Patents by Inventor Kazuto Miyoshi

Kazuto Miyoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040197703
    Abstract: Disclosed is a positive-type photosensitive resin composition comprising: (a) an alkali-soluble resin; (b) a quinone diazide compound; (c) a heatsensitive compound which colors upon being heated and which shows an absorption maximum at a wavelength of not less than 350 nm and not more than 700 nm; and (d) a compound which does not have an absorption maximum at a wavelength of not less than 350 nm to less than 500 nm, and has an absorption maximum at a wavelength of not less than 500 nm and not more than 750 nm. The composition is preferably used for forming light-blocking separators or black matrices of organic electroluminescent devices and liquid crystal display elements.
    Type: Application
    Filed: April 7, 2004
    Publication date: October 7, 2004
    Applicant: Toray Industries, Inc.
    Inventors: Kazuto Miyoshi, Ryoji Okuda, Masao Tomikawa
  • Publication number: 20030194631
    Abstract: A positive photosensitive resin precursor composition which can be can be developed in an alkaline developer is provided.
    Type: Application
    Filed: March 3, 2003
    Publication date: October 16, 2003
    Inventors: Mitsuhito Suwa, Kazuto Miyoshi, Masao Tomikawa
  • Patent number: 6593043
    Abstract: A composition of a positive photosensitive resin precursor includes (a) a polyamic acid ester and/or a polyamic acid each having at least one selected from a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group and a thiol group at the end of a principal chain of the polymer, (b) a compound having a phenolic hydroxyl group, and (c) a quinonediazide sulfnate. The composition can be subjected to dissolution in an alkaline developer.
    Type: Grant
    Filed: November 1, 2001
    Date of Patent: July 15, 2003
    Assignee: Toray Industries, Inc.
    Inventors: Mitsuhito Suwa, Kazuto Miyoshi, Masao Tomikawa
  • Publication number: 20020090564
    Abstract: A composition of a positive photosensitive resin precursor includes (a) a polyamic acid ester and/or a polyamic acid each having at least one selected from a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group and a thiol group at the end of a principal chain of the polymer, (b) a compound having a phenolic hydroxyl group, and (c) a quinonediazide sulfnate. The composition can be subjected to dissolution in an alkaline developer.
    Type: Application
    Filed: November 1, 2001
    Publication date: July 11, 2002
    Inventors: Mitsuhito Suwa, Kazuto Miyoshi, Masao Tomikawa
  • Patent number: 6378059
    Abstract: A virtual storage unit, virtual storage method and storage medium are provided which are capable of preventing, by incorporating variable length pages, occurrence of faults at a time of execution of a user program and of improving a program execution speed, thus executing the user program efficiently. When a virtual address referenced to by the user program does not exist in a TLB (Translation Look-aside Buffer), a TLB absence page detecting program is activated. The TLB absence page detecting program activates a TLB absence page replacing program. The TLB absence page replacing program activates a page placement referencing program. Page information corresponding to the virtual address referenced by the user program is taken by the page placement referencing program from the page placement storing program and is stored in the TLB. This allows the user program to make a reference to the above virtual address.
    Type: Grant
    Filed: March 28, 2000
    Date of Patent: April 23, 2002
    Assignee: NEC Corporation
    Inventor: Kazuto Miyoshi