Patents by Inventor Kenji Terao
Kenji Terao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240067763Abstract: The solid titanium catalyst component (I) of the present invention contains titanium, magnesium, halogen, and a cyclic multiple-ester-group-containing compound (a) represented by the following formula (1).Type: ApplicationFiled: August 26, 2021Publication date: February 29, 2024Applicant: MITSUI CHEMICALS, INC.Inventors: Takashi KIMURA, Makoto ISOGAI, Yasushi NAKAYAMA, Kenji MICHIUE, Takashi JINNAI, Wataru YAMADA, Shotaro TAKANO, Hiroshi TERAO, Takaaki YANO, Yoshiyuki TOTANI, Sunil Krzysztof MOORTHI, Takashi NAKANO
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Publication number: 20240067764Abstract: A solid titanium catalyst component (I) for olefin polymer production contains titanium, magnesium, halogen, and a cyclic multiple-ester-group-containing compound (a) represented by the formula (1). Preferably, a propylene polymer that is obtained by the olefin polymerization method and has specific thermal properties as determined primarily by differential scanning calorimetry (DSC).Type: ApplicationFiled: December 21, 2021Publication date: February 29, 2024Applicant: MITSUI CHEMICALS, INC.Inventors: Takashi KIMURA, Makoto ISOGAI, Yasushi NAKAYAMA, Kenji MICHIUE, Takashi JINNAI, Wataru YAMADA, Shotaro TAKANO, Hiroshi TERAO, Takaaki YANO, Yoshiyuki TOTANI, Sunil Krzysztof MOORTHI, Takashi NAKANO
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Publication number: 20230271006Abstract: Provided is a method for treating a living body using an electrical stimulator including a base wire having a core wire and an outer winding wire wound around the core wire. An annulus is formed by winding the base wire in a loop shape. A first end of the core wire is electrically connected to a first end of the outer winding wire. A second end of the core wire is connected to a first terminal of an external circuit. A second end of the outer winding wire is connected to a second terminal of the external circuit. The method includes holding the living body or a part of the living body of a subject in the annulus and generating an alternating current in the external circuit for a therapeutically effective time period to apply an electrical stimulation to the living body or the part of the living body.Type: ApplicationFiled: February 15, 2023Publication date: August 31, 2023Inventors: Tsunaki KANEKO, Masaki SAITO, Thitaporn DETMOD, Kenji TERAO, Masafumi OHSAKO, Xueqian ZENG
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Patent number: 10734827Abstract: A power supply system includes a DC-DC converter, a relay, and a control unit configured to i) start up the DC-DC converter based on a state transition of an ignition signal from OFF to ON, ii) cause the DC-DC converter to output a first low voltage when a high-voltage battery is connected to the DC-DC converter by the relay, iii) cause the DC-DC converter to output a voltage specified by an output voltage command in a case where the output voltage command is provided from a high-order ECU after output of the first low voltage is started, and iv) cause the DC-DC converter to output a fixed voltage higher than the first low voltage in a case where the output voltage command is not provided from the high-order ECU by a time at which a first time elapses after the output of the first low voltage is started.Type: GrantFiled: October 2, 2018Date of Patent: August 4, 2020Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHAInventor: Kenji Terao
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Patent number: 10446404Abstract: Provided is a method of adjusting an electron-beam irradiated area in an electron beam irradiation apparatus that deflects an electron beam with a deflector to irradiate an object with the electron beam, the method including: emitting an electron beam while changing an irradiation position on an adjustment plate by controlling the deflector in accordance with an electron beam irradiation recipe, the adjustment plate detecting a current corresponding to the emitted electron beam; acquiring a current value detected from the adjustment plate; forming image data corresponding to the acquired current value; determining whether the electron-beam irradiated area is appropriate based on the formed image data; and updating the electron beam irradiation recipe when the electron-beam irradiated area is determined not to be appropriate.Type: GrantFiled: January 17, 2018Date of Patent: October 15, 2019Assignee: EBARA CORPORATIONInventors: Ryo Tajima, Masahiro Hatakeyama, Kenichi Suematsu, Kiwamu Tsukamoto, Kenji Watanabe, Shoji Yoshikawa, Shinichi Okada, Kenji Terao
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Publication number: 20190173291Abstract: A power supply system includes a DC-DC converter, a relay, and a control unit configured to i) start up the DC-DC converter based on a state transition of an ignition signal from OFF to ON, ii) cause the DC-DC converter to output a first low voltage when a high-voltage battery is connected to the DC-DC converter by the relay, iii) cause the DC-DC converter to output a voltage specified by an output voltage command in a case where the output voltage command is provided from a high-order ECU after output of the first low voltage is started, and iv) cause the DC-DC converter to output a fixed voltage higher than the first low voltage in a case where the output voltage command is not provided from the high-order ECU by a time at which a first time elapses after the output of the first low voltage is started.Type: ApplicationFiled: October 2, 2018Publication date: June 6, 2019Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHAInventor: Kenji TERAO
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Publication number: 20180233374Abstract: Provided is a method of adjusting an electron-beam irradiated area in an electron beam irradiation apparatus that deflects an electron beam with a deflector to irradiate an object with the electron beam, the method including: emitting an electron beam while changing an irradiation position on an adjustment plate by controlling the deflector in accordance with an electron beam irradiation recipe, the adjustment plate detecting a current corresponding to the emitted electron beam; acquiring a current value detected from the adjustment plate; forming image data corresponding to the acquired current value; determining whether the electron-beam irradiated area is appropriate based on the formed image data; and updating the electron beam irradiation recipe when the electron-beam irradiated area is determined not to be appropriate.Type: ApplicationFiled: January 17, 2018Publication date: August 16, 2018Inventors: Ryo TAJIMA, Masahiro HATAKEYAMA, Kenichi SUEMATSU, Kiwamu TSUKAMOTO, Kenji WATANABE, Shoji YOSHIKAWA, Shinichi OKADA, Kenji TERAO
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Patent number: 10002740Abstract: An electron beam inspection device includes: a primary electron optical system that irradiates the surface of a sample with an electron beam; and a secondary electron optical system that gathers secondary electrons emitted from the sample and forms an image on the sensor surface of a detector. An electron image of the surface of the sample is obtained from a signal detected by the detector, and the sample is inspected. A cylindrical member that is formed with conductors stacked as an inner layer and an outer layer, and an insulator stacked as an intermediate layer is provided inside a lens tube into which the secondary electron optical system is incorporated. An electron orbital path is formed inside the cylindrical member, and the members constituting the secondary electron optical system are arranged outside the cylindrical member.Type: GrantFiled: August 2, 2017Date of Patent: June 19, 2018Assignee: EBARA CORPORATIONInventors: Masahiro Hatakeyama, Ryo Tajima, Kenichi Suematsu, Kenji Watanabe, Yasushi Toma, Kenji Terao, Takeshi Murakami
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Patent number: 9966227Abstract: A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed.Type: GrantFiled: November 5, 2014Date of Patent: May 8, 2018Assignee: EBARA CORPORATIONInventors: Masahiro Hatakeyama, Takeshi Murakami, Yoshihiko Naito, Kenji Terao, Norio Kimura, Kenji Watanabe
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Publication number: 20180040452Abstract: An electron beam inspection device includes: a primary electron optical system that irradiates the surface of a sample with an electron beam; and a secondary electron optical system that gathers secondary electrons emitted from the sample and forms an image on the sensor surface of a detector. An electron image of the surface of the sample is obtained from a signal detected by the detector, and the sample is inspected. A cylindrical member that is formed with conductors stacked as an inner layer and an outer layer, and an insulator stacked as an intermediate layer is provided inside a lens tube into which the secondary electron optical system is incorporated. An electron orbital path is formed inside the cylindrical member, and the members constituting the secondary electron optical system are arranged outside the cylindrical member.Type: ApplicationFiled: August 2, 2017Publication date: February 8, 2018Inventors: Masahiro HATAKEYAMA, Ryo TAJIMA, Kenichi SUEMATSU, Kenji WATANABE, Yasushi TOMA, Kenji TERAO, Takeshi MURAKAMI
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Patent number: 9852878Abstract: A surface processing apparatus is an apparatus which performs surface processing on an inspection object 20 by irradiating the inspection object with an electron beam. A surface processing apparatus includes: an electron source 10 (including lens system that controls beam shape of electron beam) which generates an electron beam; a stage 30 on which an inspection object 20 to be irradiated with the electron beam is set; and an optical microscope 110 for checking a position to be irradiated with the electron beam. The current value of the electron beam which irradiates the inspection object 20 is set at 10 nA to 100 A.Type: GrantFiled: June 23, 2015Date of Patent: December 26, 2017Assignee: EBARA CORPORATIONInventors: Masahiro Hatakeyama, Kenichi Suematsu, Ryo Tajima, Kiwamu Tsukamoto, Kenji Terao, Shoji Yoshikawa
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Publication number: 20150371813Abstract: A surface processing apparatus is an apparatus which performs surface processing on an inspection object 20 by irradiating the inspection object with an electron beam. A surface processing apparatus includes: an electron source 10 (including lens system that controls beam shape of electron beam) which generates an electron beam; a stage 30 on which an inspection object 20 to be irradiated with the electron beam is set; and an optical microscope 110 for checking a position to be irradiated with the electron beam. The current value of the electron beam which irradiates the inspection object 20 is set at 10 nA to 100 A.Type: ApplicationFiled: June 23, 2015Publication date: December 24, 2015Inventors: Masahiro HATAKEYAMA, Kenichi SUEMATSU, Ryo TAJIMA, Kiwamu TSUKAMOTO, Kenji TERAO, Shoji YOSHIKAWA
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Patent number: 9194826Abstract: The electron beam apparatus is provided with a stage for mounting a sample thereon, a primary optical system for generating an electron beam having an irradiation area and irradiating the electron beam onto the sample, a secondary optical system for detecting electrons which have been generated through the irradiation of the electron beam onto the sample and have acquired structural information of the sample and acquiring an image of the sample about a viewing area and an irradiation area changing section for changing the position of the irradiation area with respect to the viewing area.Type: GrantFiled: April 15, 2008Date of Patent: November 24, 2015Assignee: EBARA CORPORATIONInventors: Toru Kaga, Kenji Terao, Masahiro Hatakeyama, Kenji Watanabe, Yoshihiko Naito, Takeshi Murakami, Norio Kimura
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Patent number: 9105444Abstract: An electro-optical inspection apparatus is provided that is capable of preventing adhesion of dust or particles to the sample surface as much as possible. A stage (100) on which a sample (200) is placed is disposed inside a vacuum chamber (112) that can be evacuated to vacuum, and a dust collecting electrode (122) is disposed to surround a periphery of the sample (200). The dust collecting electrode (122) is applied with a voltage having the same polarity as a voltage applied to the sample (200) and an absolute value that is the same or larger than an absolute value of the voltage. Thus, because dust or particles such as particles adhere to the dust collecting electrode (122), adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber containing the stage, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied.Type: GrantFiled: December 4, 2013Date of Patent: August 11, 2015Assignee: EBARA CORPORATIONInventors: Kenji Watanabe, Masahiro Hatakeyama, Yoshihiko Naito, Tatsuya Kohama, Kenji Terao, Takeshi Murakami, Takehide Hayashi, Kiwamu Tsukamoto, Hiroshi Sobukawa, Norio Kimura
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Publication number: 20150060666Abstract: A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed.Type: ApplicationFiled: November 5, 2014Publication date: March 5, 2015Applicant: EBARA CORPORATIONInventors: Masahiro Hatakeyama, Takeshi Murakami, Yoshihiko Naito, Kenji Terao, Norio Kimura, Kenji Watanabe
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Patent number: 8937283Abstract: A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed.Type: GrantFiled: April 10, 2009Date of Patent: January 20, 2015Assignee: Ebara CorporationInventors: Masahiro Hatakeyama, Takeshi Murakami, Yoshihiko Naito, Kenji Terao, Norio Kimura, Kenji Watanabe
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Patent number: 8859984Abstract: Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.Type: GrantFiled: July 30, 2013Date of Patent: October 14, 2014Assignee: Ebara CorporationInventors: Nobuharu Noji, Yoshihiko Naito, Hirosi Sobukawa, Kenji Terao, Masahiro Hatakeyama, Katsuya Okumura
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Publication number: 20140091215Abstract: An electro-optical inspection apparatus is provided that is capable of preventing adhesion of dust or particles to the sample surface as much as possible. A stage (100) on which a sample (200) is placed is disposed inside a vacuum chamber (112) that can be evacuated to vacuum, and a dust collecting electrode (122) is disposed to surround a periphery of the sample (200). The dust collecting electrode (122) is applied with a voltage having the same polarity as a voltage applied to the sample (200) and an absolute value that is the same or larger than an absolute value of the voltage. Thus, because dust or particles such as particles adhere to the dust collecting electrode (122), adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber containing the stage, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied.Type: ApplicationFiled: December 4, 2013Publication date: April 3, 2014Applicant: Ebara CorporationInventors: Kenji WATANABE, Masahiro HATAKEYAMA, Yoshihiko NAITO, Tatsuya KOHAMA, Kenji TERAO, Takeshi MURAKAMI, Takehide HAYASHI, Kiwamu TSUKAMOTO, Hiroshi SOBUKAWA, Norio KIMURA
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Patent number: 8624182Abstract: An electro-optical inspection apparatus prevents adhesion of dust or particles to a sample surface, wherein a stage on which a sample is placed is disposed inside a vacuum chamber that can be evacuated, and a dust collecting electrode is disposed to surround a periphery of the sample. The dust collecting electrode is applied with a voltage having the same polarity as a voltage applied to the sample and an absolute value that is the same or larger than an absolute value of the voltage. Because dust or particles adhere to the dust collecting electrode, adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied.Type: GrantFiled: August 2, 2011Date of Patent: January 7, 2014Assignee: Ebara CorporationInventors: Kenji Watanabe, Masahiro Hatakeyama, Yoshihiko Naito, Tatsuya Kohama, Kenji Terao, Takeshi Murakami, Takehide Hayashi, Kiwamu Tsukamoto, Hiroshi Sobukawa, Norio Kimura
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Publication number: 20130313429Abstract: Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.Type: ApplicationFiled: July 30, 2013Publication date: November 28, 2013Applicant: EBARA CORPORATIONInventors: Nobuharu Noji, Yoshihiko Naito, Hirosi Sobukawa, Kenji Terao, Masahiro Hatakeyama, Katsuya Okumura