Patents by Inventor Kenichi AKAZAWA
Kenichi AKAZAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230026543Abstract: A break-in processing apparatus is disclosed, which can reliably perform a break-in process for an elastic membrane without reducing a utilization rate of a polishing apparatus. The break-in processing apparatus includes a stage to which an elastic membrane assembly including a carrier and an elastic membrane attached to the carrier is placed; a break-in determination module facing the elastic membrane placed to the stage; a fluid supply unit configured to supply a pressurized fluid into a pressure chamber formed between the outermost periphery portion of the elastic membrane and the carrier; and a controller configured to control operations of the break-in determination module and the fluid supply unit. The controller determines a completion of a break-in process of the elastic membrane based on a load applied to the break-in determination module by the elastic membrane which is expanded by the pressurized fluid supplied into the pressure chamber.Type: ApplicationFiled: July 15, 2022Publication date: January 26, 2023Inventors: Osamu NABEYA, Kenichi AKAZAWA
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Patent number: 11511389Abstract: Disclosed is a polishing head for a polishing apparatus for polishing a quadrangular substrate using a polishing pad attached to a polishing table, comprising a head body portion, a plurality of elastic bags disposed in a surface of the head body portion, which is to face the polishing table, and a substrate holding plate for holding the substrate, the substrate holding plate being pressed by the elastic bags in a direction away from the head body portion, the head body portion being provided with channels for bags, which are in communication with the respective elastic bags, the polishing head further including at least two support plates disposed between the elastic bags on one hand and the substrate holding plate on the other, the elastic bags being configured to press the substrate holding plate through the support plates.Type: GrantFiled: September 19, 2019Date of Patent: November 29, 2022Assignee: EBARA CORPORATIONInventors: Kenichi Akazawa, Makoto Kashiwagi, Yu Ishii, Atsushi Yoshida, Kenichi Kobayashi, Tetsuji Togawa, Hozumi Yasuda
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Publication number: 20220005716Abstract: To provide an automated apparatus for conveying a rectangular substrate. According to one embodiment, there is provided a substrate conveying apparatus for conveying the rectangular substrate. The substrate conveying apparatus includes a plurality of conveyance rollers, a plurality of roller shafts, a motor, and a pusher. The plurality of conveyance rollers are configured to support a lower surface of the substrate. To the plurality of roller shafts, the plurality of conveyance rollers are mounted. The motor is configured to rotate the plurality of roller shafts. The pusher is for lifting the substrate on the plurality of conveyance rollers such that the substrate is separated away from the plurality of conveyance rollers. The pusher includes a stage configured to pass through a clearance between the plurality of roller shafts.Type: ApplicationFiled: July 9, 2019Publication date: January 6, 2022Inventors: Akihiro Yazawa, Takashi Koba, Kenichi Kobayashi, Kenichi Akazawa, Fong-Jie Du, Makoto Kashiwagi, Asagi Matsugu, Takahiro Nanjo, Hideharu Aoyama, Takashi Mitsuya, Tetsuji Togawa
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Publication number: 20200094371Abstract: Disclosed is a polishing head for a polishing apparatus for polishing a quadrangular substrate using a polishing pad attached to a polishing table, comprising a head body portion, a plurality of elastic bags disposed in a surface of the head body portion, which is to face the polishing table, and a substrate holding plate for holding the substrate, the substrate holding plate being pressed by the elastic bags in a direction away from the head body portion, the head body portion being provided with channels for bags, which are in communication with the respective elastic bags, the polishing head further including at least two support plates disposed between the elastic bags on one hand and the substrate holding plate on the other, the elastic bags being configured to press the substrate holding plate through the support plates.Type: ApplicationFiled: September 19, 2019Publication date: March 26, 2020Inventors: Kenichi Akazawa, Makoto Kashiwagi, Yu Ishii, Atsushi Yoshida, Kenichi Kobayashi, Tetsuji Togawa, Hozumi Yasuda
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Patent number: 10593570Abstract: According to the present disclosure, there is provided a substrate holding module that is capable of accommodating a substrate transferred by a transfer robot. The substrate holding module includes a pedestal including a holding mechanism configured to hold the substrate, a cover configured to cover the pedestal, and a moving mechanism configured to move the cover away from the pedestal.Type: GrantFiled: February 1, 2017Date of Patent: March 17, 2020Assignee: Ebara CorporationInventors: Akihiro Yazawa, Kenichi Kobayashi, Kenichi Akazawa
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Patent number: 10525564Abstract: Disclosed is a reversing machine that reverses a substrate upside down. The reversing machine includes: a first arm pair configured to mount a substrate thereon; a second arm pair facing the first arm pair; an opening/closing mechanism configured to open/close the second arm pair so as to grip the substrate mounted on the first arm pair; and a rotating mechanism configured to rotate the first arm pair and the second arm pair around a predetermined axis that is set inside the first arm pair and the second arm pair and extends along an extension direction of the first arm pair and the second arm pair such that the substrate is reversed upside down.Type: GrantFiled: August 26, 2016Date of Patent: January 7, 2020Assignee: Ebara CorporationInventors: Kenichi Akazawa, Kenichi Kobayashi, Akihiro Yazawa, Manao Hoshina
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Patent number: 10160013Abstract: A rinsing bath which can simplify a discharging structure of a rinsing liquid is disclosed. The rinsing bath includes an inner bath for storing the rinsing liquid, an overflow bath configured to receive the rinsing liquid overflowing the inner bath, a stopper for closing a drain hole provided on a bottom of the inner bath, an actuator configured to move the stopper between a closing position in which the stopper closes the drain hole and a opening position in which the stopper is away from the drain hole, a rinsing liquid supply pipe configured to supply the rinsing liquid into the inner bath, and a drain pipe coupled to a bottom of the overflow bath. The drain hole communicates between an inside of the inner bath and an inside of the overflow bath.Type: GrantFiled: August 24, 2015Date of Patent: December 25, 2018Assignee: EBARA CORPORATIONInventors: Masahiko Sekimoto, Toshio Yokoyama, Kenichi Kobayashi, Kenichi Akazawa
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Patent number: 10141211Abstract: A substrate processing apparatus comprises a transferring device including a grasping section configured to grasp a substrate holder, and a transferring section configured to transfer the substrate holder grasped by the grasping section, and a processing bath for storing a substrate held by the substrate holder so that a surface of the substrate is vertically oriented, and processing the substrate. The grasping section is configured to grasp the substrate holder with a surface of the substrate oriented horizontally. The transferring section is configured to transfer the substrate holder above the processing bath, with the surface of the substrate oriented horizontally.Type: GrantFiled: August 29, 2017Date of Patent: November 27, 2018Assignee: EBARA CORPORATIONInventors: Toshio Yokoyama, Masahiko Sekimoto, Kenichi Kobayashi, Kenichi Akazawa, Takashi Mitsuya, Keiichi Kurashina
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Publication number: 20170358472Abstract: A substrate processing apparatus according to the present invention comprises a transferring device including a grasping section configured to grasp a substrate holder, and a transferring section configured to transfer the substrate holder grasped by the grasping section, and a processing bath for storing a substrate held by the substrate holder so that a surface of the substrate is vertically oriented, and processing the substrate. The grasping section is configured to grasp the substrate holder with a surface of the substrate oriented horizontally. The transferring section is configured to transfer the substrate holder above the processing bath, with the surface of the substrate oriented horizontally.Type: ApplicationFiled: August 29, 2017Publication date: December 14, 2017Inventors: Toshio YOKOYAMA, Masahiko SEKIMOTO, Kenichi KOBAYASHI, Kenichi AKAZAWA, Takashi MITSUYA, Keiichi KURASHINA
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Patent number: 9786532Abstract: A substrate processing apparatus is described herein. The substrate processing apparatus comprises a transferring device including: a grasping section configured to grasp a substrate holder, a transferring section configured to transfer the substrate holder grasped by the grasping section, and a processing bath for storing a substrate held by the substrate holder so that a surface of the substrate is vertically oriented. The grasping section is configured to grasp the substrate holder with a surface of the substrate oriented horizontally. The transferring section is configured to transfer the substrate holder above the processing bath, with the surface of the substrate oriented horizontally.Type: GrantFiled: March 23, 2015Date of Patent: October 10, 2017Assignee: EBARA CORPORATIONInventors: Toshio Yokoyama, Masahiko Sekimoto, Kenichi Kobayashi, Kenichi Akazawa, Takashi Mitsuya, Keiichi Kurashina
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Publication number: 20170236727Abstract: According to the present disclosure, there is provided a substrate holding module that is capable of accommodating a substrate transferred by a transfer robot. The substrate holding module includes a pedestal including a holding mechanism configured to hold the substrate, a cover configured to cover the pedestal, and a moving mechanism configured to move the cover away from the pedestal.Type: ApplicationFiled: February 1, 2017Publication date: August 17, 2017Inventors: Akihiro Yazawa, Kenichi Kobayashi, Kenichi Akazawa
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Publication number: 20170072531Abstract: Disclosed is a reversing machine that reverses a substrate upside down. The reversing machine includes: a first arm pair configured to mount a substrate thereon; a second arm pair facing the first arm pair; an opening/closing mechanism configured to open/close the second arm pair so as to grip the substrate mounted on the first arm pair; and a rotating mechanism configured to rotate the first arm pair and the second arm pair around a predetermined axis that is set inside the first arm pair and the second arm pair and extends along an extension direction of the first arm pair and the second arm pair such that the substrate is reversed upside down.Type: ApplicationFiled: August 26, 2016Publication date: March 16, 2017Inventors: Kenichi Akazawa, Kenichi Kobayashi, Akihiro Yazawa, Manao Hoshina
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Publication number: 20160059271Abstract: A rinsing bath which can simplify a discharging structure of a rinsing liquid is disclosed. The rinsing bath includes an inner bath for storing the rinsing liquid, an overflow bath configured to receive the rinsing liquid overflowing the inner bath, a stopper for closing a drain hole provided on a bottom of the inner bath, an actuator configured to move the stopper between a closing position in which the stopper closes the drain hole and a opening position in which the stopper is away from the drain hole, a rinsing liquid supply pipe configured to supply the rinsing liquid into the inner bath, and a drain pipe coupled to a bottom of the overflow bath. The drain hole communicates between an inside of the inner bath and an inside of the overflow bath.Type: ApplicationFiled: August 24, 2015Publication date: March 3, 2016Inventors: Masahiko SEKIMOTO, Toshio YOKOYAMA, Kenichi KOBAYASHI, Kenichi AKAZAWA
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Publication number: 20150270147Abstract: A substrate processing apparatus capable of inhibiting diffusion of a chemical solution atmosphere around a processing bath. The substrate processing apparatus has a processing bath for storing a substrate holder holding a substrate and for processing the substrate, a lifter configured to support the substrate holder, store the substrate holder in the processing bath, and take out the substrate holder from the processing bath, and a cover configured to cover the periphery of the substrate holder taken out from the processing bath by the lifter.Type: ApplicationFiled: March 23, 2015Publication date: September 24, 2015Inventors: Kenichi KOBAYASHI, Masahiko SEKIMOTO, Toshio YOKOYAMA, Kenichi AKAZAWA, Keiichi KURASHINA, Takashi MITSUYA
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Publication number: 20150270151Abstract: A substrate processing apparatus according to the present invention comprises a transferring device including a grasping section configured to grasp a substrate holder, and a transferring section configured to transfer the substrate holder grasped by the grasping section, and a processing bath for storing a substrate held by the substrate holder so that a surface of the substrate is vertically oriented, and processing the substrate. The grasping section is configured to grasp the substrate holder with a surface of the substrate oriented horizontally. The transferring section is configured to transfer the substrate holder above the processing bath, with the surface of the substrate oriented horizontally.Type: ApplicationFiled: March 23, 2015Publication date: September 24, 2015Inventors: Toshio YOKOYAMA, Masahiko SEKIMOTO, Kenichi KOBAYASHI, Kenichi AKAZAWA, Takashi MITSUYA, Keiichi KURASHINA
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Patent number: D981459Type: GrantFiled: June 16, 2021Date of Patent: March 21, 2023Assignee: EBARA CORPORATIONInventors: Kenichi Akazawa, Osamu Nabeya
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Patent number: D981969Type: GrantFiled: June 15, 2021Date of Patent: March 28, 2023Assignee: EBARA CORPORATIONInventors: Kenichi Akazawa, Tomoko Owada, Osamu Nabeya, Makoto Fukushima, Yuichi Kato
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Patent number: D989012Type: GrantFiled: March 16, 2021Date of Patent: June 13, 2023Assignee: EBARA CORPORATIONInventors: Kenichi Akazawa, Osamu Nabeya, Shingo Togashi, Satoru Yamaki, Tomoko Owada, Cheng Cheng, Yuichi Kato
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Patent number: D1021832Type: GrantFiled: April 19, 2023Date of Patent: April 9, 2024Assignee: EBARA CORPORATIONInventors: Kenichi Akazawa, Osamu Nabeya, Shingo Togashi, Satoru Yamaki, Tomoko Owada, Cheng Cheng, Yuichi Kato