Patents by Inventor Kung-Lung Cheng

Kung-Lung Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6498226
    Abstract: This invention provides cycloaliphatic polyimide having the following formula (I): wherein 1 and n are integers from 4 to 7; m is an integer from 0 to 2; p is an integer from 1 to 8; polycyclic aliphatic compound R reprents C1-8 cycloalkyl, cycloalkenyl, cycloalkynyl, norbornenyl, decalinyl, adamantanyl, or cubanyl. That cycloaliphatic polyimide can be a through transparent film, their thermal stability is over 430° C. and dielectric constant is about 2.7.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: December 24, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Kung-Lung Cheng, Shu-Chen Lin, Wen-Ling Lui, Chih-Hsiang Lin, Wei-Ling Lin, Woan-Shiow Tzeng
  • Publication number: 20020120090
    Abstract: This invention provides cycloaliphatic polyimide having the following formula (I): 1
    Type: Application
    Filed: May 3, 2001
    Publication date: August 29, 2002
    Applicant: Industrial Technology Research Institute
    Inventors: Kung-Lung Cheng, Shu-Chen Lin, Wen-Ling Lui, Chih-Hsiang Lin, Wei-Ling Lin, Woan-Shiow Tzeng
  • Patent number: 6313314
    Abstract: The present invention provides a novel method for the preparation of N-azidosulfonyl-arylimides, which are known as photo-initiators. At the outset, substitution reaction of 4-acetamidobenzenesulfonyl halide with MN3 (M denotes hydrogen or alkaline metal) provides the corresponding azide. After de-protection to remove the actyl group, aminoarylsulfonyl azide is extracted with organic solvent, and the extract is directly used for addition reaction with maleic anhydride without concentration. Finally, end products are obtained by dehydration of the addition products using acetic anhydride/metal acetate, followed by re-crystallization in alcohol solvent. The end products are obtained in purer form and greater yield than that in conventional methods.
    Type: Grant
    Filed: August 7, 2000
    Date of Patent: November 6, 2001
    Assignee: Industrial Technology Research Institute
    Inventors: Kung-Lung Cheng, Shu-Chen Lin, Woan-Shiow Tzeng, Se-Tsun Hong
  • Patent number: 6225378
    Abstract: A triazine compound having formula I or formula II: Wherein n is integer from 1 to 5; R1 is hydrogen, halogen, C1-C4 alkyl, or C1-C4 alkoxyl; and R2 is aliphatic amine, aliphatic alcohol, alicyclic amine or alicyclic alcohol, and an epoxy resin composition containing the triazine compound. The epoxy resin composition is suitable for the preparation of the structural substrate of printed circuit boards having low dielectric constant.
    Type: Grant
    Filed: July 1, 1999
    Date of Patent: May 1, 2001
    Assignee: Industrial Technology Research Institute
    Inventors: Shin-Shin Wang, Hung-Chou Kang, Jie-Hwa Ma, Meng-Song Yin, Se-Tsun Hong, Kuo-Yuan Hsu, Kung-Lung Cheng
  • Patent number: 6090870
    Abstract: The present invention provides an epoxy resin composition, comprising:(A) a phenol epoxy resin represented by the following formula (I) ##STR1## wherein each R.sup.1 is the same or different and is independently selected from the group consisting of hydrogen, C.sub.1 to C.sub.6 hydrocarbyl groups, C.sub.6 to C.sub.10 aromatic groups, and C.sub.1 to C.sub.6 hydrocarbyl-substituted C.sub.6 to C.sub.10 aromatic groups,each R.sup.2 is the same or different and is independently selected from the group consisting of hydrogen, C.sub.1 to C.sub.6 hydrocarbyl groups, C.sub.6 to C.sub.10 aromatic groups, and C.sub.1 to C.sub.6 hydrocarbyl-substituted C.sub.6 to C.sub.10 aromatic groups, ##STR2## wherein R.sup.3 is selected from the group consisting of hydrogen, C.sub.1 to C.sub.6 hydrocarbyl groups, C.sub.6 to C.sub.10 aromatic groups, and C.sub.1 to C.sub.6 hydrocarbyl-substituted C.sub.6 to C.sub.10 aromatic groups, each R.sup.
    Type: Grant
    Filed: October 30, 1998
    Date of Patent: July 18, 2000
    Assignee: Industrial Technology Research Institute
    Inventors: Hsiu-Rong Chang, Yeong-Tsyr Hwang, Meng-Song Yin, Kung-Lung Cheng
  • Patent number: 5948923
    Abstract: A number of new phenolepoxy resins are prepared by reacting polyphenol, epihalohydrin and imidazole in a homogeneous reaction medium.
    Type: Grant
    Filed: October 30, 1998
    Date of Patent: September 7, 1999
    Assignee: Industrial Technology Research Institute
    Inventors: Kung-Lung Cheng, Woan-Shiow Tzeng, Shu-Chen Lin
  • Patent number: 5844062
    Abstract: A process for preparing phenolepoxy resin represented by the following formula: ##STR1## wherein: (a) R.sup.1, R.sup.2, R.sup.3, and R.sup.4, which can be the same or different, are hydrogen, C.sub.1 to C.sub.6 alkyl groups, C.sub.6 to C.sub.10 aromatic groups, or C.sub.1 to C.sub.6 alkyl group-substituted C.sub.6 to C.sub.10 aromatic groups; (b) R.sup.5 and R.sup.6, which can be the same or different, are hydrogen, C.sub.1 to C.sub.6 alkyl groups, C.sub.6 to C.sub.10 aromatic groups, or C.sub.1 to C.sub.6 alkyl group-substituted C.sub.6 to C.sub.10 aromatic groups; ##STR2## (c) R.sup.7 is hydrogen, C.sub.1 to C.sub.6 alkyl groups, C.sub.6 to C.sub.10 aromatic groups, or C.sub.1 to C.sub.6 alkyl group-substituted C.sub.6 to C.sub.10 aromatic groups; (d) R.sup.8 and R.sup.9, which can be the same of different, are hydrogen, C.sub.1 to C.sub.6 alkyl groups, C.sub.6 to C.sub.10 aromatic groups, or C.sub.1 to C.sub.6 alkyl group-substituted C.sub.6 to C.sub.10 aromatic groups; and (e) n is an integer of 0 or 1.
    Type: Grant
    Filed: April 29, 1997
    Date of Patent: December 1, 1998
    Assignee: Industrial Technology Research Institute
    Inventors: Kung-Lung Cheng, Woan-Shiow Tzeng, Shu-Chen Lin