Abstract: A frame that prevents the decrease in the exposure area by preventing the frame from curving inward by the tensile force of the pellicle membrane and makes it possible to obtain a pellicle having excellent dimensional accuracy and attachment position accuracy on a photomask, and a pellicle for photolithography using the frame. A pellicle frame of the present invention comprises, in at least one pair of opposite side members of a generally rectangular frame body, a portion with an arc form curved outward in the center portion of the side members, portions with an arc form curved inward on both sides of the portion curved outward, and portions with a straightly linear form on the outer sides of the portions curved inward. The radius of the portions with an arc form curved inward is preferably ? or larger of the radius of the portion with an arc form curved outward.

Abstract: The invention provides a pellicle frame which can readily be peeled off after being adhesively attached to a photomask, and a photolithographic framed pellicle which makes use of this pellicle frame. The pellicle frame provided by the invention is a rectangular framework body of which the longer side framework member has a length of at least 500 mm, wherein at least one cavity is provided on the outside surface of any framework member at a distance of 50 mm or smaller from a corner of the frame. It is preferable that at least five cavities are provided on the outside surfaces of the pellicle frame, and the cavities each have a cylindrical configuration having a diameter in the range from 1.0 mm to 3.0 mm and a depth of at least 0.5 mm, but not deep enough to penetrate the framework member through. The framed pellicle is constructed by using this pellicle frame.

Abstract: There is provided a pellicle container for use in photolithography, with which no dust particles are deposited onto the pellicle contained therein, and contamination of the pellicle can be prevented and good condition is ensured. The present invention provides a pellicle container consisting of a container base on which a pellicle is mounted, and a covering body that covers the pellicle and latches with the container base by engagement together with the container base along the peripheral edges, wherein the pellicle is supported by inserting a frame supporting pin in the opening of a sleeve provided on the outside surface of the pellicle frame.

Abstract: The invention provides an inexpensive improved die-coating method for the preparation of a high-quality pellicle membrane used for dust-proof protection of a photomask in the photolithographic patterning works in respect of greatly decreased deposition of foreign matter particles and increased uniformity of the film. The improvement is accomplished by a method comprising the steps of: keeping the coating die end as immersed in the coating solution; gently pulling up the coating die at a rate, for example, not exceeding 2 mm/second until the die end comes apart from the solution; and holding the coating die as pulled up until the drops of the coating solution hanging from the die end disappear by means of the surface tension of the solution giving a flat, smooth end surface of the coating die prior to the start of the coating works on a substrate surface with the coating solution ejected from the slit in the coating die end followed by drying and peeling of the resin film off the substrate surface.

Abstract: A frame that prevents the decrease in the exposure area by preventing the frame from curving inward by the tensile force of the pellicle membrane and makes it possible to obtain a pellicle having excellent dimensional accuracy and attachment position accuracy on a photomask, and a pellicle for photolithography using the frame. A pellicle frame of the present invention comprises, in at least one pair of opposite side members of a generally rectangular frame body, a portion with an arc form curved outward in the center portion of the side members, portions with an arc form curved inward on both sides of the portion curved outward, and portions with a straightly linear form on the outer sides of the portions curved inward. The radius of the portions with an arc form curved inward is preferably ? or larger of the radius of the portion with an arc form curved outward.