Patents by Inventor Ki-Beom Lee

Ki-Beom Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190058782
    Abstract: According to an embodiment of the present disclosure, there is provided a stand-holder for a portable terminal, the stand-holder including: a support portion fixed to a rear surface of the portable terminal; a holding portion; and a coupling portion configured to couple the support portion and the holding portion, and having both ends. One of the both ends of the coupling portion is rotatably coupled to the support portion to be rotatable relative to the support portion, and the other end of the coupling portion is coupled to the holding portion to enable the holding portion to be rotated.
    Type: Application
    Filed: September 19, 2018
    Publication date: February 21, 2019
    Inventor: Ki Beom LEE
  • Publication number: 20180122379
    Abstract: An approach for controlling method of an electronic device is provided. The approach acquires voice information and image information for setting an action to be executed according to a condition, the voice information and the image information being respectively generated from a voice and a behavior associated with the voice of a user. The approach determines an event to be detected according to the condition and a function to be executed according to the action when the event is detected, based on the acquired voice information and the acquired image information. The approach determines at least one detection resource to detect the determined event. In response to the at least one determined detection resource detecting at least one event satisfying the condition, the approach executes the function according to the action.
    Type: Application
    Filed: November 3, 2017
    Publication date: May 3, 2018
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Young-chul SOHN, Gyu-tae PARK, Ki-beom LEE, Jong-ryul LEE
  • Patent number: 9921488
    Abstract: A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.
    Type: Grant
    Filed: February 3, 2015
    Date of Patent: March 20, 2018
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jun-Ho Sim, Jung-In Park, Ki-Beom Lee, Hi-Kuk Lee, Hyun-Seok Kim, Kab-Jong Seo, Sang-Hyun Yun, Sang-Hyun Lee, Jung-Chul Heo, Jong-Joo Kim, Chang-Hoon Kim
  • Patent number: 9835951
    Abstract: Embodiments of the present invention provide a roll-to-roll exposure system having a reference mark array and alignment scope units for precisely measuring the position and orientation of an object on a flexible multilayered circuit film. A roll-to-roll exposure system according to an exemplary embodiment of the present invention includes: a plurality of rolls configured to move a flexible multilayered circuit film having an object positioned thereon; alignment scope units positioned so as to be spaced apart from each other and proximate to the rolls; and at least one exposure unit positioned so as to be spaced proximate to the rolls and spaced apart from sides of the alignment scope units, in which one of the rolls has a reference mark array on its surface.
    Type: Grant
    Filed: November 5, 2015
    Date of Patent: December 5, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jae Hyuk Chang, Sang Hyun Yun, Ki Beom Lee, Hi Kuk Lee
  • Patent number: 9746780
    Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.
    Type: Grant
    Filed: June 19, 2015
    Date of Patent: August 29, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Hyun-Seok Kim, Sang-Hyun Yun, Hi-Kuk Lee, Jae-Hyuk Chang, Sang-Hyun Lee, Jung-In Park, Jung-Chul Heo, Kab-Jong Seo, Ki-Beom Lee, Jun-Ho Sim
  • Patent number: 9746767
    Abstract: A photoresist composition including 5 wt % to 10 wt % of a binder resin, 5 wt % to 10 wt % of a photopolymerization monomer, 1 wt % to 5 wt % of a photopolymerization initiator comprising an oxime ester-based compound and activated by light in a wavelength range of 400 nm to 410 nm, 5 wt % to 10 wt % of a black coloring agent, and a residual amount of a solvent.
    Type: Grant
    Filed: October 13, 2015
    Date of Patent: August 29, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Ki Beom Lee, Hyun-Seok Kim, Hi Kuk Lee, Jae Hyuk Chang
  • Patent number: 9690204
    Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.
    Type: Grant
    Filed: March 20, 2015
    Date of Patent: June 27, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Sang-Hyun Lee, Hyun-Seok Kim, Jung-Chul Heo, Hi-Kuk Lee, Sang-Hyun Yun, Ki-Beom Lee, Chang-Hoon Kim, Jung-In Park, Kab-Jong Seo, Jun-Ho Sim, Jae-Hyuk Chang
  • Patent number: 9645450
    Abstract: Exemplary embodiments of the invention relate to an alignment apparatus including a source unit providing an electromagnetic signal, a receiving unit detecting the provided electromagnetic signal, and a polarization element positioned between the source unit and the receiving unit and having a transmissive axis fixed in a predetermined direction. A substrate may be positioned between the source unit and the receiving unit, and may be formed with a polarizer including a plurality of metal lines with a minute linear pattern. The luminance or intensity of the electromagnetic signal may be detected by the receiving unit while rotating the substrate.
    Type: Grant
    Filed: April 26, 2013
    Date of Patent: May 9, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jae Hyuk Chang, Hi Kuk Lee, Cha-Dong Kim, Sang Hyun Yun, Jung-In Park, Chang Hoon Kim, Ki Beom Lee
  • Patent number: 9594307
    Abstract: An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.
    Type: Grant
    Filed: March 26, 2014
    Date of Patent: March 14, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Cha-Dong Kim, Hoon Kang, Chang-Hoon Kim, Sang-Hyun Yun, Jung-In Park, Woo-Yong Sung, Ki-Beom Lee, Hi-Kuk Lee, Jae-Hyuk Chang
  • Patent number: 9535333
    Abstract: A maskless exposure device includes a plurality of exposure heads, each exposure head including a digital micro-mirror device configured to scan an exposure beam to a substrate, the exposure heads being disposed in staggered first and second rows, a plurality of reflecting members disposed on side surfaces of the exposure heads and having reflecting surfaces parallel with each other, a light emitting part configured to light to the reflecting members, and a light receiving part configured to receive light via the reflecting members.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: January 3, 2017
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Kab-Jong Seo, Hi-Kuk Lee, Jae-Hyuk Chang, Ki-Beom Lee
  • Patent number: 9481535
    Abstract: A vacuum roll-to-roll device includes: a first chamber; a second chamber neighboring the first chamber; a shutter disposed between the first chamber and the second chamber; a sealing member attached to the shutter; and a roll-type substrate which moves from the first chamber to the second chamber through the sealing member. A thickness of a lateral side of the roll-type substrate decreases in a direction toward an edge thereof.
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: November 1, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Sang-Mi Kim, Gug Rae Jo, Jae Hyuk Chang, Seung-Jun Lee, Seung-Min Lee, Dae-Young Lee, Ki-Beom Lee
  • Patent number: 9436098
    Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: September 6, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jung-Chul Heo, Hi-Kuk Lee, Jae-Hyuk Chang, Sang-Hyun Lee, Jung-In Park, Sang-Hyun Yun, Ki-Beom Lee, Hyun-Seok Kim, Kab-Jong Seo, Jun-Ho Sim, Byoung-Min Yun, Sang-Don Jang, Jae-Young Jang, Chang-Hoon Kim
  • Publication number: 20160209756
    Abstract: Embodiments of the present invention provide a roll-to-roll exposure system having a reference mark array and alignment scope units for precisely measuring the position and orientation of an object on a flexible multilayered circuit film. A roll-to-roll exposure system according to an exemplary embodiment of the present invention includes: a plurality of rolls configured to move a flexible multilayered circuit film having an object positioned thereon; alignment scope units positioned so as to be spaced apart from each other and proximate to the rolls; and at least one exposure unit positioned so as to be spaced proximate to the rolls and spaced apart from sides of the alignment scope units, in which one of the rolls has a reference mark array on its surface.
    Type: Application
    Filed: November 5, 2015
    Publication date: July 21, 2016
    Inventors: Jae Hyuk CHANG, Sang Hyun YUN, Ki Beom LEE, Hi Kuk LEE
  • Publication number: 20160202615
    Abstract: A maskless exposure device includes a plurality of exposure heads, each exposure head including a digital micro-mirror device configured to scan an exposure beam to a substrate, the exposure heads being disposed in staggered first and second rows, a plurality of reflecting members disposed on side surfaces of the exposure heads and having reflecting surfaces parallel with each other, a light emitting part configured to light to the reflecting members, and a light receiving part configured to receive light via the reflecting members.
    Type: Application
    Filed: August 26, 2015
    Publication date: July 14, 2016
    Inventors: KAB-JONG SEO, Hi-Kuk Lee, Jae-Hyuk Chang, Ki-Beom Lee
  • Publication number: 20160195806
    Abstract: A photoresist composition including 5 wt % to 10 wt % of a binder resin, 5 wt % to 10 wt % of a photopolymerization monomer, 1 wt % to 5 wt % of a photopolymerization initiator comprising an oxime ester-based compound and activated by light in a wavelength range of 400 nm to 410 nm, 5 wt % to 10 wt % of a black coloring agent, and a residual amount of a solvent.
    Type: Application
    Filed: October 13, 2015
    Publication date: July 7, 2016
    Inventors: Ki Beom LEE, Hyun-Seok KIM, Hi Kuk LEE, Jae Hyuk CHANG
  • Patent number: 9383651
    Abstract: In an aspect, a grating light valve module including: a substrate; and a plurality of ribbons disposed on the substrate, wherein each of the ribbons includes an insulating layer, a conductive layer disposed on the insulating layer, and an anti-oxidation layer disposed on the conductive layer is provided.
    Type: Grant
    Filed: February 25, 2014
    Date of Patent: July 5, 2016
    Assignee: Samsung Display Co., Ltd.
    Inventors: Hi Kuk Lee, Tsunemitsu Torigoe, Chang Hoon Kim, Ki Beom Lee, Su-Yeon Sim, Sang Hyun Lee
  • Patent number: 9335631
    Abstract: A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: May 10, 2016
    Assignee: Samsung Display Co., Ltd.
    Inventors: Ki-Beom Lee, Sang-Hyun Yun, Hi-Kuk Lee, Jae-Hyuk Chang, Chang-Hoon Kim, Jung-In Park
  • Publication number: 20160116847
    Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.
    Type: Application
    Filed: June 19, 2015
    Publication date: April 28, 2016
    Inventors: Hyun-Seok Kim, Sang-Hyun Yun, Hi-Kuk Lee, Jae-Hyuk Chang, Sang-Hyun Lee, Jung-In Park, Jung-Chul Heo, Kab-Jong Seo, Ki-Beom Lee, Jun-Ho Sim
  • Publication number: 20160077449
    Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.
    Type: Application
    Filed: March 2, 2015
    Publication date: March 17, 2016
    Inventors: Jung-Chul HEO, Hi-Kuk LEE, Jae-Hyuk CHANG, Sang-Hyun LEE, Jung-In PARK, Sang-Hyun YUN, Ki-Beom LEE, Hyun-Seok KIM, Kab-Jong SEO, Jun-Ho SIM, Byoung-Min YUN, Sang-Don JANG, Jae-Young JANG, Chang-Hoon KIM
  • Publication number: 20160062180
    Abstract: A color filter composition includes a mill base including a pigment, an initiator, and a solvent. The initiator is a compound including an oxime group and a light absorbance unit, as expressed in Formula 1. In Formula 1, X, Y, and R1 are identical to or different from each other and are independently a C1 to C12 alkyl based group or a phenyl based group. The light absorbance unit includes at least one of an acetophenone based group, a benzoin based group, a benzophenone based group, and a triazine based group.
    Type: Application
    Filed: July 21, 2015
    Publication date: March 3, 2016
    Inventors: Hi Kuk LEE, Tsunemitsu TORIGOE, Chang Hoon KIM, Ki Beom LEE, Su-Yeon SIM, Sang Hyun LEE