Patents by Inventor Lee Chen

Lee Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210183619
    Abstract: An RF antenna is configured, when powered, to inductively generate plasma in a process region of a chamber, including: an array of parallel conductive lines that are oriented along a plane, the array including a first conductive line, a second conductive line, a third conductive line, and a fourth conductive line; wherein the first and second conductive lines are adjacent, wherein the second and third conductive lines are adjacent, and wherein the third and fourth conductive lines are adjacent; wherein when the RF antenna is powered, current flow in the adjacent first and second conductive lines occurs in an opposite direction, current flow in the adjacent second and third conductive lines occurs in a same direction, current flow in the adjacent third and fourth conductive lines occurs in an opposite direction.
    Type: Application
    Filed: July 26, 2019
    Publication date: June 17, 2021
    Inventors: Roger Patrick, Neil M.P. Benjamin, Lee Chen, Alan Schoepp, Clint Edward Thomas, Thomas W. Anderson, Sang Heon Song
  • Publication number: 20200316019
    Abstract: The present invention provides a method for treating a protein aggregation disease, including: administering a pharmaceutical composition comprising a compound represented by the following formula (I) to a subject in need thereof, wherein each R1, R2, R3, R4, R5 and R6 are defined in the specification.
    Type: Application
    Filed: June 24, 2020
    Publication date: October 8, 2020
    Applicant: NATIONAL TAIWAN NORMAL UNIVERSITY
    Inventors: Guey-Jen LEE-CHEN, Wenwei LIN, Ya-Jen CHIU, Te-Hsien LIN
  • Patent number: 10796916
    Abstract: A processing system is disclosed, having a power transmission element with an interior cavity that propagates electromagnetic energy proximate to a continuous slit in the interior cavity. The continuous slit forms an opening between the interior cavity and a substrate processing chamber. The electromagnetic energy may generate an alternating charge in the continuous slit that enables the generation of an electric field that may propagate into the processing chamber. The electromagnetic energy may be conditioned prior to entering the interior cavity to improve uniformity or stability of the electric field. The conditioning may include, but is not limited to, phase angle, field angle, and number of feeds into the interior cavity.
    Type: Grant
    Filed: March 30, 2018
    Date of Patent: October 6, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Merritt Funk, Jianping Zhao, Lee Chen
  • Patent number: 10769406
    Abstract: A non-directional fingerprint and palmprint identification method and a non-directional fingerprint and palmprint data creation method. In the fingerprint and palmprint identification method, a fingerprint and palmprint identification device detects and scans the fingerprints and palmprint of a user to generate a fingerprint and palmprint image and transmit the image to a processor. The processor identifies and calculates the fingerprint and palmprint image to obtain the fingerprint of a specific finger and the palmprint. According to at least one reference line and the fingerprint of the specific finger and the palmprint, the processor identifies and processes the intersection points to generate multiple intersection points.
    Type: Grant
    Filed: March 18, 2018
    Date of Patent: September 8, 2020
    Assignee: KEYCORE TECHNOLOGY CORP.
    Inventors: Wei-Cheng Lin, Ye-Lee Chen, Shih-Hsiu Tseng, Chien-Jen Hsiao
  • Patent number: 10734200
    Abstract: A chemical processing system and a method of using the chemical processing system to treat a substrate with a mono-energetic space-charge neutralized neutral beam-activated chemical process is described. The chemical processing system comprises a first plasma chamber for forming a first plasma at a first plasma potential, and a second plasma chamber for forming a second plasma at a second plasma potential greater than the first plasma potential, wherein the second plasma is formed using electron flux from the first plasma. Further, the chemical processing system comprises a substrate holder configured to position a substrate in the second plasma chamber.
    Type: Grant
    Filed: November 15, 2016
    Date of Patent: August 4, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Lee Chen
  • Patent number: 10735267
    Abstract: A method for web service load balancing may commence with receiving, from a local DNS server, a request for a web service. The local DNS server may be coupled to a web client requesting the web service. The request may include local DNS server information. The method may continue with determining a geographic location of the local DNS server based on the local DNS server information. The method may further include selecting a web server from a plurality of web servers based on the web service. The method may continue with determining a geographic location of the web server and determining that the geographic location of the local DNS server matches the geographic location of the web server. The method may further include selecting the web server based on the match. The method may continue with sending a response to the local DNS server.
    Type: Grant
    Filed: March 22, 2018
    Date of Patent: August 4, 2020
    Assignee: A10 Networks, Inc.
    Inventors: Lee Chen, John Chiong
  • Patent number: 10716768
    Abstract: The present invention provides a use of a compound to prepare a pharmaceutical composition for treating abnormal ?-amyloid aggregation mediated diseases. The compound is represented by the following formula (I): wherein A, B, R1, R2, R3, R4, R5 and R6 are defined in the specification.
    Type: Grant
    Filed: July 21, 2017
    Date of Patent: July 21, 2020
    Assignee: NATIONAL TAIWAN NORMAL UNIVERSITY
    Inventors: Guey-Jen Lee-Chen, Wenwei Lin
  • Patent number: 10685810
    Abstract: An apparatus for generating plasma, including a quadrupole antenna having a center region and an outer region and configured to be disposed over a dielectric window of a plasma chamber. The quadrupole antenna including a first coil defining a first SDA and a second coil defining a second SDA, the first coil being in a nested arrangement within the second coil. The nested arrangement places a turn of the first coil to be adjacent to a corresponding turn of the second coil as the first and second coils spiral from the center region to the outer region of the quadrupole antenna. Adjacent turns of each of the first and second coils are horizontally separated from one another by a distance when disposed over the dielectric window.
    Type: Grant
    Filed: July 15, 2019
    Date of Patent: June 16, 2020
    Assignee: Lam Research Corporation
    Inventors: Hema Swaroop Mopidevi, Lee Chen, Thomas W. Anderson
  • Publication number: 20200118792
    Abstract: An apparatus for generating plasma, including a quadrupole antenna having a center region and an outer region and configured to be disposed over a dielectric window of a plasma chamber. The quadrupole antenna including a first coil defining a first SDA and a second coil defining a second SDA, the first coil being in a nested arrangement within the second coil. The nested arrangement places a turn of the first coil to be adjacent to a corresponding turn of the second coil as the first and second coils spiral from the center region to the outer region of the quadrupole antenna. Adjacent turns of each of the first and second coils are horizontally separated from one another by a distance when disposed over the dielectric window.
    Type: Application
    Filed: July 15, 2019
    Publication date: April 16, 2020
    Inventors: Hema Swaroop Mopidevi, Lee Chen, Thomas W. Anderson
  • Patent number: 10554630
    Abstract: Systems, methods, and non-transitory computer-readable media can receive a password from a user. A first password hash is generated based on the password and a first salt. A second password hash is generated based on the first password hash and a second salt. The first salt, the second salt, and the second password hash are transmitted to a third party.
    Type: Grant
    Filed: January 4, 2017
    Date of Patent: February 4, 2020
    Assignee: Facebook, Inc.
    Inventor: Evan Lee Chen
  • Patent number: 10447775
    Abstract: Provided are methods and systems for balancing servers based on a server load status. A method for balancing servers based on a server load status may commence with receiving, from a server of a plurality of servers, a service response to a service request. The service response may include a computing load of the server. The method may continue with receiving a next service request from a host. The method may further include determining, based on the computing load of the server, whether the server is available to process the next service request. The method may include selectively sending the next service request to the server based on the determination that the server is available to process the next service request.
    Type: Grant
    Filed: March 27, 2018
    Date of Patent: October 15, 2019
    Assignee: A10 Networks, Inc.
    Inventors: Lalgudi Narayanan Kannan, Ronald Wai Lun Szeto, Lee Chen, Feilong Xu, Rajkumar Jalan
  • Publication number: 20190286877
    Abstract: A non-directional fingerprint and palmprint identification method and a non-directional fingerprint and palmprint data creation method. In the fingerprint and palmprint identification method, a fingerprint and palmprint identification device detects and scans the fingerprints and palmprint of a user to generate a fingerprint and palmprint image and transmit the image to a processor. The processor identifies and calculates the fingerprint and palmprint image to obtain the fingerprint of a specific finger and the palmprint. According to at least one reference line and the fingerprint of the specific finger and the palmprint, the processor identifies and processes the intersection points to generate multiple intersection points.
    Type: Application
    Filed: March 18, 2018
    Publication date: September 19, 2019
    Inventors: Wei-Cheng Lin, Ye-Lee Chen, Shih-Hsiu Tseng, Chien-Jen Hsiao
  • Patent number: 10395903
    Abstract: A processing system is disclosed, having an electron beam source chamber that excites plasma to generate an electron beam, and an ion beam source chamber that houses a substrate and also excites plasma to generate an ion beam. The processing system also includes a dielectric injector coupling the electron beam source chamber to the ion beam source chamber that simultaneously injects the electron beam and the ion beam and propels the electron beam and the ion beam in opposite directions. The voltage potential gradient between the electron beam source chamber and the ion beam source chamber generates an energy field that is sufficient to maintain the electron beam and ion beam as a plasma treats the substrate so that radio frequency (RF) power initially applied to the processing system to generate the electron beam can be terminated thus improving the power efficiency of the processing system.
    Type: Grant
    Filed: May 18, 2018
    Date of Patent: August 27, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Zhiying Chen, Lee Chen, Merritt Funk
  • Patent number: 10388528
    Abstract: This disclosure relates to a plasma processing system for controlling plasma density near the edge or perimeter of a substrate that is being processed. The plasma processing system may include a plasma chamber that can receive and process the substrate using plasma for etching the substrate, doping the substrate, or depositing a film on the substrate. This disclosure relates to a plasma processing system that may be configured to enable non-ambipolar diffusion to counter ion loss to the chamber wall. The plasma processing system may include a ring cavity coupled to the plasma processing system that is in fluid communication with plasma generated in the plasma processing system. The ring cavity may be coupled to a power source to form plasma that may diffuse ions into the plasma processing system to minimize the impact of ion loss to the chamber wall.
    Type: Grant
    Filed: May 25, 2016
    Date of Patent: August 20, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Lee Chen, Zhiying Chen, Jianping Zhao, Merritt Funk
  • Patent number: 10375812
    Abstract: A surface wave plasma (SWP) source couples microwave (MW) energy into a processing chamber through, for example, a radial line slot antenna, to result in a low mean electron energy (Te). An ICP source, is provided between the SWP source and the substrate and is energized at a low power, less than 100 watts for 300 mm wafers, for example, at about 25 watts. The ICP source couples energy through a peripheral electric dipole coil to reduce capacitive coupling.
    Type: Grant
    Filed: March 28, 2016
    Date of Patent: August 6, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Jianping Zhao, Lee Chen, Merritt Funk, Radha Sundararajan
  • Patent number: 10354838
    Abstract: An apparatus for generating plasma, including a quadrupole antenna having a center region and an outer region and configured to be disposed over a dielectric window of a plasma chamber. The quadrupole antenna including a first coil defining a first SDA and a second coil defining a second SDA, the first coil being in a nested arrangement within the second coil. The nested arrangement places a turn of the first coil to be adjacent to a corresponding turn of the second coil as the first and second coils spiral from the center region to the outer region of the quadrupole antenna. Adjacent turns of each of the first and second coils are horizontally separated from one another by a distance when disposed over the dielectric window.
    Type: Grant
    Filed: October 10, 2018
    Date of Patent: July 16, 2019
    Assignee: Lam Research Corporation
    Inventors: Hema Swaroop Mopidevi, Lee Chen, Thomas W. Anderson
  • Patent number: 10354841
    Abstract: The present invention provides a SWP (surface wave plasma) processing system that does not create underdense conditions when operating at low microwave power and high gas pressure, thereby achieving a larger process window. The DC ring subsystem can be used to adjust the edge to central plasma density ratio to achieve uniformity control in the SWP processing system.
    Type: Grant
    Filed: April 7, 2016
    Date of Patent: July 16, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Jianping Zhao, Lee Chen, Barton G. Lane, Merritt Funk, Radha Sundararajan
  • Publication number: 20190179963
    Abstract: The disclosed computer-implemented method may include (1) receiving, in a graphical user interface displayed on a computing device, data corresponding to a search request for a target search result, (2) rendering, from a storage device, a list of search results for the search request in the graphical user interface, (3) detecting, by the computing device, a user-initiated event corresponding to an identification of the target search result during the rendering of the list of search results in the graphical user interface, and (4) interrupting, by the computing device, the rendering of the list of search results in response to detecting the user-initiated event corresponding to the identification of the target search result in the graphical user interface. Various other methods, systems, and computer-readable media are also disclosed.
    Type: Application
    Filed: December 13, 2017
    Publication date: June 13, 2019
    Inventors: Ryan Kanoknukulchai, Evan Lee Chen, Yinshi Zhang
  • Publication number: 20190180318
    Abstract: The disclosed computer-implemented method for utilizing machine-readable code in image data for tracking data sharing may include (1) receiving, by a target computing device from a source computing device, image data in a graphical user interface, (2) identifying, by the target computing device, machine-readable code embedded in the image data, and (3) determining, by the target computing device, based on the embedded machine-readable code, one or more tracking metrics associated with sharing the image data. Various other methods, systems, and computer-readable media are also disclosed.
    Type: Application
    Filed: December 13, 2017
    Publication date: June 13, 2019
    Inventors: Evan Lee Chen, Yinshi Zhang
  • Patent number: 10305859
    Abstract: Applying a security policy to an application session, includes recognizing the application session between a network and an application via a security gateway, determining by the security gateway a user identity of the application session using information about the application session, obtaining by the security gateway the security policy comprising network parameters mapped to the user identity, and applying the security policy to the application session by the security gateway. The user identity may be a network user identity or an application user identity recognized from packets of the application session. The security policy may comprise a network traffic policy mapped and/or a document access policy mapped to the user identity, where the network traffic policy is applied to the application session. The security gateway may further generate a security report concerning the application of the security policy to the application session.
    Type: Grant
    Filed: May 22, 2017
    Date of Patent: May 28, 2019
    Assignee: A10 Networks, Inc.
    Inventors: Lee Chen, Dennis Oshiba, John Chiong