Abstract: A method for generating extreme ultraviolet radiation and soft x-ray radiation with a gas discharge operated on the left branch of the Paschen curve, in particular, for EUV lithography, wherein a discharge chamber (10) of a predetermined gas pressure and two electrodes (11, 12) are used, wherein the electrodes have an opening (14, 15), respectively, positioned on the same symmetry axis (13) and, in the course of a voltage increase (16) upon reaching a predetermined ignition voltage (Uz), generate a plasma (17) located in the area between their openings (14, 15), which plasma is a source of the radiation (17?) to be generated, wherein an ignition of the plasma (17) is realized by affecting the gas pressure and/or by triggering, and wherein, with the ignition of the plasma (17), an energy storage device supplies by means of the electrodes (11, 12) stored energy into the plasma (17), characterized in that the ignition of the plasma (17) is realized by using a predetermined ignition delay (18).

Abstract: The invention relates to a gas discharge lamp for EUV radiation with an anode (1) and a hollow cathode (2), wherein the hollow cathode (2) has at least two openings (3, 3?) and the anode (1) has a through hole (4), which is characterized in that the longitudinal axes (5, 5?) of the hollow cathode openings (3) have a common point of intersection S lying on the axis of symmetry (6) of the anode opening (4).

Abstract: The invention relates to a gas discharge lamp for the wavelength range of extreme ultraviolet radiation and/or soft X-ray radiation with at least two electrodes for providing a radiation-emitting plasma in the intervening discharge space, wherein one of the electrodes has a continuous opening to an adjoining outer region, in which outer region charge carriers can be generated which can be transported through the opening into the discharge space, characterized in that the electrode opening narrows in the direction of the outer region.

Abstract: In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area of two electrode recesses that are coaxial to one another, a gas fill with predetermined gas pressure in accordance with a discharge operation realized on the left branch of the Paschen curve is provided. In this area, a plasma emitting the radiation is generated when supplying energy. The plasma is displaced or deformed by a pressure change of the gas fill in the area of the electrode recesses.

Abstract: A pneumatic gate valve includes a valve housing made of injection-molded plastic material and having a plurality of external ports. Received in the valve housing are a plurality of valve bushings disposed in axial-spaced relationship as to define a valve bore and a plurality of pressure fluid compartments in fluid communication with the ports. A slide member for regulating a flow of compressed air between the ports is accommodated in the valve bore of the valve housing and displaceable in axial direction. The valve bushings are made of plastic material with a same melting temperature as the plastic material of the valve housing so as to realize a material union between the valve bushings and the valve housing, when plastic material is molded around the valve bushings during injection molding of the valve housing.

Abstract: In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area of two electrode recesses that are coaxial to one another, a gas fill with predetermined gas pressure in accordance with a discharge operation realized on the left branch of the Paschen curve is provided. In this area, a plasma emitting the radiation is generated when supplying energy. The plasma is displaced or deformed by a pressure change of the gas fill in the area of the electrode recesses.

Abstract: A method for generating extreme ultraviolet radiation and soft x-ray radiation with a gas discharge operated on the left branch of the Paschen curve, in particular, for EUV lithography,

Abstract: The invention relates to a device for generating extreme ultraviolet and soft x-rays from a gas discharge, operated on the left-hand branch of the Paschen curve. There are two main electrodes, between which there is a gas-filled space, and each main electrode exhibits an opening, by means of which an axis of symmetry [(5)] is defined; and there are means to increase the conversion efficiency. Preferred fields of application are those requiring extreme ultraviolet (EUV) radiation or soft x-rays at a wavelength ranging from approximately 1 to 20 nm, and in particular around 13 nm, such as in EUV lithography.

Abstract: A pneumatic gate valve includes a valve housing made of injection-molded plastic material and having a plurality of external ports. Received in the valve housing are a plurality of valve bushings disposed in axial-spaced relationship as to define a valve bore and a plurality of pressure fluid compartments in fluid communication with the ports. A slide member for regulating a flow of compressed air between the ports is accommodated in the valve bore of the valve housing and displaceable in axial direction. The valve bushings are made of plastic material with a same melting temperature as the plastic material of the valve housing so as to realize a material union between the valve bushings and the valve housing, when plastic material is molded around the valve bushings during injection molding of the valve housing.

Abstract: The invention pertains to a machine tool for processing workpieces with tools, wherein the machine tool has a spindle housing that contains a spindle shaft and accommodates at least one tool as well as a drive device that causes a rotational movement of the spindle shaft. The machine tool is characterized by the fact that the drive device (3) contains a hydraulically operated displacement machine or swash plate device.

Abstract: A method and a device for generating extreme ultraviolet (EUV) and soft x-ray radiation from a gas discharge. The device has at least two electrodes each having a flush opening by which an axis of symmetry is defined, in which an intermediate space with a wide spatial homogenous gas filling between anode and cathode is provided. The electrodes are formed in such a way, that the gas discharge is formed exclusively in the volume defined by the flush openings. The current pulses with respect to amplitude and period duration are selected in such a way that a dense hot plasma channel is formed on the axis of symmetry, the plasma being the source of EUV and/or soft x-ray radiation. The preferred area of application is the EUV projection lithography in the spectral range around 13 nm.

Abstract: The invention pertains to a machine tool for processing workpieces with tools, wherein said machine tool has a spindle housing that contains a spindle shaft and accommodates at least one tool as well as a drive device that causes a rotational movement of the spindle shaft. The machine tool is characterized by the fact that the drive device (3) contains a hydraulically operated displacement machine.

Abstract: The invention relates to a method and a device for reducing imbalances (.DELTA.V.sub.12, .DELTA.V.sub.23, .DELTA.V.sub.31) in a three-phase network (42) by means of a static compensator. According to the invention, a correction signal (.DELTA.B.sub.12, .DELTA.B.sub.23, .DELTA.B.sub.31) is in each case superimposed on a mean susceptance value (B.sub.SVC), which is produced, of the static compensator, which correction signals (.DELTA.B.sub.12, .DELTA.B.sub.23, .DELTA.B.sub.31) are in each case proportional to an imbalance (.DELTA.V.sub.12, .DELTA.V.sub.23, .DELTA.V.sub.31), which imbalances are determined from measured line to earth voltages (V.sub.01, V.sub.02, V.sub.03) by comparisons, in pairs, of the determined line to line voltages (V.sub.12, V.sub.23, V.sub.31). Imbalances (.DELTA.V.sub.12, .DELTA.V.sub.23, .DELTA.V.sub.31) in the three-phase network (42) can thus be reduced in a simple manner.

Abstract: The novel process and device makes it possible to construct linear transfer installations without a special return transport system for workpieces or workpiece carriers, to keep the number of circulating workpieces or workpiece carriers to a minimum, and to increase or reduce the number of stations in the transfer installation in an arbitrary manner. The invention consists of organizing a flow of parts via an arbitrary number of successive stations by the alternating transfer in pairs between respective adjacent stations so that, as a result, a forward as well as a return movement of workpieces or workpiece carriers is produced. For this purpose, dumbbell-type double transfer devices are used between all stations, and alternate of the transfer devices are operated simultaneously to transfer the workpieces.

Abstract: A roller-bearing cage prevents bearing rollers from falling out of the cage when the outer ring of the bearing is away from the cage, for example, when the outer ring is removed, the cage is removed or the cage is swung out from the outer ring. The rollers are held in place by holding knobs formed on a radially outwardly directed cage flange located at the axial end of the rollers. The knobs are located radially outwardly of the pitch circle of the rollers, are spaced circumferentially apart sufficient to be out of contact with the rollers when the rollers are in the operating position of the bearing in contact with the outer and inner ring, yet are spaced close enough together that the space between two holding knobs is less than the diameter of the roller lying opposite the knobs. The knobs are formed on a resilient, outwardly directed cage flange which moves resiliently upon the snapping in and out of the rollers in the cage. The knobs may be hemispherical or frustoconically shaped.

Abstract: A workpiece is clamped onto a worktable that can travel in at least three directions at right angles to each other relatively to each of several tools. The tools which are inserted each in an individually driven work spindle with only one of the spindles cutting at a time. The spindles are located in a stationary spindle support or in spindle supports permitting linear travel. The workpiece and the tools are brought into contact by numerically controlled movements in the Z-direction, in the X- and Y-directions or in the X- and Z-directions. An automatic tool changing device cooperates with the spindles and with at least one tool magazine. For changing tools, one or one each changer arm or comparable device can work in conjunction with a spindle and with at least one tool magazine.

Abstract: A light-sensitive mixture which contains a resinous binder which is insoluble in water but soluble or at least swellable in aqueous-alkaline solutions, and an o-naphthoquinonediazide-sulfonic acid ester, the o-naphthoquinonediazide-sulfonic acid ester being of the formula I ##STR1## in which R is hydrogen or an alkyl or aryl radical andR.sub.1 is hydrogen or a 1,2-naphthoquinone-2-diazide-4-sulfonyl, 1,2-naphthoquinone-2-diazide-5-sulfonyl or 7-methoxy-1,2-naphthoquinone-2-diazide-4-sulfonyl radical,and the number of the identical or different naphthoquinonediazide-sulfonyl radicals, defined as R.sub.1, in the molecule being 1 to 5; is useful in the preparation of light-sensitive resist materials. The resist material produced using the light-sensitive mixture has a high light sensitivity and very good developer resistance to alkaline developers and can be developed without any problems with aqueous, weakly alkaline solutions.

Abstract: A process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulfonic acid or salts thereof, of the general formula Z ##STR1## is disclosed in which X=hydrogen, a metal or an ammonium group, preferably an alkali metal or alkaline earth metal, especially sodium or potassium and the ammonium group.The compounds can be used as much or as intermediates or starting materials for the production of light-sensitive compounds and radiation-sensitive mixtures and materials.

Abstract: The invention relates to novel radiation-sensitive compounds which are esters or amides of a 1,2-naphthoquinone-(2)-diazide-4-sulfonic acid of the general formula ##STR1## in which R.sub.1 and R.sub.2 are identical or different and denote hydrogen, an alkyl group, an alkyl ether group or an alkyl thioether group whose carbon chains may be interrupted by ether oxygen atoms, an acylamino group, carboxylic acid ester group, sulfonic acid ester group or sulfonamide group,R.sub.1 and R.sub.2 not being hydrogen at the same time.The compounds are used as radiation-sensitive components in radiation-sensitive mixtures with which corresponding copying materials can be produced. The compounds have an absorption which is directed towards longer wavelengths matching the emission range of commercially available radiation sources. They also make it possible, in a reliable and practical manner, to carry out negativeworking image reversal processes.

Abstract: Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids are disclosed having the general formula A ##STR1## in which R is an alkyl, epoxyalklyl, alkylcarbonyl or alkylsulfonyl group, the carbon chains of which may be interrupted by oxygen atoms, or a substituted or unsubstituted aralkyl, arylcarbonyl or arylsulfonyl group andX is hydrogen, a metal or an ammonium group.A process for the preparation of the compounds is also disclosed. The compounds can be used as such, or preferably after condensation of their sulfonic acid chlorides with aromatic hydroxy compounds or amines to give the corresponding esters or amides, as light-sensitive compounds in radiation-sensitive mixtures or materials.