Patents by Inventor Kazutoshi Sekihara

Kazutoshi Sekihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9766538
    Abstract: A pellicle frame and a pellicle made with it is proposed in which at least one pair of the side bars of the frame are made to have a deflection (bow) which has an amount or a distance of displacement measured at the middle point of the side bar accounting for 0.01 through 1% of the length of the respective side bar.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: September 19, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara
  • Patent number: 9740093
    Abstract: A pellicle is proposed in which a mask-bonding agglutinant layer, that bonds the pellicle to a photomask, is divided into segments, and the vacancies thus created between these segments are entirely occupied by segments of a non-resilient body layer, and these alternately arranged segments are flush with each other.
    Type: Grant
    Filed: December 16, 2015
    Date of Patent: August 22, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara
  • Patent number: 9612529
    Abstract: A pellicle is proposed in which the frame is formed with an external horizontal slit for the purpose of receiving a pressing means, which can urge the pellicle to be adhered to a photomask, in which the slit forms a vertically protruding part of a thickness of 5-30% of the width of a pellicle frame main body and a horizontally protruding part of a thickness of 0.3-1 mm; also the method of adhering the pellicle to the photomask is proposed.
    Type: Grant
    Filed: August 14, 2015
    Date of Patent: April 4, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara
  • Patent number: 9395634
    Abstract: A pellicle is proposed in which the frame is made of an aluminum alloy and at least the inner wall of the frame is entirely coated with a pure aluminum layer, which preferably has a purity of 99.7% or higher and a thickness of 3 through 50 micrometers; the pellicle frame with the pure aluminum layer may be subjected to anodic oxidation treatment, electric coloring, and void filling, and a resin layer can be formed as the outermost layer.
    Type: Grant
    Filed: January 31, 2014
    Date of Patent: July 19, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara
  • Patent number: 9389499
    Abstract: A pellicle was well as an assembly of photomask plus pellicle is proposed in which the conventional agglutinant layer which bonds the pellicle to photomask is replaced by male and female screws and elastic body layer; in particular the pellicle frame is screwed to the photomask while the sealing of the space within the pellicle frame is secured by the elastic body layer.
    Type: Grant
    Filed: April 4, 2014
    Date of Patent: July 12, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara
  • Publication number: 20160187772
    Abstract: A pellicle is proposed in which a mask-bonding agglutinant layer, that bonds the pellicle to a photomask, is divided into segments, and the vacancies thus created between these segments are entirely occupied by segments of a non-resilient body layer, and these alternately arranged segments are flush with each other.
    Type: Application
    Filed: December 16, 2015
    Publication date: June 30, 2016
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara
  • Publication number: 20160154300
    Abstract: A pellicle frame and a pellicle made with it is proposed in which at least one pair of the side bars of the frame are made to have a deflection (bow) which has an amount or a distance of displacement measured at the middle point of the side bar accounting for 0.01 through 1% of the length of the respective side bar.
    Type: Application
    Filed: November 16, 2015
    Publication date: June 2, 2016
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara
  • Publication number: 20160085147
    Abstract: A pellicle is proposed in which the frame is formed with an external horizontal slit for the purpose of receiving a pressing means, which can urge the pellicle to be adhered to a photomask, in which the slit forms a vertically protruding part of a thickness of 5-30% of the width of a pellicle frame main body and a horizontally protruding part of a thickness of 0.3-1 mm; also the method of adhering the pellicle to the photomask is proposed.
    Type: Application
    Filed: August 14, 2015
    Publication date: March 24, 2016
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara
  • Patent number: 9176374
    Abstract: A pellicle is proposed in which the frame is composed of a detachable double structure of an inner frame and an outer frame, and the pellicle membrane is adhered only to the inner frame and the photomask-agglutination layer is laid only to the inner frame, and the outer frame is removed from the inner frame after the pellicle is agglutinated to the photomask.
    Type: Grant
    Filed: October 4, 2013
    Date of Patent: November 3, 2015
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara
  • Publication number: 20140315122
    Abstract: A pellicle was well as an assembly of photomask plus pellicle is proposed in which the conventional agglutinant layer which bonds the pellicle to photomask is replaced by male and female screws and elastic body layer; in particular the pellicle frame is screwed to the photomask while the sealing of the space within the pellicle frame is secured by the elastic body layer.
    Type: Application
    Filed: April 4, 2014
    Publication date: October 23, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara
  • Publication number: 20140307237
    Abstract: A pellicle is proposed in which the frame is made of an aluminum alloy and at least the inner wall of the frame is entirely coated with a pure aluminum layer, which preferably has a purity of 99.7% or higher and a thickness of 3 through 50 micrometers; the pellicle frame with the pure aluminum layer may be subjected to anodic oxidation treatment, electric coloring, and void filling, and a resin layer can be formed as the outermost layer.
    Type: Application
    Filed: January 31, 2014
    Publication date: October 16, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara
  • Publication number: 20140106265
    Abstract: A pellicle is proposed in which the frame is composed of a detachable double structure of an inner frame and an outer frame, and the pellicle membrane is adhered only to the inner frame and the photomask-agglutination layer is laid only to the inner frame, and the outer frame is removed from the inner frame after the pellicle is agglutinated to the photomask.
    Type: Application
    Filed: October 4, 2013
    Publication date: April 17, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara
  • Patent number: 8449966
    Abstract: A new kind of pellicle frame is proposed which is made up of a core body and a clad body; the core body consists of a composite of carbon fiber plus resin, and it is preferred that the carbon fiber exists in the form of a laminated body of carbon fiber sheets in which the resin is impregnated; and the clad body is the outer layer sealing the core body such that no carbon is exposed through the clad body.
    Type: Grant
    Filed: September 16, 2011
    Date of Patent: May 28, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Kazutoshi Sekihara
  • Patent number: 8435703
    Abstract: There is provided a pellicle having a rectangular pellicle frame formed of four side bars, having a through hole made through at least one of the frame bars for adjusting a pressure of a space formed within the pellicle frame equal to a pressure outside the pellicle frame; and a filter member disposed to cover up an external opening of the through hole for preventing entrance of particles into the space, wherein the through hole is formed with: (1) an outer stepped portion defining a first recess, opening outside the pellicle frame, for accommodating the filter member, (2) an inner stepped portion defining a second recess, opening in a bottom of the first recess, and (3) a ventilation hole with one end opening in a bottom of the second recess of the inner stepped portion and the other end opening in the space within the pellicle frame.
    Type: Grant
    Filed: June 28, 2010
    Date of Patent: May 7, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Kazutoshi Sekihara
  • Patent number: 8338060
    Abstract: A method for manufacturing a pellicle for lithography includes steps of providing a pellicle frame having one pair of long sides and one pair of short sides, each of the long sides 11 having a linear shape and each of the short sides 12 including a central portion projecting outwardly, intermediate regions positioned on the opposite sides of the central region and having a re-entrant arcuate shape and end proximity regions each having a linear shape, and adhering a pellicle membrane whose tensile force distribution is adjusted so that a tensile force along the pair of long sides of the pellicle frame is larger than a tensile force along the pair of short sides of the pellicle frame, thereby transforming the one of short sides of the pellicle frame to which the pellicle membrane is adhered to have a linear shape.
    Type: Grant
    Filed: January 27, 2011
    Date of Patent: December 25, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Kazutoshi Sekihara
  • Patent number: 8293432
    Abstract: There is provided a pellicle which has a ventilation hole made through at least one frame bar for adjusting the pressure inside the frame to the atmospheric pressure, and a filter to cover up the external opening of the ventilation hole for preventing entrance of a foreign substance, and at least one of two openings of the ventilation hole is chamfered to a degree selected from a group consisting of “C0.5 to C1.0” and “R0.5 to R1.0”.
    Type: Grant
    Filed: June 18, 2010
    Date of Patent: October 23, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Kazutoshi Sekihara
  • Publication number: 20120107548
    Abstract: A new kind of pellicle frame is proposed which is made up of a core body and a clad body; the core body consists of a composite of carbon fiber plus resin, and it is preferred that the carbon fiber exists in the form of a laminated body of carbon fiber sheets in which the resin is impregnated; and the clad body is the outer layer sealing the core body such that no carbon is exposed through the clad body.
    Type: Application
    Filed: September 16, 2011
    Publication date: May 3, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara
  • Publication number: 20110189594
    Abstract: A method for manufacturing a pellicle for lithography includes steps of providing a pellicle frame having one pair of long sides and one pair of short sides, each of the long sides 11 having a linear shape and each of the short sides 12 including a central portion projecting outwardly, intermediate regions positioned on the opposite sides of the central region and having a re-entrant arcuate shape and end proximity regions each having a linear shape, and adhering a pellicle membrane whose tensile force distribution is adjusted so that a tensile force along the pair of long sides of the pellicle frame is larger than a tensile force along the pair of short sides of the pellicle frame, thereby transforming the one of short sides of the pellicle frame to which the pellicle membrane is adhered to have a linear shape.
    Type: Application
    Filed: January 27, 2011
    Publication date: August 4, 2011
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Kazutoshi Sekihara
  • Publication number: 20100328635
    Abstract: There is provided a pellicle having a rectangular pellicle frame formed of four side bars, having a through hole made through at least one of the frame bars for adjusting a pressure of a space formed within the pellicle frame equal to a pressure outside the pellicle frame; and a filter member disposed to cover up an external opening of the through hole for preventing entrance of particles into the space, wherein the through hole is formed with: (1) an outer stepped portion defining a first recess, opening outside the pellicle frame, for accommodating the filter member, (2) an inner stepped portion defining a second recess, opening in a bottom of the first recess, and (3) a ventilation hole with one end opening in a bottom of the second recess of the inner stepped portion and the other end opening in the space within the pellicle frame.
    Type: Application
    Filed: June 28, 2010
    Publication date: December 30, 2010
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara
  • Publication number: 20100323281
    Abstract: There is provided a pellicle which has a ventilation hole made through at least one frame bar for adjusting the pressure inside the frame to the atmospheric pressure, and a filter to cover up the external opening of the ventilation hole for preventing entrance of a foreign substance, and at least one of two openings of the ventilation hole is chamfered to a degree selected from a group consisting of
    Type: Application
    Filed: June 18, 2010
    Publication date: December 23, 2010
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Kazutoshi Sekihara