Abstract: An atomic magnetometer includes a cell containing an atomic group, a pump light source, a probe light source, a mirror, and a detector. The cell is disposed between the pump light source and the mirror and between the probe light source and the detector. A pump beam emitted from the pump light source is circularly polarized light. The pump beam passes through the cell and is reflected by the mirror and then passes through the cell again. The probe beam emitted from the probe light source is linearly polarized light. An optical path of the probe beam is parallel to the plane of incidence of the pump beam and is also parallel to the surface of the mirror. The optical path of the probe beam crosses the optical path of the pump beam in the cell. The probe beam which has passed through the cell enters the detector.

Abstract: It is disclosed a method of forming fine patterns comprising: covering a substrate having photoresist patterns thereon made of a photoresist composition which is sensitive to high energy light rays with wavelength of 200 nm or shorter or electron beam radiation, with an over-coating agent for forming fine patterns, applying heat treatment to cause thermal shrinkage of the over-coating agent so that the spacing between adjacent photoresist patterns is lessened by the resulting thermal shrinking action, and removing the over-coating agent substantially completely. The present invention provides a method of forming fine patterns whereby fine patterns having pattern width or diameter of 100 nm or shorter and being excellent in uniformity (in-plane uniformity), etc. can be formed by ultrafine processing using high energy light rays with wavelength of 200 nm or shorter or electron beams.

Abstract: A digital-to-analog converter generates a voltage from power supply and ground voltages, generates upper and lower limit reference voltages for a reference width which regards the generated voltage as an intermediate potential, converts a change in an analog input signal with respect to the upper and lower limit reference voltages into a digital code, and performs a control in order to achieve a sample and hold of the analog input signal.

Abstract: An analog-to-digital (AD) converter device, includes: a capacitive digital-to-analog converter (DAC) including a reference capacitor group having capacitors which are weighted with a ratio, one terminal of each of the capacitors being coupled to a common signal line, the other terminal of each of the capacitors being coupled to one of reference power supplies via one of switches; a comparator to compare a voltage of the common signal line with a reference voltage; a successive approximation routine circuit to control the switches based on a comparison result of the comparator; an offset correction circuit to correct an offset of the comparator; and a DAC correction circuit to correct an error in a voltage change of the common signal line, the offset correction circuit and the DAC correction circuit performing a correction so that a residual offset of the comparator and a residual error of the capacitive DAC cancel.

Abstract: A polarization gain medium such as an emitting laser diode provides the optical pumping. An atomic vapor cell is positioned in the laser cavity providing spontaneous push-pull optical pumping inside the laser cavity. This causes the laser beam to be modulated at hyperfine-resonance frequency. A clock signal is obtained from electrical modulation across the laser diode.

Abstract: An analog-to-digital converter circuit includes: a capacitor array including a plurality of first capacitors, each having a first terminal connecting to a common node and having a capacitance represented by the nth power of 2 (2n) on the basis of the smallest of the capacitances of the first capacitors=1; a second capacitor for contributing to attenuation of the voltage on the common node; a switch array, each switch of the switch array supplying and disconnecting one of a first reference voltage, a second reference voltage, and the voltage of an input signal to and from a second terminal of an associated one of the first capacitors; a second switch supplying and disconnecting a third reference voltage to and from the common node; a comparator comparing a voltage on the common node with the third reference voltage; and a control circuit controlling the first switches and the second switch.

Abstract: There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask. The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.

Abstract: The present invention provides a material for forming a protective film that has favorable alkali solubility and gives a protective film excelling in water repellency, as well as a method for forming a photoresist pattern using this material for forming a protective film. The material for forming a protective film of the present invention contains an alkali-soluble polymer having a unit derived from a monomer represented by the following general formula (A-1) as a constitutional unit. In the general formula (A-1), R1 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or the like; R2, R3, and R4 are each independently an alkylene chain having 1 to 6 carbon atoms or the like; R5 and R6 are each independently an alkyl group or fluoroalkyl group having 1 to 15 carbon atoms or the like; and at least one of R5 and R6 is a fluoroalkyl group; Z is an alkylene chain having 1 to 2 carbon atoms or an oxygen atom; m is 0 or 1; and n is an integer of 0 to 3.

Abstract: The present invention relates to a method and system for polarizing a solid compound of interest via spin transfer from an optically-pumped alkali vapor. In one embodiment, the method provides a cell which contains a solid compound as well as pure alkali metal and some amount of buffer gas. The cell is heated to vaporize some of the pure alkali. Resonant laser light is passed through the cell to polarize the atomic vapor, a process known as “optical pumping.” Optical pumping can transfer order from photons to atoms, causing a buildup of vapor atoms in one angular momentum state. This vapor polarization is then transferred through the surface of the solid compound in order to polarize the nuclei in the bulk of the compound. This can produce nuclear polarizations in the sample many times larger than the limit set by thermal equilibrium. The method can be used in nuclear magnetic resonance (NMR) or magnetic resonance imaging (MRI).

Abstract: A digital-to-analog converter generates a voltage from power supply and ground voltages, generates upper and lower limit reference voltages for a reference width which regards the generated voltage as an intermediate potential, converts a change in an analog input signal with respect to the upper and lower limit reference voltages into a digital code, and performs a control in order to achieve a sample and hold of the analog input signal.

Abstract: Provided are a fine pattern forming method for forming a fine resin pattern having an excellent shape on a supporting body, and a coat film forming material used in the fine pattern forming method. A photosensitive resin composition is applied on the supporting body, selectively exposed and developed to form a first resin pattern. On the surface of the first resin pattern, a coat film composed of a water-soluble resin film is formed to form a coat pattern, then, on the supporting body whereupon the coat pattern is formed, a resin composition containing a photo-acid generating agent is applied, and the entire surface is exposed. Then, the work is cleaned by a solvent, and a second resin pattern wherein a resin film is formed on the surface of the coat pattern is formed. The coat film is formed by using the coat film forming material composed of an aqueous solution containing a water soluble resin and a water soluble cross-linking agent.

Abstract: An application liquid capable of forming a dense silica-based coating film even when embedded into a fine groove, and a method for formation of a silica-based coating film using the application liquid are provided. An application liquid is used including (A) a siloxane polymer, and (B) a base generator represented by the following general formula (I): wherein, R1 and R2 are a hydrocarbon group having 1 to 5 carbon atoms and which may be the same or different; or one of R1 and R2 is a hydrogen atom and the other is a hydrocarbon group having 1 to 5 carbon atoms; when R1 and R2 are both a hydrocarbon group, these may bind to one another to form a ring structure; R3 is a linking group; and R4 is a condensed ring.

Abstract: An analog-to-digital converter circuit includes: a capacitor array including a plurality of first capacitors, each having a first terminal connecting to a common node and having a capacitance represented by the nth power of 2 (2n) on the basis of the smallest of the capacitances of the first capacitors=1; a second capacitor for contributing to attenuation of the voltage on the common node; a switch array, each switch of the switch array supplying and disconnecting one of a first reference voltage, a second reference voltage, and the voltage of an input signal to and from a second terminal of an associated one of the first capacitors; a second switch supplying and disconnecting a third reference voltage to and from the common node; a comparator comparing a voltage on the common node with the third reference voltage; and a control circuit controlling the first switches and the second switch.

Abstract: A positive resist composition that exhibits a large exposure margin, and excellent levels of resolution and dry etching resistance, as well as a method of forming a resist pattern that uses the positive resist composition.

Abstract: Provided are a coating formation agent for pattern micro-fabrication, and a method for forming a micropattern using the same, which enables: suppression and/or control of variation of the micro-fabrication size without being accompanied by defect generation following the micro-fabrication process even in ultramicro-fabrication particularly on the order of no greater than 120 nm, or a micro-fabrication process of a resist pattern with an increased aspect ratio; maintainance of a favorable resist pattern configuration after the micro-fabrication process while keeping the desired micro-fabrication size; and also avoidance of defects resulting from development of bacteria and the like after application of the coating formation agent for pattern micro-fabrication.

Abstract: A novel method for forming a pattern capable of decreasing the number of steps in a double patterning process, and a material for forming a coating film suitably used in the method for forming a pattern are provided. First resist film (2) is formed by applying a first chemically amplified resist composition on support (1), and thus formed film is selectively exposed, and developed to form multiple first resist patterns (3). Next, on the surface of the first resist patterns (3) are formed multiple coating patterns (5) by forming coating films (4) constituted with a water soluble resin film, respectively. Furthermore, a second chemically amplified resist composition is applied on the support (1) having the coating pattern (5) formed thereon to form second resist film (6), which is selectively exposed and developed to form multiple second resist patterns (7). Accordingly, a pattern including the coating patterns (5) and the second resist patterns (7) is formed on the support (1).

Abstract: This invention provides a film forming composition for nanoimprinting, which has excellent resistance to etching with oxygen gas, can prevent the separation of a transfer pattern, can eliminate a problem of a holing time on a substrate, and is also excellent in transferability, and photosensitive resist, a nanostructure, a method for pattern formation using the same, and a program for realizing the method for pattern formation. The film forming composition for nanoimprinting comprises a polymeric silicon compound having the function of causing a photocuring reaction. Preferably, the polymeric silicon compound has a functional group cleavable as a result of response to electromagnetic waves and causes a curing reaction upon exposure to electromagnetic waves. More preferred are siloxane polymer compounds, silicon carbide polymer compounds, polysilane polymer compounds, and silazane polymer compounds, or any mixture thereof.

Abstract: An atomic magnetometer includes a cell containing an atomic group, a pump light source, a probe light source, a mirror, and a detector. The cell is disposed between the pump light source and the mirror and between the probe light source and the detector. A pump beam emitted from the pump light source is circularly polarized light. The pump beam passes through the cell and is reflected by the mirror and then passes through the cell again. The probe beam emitted from the probe light source is linearly polarized light. An optical path of the probe beam is parallel to a plane of incidence of the pump beam and is also parallel to a surface of the mirror. The optical path of the probe beam crosses an optical path of the pump beam in the cell. The probe beam which has passed through the cell enters the detector.

Abstract: Disclosed are a film-forming composition which can form a pattern having an enhanced contrast by the action of uneven surface morphology produced after image development, and a method for forming a pattern and a three-dimensional mold using the composition. A composition comprising at least one of a hydrolysate and a condensation product of an alkoxy metal compound represented by the chemical formula (A), the composition additionally comprising a compound which can respond to at least one of light and heat to control the solubility of a finished film in a developing solution. R1n-M(OR2)4-n??(A) wherein M represents a silicon, a germanium, a titanium, a tantalum, an indium or a tin; R1 represents a hydrogen atom or a monovalent organic group; R2 represents a monovalent organic group; and n represents an integer of 1 to 3.

Abstract: The invention provides a positive resist composition which has high etching resistance and attains high resolution, and a method of forming patterns by using the positive resist composition.