Patents by Inventor Lijing Gou
Lijing Gou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10522461Abstract: A method of forming a semiconductor structure comprises forming pools of acidic or basic material in a substrate structure. A resist is formed over the pools of acidic or basic material and the substrate structure. The acidic or basic material is diffused from the pools into portions of the resist proximal to the pools more than into portions of the resist distal to the pools. Then, the resist is exposed to a developer to remove a greater amount of the resist portions proximal to the pools compared to the resist portions distal to the pools to form openings in the resist. The openings have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure. The method may further comprise forming features in the openings of the resist. The features have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure.Type: GrantFiled: July 23, 2018Date of Patent: December 31, 2019Assignee: Micron Technology, Inc.Inventors: Adam L. Olson, Kaveri Jain, Lijing Gou, William R. Brown, Ho Seop Eom, Xue (Gloria) Chen, Anton J. deVilliers
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Patent number: 10242995Abstract: Some embodiments include a string of charge storage devices formed along a vertical channel of semiconductor material; a gate region of a drain select gate (SGD) transistor, the gate region at least partially surrounding the vertical channel; a dielectric barrier formed in the gate region; a first isolation layer formed above the gate region and the dielectric barrier; a drain region of the SGD transistor formed above the vertical channel; and a second isolation layer formed above the first isolation layer and the drain region, wherein the second isolation layer includes a conductive contact in electrical contact with the drain region of the SGD transistor. Additional apparatus and methods are disclosed.Type: GrantFiled: November 9, 2017Date of Patent: March 26, 2019Assignee: Micron Technology, Inc.Inventors: Hongbin Zhu, Lijing Gou, Gordon Haller, Luan C. Tran
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Publication number: 20180366406Abstract: A method of forming a semiconductor structure comprises forming pools of acidic or basic material in a substrate structure. A resist is formed over the pools of acidic or basic material and the substrate structure. The acidic or basic material is diffused from the pools into portions of the resist proximal to the pools more than into portions of the resist distal to the pools. Then, the resist is exposed to a developer to remove a greater amount of the resist portions proximal to the pools compared to the resist portions distal to the pools to form openings in the resist. The openings have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure. The method may further comprise forming features in the openings of the resist. The features have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure.Type: ApplicationFiled: July 23, 2018Publication date: December 20, 2018Inventors: Adam L. Olson, Kaveri Jain, Lijing Gou, William R. Brown, Ho Seop Eom, Xue (Gloria) Chen, Anton J. deVilliers
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Patent number: 10032719Abstract: A method of forming a semiconductor structure comprises forming pools of acidic or basic material in a substrate structure. A resist is formed over the pools of acidic or basic material and the substrate structure. The acidic or basic material is diffused from the pools into portions of the resist proximal to the pools more than into portions of the resist distal to the pools. Then, the resist is exposed to a developer to remove a greater amount of the resist portions proximal to the pools compared to the resist portions distal to the pools to form openings in the resist. The openings have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure. The method may further comprise forming features in the openings of the resist. The features have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure.Type: GrantFiled: May 26, 2017Date of Patent: July 24, 2018Assignee: Micron Technology Inc.Inventors: Adam L. Olson, Kaveri Jain, Lijing Gou, William R. Brown, Ho Seop Eom, Xue (Gloria) Chen, Anton J. deVilliers
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Publication number: 20180069015Abstract: Some embodiments include a string of charge storage devices formed along a vertical channel of semiconductor material; a gate region of a drain select gate (SGD) transistor, the gate region at least partially surrounding the vertical channel; a dielectric barrier formed in the gate region; a first isolation layer formed above the gate region and the dielectric barrier; a drain region of the SGD transistor formed above the vertical channel; and a second isolation layer formed above the first isolation layer and the drain region, wherein the second isolation layer includes a conductive contact in electrical contact with the drain region of the SGD transistor. Additional apparatus and methods are disclosed.Type: ApplicationFiled: November 9, 2017Publication date: March 8, 2018Inventors: Hongbin Zhu, Lijing Gou, Gordon Haller, Luan C. Tran
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Patent number: 9842847Abstract: Some embodiments include a string of charge storage devices formed along a vertical channel of semiconductor material; a gate region of a drain select gate (SGD) transistor, the gate region at least partially surrounding the vertical channel; a dielectric barrier formed in the gate region; a first isolation layer formed above the gate region and the dielectric barrier; a drain region of the SGD transistor formed above the vertical channel; and a second isolation layer formed above the first isolation layer and the drain region, wherein the second isolation layer includes a conductive contact in electrical contact with the drain region of the SGD transistor. Additional apparatus and methods are disclosed.Type: GrantFiled: February 11, 2015Date of Patent: December 12, 2017Assignee: Micron Technology, Inc.Inventors: Hongbin Zhu, Lijing Gou, Gordon Haller, Luan C. Tran
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Publication number: 20170263552Abstract: A method of forming a semiconductor structure comprises forming pools of acidic or basic material in a substrate structure. A resist is formed over the pools of acidic or basic material and the substrate structure. The acidic or basic material is diffused from the pools into portions of the resist proximal to the pools more than into portions of the resist distal to the pools. Then, the resist is exposed to a developer to remove a greater amount of the resist portions proximal to the pools compared to the resist portions distal to the pools to form openings in the resist. The openings have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure. The method may further comprise forming features in the openings of the resist. The features have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure.Type: ApplicationFiled: May 26, 2017Publication date: September 14, 2017Inventors: Adam L. Olson, Kaveri Jain, Lijing Gou, William R. Brown, Ho Seop Eom, Xue (Gloria) Chen, Anton J. deVilliers
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Patent number: 9666531Abstract: A method of forming a semiconductor structure comprises forming pools of acidic or basic material in a substrate structure. A resist is formed over the pools of acidic or basic material and the substrate structure. The acidic or basic material is diffused from the pools into portions of the resist proximal to the pools more than into portions of the resist distal to the pools. Then, the resist is exposed to a developer to remove a greater amount of the resist portions proximal to the pools compared to the resist portions distal to the pools to form openings in the resist. The openings have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure. The method may further comprise forming features in the openings of the resist. The features have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure.Type: GrantFiled: June 24, 2016Date of Patent: May 30, 2017Assignee: Micron Technology, Inc.Inventors: Adam L. Olson, Kaveri Jain, Lijing Gou, William R. Brown, Ho Seop Eom, Xue Chen, Anton J. deVilliers
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Publication number: 20160307839Abstract: A method of forming a semiconductor structure comprises forming pools of acidic or basic material in a substrate structure. A resist is formed over the pools of acidic or basic material and the substrate structure. The acidic or basic material is diffused from the pools into portions of the resist proximal to the pools more than into portions of the resist distal to the pools. Then, the resist is exposed to a developer to remove a greater amount of the resist portions proximal to the pools compared to the resist portions distal to the pools to form openings in the resist. The openings have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure. The method may further comprise forming features in the openings of the resist. The features have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure.Type: ApplicationFiled: June 24, 2016Publication date: October 20, 2016Inventors: Adam L. Olson, Kaveri Jain, Lijing Gou, William R. Brown, Ho Seop Eom, Xue Chen, Anton J. deVilliers
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Publication number: 20160233225Abstract: Some embodiments include a string of charge storage devices formed along a vertical channel of semiconductor material; a gate region of a drain select gate (SGD) transistor, the gate region at least partially surrounding the vertical channel; a dielectric barrier formed in the gate region; a first isolation layer formed above the gate region and the dielectric barrier; a drain region of the SGD transistor formed above the vertical channel; and a second isolation layer formed above the first isolation layer and the drain region, wherein the second isolation layer includes a conductive contact in electrical contact with the drain region of the SGD transistor. Additional apparatus and methods are disclosed.Type: ApplicationFiled: February 11, 2015Publication date: August 11, 2016Inventors: Hongbin Zhu, Lijing Gou, Gordon Haller, Luan C. Tran
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Patent number: 9396996Abstract: A method of forming a semiconductor structure comprises forming pools of acidic or basic material in a substrate structure. A resist is formed over the pools of acidic or basic material and the substrate structure. The acidic or basic material is diffused from the pools into portions of the resist proximal to the pools more than into portions of the resist distal to the pools. Then, the resist is exposed to a developer to remove a greater amount of the resist portions proximal to the pools compared to the resist portions distal to the pools to form openings in the resist. The openings have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure. The method may further comprise forming features in the openings of the resist. The features have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure.Type: GrantFiled: September 9, 2015Date of Patent: July 19, 2016Assignee: Micron Technology, Inc.Inventors: Adam L. Olson, Kaveri Jain, Lijing Gou, William R. Brown, Ho Seop Eom, Xue (Gloria) Chen, Anton J. deVilliers
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Patent number: 9291907Abstract: Methods of forming resist features, resist patterns, and arrays of aligned, elongate resist features are disclosed. The methods include addition of a compound, e.g., an acid or a base, to at least a lower surface of a resist to alter acidity of at least a segment of one of an exposed, acidic resist region and an unexposed, basic resist region. The alteration, e.g., increase or decrease, in the acidity shifts an acid-base equilibrium to either encourage or discourage development of the segment. Such “chemical proximity correction” techniques may be used to enhance the acidity of an exposed, acidic resist segment, to enhance the basicity of an unexposed, basic resist segment, or to effectively convert an exposed, acidic resist segment to an unexposed, basic resist segment or vice versa. Thus, unwanted line breaks, line merges, or misalignments may be avoided.Type: GrantFiled: May 18, 2012Date of Patent: March 22, 2016Assignee: Micron Technology, Inc.Inventors: Kaveri Jain, Adam L. Olson, William R. Brown, Lijing Gou, Ho Seop Eom, Anton J. deVilliers
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Patent number: 9235134Abstract: Photolithographic apparatus and methods are disclosed. One such apparatus includes an optical path configured to provide a first diffraction pattern in a portion of an optical system and to provide a second diffraction pattern to the portion of the optical system after providing the first diffraction pattern. Meanwhile, one such method includes providing a first diffraction pattern onto a portion of an optical system, wherein a semiconductor article is imaged using the first diffraction pattern. A second diffraction pattern is also provided onto the portion of the optical system, but the second diffraction pattern is not used to image the semiconductor article.Type: GrantFiled: August 16, 2010Date of Patent: January 12, 2016Assignee: Micron Technology, Inc.Inventors: Yuan He, Kaveri Jain, Lijing Gou, Zishu Zhang, Anton deVilliers, Michael Hyatt, Jianming Zhou, Scott Light, Dan Millward
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Publication number: 20150380307Abstract: A method of forming a semiconductor structure comprises forming pools of acidic or basic material in a substrate structure. A resist is formed over the pools of acidic or basic material and the substrate structure. The acidic or basic material is diffused from the pools into portions of the resist proximal to the pools more than into portions of the resist distal to the pools. Then, the resist is exposed to a developer to remove a greater amount of the resist portions proximal to the pools compared to the resist portions distal to the pools to form openings in the resist. The openings have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure. The method may further comprise forming features in the openings of the resist. The features have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure.Type: ApplicationFiled: September 9, 2015Publication date: December 31, 2015Inventors: Adam L. Olson, Kaveri Jain, Lijing Gou, William R. Brown, Ho Seop Eom, Xue (Gloria) Chen, Anton J. deVilliers
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Patent number: 9140977Abstract: An imaging device comprising a first region and a second region. Imaging features in the first region and assist features in the second region are substantially the same size as one another and are formed substantially on pitch. Methods of forming an imaging device and methods of forming a semiconductor device structure are also disclosed.Type: GrantFiled: May 13, 2013Date of Patent: September 22, 2015Assignee: MICRON TECHNOLOGY, INC.Inventors: Yuan He, Kaveri Jain, Lijing Gou, Zishu Zhang, Anton J. deVilliers, Michael Hyatt, Jianming Zhou, Scott L. Light, Dan B. Millward
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Patent number: 9142504Abstract: Methods of forming features are disclosed. One method comprises forming a resist over a pool of acidic or basic material on a substrate structure, selectively exposing the resist to an energy source to form exposed resist portions and non-exposed resist portions, and diffusing acid or base of the acidic or basic material from the pool into proximal portions of the resist. Another method comprises forming a plurality of recesses in a substrate structure. The plurality of recesses are filled with a pool material comprising acid or base. A resist is formed over the pool material and the substrate structure and acid or base is diffused into adjacent portions of the resist. The resist is patterned to form openings in the resist. The openings comprise wider portions distal to the substrate structure and narrower portions proximal to the substrate structure. Additional methods and semiconductor device structures including the features are disclosed.Type: GrantFiled: August 12, 2014Date of Patent: September 22, 2015Assignee: MICRON TECHNOLOGY, INC.Inventors: Adam L. Olson, Kaveri Jain, Lijing Gou, William R. Brown, Ho Seop Eom, Xue Chen, Anton J. deVilliers
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Publication number: 20150015860Abstract: A method of mitigating asymmetric lens heating in photolithographically patterning a photo-imageable material using a reticle includes determining where first hot spot locations are expected to occur on a lens when using a reticle to pattern a photo-imageable material. The reticle is then fabricated to include non-printing features within a non-printing region of the reticle which generate additional hot spot locations on the lens when using the reticle to pattern the photo-imageable material. Other implementations are contemplated, including reticles which may be independent of method of use or fabrication.Type: ApplicationFiled: September 29, 2014Publication date: January 15, 2015Inventors: Scott L. Light, Dan Millward, Yuan He, Kaveri Jain, Lijing Gou, Zishu Zhang, Anton J. deVilliers, Michael D. Hyatt, Jianming Zhou
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Publication number: 20140353803Abstract: Methods of forming features are disclosed. One method comprises forming a resist over a pool of acidic or basic material on a substrate structure, selectively exposing the resist to an energy source to form exposed resist portions and non-exposed resist portions, and diffusing acid or base of the acidic or basic material from the pool into proximal portions of the resist. Another method comprises forming a plurality of recesses in a substrate structure. The plurality of recesses are filled with a pool material comprising acid or base. A resist is formed over the pool material and the substrate structure and acid or base is diffused into adjacent portions of the resist. The resist is patterned to form openings in the resist. The openings comprise wider portions distal to the substrate structure and narrower portions proximal to the substrate structure. Additional methods and semiconductor device structures including the features are disclosed.Type: ApplicationFiled: August 12, 2014Publication date: December 4, 2014Inventors: Adam L. Olson, Kaveri Jain, Lijing Gou, William R. Brown, Ho Seop Eom, Xue Chen, Anton J. deVilliers
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Patent number: 8883372Abstract: A reticle with a composite polarizer includes: a transparent substrate; a patterned layer disposed on said transparent substrate; and a polarizing filter disposed on said transparent substrate, wherein said transparent substrate is substantially transparent with respect to illumination light, said patterned layer is partially opaque with respect to said illumination light, and said polarizing filter is capable of selectively polarizing said illumination light.Type: GrantFiled: June 5, 2012Date of Patent: November 11, 2014Assignee: Nanya Technology Corp.Inventors: Scott Light, Dan Millward, Anton Devilliers, Yuan He, Michael Hyatt, Lijing Gou, Kaveri Jain, Zishu Zhang, Jianming Zhou
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Patent number: 8859195Abstract: A method of lithographically patterning a substrate that has photoresist having removal areas and non-removal areas includes first exposing at least the non-removal areas to radiation effective to increase outer surface roughness of the photoresist in the non-removal areas at least post-develop but ineffective to change photoresist solubility in a developer for the photoresist to be cleared from the non-removal areas upon develop with the developer. Second exposing of radiation to the removal areas is conducted to be effective to change photoresist solubility in the developer for the photoresist to be cleared from the removal areas upon develop with the developer. The photoresist is developed with the developer effective to clear photoresist from the removal areas and to leave photoresist in the non-removal areas that has outer surface roughness in the non-removal areas which is greater than that before the first exposing. Other implementations and embodiments are contemplated.Type: GrantFiled: October 24, 2012Date of Patent: October 14, 2014Assignee: Micron Technology, Inc.Inventors: Yoshiki Hishiro, Scott Sills, Hiroyuki Mori, Troy Gugel, Paul D. Shirley, Lijing Gou, Adam Olson