Abstract: It is an object of the present invention to provide a cleaning solution for removing carbon-incorporated silicon oxide (SiOC) from the surface of a wafer in a step of producing a wafer having a material comprising the SiOC, and a cleaning method of using the same. The cleaning solution of the present invention comprises 2% by mass to 30% by mass of a fluorine compound, 0.0001% by mass to 20% by mass of a specific cationic surfactant that is an ammonium salt or an amine, and water, and has a pH value of 0 to 4.

Abstract: The present invention provides a system for accurate three-dimensional (3D) capture of apparel by 3D scanning and stereo photogrammetry. One or more flexible deflated bladders are inserted into an apparel and inflated by a filling media source. The bladder is inflated to measure at least one of size of the apparel, tensile strength of the fabric of the apparel, or cross section perimeter of the apparel. A rotating structure is anchored onto the stable structure to uniformly rotate all the fixed points of the apparel. One or more 3D scanners are configured to scan the inflated apparel on the stable structure and export the scanned data to one or more software applications. The processor retrieves the 3D scanned dimensional data from a searchable database and compares the given apparel's dimensions with one or more apparels' dimensions in the database to provide the customer with size recommendation via a display.

Abstract: An electronic device, a controller, and an operation method of an electronic device are disclosed. In one embodiment, an electronic device comprises a fingerprint sensor, a pressure detector, and at least one processor. The fingerprint sensor comprises a detecting surface, and is configured to detect a fingerprint of a finger touching the detecting surface. The pressure detector comprises a plurality of pressure sensors configured to detect pressure applied on the detecting surface. The at least one processor is configured to perform processing based on a fingerprint detection result of the fingerprint sensor and a pressure detection result of the pressure detector. The pressure detection result varies depending on a position on the detecting surface at which the pressure is applied.

Abstract: An electronic apparatus includes a communication unit configured to perform wireless communication, a storage, a first determiner, and an indoor specifying unit. The storage stores therein, as registered identification information, identification information whose contents are changeable, the identification information being allocated to a first communication device with which the communication unit is capable of performing wireless communication. The first determiner determines whether received identification information agrees with the registered identification information, the received identification information being the identification information received by the communication unit from a second communication device and allocated to the second communication device. The indoor specifying unit performs indoor specification to specify that a user having the electronic apparatus is indoors, based on a first result of determination by the first determiner.

Abstract: An electronic device and a control method are disclosed. In one embodiment, an electronic device comprises a case, a display, a fingerprint authentication area, and a light emitter. The display is located on at least one surface of the case. The fingerprint authentication area is located on a surface of the display. The light emitter is located inside the case. The fingerprint authentication area comprises an area through which light of the light emitter is visibly recognizable.

Abstract: According to the present invention, it is possible to provide a cleaning solution which removes a dry etching residue and photoresist on a surface of a semiconductor element having a low dielectric constant film (a low-k film) and at least one material selected from between a material that contains 10 atom % or more of titanium and a material that contains 10 atom % or more of tungsten, wherein the cleaning solution contains: 0.002-50 mass % of at least one type of oxidizing agent selected from among a peroxide, perchloric acid, and a perchlorate salt; 0.000001-5 mass % of an alkaline earth metal compound; and water.

Abstract: An electronic device includes a display (display unit), a camera (imaging unit), sensors, and a controller. The controller determines the state of the electronic device on the basis of a detection result of a first sensor among the sensors. The controller causes the display to display, when the determined state is a first state, a first overlay image in which first sensor information based on a detection result of a second sensor among the sensors is overlaid on an image captured by the camera. The controller causes the display to display, when the determined state is a second state, a second overlay image in which second sensor information based on the detection result of the second sensor among the plurality of sensors is overlaid on the image captured by the camera. The second sensor information differs from the first sensor information.

Abstract: An electronic apparatus comprises a display, a fingerprint sensor, a touch sensor, and at least one processor. The display displays an icon. The fingerprint sensor reads fingerprint information. The touch sensor detects a movement of a finger. The at least one processor executes, when the movement of the finger from the icon toward the fingerprint sensor is detected and fingerprint information is read by the fingerprint sensor, a function of the icon since the fingerprint information which has been read matches registered fingerprint information which has been previously registered.

Abstract: The present invention provides a system for accurate three-dimensional (3D) capture of apparel by 3D scanning and stereo photogrammetry. One or more flexible deflated bladders are inserted into an apparel and inflated by a filling media source. The bladder is inflated to measure at least one of size of the apparel, tensile strength of the fabric of the apparel, or cross section perimeter of the apparel. A rotating structure is anchored onto the stable structure to uniformly rotate all the fixed points of the apparel. One or more 3D scanners are configured to scan the inflated apparel on the stable structure and export the scanned data to one or more software applications. The processor retrieves the 3D scanned dimensional data from a searchable database and compares the given apparel's dimensions with one or more apparels' dimensions in the database to provide the customer with size recommendation via a display.

Abstract: An electronic apparatus comprises a display configured to display at least one icon, a fingerprint sensor configured to scan fingerprint information, a touch sensor configured to detect contact of a finger, and a controller configured to execute a function of a certain icon of the at least one icon. The controller executes the function of the certain icon based on the scanned fingerprint information and registered fingerprint information that is registered in advance if movement of a finger toward the certain icon is detected by at least one of the touch sensor and the fingerprint sensor.

Abstract: The present invention relates to a wet etching composition for a substrate having a SiN layer and a Si layer, comprising 0.1-50 mass % fluorine compound (A), 0.04-10 mass % oxidant (B) and water (D) and having pH in a range of 2.0-5.0. The present invention also relates to a wet etching process for a semiconductor substrate having a SiN layer and a Si layer, the process using the wet etching composition. The composition of the present invention can be used for a substrate having a SiN layer and a Si layer to enhance removal selectivity of Si over SiN while reducing corrosion of the device and the exhaust line and air pollution caused by a volatile component generated upon use and further a burden on the environment caused by the nitrogen content contained in the composition.

Abstract: An electronic device includes a proximity sensor, a touch sensor, and a controller that turns the proximity sensor on when it is judged that the electronic device is wet on the basis of an output of the touch sensor.

Abstract: A liquid composition for imparting alcohol-repellency to a semiconductor substrate material and a method for treating a semiconductor substrate surface using the liquid composition, are disclosed. The liquid composition contains: a surfactant (A) having a substituent of formula (1) (where n is an integer of 3 to 20), and an anionic hydrophilic group; and a compound (B) being selected from the group consisting of compounds having a polyethylenimine and a substituent of formula (2) or formula (3) (where R1, R2, R3 and R4 are each independently hydrogen or a C1-6 alkyl, alkenyl, alkynyl, or aryl, and X? is a fluoride ion, a chloride ion, a bromide ion, an iodide ion, a fluoroborate ion, a phosphate ion, an acetate ion, a trifluoroacetate ion, a sulfate ion, a hydrogen sulfate ion, a methane sulfate ion, a hydroxide ion, a perchlorate ion, or a nitrate ion).

Abstract: According to the present invention, it is possible to provide a cleaning method for removing a photoresist and dry etching residue on a surface of a semiconductor element having a low-k film and a material that contains 10 atom % or more of tantalum, wherein the cleaning method is characterized by using a cleaning solution that contains 0.002-50 mass % of hydrogen peroxide, 0.001-1 mass % of an alkaline earth metal compound, an alkali, and water.

Abstract: An electronic device includes a voice input unit, a location sensor that acquires location information indicating a current location of the device itself, and a controller that can recognize voice input to the voice input unit. If the controller determines that a user is not carrying out a schedule as planned in schedule information of the user stored in advance based on the schedule information, and at least one of the location information and recognized predetermined voice other than voice of the user, the controller notifies the user of predetermined information.

Abstract: The present invention makes it possible to provide a semiconductor element cleaning method that is characterized in that: a hard mask pattern is formed on a substrate that has a low relative permittivity film and at least one of a cobalt, a cobalt alloy, or a tungsten plug; and a cleaning liquid that contains 0.001-20% by mass of an alkali metallic compound, 0.1-30% by mass of quaternary ammonium hydroxide, 0.01-60% by mass of a organic water-soluble solvent, 0.0001-0.1% by mass of hydrogen peroxide, and water is subsequently used on a semiconductor element in which, using the hard mask pattern as a mask, the hard mask, the low relative permittivity film, and a barrier insulating film are dry etched, and dry etch residues are removed.

Abstract: An electronic apparatus is disclosed. An electronic apparatus includes: a touch area on a surface of the electronic apparatus; a fingerprint sensor; and at least one processor. The at least one processor is configured to: execute a first operation of an application; cause the fingerprint sensor to detect a touch of a finger of a user on the touch area; cause the fingerprint sensor to obtain a fingerprint of the finger in response to the detection of the touch; cause the fingerprint sensor to measure a force of the finger to the touch area, and change the first operation in accordance with the force if the fingerprint is identical to a predetermined fingerprint.

Abstract: It is an object of the present invention to provide a cleaning solution for removing carbon-incorporated silicon oxide (SiOC) from the surface of a wafer in a step of producing a wafer having a material comprising the SiOC, and a cleaning method of using the same. The cleaning solution of the present invention comprises 2% by mass to 30% by mass of a fluorine compound, 0.0001% by mass to 20% by mass of a specific cationic surfactant that is an ammonium salt or an amine, and water, and has a pH value of 0 to 4.

Abstract: According to the present invention, it is possible to provide a cleaning solution which removes a dry etching residue and photoresist on a surface of a semiconductor element having a low dielectric constant film (a low-k film) and at least one material selected from between a material that contains 10 atom % or more of titanium and a material that contains 10 atom % or more of tungsten, wherein the cleaning solution contains: 0.002-50 mass % of at least one type of oxidizing agent selected from among a peroxide, perchloric acid, and a perchlorate salt; 0.000001-5 mass % of an alkaline earth metal compound; and water.

Abstract: A liquid semiconductor device cleaning composition used in a process of fabricating a semiconductor integrated circuit, for removing a hard mask or a dry etch residue while suppressing damage to a low-dielectric-constant interlayer dielectric film and cobalt or a cobalt alloy, where the liquid semiconductor device cleaning composition contains hydrogen peroxide at 10-30% by mass, potassium hydroxide at 0.005-0.7% by mass, aminopolymethylene phosphonic acid at 0.00001-0.01% by mass, at least one selected from amines and azoles at 0.001-5% by mass and water. A semiconductor device can be cleaned by bringing the liquid cleaning composition into contact with the semiconductor device.