Patents by Inventor Kiyoshi Ishikawa

Kiyoshi Ishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090080479
    Abstract: A polarization gain medium such as an emitting laser diode provides the optical pumping. An atomic vapor cell is positioned in the laser cavity providing spontaneous push-pull optical pumping inside the laser cavity. This causes the laser beam to be modulated at hyperfine-resonance frequency. A clock signal is obtained from electrical modulation across the laser diode.
    Type: Application
    Filed: May 7, 2008
    Publication date: March 26, 2009
    Inventors: Yuan-Yu Jau, Kiyoshi Ishikawa, William Happer
  • Publication number: 20090029284
    Abstract: There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask. The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.
    Type: Application
    Filed: June 16, 2006
    Publication date: January 29, 2009
    Applicants: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Shogo Matsumaru, Toshiyuki Ogata, Kiyoshi Ishikawa, Hideo Hada, Shigenori Fujikawa, Toyoki Kunitake
  • Patent number: 7449276
    Abstract: The invention provides a positive photoresist composition which exhibits a high level of etching resistance and attains high resolution, and enables the formation of a fine pattern using an electron beam exposure step, as well as a method for forming a resist pattern that uses the positive photoresist composition. This positive photoresist composition for use with EB contains a resin component (A) that exhibits increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C), wherein the component (A) comprises a copolymer containing a first structural unit (a1) derived from hydroxystyrene and a second structural unit (a2) derived from a (meth)acrylate ester having an alcoholic hydroxyl group, and a portion of the hydroxyl groups of the structural units (a1) and the alcoholic hydroxyl groups of the structural units (a2) are protected with acid dissociable, dissolution inhibiting groups.
    Type: Grant
    Filed: April 22, 2004
    Date of Patent: November 11, 2008
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takuma Hojo, Kiyoshi Ishikawa, Tsuyoshi Nakamura, Tasuku Matsumiya
  • Publication number: 20080241747
    Abstract: A positive resist composition that exhibits a large exposure margin, and excellent levels of resolution and dry etching resistance, as well as a method of forming a resist pattern that uses the positive resist composition.
    Type: Application
    Filed: January 14, 2005
    Publication date: October 2, 2008
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takuma Hojo, Kiyoshi Ishikawa, Tomoyuki Ando
  • Patent number: 7183491
    Abstract: To provide a printed wiring board where the impedance between pads through which differential signals pass has been set to a predetermined standard value. The printed wiring board includes a first conductor layer extending over an area excluding a hole formed for each pad group and filled with a dielectric, and a second conductor layer extending over an area containing areas facing the hole. The hole encompasses a plurality of areas facing predetermined respective pads which are adjacent to each other and which form the pad group from among the plurality of pads.
    Type: Grant
    Filed: December 22, 2003
    Date of Patent: February 27, 2007
    Assignee: Fujitsu Limited
    Inventor: Kiyoshi Ishikawa
  • Publication number: 20070042288
    Abstract: The invention provides a positive photoresist composition which exhibits a high level of etching resistance and attains high resolution, and enables the formation of a fine pattern using an electron beam exposure step, as well as a method for forming a resist pattern that uses the positive photoresist composition. This positive photoresist composition for use with EB contains a resin component (A) that exhibits increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C), wherein the component (A) comprises a copolymer containing a first structural unit (a1) derived from hydroxystyrene and a second structural unit (a2) derived from a (meth)acrylate ester having an alcoholic hydroxyl group, and a portion of the hydroxyl groups of the structural units (a1) and the alcoholic hydroxyl groups of the structural units (a2) are protected with acid dissociable, dissolution inhibiting groups.
    Type: Application
    Filed: April 22, 2004
    Publication date: February 22, 2007
    Inventors: Takuma Hojo, Kiyoshi Ishikawa, Tsuyoshi Nakamura, Tasuku Matsumiya
  • Publication number: 20060247346
    Abstract: The invention provides a positive resist composition which has high etching resistance and attains high resolution, and a method of forming patterns by using the positive resist composition.
    Type: Application
    Filed: April 15, 2004
    Publication date: November 2, 2006
    Inventors: Takuma Hojo, Kiyoshi Ishikawa
  • Publication number: 20060127799
    Abstract: A resist pattern forming method which can prevent a fine resist pattern from collapsing in a drying step after a development treatment in case of forming a resist pattern is provided. This method comprises applying a positive resist composition comprising a resin component (A), which has an alkali-soluble unit content of less than 20 mol % and also has an acid dissociable dissolution inhibiting group, alkali solubility thereof being enhanced by action of acid, an acid generator component (B) which generates an acid under exposure, and an organic solvent (C) which dissolves the components (A) and (B) on a substrate; subjecting the resulting film to prebaking, selective exposure, post exposure baking and alkali development; performing a displacing step of displacing a liquid existing on the substrate with a displacing liquid at least one time; displacing the displacing liquid with a liquid for critical drying; and performing a drying step of drying the liquid for critical drying via a critical state.
    Type: Application
    Filed: December 2, 2003
    Publication date: June 15, 2006
    Inventors: Naotaka Kubota, Kiyoshi Ishikawa, Mitsuru Sato, Tasuku Matsumiya, Kazuhiro Fujii, Kenichi Sato
  • Publication number: 20060063102
    Abstract: There is provided a positive resist composition which, during resist pattern formation, can prevent the collapse of very fine resist patterns during the drying step following developing. This positive resist composition is used in a resist pattern formation method comprising a step, within the lithography process, for substituting a liquid remaining on the substrate following alkali developing with a critical drying liquid, and then drying this critical drying liquid by causing passage through a critical state.
    Type: Application
    Filed: December 1, 2003
    Publication date: March 23, 2006
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Naotaka Kubota, Kiyoshi Ishikawa, Mitsuru Sato, Tasuku Matsumiya
  • Publication number: 20050086119
    Abstract: A method for creating a content with higher advertising function, and an appropriate device for distributing such content are disclosed. A user's PC (100) logs on to a PVad service server (200) and makes a request for distribution of a PVad (a promotion video including an advertisement element). The PVad service server (200) distributes the PVad requested. A PVad is stored by correlating with a PV-ID that is to identify an artist etc. incorporated in a promotion video, and an ad-ID that is to identify an advertised subject incorporated in the promotion video. The PVad service server (200) stores distribution logs for the PVad on a PVad view log counter database (400). An advertiser's PC (600) makes a request for a view data. The PVad service server (200) retrieves a view log from the PVad view log counter database (400) based on an ad-ID, and sends the view log retrieved as a “view data for advertiser”.
    Type: Application
    Filed: January 14, 2003
    Publication date: April 21, 2005
    Inventors: Tsuyoshi Komuro, Fumio Tanaka, Masaru Eshima, Kiyoshi Ishikawa, Yoshihiro Hirata, Hidekazu Imatani
  • Publication number: 20040144562
    Abstract: To provide a printed wiring board where the impedance between pads through which differential signals pass has been set to a predetermined standard value. The printed wiring board includes a first conductor layer extending over an area excluding a hole formed for each pad group and filled with a dielectric, and a second conductor layer extending over an area containing areas facing the hole. The hole encompasses a plurality of areas facing predetermined respective pads which are adjacent to each other and which form the pad group from among the plurality of pads.
    Type: Application
    Filed: December 22, 2003
    Publication date: July 29, 2004
    Applicant: Fujitsu Limited
    Inventor: Kiyoshi Ishikawa
  • Publication number: 20040104196
    Abstract: It is disclosed a method of forming fine patterns comprising: covering a substrate having photoresist patterns thereon made of a photoresist composition which is sensitive to high energy light rays with wavelength of 200 nm or shorter or electron beam radiation, with an over-coating agent for forming fine patterns, applying heat treatment to cause thermal shrinkage of the over-coating agent so that the spacing between adjacent photoresist patterns is lessened by the resulting thermal shrinking action, and removing the over-coating agent substantially completely. The present invention provides a method of forming fine patterns whereby fine patterns having pattern width or diameter of 100 nm or shorter and being excellent in uniformity (in-plane uniformity), etc. can be formed by ultrafine processing using high energy light rays with wavelength of 200 nm or shorter or electron beams.
    Type: Application
    Filed: August 21, 2003
    Publication date: June 3, 2004
    Inventors: Tsuyoshi Nakamura, Tasuku Matsumiya, Kiyoshi Ishikawa, Yoshiki Sugeta, Toshikazu Tachikawa
  • Patent number: 6606586
    Abstract: A physical quantity at a given position in an analysis space is expressed by using a Poisson's equation, a Green's function and the Green's theorem. The equation thus obtained is substituted into an unknown parameter in the equation, to be expanded into infinite series. Stopping the expansion when the equation is expanded to some degree, the equation can be expressed only with known parameters such as boundary conditions. Through calculating the respective values of integrations included in terms of the series by the Monte Carlo method and adding them up, a physical quantity at a given position can be thereby obtained. Further, by the same method, a parasitic element constant at a given position in the analysis space can be also obtained. With this method, a simulation is achieved for obtaining a physical quantity and a parasitic element constant at a given position in an analysis space, without solving a matrix equation.
    Type: Grant
    Filed: May 5, 1999
    Date of Patent: August 12, 2003
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventor: Kiyoshi Ishikawa
  • Patent number: 6153354
    Abstract: An electron beam negative working resist composition is diclosed including: (A) an alkali-soluble resin, (B) an acid-crosslinkable substance, (C) an acid generating agent, and (D) a sensitizing substance, the sensitizing substance (D) being a substance which serves to accumulate electrons or energy through electron beam exposure and to reemit the accumulated electrons or energy into a resist film. Thus, the electron beam negative working resist composition can achieve a desired high sensitivity.
    Type: Grant
    Filed: September 7, 1999
    Date of Patent: November 28, 2000
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yasuhiko Katsumata, Kiyoshi Ishikawa, Katsumi Oomori
  • Patent number: 6087068
    Abstract: Proposed is a novel undercoating composition to form an undercoating layer interposed between the surface of a substrate and a photoresist layer with an object to decrease the adverse influences by the reflection of light on the substrate surface in the pattern-wise exposure of the photo-resist layer to ultraviolet light without the undesirable phenomena of intermixing between layers and notching along with a large selectivity ratio in the etching rates between the patterned resist layer and the undercoating layer in a dry-etching treatment. The undercoating composition comprises (A) an ultraviolet absorber which is a benzophenone compound or an aromatic azomethine compound each having at least one unsubstituted or alkyl-substituted amino group on the aryl groups and (B) a crosslinking agent which is preferably a melamine compound having at least two methylol groups or alkoxymethyl groups bonded to the nitrogen atoms in a molecule in a weight proportion (A):(B) in the range from 1:1 to 1:10.
    Type: Grant
    Filed: March 18, 1999
    Date of Patent: July 11, 2000
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Mitsuru Sato, Katsumi Oomori, Etsuko Iguchi, Kiyoshi Ishikawa, Fumitake Kaneko
  • Patent number: 6083665
    Abstract: A proposal is made for the photolithographic formation of a patterned resist layer on a substrate without the troubles due to reflection of the exposure light on the substrate surface. Thus, patterning is conducted on a photo-resist laminate comprising (a) a substrate; (b) a specific anti-reflection coating layer formed on one surface of the substrate; and (c) a photoresist layer formed on the anti-reflection coating layer from a specific negative-working chemical-sensitization photoresist composition.
    Type: Grant
    Filed: March 22, 1999
    Date of Patent: July 4, 2000
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Mitsuru Sato, Katsumi Oomori, Etsuko Iguchi, Kiyoshi Ishikawa, Fumitake Kaneko, Toshimasa Nakayama
  • Patent number: 6042988
    Abstract: The present invention provides a chemical-amplification-type negative resist composition containing an alkali-soluble resin, a compound capable of generating an acid by irradiation and a crosslinking agent, and the resist composition of the present invention is characterized in that it further contains an organic carboxylic acid compound as an acidic compound and an organic amine compound as an alkaline compound.
    Type: Grant
    Filed: September 29, 1998
    Date of Patent: March 28, 2000
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Mitsuro Sato, Katsumi Oomori, Etsuko Iguchi, Kiyoshi Ishikawa, Fumitake Kaneko, Yoshiki Sugeta
  • Patent number: 5955241
    Abstract: The present invention provides a chemical-amplification-type negative resist composition and a method for forming a negative resist pattern using the same. The chemical-amplification-type negative resist composition comprises (A) an alkali-soluble resin, (B) an acid-generating agent, and (C) a compound capable of causing crosslinking reaction in the presence of an acid, wherein the ingredient (A) is a mixture comprising (i) a copolymer which comprises constitutional repeating units of a hydroxystyrene type, has a weight average molecular weight of 2,000 to 4,000, and has a ratio of the weight average molecular weight to the number average molecular weight falling within 1.0 to 2.0; and (ii) a hydroxystyrene homopolymer, and wherein the dissolution rate of the ingredient (A) at 23.degree. C. in a 2.38% by weight tetramethylammonium hydroxide aqueous solution falls within 80 to 300 nm/s.
    Type: Grant
    Filed: October 23, 1997
    Date of Patent: September 21, 1999
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Mitsuru Sato, Kiyoshi Ishikawa, Hiroyuki Yamazaki, Yoshiki Sugeta, Toshimasa Nakayama
  • Patent number: 5953134
    Abstract: An image forming method for use in image forming apparatus including on the right surface thereof a discharge opening connectable with a post-processing device, the image forming method comprising the steps of:a first step of delivering one or more documents to a read position sequentially starting from the first document to read the documents at the read position, and outputting the documents in the form of images of the same posture as document images to be read on the documents;a second step of reading a document at a position where the same is placed and outputting the document in the form of an image of the same posture of a document image to be read on the document;a third step of forming, on the upper surface of a sheet to be supplied from the left surface side of the image forming apparatus, the images output in the first or second step in the order that they are read, and delivering the formed images in a direction of the right surface of the image forming apparatus; anda fourth step of reversing the
    Type: Grant
    Filed: October 18, 1996
    Date of Patent: September 14, 1999
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Akihiko Sato, Kiyoshi Ishikawa, Yuji Akiyoshi, Akiyoshi Inoue, Hiroaki Ishizawa, Yoshiharu Namba
  • Patent number: 5941839
    Abstract: A rotary apparatus gives a patient a rotational motion at a discretionary controlled speed suitable to medical treatment and at the same time can continuously supply the patient in rotation with oxygen for inhalation by means of oxygen supply equipment. The apparatus is characterized in that a chair 1 on which a patient is sitting is driven, via a rotary shaft 6, by a driving system 3 installed in a control base 2 to rotate, and oxygen for inhalation to be supplied to the patient in rotation is guided to pass through the interior of the rotary shaft 6 and supplied by a mouthpiece 23 provided at the top end of an oxygen supply tube 21 to a position suitable for the patient to breathe.
    Type: Grant
    Filed: September 30, 1997
    Date of Patent: August 24, 1999
    Assignee: Akiko Ishikawa
    Inventor: Kiyoshi Ishikawa