651Abstract: Provided is an article having a novel surface with a texture different from conventional kinds. The article having a metal oxide-containing coating provided by the present invention comprises a substrate and a metal oxide-containing coating provided to the substrate surface. The metal oxide-containing coating has a Vickers hardness of 350 or higher, a surface roughness Ra of 300 nm or less, and a 20° gloss value of 50 or higher.Type: GrantFiled: November 27, 2013Date of Patent: October 22, 2019Assignee: FUJIMI INCORPORATEDInventors: Hitoshi Morinaga, Kazusei Tamai, Maiko Asai, Hiroaki Mizuno, Kyohei Ota
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Patent number: 10434622Abstract: A polishing method capable of removing waviness on a resin-coated surface having a curved surface is provided. The resin-coated surface having the curved surface is polished by using a polishing pad having a polishing surface formed of a hard resin layer.Type: GrantFiled: July 30, 2015Date of Patent: October 8, 2019Assignee: FUJIMI INCORPORATEDInventors: Yutaka Niwano, Hitoshi Morinaga, Keigo Ohashi, Kazusei Tamai
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Publication number: 20190262968Abstract: The present invention relates to a chemical mechanical polishing (CMP) apparatus for polishing a workpiece, such as a metal body, to a mirror finish. The chemical mechanical polishing apparatus includes: a polishing pad (2) having an annular polishing surface (2a) which has a curved vertical cross-section; a workpiece holder (11) for holding a workpiece (W) having a polygonal shape; a rotating device (15) configured to rotate the workpiece holder (11) about an axis of the workpiece (W); a pressing device (14) configured to press a periphery of the workpiece (W) against the annular polishing surface (2a); and an operation controller (25) configured to change a speed at which the rotating device (15) rotates the workpiece (W) according to a rotation angle of the workpiece (W). The pressing device (14) is disposed more inwardly than the workpiece holder (11) in a radial direction of the polishing table (3).Type: ApplicationFiled: May 15, 2019Publication date: August 29, 2019Inventors: Yu ISHII, Kenya ITO, Hitoshi MORINAGA, Kazusei TAMAI, Shingo OHTSUKI, Hiroshi ASANO
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Publication number: 20190153263Abstract: Provided are an abrasive, a polishing composition, and a polishing method capable of polishing the surface of an alloy or metal oxide at a sufficient polishing removal rate and providing a high-quality mirror surface. The abrasive contains alumina having an ?-conversion rate of 80% or more and having a 50% particle diameter, in a volume-based cumulative particle diameter distribution, of 0.15 ?m or more to 0.35 ?m or less. The polishing composition contains this abrasive and has a pH of 7 or less. These abrasive and polishing composition are used for polishing polishing objects containing at least one of an alloy and a metal oxide.Type: ApplicationFiled: January 27, 2017Publication date: May 23, 2019Applicant: FUJIMI INCORPORATEDInventors: Hitoshi MORINAGA, Kazusei TAMAI, Maiko ASAI, Yuuichi ITO, Kyosuke TENKO, Toru KAMADA
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Publication number: 20190084121Abstract: There is provided a polishing pad that ensures sufficiently performing polishing up to a part near a projection portion and an inner surface of a recessed portion in a surface of an object to be polished in polishing the object to be polished having a surface with at least one of the projection portion and the recessed portion. The polishing pad includes a napped part (1) where a plurality of fibers (12) with a length of 3 mm or more are napped on a surface of a base portion (11). A count of the fibers (12) is 10000 pieces/cm2 or more.Type: ApplicationFiled: January 27, 2017Publication date: March 21, 2019Applicant: FUJIMI INCORPORATEDInventors: Maiko ASAI, Yuuichi ITO, Kazusei TAMAI, Muneaki TAHARA
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Publication number: 20180200861Abstract: To provide a polishing pad capable of sufficiently polishing, in polishing of an object to be polished having at least one of a projection portion and a recessed portion on the surface, a portion near the projection portion or the inner surface of the recessed portion of the surface of the object to be polished. The polishing pad has a piloerection portion (1) in which a plurality of fibers (12) having a length of 2 mm or more are raised on the surface of a base (11), in which the mass of the fibers (12) is 250 g/m2 or more. The polishing pad is used for polishing an object to be polished (2) containing metal, an alloy, or a metal oxide material and having at least one of a projection portion (21) and a recessed portion (22) on the surface.Type: ApplicationFiled: May 18, 2016Publication date: July 19, 2018Applicant: FUJIMI INCORPORATEDInventors: Hitoshi MORINAGA, Kazusei TAMAI, Muneaki TAHARA, Maiko ASAI, Yuuichi ITO
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Patent number: 9994748Abstract: [Problem] An object is to provide a polishing composition which can improve smoothness of a surface of an alloy material to obtain a highly glossy surface, and can obtain a high-quality mirror surface having significantly reduced scratches or the like. [Solution] There is provided a polishing composition which is used for polishing an alloy material, and which comprises abrasive grains and an additive which does not form a complex with specific metal species and is adsorbed on a surface of the alloy to exhibit an anticorrosive effect.Type: GrantFiled: July 17, 2014Date of Patent: June 12, 2018Assignee: FUJIMI INCORPORATEDInventors: Hiroshi Asano, Maiko Asai, Hitoshi Morinaga, Kazusei Tamai
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Publication number: 20170355881Abstract: Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives, has a pH of 6.0 or more to 9.0 or less, and is used for polishing ceramic.Type: ApplicationFiled: November 26, 2015Publication date: December 14, 2017Applicant: FUJIMI INCORPORATEDInventors: Kazusei TAMAI, Shingo OTSUKI, Tomoya IKEDO, Shota HISHIDA, Hiroshi ASANO, Maiko ASAI, Yuuichi ITO
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Publication number: 20170312880Abstract: The present invention relates to a chemical mechanical polishing (CMP) apparatus for polishing a workpiece, such as a metal body, to a mirror finish. The chemical mechanical polishing apparatus includes: a polishing pad (2) having an annular polishing surface (2a) which has a curved vertical cross-section; a workpiece holder (11) for holding a workpiece (W) having a polygonal shape; a rotating device (15) configured to rotate the workpiece holder (11) about an axis of the workpiece (W); a pressing device (14) configured to press a periphery of the workpiece (W) against the annular polishing surface (2a); and an operation controller (25) configured to change a speed at which the rotating device (15) rotates the workpiece (W) according to a rotation angle of the workpiece (W). The pressing device (14) is disposed more inwardly than the workpiece holder (11) in a radial direction of the polishing table (3).Type: ApplicationFiled: October 30, 2015Publication date: November 2, 2017Inventors: Yu ISHII, Kenya ITO, Hitoshi MORINAGA, Kazusei TAMAI, Shingo OHTSUKI, Hiroshi ASANO
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Publication number: 20170260436Abstract: Abrasives, a polishing composition, and a polishing method that can reduce undulation of an outer surface of a resin coating by polishing with reduced occurrence of polishing flaws. The polishing composition includes abrasives of aluminium oxide particles having a specific surface area of 5 m2/g or more and 50 m2/g or less and an average secondary particle diameter of 0.05 ?m or more and 4.8 ?m or less. This polishing composition can be used for polishing an outer surface of the resin coating.Type: ApplicationFiled: September 10, 2015Publication date: September 14, 2017Applicant: FUJIMI INCORPORATEDInventors: Eiichi YAMADA, Kazusei TAMAI
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Publication number: 20170252890Abstract: A polishing method capable of removing waviness on a resin-coated surface having a curved surface is provided. The resin-coated surface having the curved surface is polished by using a polishing pad having a polishing surface formed of a hard resin layer.Type: ApplicationFiled: July 30, 2015Publication date: September 7, 2017Applicant: FUJIMI INCORPORATEDInventors: Yutaka NIWANO, Hitoshi MORINAGA, Keigo OHASHI, Kazusei TAMAI
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Publication number: 20170216993Abstract: Provided is a composition for polishing a titanium alloy material, which enables polishing of a titanium alloy material at a high polishing speed and can provide a polished titanium alloy material having excellent surface smoothness and having a highly glossy surface after polishing. The composition for polishing a titanium alloy material is a composition that is intended for polishing a titanium alloy material and comprises a compound having a function of dissolving at least one metal element other than titanium, which exists at a content of more than 0.5% by mass with respect to the total mass of the titanium alloy material, at a higher degree of solubility than that of titanium; and abrasive grains.Type: ApplicationFiled: May 1, 2015Publication date: August 3, 2017Applicant: FUJIMI INCORPORATEDInventors: Maiko ASAI, Kazusei TAMAI, Hitoshi MORINAGA, Hiroshi ASANO