Patents by Inventor Keisuke Arimura

Keisuke Arimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230331018
    Abstract: An object of the present invention is to provide a lithographic printing plate precursor from which a lithographic printing plate with excellent oil-based cleaner printing durability is obtained, a method of producing a lithographic printing plate, a printing method, and a method of producing an aluminum support. The lithographic printing plate precursor of the present invention is a lithographic printing plate precursor including an aluminum support, and an image recording layer disposed on the aluminum support, in which the aluminum support includes an aluminum plate and an anodized aluminum film disposed on the aluminum plate, the image recording layer is disposed on the aluminum support on a side of the anodized film, and an area ratio of projections with a height of 0.
    Type: Application
    Filed: June 21, 2023
    Publication date: October 19, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Atsushi MATSUURA, Yusuke KOZAWA, Keisuke ARIMURA
  • Patent number: 11635557
    Abstract: Provided is a laminate having a good whiteness and a high infrared-shielding property. Provided are also a kit forming the above-mentioned laminate, a method for producing a laminate, and an optical sensor. The laminate includes an infrared-shielding layer and a white layer, in which the infrared-shielding layer is a layer that shields at least a part of a wavelength range at 800 to 1,500 nm, and the white layer has a value of L* of 35 to 100, a value of a* of ?20 to 20, and a value of b* of ?40 to 30 in a L*a*b* color coordinate system of CIE 1976.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: April 25, 2023
    Assignee: FUJIFILM Corporation
    Inventors: Yoshinori Taguchi, Keisuke Arimura
  • Patent number: 11518833
    Abstract: A composition includes two or more near infrared absorbing compounds having an absorption maximum in a wavelength range of 650 to 1000 nm and having a solubility of 0.1 mass % or lower in water at 23° C., in which the two or more near infrared absorbing compounds include a first near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm, and a second near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm which is shorter than the absorption maximum of the first near infrared absorbing compound, and a difference between the absorption maximum of the first near infrared absorbing compound and the absorption maximum of the second near infrared absorbing compound is 1 to 150 nm.
    Type: Grant
    Filed: January 25, 2021
    Date of Patent: December 6, 2022
    Assignee: FUJIFILM Corporation
    Inventors: Tokihiko Matsumura, Daisuke Sasaki, Kyohei Arayama, Yoshihiro Jimbo, Kazuya Oota, Keisuke Arimura, Takahiro Okawara
  • Publication number: 20220326615
    Abstract: An object of the present invention is to provide a lithographic printing plate precursor which has excellent on-press developability and is capable of suppressing generation of slip stains and from which a lithographic printing plate with satisfactory printing durability is obtained, and a method of producing a lithographic printing plate and a printing method using the lithographic printing plate precursor.
    Type: Application
    Filed: June 24, 2022
    Publication date: October 13, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Atsushi MATSUURA, Keisuke Arimura
  • Publication number: 20210139708
    Abstract: A composition includes two or more near infrared absorbing compounds having an absorption maximum in a wavelength range of 650 to 1000 nm and having a solubility of 0.1 mass % or lower in water at 23° C., in which the two or more near infrared absorbing compounds include a first near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm, and a second near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm which is shorter than the absorption maximum of the first near infrared absorbing compound, and a difference between the absorption maximum of the first near infrared absorbing compound and the absorption maximum of the second near infrared absorbing compound is 1 to 150 nm.
    Type: Application
    Filed: January 25, 2021
    Publication date: May 13, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Tokihiko MATSUMURA, Daisuke SASAKI, Kyohei ARAYAMA, Yoshihiro JIMBO, Kazuya OOTA, Keisuke ARIMURA, Takahiro OKAWARA
  • Patent number: 10989846
    Abstract: Provided are a near infrared absorbing composition with which a cured film having excellent solvent resistance and thermal shock resistance can be manufactured, a near infrared cut filter, a method of manufacturing a near infrared cut filter, a solid image pickup element, a camera module, and an image display device. The near infrared absorbing composition includes: a resin A that satisfies the following condition a1; an infrared absorber B; and a solvent D. At least the resin A has a crosslinking group, or the near infrared absorbing composition further includes a compound C having a crosslinking group that is different from the resin A. condition a1: in a case where the resin A does not have a crosslinking group, a glass transition temperature of the resin A measured by differential scanning calorimetry is 0° C. to 100° C.
    Type: Grant
    Filed: June 14, 2018
    Date of Patent: April 27, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Seiichi Hitomi, Takashi Kawashima, Keisuke Arimura, Takahiro Okawara
  • Patent number: 10947389
    Abstract: The composition includes two or more near infrared absorbing compounds having an absorption maximum in a wavelength range of 650 to 1000 nm and having a solubility of 0.1 mass % or lower in water at 23° C., in which the two or more near infrared absorbing compounds include a first near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm, and a second near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm which is shorter than the absorption maximum of the first near infrared absorbing compound, and a difference between the absorption maximum of the first near infrared absorbing compound and the absorption maximum of the second near infrared absorbing compound is 1 to 150 nm.
    Type: Grant
    Filed: June 26, 2018
    Date of Patent: March 16, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Tokihiko Matsumura, Daisuke Sasaki, Kyohei Arayama, Yoshihiro Jimbo, Kazuya Oota, Keisuke Arimura, Takahiro Okawara
  • Patent number: 10732333
    Abstract: The present invention relates to an infrared sensor, a near-infrared ray absorption composition, a photosensitive resin composition, a compound, a near-infrared ray absorption filter, and an image pick-up device. Provided is an infrared sensor 100 that detects an object by detecting light in wavelengths of 900 nm to 1,000 nm, including infrared ray transmission filters 113 and near-infrared ray absorption filters 111, in which the near-infrared ray absorption filters 111 contains a near-infrared ray absorption substance having a maximum absorption wavelength in wavelengths of 900 nm to 1,000 nm.
    Type: Grant
    Filed: October 19, 2016
    Date of Patent: August 4, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Yutaro Norizuki, Takashi Katoh, Satoru Murayama, Yoshihiro Jimbo, Daisuke Sasaki, Keisuke Arimura, Takuya Tsuruta
  • Patent number: 10598835
    Abstract: An infrared absorbing composition which is used for forming an infrared cut filter in a solid image pickup element having the infrared cut filter includes at least one infrared absorber having an absorption maximum at a wavelength of 650 nm or longer which is selected from polymethine colorants.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: March 24, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Kazuya Oota, Daisuke Sasaki, Yuki Hirai, Takahiro Okawara, Kazuto Shimada, Keisuke Arimura
  • Publication number: 20190196073
    Abstract: Provided are a composition with which a film having excellent heat resistance and light fastness can be provided, the film, a near infrared cut filter, a pattern forming method, a laminate, a solid image pickup element, an image display device, a camera module, and an infrared sensor.
    Type: Application
    Filed: February 27, 2019
    Publication date: June 27, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Suguru SAMEJIMA, Tokihiko MATSUMURA, Keisuke ARIMURA, Shunsuke KITAJIMA
  • Publication number: 20190154891
    Abstract: A dry etching composition includes a coloring material which allows transmission of infrared rays and shields visible light, a curable compound, and a solvent, in which a ratio A/B between a minimum value A of a light absorbance of the composition in a wavelength range of 400 to 700 nm and a maximum value B of a light absorbance in a wavelength range of 1100 to 1300 nm is 4.5 or greater.
    Type: Application
    Filed: January 18, 2019
    Publication date: May 23, 2019
    Applicant: FUJIFILM Corporation
    Inventor: Keisuke ARIMURA
  • Publication number: 20190135951
    Abstract: Provided is a laminate having a good whiteness and a high infrared-shielding property. Provided are also a kit forming the above-mentioned laminate, a method for producing a laminate, and an optical sensor. The laminate includes an infrared-shielding layer and a white layer, in which the infrared-shielding layer is a layer that shields at least a part of a wavelength range at 800 to 1,500 nm, and the white layer has a value of L* of 35 to 100, a value of a* of ?20 to 20, and a value of b* of ?40 to 30 in a L*a*b* color coordinate system of CIE 1976.
    Type: Application
    Filed: December 21, 2018
    Publication date: May 9, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Yoshinori Taguchi, Keisuke Arimura
  • Publication number: 20180305552
    Abstract: The composition includes two or more near infrared absorbing compounds having an absorption maximum in a wavelength range of 650 to 1000 nm and having a solubility of 0.1 mass % or lower in water at 23° C., in which the two or more near infrared absorbing compounds include a first near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm, and a second near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm which is shorter than the absorption maximum of the first near infrared absorbing compound, and a difference between the absorption maximum of the first near infrared absorbing compound and the absorption maximum of the second near infrared absorbing compound is 1 to 150 nm.
    Type: Application
    Filed: June 26, 2018
    Publication date: October 25, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Tokihiko MATSUMURA, Daisuke SASAKI, Kyohei ARAYAMA, Yoshihiro JIMBO, Kazuya OOTA, Keisuke ARIMURA, Takahiro OKAWARA
  • Publication number: 20180292586
    Abstract: Provided are a near infrared absorbing composition with which a cured film having excellent solvent resistance and thermal shock resistance can be manufactured, a near infrared cut filter, a method of manufacturing a near infrared cut filter, a solid image pickup element, a camera module, and an image display device. The near infrared absorbing composition includes: a resin A that satisfies the following condition a1; an infrared absorber B; and a solvent D. At least the resin A has a crosslinking group, or the near infrared absorbing composition further includes a compound C having a crosslinking group that is different from the resin A. condition a1: in a case where the resin A does not have a crosslinking group, a glass transition temperature of the resin A measured by differential scanning calorimetry is 0° C. to 100° C.
    Type: Application
    Filed: June 14, 2018
    Publication date: October 11, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Seiichi HITOMI, Takashi KAWASHIMA, Keisuke ARIMURA, Takahiro OKAWARA
  • Publication number: 20180188428
    Abstract: A near-infrared cut filter has a first infrared absorbing layer including an infrared absorber A, a second infrared absorbing layer including an infrared absorber C, and a resin layer disposed between the first infrared absorbing layer and the second infrared absorbing layer.
    Type: Application
    Filed: February 20, 2018
    Publication date: July 5, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Keisuke ARIMURA, Kazuto SHIMADA, Takahiro OKAWARA, Takashi KAWASHIMA, Hidenori TAKAHASHI
  • Publication number: 20180175090
    Abstract: A near infrared absorbing composition includes: a copper compound; a radical trapping agent; and a resin which generates a radical at 180° C. or higher.
    Type: Application
    Filed: February 20, 2018
    Publication date: June 21, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Takahiro OKAWARA, Takashi KAWASHIMA, Kazuto SHIMADA, Keisuke ARIMURA, Kouitsu SASAKI
  • Publication number: 20180136379
    Abstract: Provided are a laminate having an antireflection layer including inorganic particles, and an infrared light reflecting layer, in which the infrared light reflecting layer includes a first selective reflection layer which is formed by fixing a liquid crystal phase having a helical axis which rotates in a right direction, and a second selective reflection layer which is formed by fixing a liquid crystal phase having a helical axis which rotates in a left direction, a method for producing the laminate, a solid-state imaging device including the laminate, and a kit used for producing the laminate.
    Type: Application
    Filed: December 25, 2017
    Publication date: May 17, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Hirotaka TAKISHITA, Kazuto SHIMADA, Keisuke ARIMURA, Takahiro OKAWARA, Daisuke SASAKI, Keiji YAMAMOTO, Masaru YOSHIKAWA, Ryoji GOTO
  • Publication number: 20180120485
    Abstract: An infrared absorbing composition which is used for forming an infrared cut filter in a solid image pickup element having the infrared cut filter includes at least one infrared absorber having an absorption maximum at a wavelength of 650 nm or longer which is selected from polymethine colorants.
    Type: Application
    Filed: November 3, 2017
    Publication date: May 3, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Kazuya OOTA, Daisuke SASAKI, Yuki HIRAI, Takahiro OKAWARA, Kazuto SHIMADA, Keisuke ARIMURA
  • Patent number: 9958576
    Abstract: Provided are a near infrared ray absorbent composition which can form a cured film having excellent heat resistance while maintaining high near infrared ray shielding properties, and a near infrared ray cut filter, a manufacturing method of a near infrared ray cut filter, a solid image pickup element, and a camera module using the near infrared ray absorbent composition. The near infrared ray absorbent composition contains a compound having a partial structure represented by M-X, and a near infrared ray absorbent compound, and a content of the compound having a partial structure represented by M-X is greater than or equal to 15 mass % with respect to a total solid content of the near infrared ray absorbent composition.
    Type: Grant
    Filed: December 23, 2016
    Date of Patent: May 1, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Takashi Kawashima, Keisuke Arimura
  • Publication number: 20180017722
    Abstract: To provide an infrared cut filter that has a wide view angle and excellent infrared shieldability and in which the generation of defects is suppressed, and a solid-state imaging device. An infrared cut filter has: a transparent base 1; an infrared absorbing film 2 that contains an infrared absorbing agent; and a dielectric multi-layer film 3, the infrared absorbing film 2 has a maximum absorption wavelength in a wavelength region of 600 nm or greater, and a ratio B/A of, to absorbance A at the maximum absorption wavelength before the infrared absorbing film 2 is dipped in at least one organic solvent selected from propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, methyl 3-methoxypropionate, ethyl lactate, acetone, and ethanol, absorbance B at the wavelength at which the absorbance A is measured after the infrared absorbing film 2 is dipped in the organic solvent for 2 minutes at 25° C. is 0.9 or greater.
    Type: Application
    Filed: September 27, 2017
    Publication date: January 18, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Keisuke ARIMURA, Kazuto SHIMADA, Daisuke SASAKI, Yuki HIRAI, Tokihiko MATSUMURA, Takahiro OKAWARA