Patents by Inventor Kwen-Woo Han

Kwen-Woo Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • COMPOSITION FOR A SILICA BASED LAYER, SILICA BASED LAYER, AND METHOD OF MANUFACTURING A SILICA BASED LAYER
    Publication number: 20150093545
    Abstract: A composition for a silica based layer, a silica based layer, and a method of manufacturing a silica based layer, the composition including a solvent; and a silicon-containing polymer, the silicon-containing polymer having a weight average molecular weight of about 20,000 to about 160,000.
    Type: Application
    Filed: September 17, 2014
    Publication date: April 2, 2015
    Inventors: Kwen-Woo HAN, Taek-Soo KWAK, Bo-Sun KIM, Eun-Su PARK, Jin-Hee BAE, Jin-Woo SEO, Han-Song LEE, Wan-Hee LIM, Byeong-Gyu HWANG, Sang-Kyun KIM, Youn-Jin CHO
  • Resist underlayer composition and process of producing integrated circuit devices using the same
    Patent number: 8962747
    Abstract: A resist underlayer composition includes a solvent, and an organosilane condensation polymerization product of: a compound represented by the following Chemical Formula 1, a compound represented by the following Chemical Formula 2, and a compound represented by the following Chemical Formula 3, [R1O]3Si—X??[Chemical Formula 1] [R2O]3Si—R3??[Chemical Formula 2] [R4O]3Si—Si[OR5]3.
    Type: Grant
    Filed: July 2, 2012
    Date of Patent: February 24, 2015
    Assignee: Cheil Industries, Inc.
    Inventors: Mi-Young Kim, Woo-Jin Lee, Kwen-Woo Han, Han-Song Lee, Sang-Kyun Kim, Jong-Seob Kim
  • RINSE LIQUID FOR INSULATING FILM AND METHOD OF RINSING INSULATING FILM
    Publication number: 20140315367
    Abstract: A rinse liquid for an insulation layer, the rinse liquid including a solvent represented by the following Chemical Formula 1:
    Type: Application
    Filed: November 26, 2013
    Publication date: October 23, 2014
    Inventors: Jin-Hee BAE, Han-Song LEE, Wan-Hee LIM, Go-Un KIM, Taek-Soo KWAK, Bo-Sun KIM, Sang-Kyun KIM, Yoong-Hee NA, Eun-Su PARK, Jin-Woo SEO, Hyun-Ji SONG, Youn-Jin CHO, Kwen-Woo HAN, Byeong-Gyu HWANG
  • Resist underlayer composition and process of producing integrated circuit devices using same
    Patent number: 8841218
    Abstract: A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product of hydrolyzed products produced from a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, and a compound represented by Chemical Formula 3.
    Type: Grant
    Filed: August 10, 2012
    Date of Patent: September 23, 2014
    Assignee: Cheil Industries, Inc.
    Inventors: Kwen-Woo Han, Mi-Young Kim, Woo-Jin Lee, Han-Song Lee, Seung-Hee Hong, Sang-Kyun Kim, Jin-Wook Lee
  • Resin composition for protection layer of color filter, protection layer of color filter using same and image sensor including same
    Patent number: 8628698
    Abstract: Disclosed is a resin composition for a protective layer of a color filter including an acrylate-based resin including a repeating unit represented by each of Chemical Formulae 1 to 3, a melamine-based resin represented by Chemical Formula 4, a thermal acid generator (TAG), and a solvent.
    Type: Grant
    Filed: July 23, 2010
    Date of Patent: January 14, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Se-Young Choi, Jae-Hyun Kim, Nam-Gwang Kim, Eui-June Jeong, Sang-Kyun Kim, Kwen-Woo Han, Hyun-Hoo Sung
  • RESIST UNDERLAYER COMPOSITION AND PROCESS OF PRODUCING INTEGRATED CIRCUIT DEVICES USING SAME
    Publication number: 20130037921
    Abstract: A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product of hydrolyzed products produced from a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, and a compound represented by Chemical Formula 3.
    Type: Application
    Filed: August 10, 2012
    Publication date: February 14, 2013
    Inventors: Kwen-Woo HAN, Mi-Young KIM, Woo-Jin LEE, Han-Song LEE, Seung-Hee HONG, Sang-Kyun KIM, Jin-Wook LEE
  • RESIST UNDERLAYER COMPOSITION AND PROCESS OF PRODUCING INTEGRATED CIRCUIT DEVICES USING THE SAME
    Publication number: 20120270981
    Abstract: A resist underlayer composition includes a solvent, and an organosilane condensation polymerization product of: a compound represented by the following Chemical Formula 1, a compound represented by the following Chemical Formula 2, and a compound represented by the following Chemical Formula 3, [R1O]3Si—X ??[Chemical Formula 1] [R2O]3Si—R3 ??[Chemical Formula 2] [R4O]3Si—Si[OR5]3.
    Type: Application
    Filed: July 2, 2012
    Publication date: October 25, 2012
    Inventors: Mi-Young KIM, Woo-Jin LEE, Kwen-Woo HAN, Han-Song LEE, Sang-Kyun KIM, Jong-Seob KIM
  • Resin Composition for Protection Layer of Color Filter, Protection Layer of Color Filter Using Same and Image Sensor Including Same
    Publication number: 20110156185
    Abstract: Disclosed is a resin composition for a protective layer of a color filter including an acrylate-based resin including a repeating unit represented by each of Chemical Formulae 1 to 3, a melamine-based resin represented by Chemical Formula 4, a thermal acid generator (TAG), and a solvent.
    Type: Application
    Filed: July 23, 2010
    Publication date: June 30, 2011
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Se-Young CHOI, Jae-Hyun KIM, Nam-Gwang KIM, Eui-June JEONG, Sang-Kyun KIM, Kwen-Woo HAN, Hyun-Hoo SUNG
  • Photosensitive resin composition for pad protective layer, and method for making image sensor using the same
    Patent number: 7851789
    Abstract: The present invention provides a photosensitive resin composition for a pad protective layer that includes (A) an alkali soluble resin, (B) a reactive unsaturated compound, (C) a photoinitiator, and (D) a solvent. The (A) alkali soluble resin includes a copolymer including about 5 to about 50 wt % of a unit having the Chemical Formula 1, about 1 to about 25 wt % of a unit having the Chemical Formula 2, and about 45 to about 90 wt % of a unit having the Chemical Formula 3, and a method of making an image sensor using the photosensitive resin composition.
    Type: Grant
    Filed: December 8, 2008
    Date of Patent: December 14, 2010
    Assignee: Cheil Industries Inc.
    Inventors: Kil-Sung Lee, Jae-Hyun Kim, Chang-Min Lee, Eui-June Jeong, Kwen-Woo Han, O-Bum Kwon, Jung-Sik Choi, Jong-Seob Kim, Tu-Won Chang, Jung-Hyun Cho, Seul-Young Jeong
  • PHOTOSENSITIVE RESIN COMPOSITION FOR PAD PROTECTIVE LAYER, AND METHOD FOR MAKING IMAGE SENSOR USING THE SAME
    Publication number: 20090146236
    Abstract: The present invention provides a photosensitive resin composition for a pad protective layer that includes (A) an alkali soluble resin, (B) a reactive unsaturated compound, (C) a photoinitiator, and (D) a solvent. The (A) alkali soluble resin includes a copolymer including about 5 to about 50 wt % of a unit having the Chemical Formula 1, about 1 to about 25 wt % of a unit having the Chemical Formula 2, and about 45 to about 90 wt % of a unit having the Chemical Formula 3, and a method of making an image sensor using the photosensitive resin composition.
    Type: Application
    Filed: December 8, 2008
    Publication date: June 11, 2009
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Kil-Sung LEE, Jae-Hyun KIM, Chang-Min LEE, Eui-June JEONG, Kwen-Woo HAN, O-Bum KWON, Jung-Sik CHOI, Jong-Seob KIM, Tu-Won CHANG, Jung-Hyun CHO, Seul-Young JEONG